| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/25/1989 | US4851978 Illumination device using a laser |
| 07/25/1989 | US4851882 Illumination optical system |
| 07/25/1989 | US4851881 Optical printing system |
| 07/25/1989 | US4851656 Method and apparatus for enhancing optical photoplotter accuracy |
| 07/25/1989 | US4851506 Protective coating, etch mask |
| 07/25/1989 | US4851324 Phenoxy propanol containing developer compositions for lithographic plates having neutral pH |
| 07/25/1989 | US4851319 Stable and durable lithographic printing plates |
| 07/25/1989 | US4851311 End point detection by measurement of reflected light; semiconductors |
| 07/25/1989 | US4850381 Machine for stripping wafers |
| 07/25/1989 | CA1257868A1 Oxime sulfonates containing reactive groups |
| 07/25/1989 | CA1257803A1 Photosensitive polymer composition and electrophoretic deposition process |
| 07/19/1989 | EP0324615A2 Metal oxide superconducting polymer composites |
| 07/19/1989 | EP0324493A2 Optical waveguide devices, elements for making the devices and methods of making the devices and elements |
| 07/19/1989 | EP0324492A2 Optical fiber connector assemblies and methods of making the assemblies |
| 07/19/1989 | EP0324485A2 Photosensitive resin composition |
| 07/19/1989 | EP0324482A2 Process of forming reflection holograms in photopolymerizable layers |
| 07/19/1989 | EP0324481A2 Storage stable photopolymerizable composition for refractive index imaging |
| 07/19/1989 | EP0324480A2 Photopolymerizable compositions and elements for refractive index imaging |
| 07/19/1989 | EP0324436A2 Apparatus for preselecting and maintaining a fixed gap between a workpiece and a vacuum seal apparatus in particle beam lithography systems |
| 07/19/1989 | EP0324059A2 Positive working radiation-sensitive composition and radiation-sensitive recording material produced therefrom |
| 07/19/1989 | CN1034073A System for registering to a moving web |
| 07/18/1989 | US4849901 Substrate exposure apparatus with flatness detection and alarm |
| 07/18/1989 | US4849785 Image recording apparatus |
| 07/18/1989 | US4849777 Lamp driver scheme |
| 07/18/1989 | US4849323 Diazonium photoreactive agent |
| 07/18/1989 | US4849322 Binder of acrylic acid-ethyl acrylate-methyl methacrylate terpolymer containing epoxy acrylate monomer and plasticized with second acrylate monomer |
| 07/18/1989 | US4849321 UV curable compositions for making improved solder mask coatings |
| 07/18/1989 | US4849320 Photopolymerization, cationic polymerization, wavelengths |
| 07/18/1989 | US4849314 Photopolymerization |
| 07/18/1989 | US4849313 Method for making a reticle mask |
| 07/18/1989 | US4849307 Photosensitive recording layer which is graft polymer of polyalkylene oxide and vinyl ester units |
| 07/18/1989 | US4849069 Of submicron cross-sectional dimensions, semiconductors |
| 07/18/1989 | US4849051 Heat resistant positive resists and method for preparing heat-resistant relief structures |
| 07/18/1989 | CA1257728A1 Mixtures crosslinkable by photopolymerization |
| 07/18/1989 | CA1257610A1 Photoresist processing solution |
| 07/13/1989 | WO1989006430A1 Gap sensing/adjustment apparatus and method for a lithography machine |
| 07/13/1989 | WO1989006379A1 Aqueous developing solution and its use in developing positive-working photoresist composition |
| 07/13/1989 | WO1989006378A1 Use of particular mixtures of ethyl lactate and methyl ethyl ketone to remove undesirable peripheral material (e.g. edge beads) from photoresist-coated substrates |
| 07/13/1989 | WO1989006376A1 Positioning subassembly for a lithography machine |
| 07/12/1989 | EP0323887A2 Heat-sensitive diazo recording materials |
| 07/12/1989 | EP0323836A2 Method for manufacturing lithographic printing plates |
| 07/12/1989 | EP0323631A2 Styryl compounds, process for preparing the same and photoresist compositions comprising the same |
| 07/12/1989 | EP0323563A2 Photosensitive thermosetting resin composition and method of forming solder resist pattern by use thereof |
| 07/12/1989 | EP0179823B1 Process for the sensitization of an oxidoreduction photocalatyst, and photocatalyst thus obtained |
| 07/11/1989 | US4847661 Image recording apparatus using microcapsule carrying sheet and separate developer sheet |
| 07/11/1989 | US4847359 Diamino-9,10-dihydroanthracenes and polyamide acid (esters) and polyimides derived therefrom |
| 07/11/1989 | US4847183 Etching, relief patterns |
| 07/11/1989 | US4847182 Method for developing a photopolymer printing plate using a developer comprising terpene hydrocarbons |
| 07/11/1989 | US4847178 Positive photosensitive o-quinone diazide composition with benzotriazole carboxylic acid or alkyl ester |
| 07/11/1989 | US4847119 Semiconductor holding fixture and method |
| 07/11/1989 | US4847110 Transfer recording medium and process for production thereof |
| 07/11/1989 | US4846929 Wet etching of thermally or chemically cured polyimide |
| 07/11/1989 | CA1257441A1 Polymerisable compositions |
| 07/11/1989 | CA1257129A1 Photo-polymerizable composition and printing plate prepared therefrom |
| 07/05/1989 | EP0323427A2 Light-sensitive compositions with phenol resins and quinone diarides |
| 07/05/1989 | EP0323264A2 X-ray exposure process using an electrically conductive x-ray mask |
| 07/05/1989 | EP0323191A2 Image-forming material |
| 07/05/1989 | EP0323050A2 Photosensitive compound |
| 07/05/1989 | EP0322585A2 Improved photopolymerizable imaging materials |
| 07/05/1989 | CN1033699A Photocurable composition containing photoreducible dye and thiol |
| 07/04/1989 | US4845183 Heat resistant polyamide and polybenzoxazole from bis-((amino-hydroxyphenyl)hexafluoroisopropyl)diphenyl ethers |
| 07/04/1989 | US4845143 Pattern-forming material |
| 07/04/1989 | US4845053 Flame ashing process for stripping photoresist |
| 07/04/1989 | US4845014 Method of forming a channel |
| 07/04/1989 | US4845013 Aftertreatment of relief plates using solution comprising a carboxylic acid and a bromide |
| 07/04/1989 | US4845012 Photocurable electrodeposition coating compositions for printed circuit photoresist films |
| 07/04/1989 | US4845011 Basified acridine compound, a triazine or quinazolinone compound |
| 07/04/1989 | US4845010 Silver complex diffusion transfer processing |
| 07/04/1989 | US4845009 Photosensitive composition comprising a polymer with maleimido group in side chain and a diazo resin |
| 07/04/1989 | US4845008 Quick-drying, lithographic printing plates |
| 07/04/1989 | US4844947 Technique for the application and cure of photosensitive paints |
| 07/04/1989 | US4844832 Containing an arylsulfonic acid, a phenol and a naphalenic solvent |
| 07/04/1989 | US4844772 Laminator |
| 07/04/1989 | US4844758 Thin film coating method |
| 07/04/1989 | US4844568 Scanning type projection exposure system |
| 07/04/1989 | CA1256759A1 Coated material and its use |
| 07/04/1989 | CA1256698A1 Uv stabilizer for polyacetylenic recording media |
| 06/29/1989 | WO1989005996A1 A photoresist composition including a copolymer from maleimide and a vinyl-ether or -ester |
| 06/29/1989 | WO1989005995A1 Method and apparatus for generating high-resolution images |
| 06/29/1989 | WO1989005800A1 Novel barbituric acid compounds, photoresists therefrom and method for preparation |
| 06/29/1989 | DE3842507A1 Process for the production of a multicolour pattern for colour filters |
| 06/29/1989 | DE3842481A1 Process for the production of an X-ray mask |
| 06/29/1989 | DE3841571A1 Photosensitive composition |
| 06/28/1989 | EP0322233A2 Method for producing ultrathin metal film and ultrathin-thin metal pattern |
| 06/28/1989 | EP0322205A2 Automated photolithographic work cell |
| 06/28/1989 | EP0321882A2 Polyfunctional ethylenically unsaturated cellulosic polymer-based photocurable compositions |
| 06/28/1989 | EP0321828A2 Photopolymerisable mixture and recording material manufactured therefrom |
| 06/28/1989 | EP0321827A2 Photopolymerisable mixture and recording material manufactured therefrom |
| 06/28/1989 | EP0321826A2 Photopolymerisable mixture and recording material manufactured therefrom |
| 06/28/1989 | EP0321618A1 Photosensitive hardenable compositions |
| 06/28/1989 | CN2040262U Locating makeup machine |
| 06/27/1989 | US4843137 In solvent for diorganodihalosilane reactant |
| 06/27/1989 | US4842992 Method of treating photoresists |
| 06/27/1989 | US4842990 Crosslinked silicone ink-repellent |
| 06/27/1989 | US4842989 Resist layer and process for forming resist pattern thereon |
| 06/27/1989 | US4842988 Lamination between crosslinked silicone elastomers |
| 06/27/1989 | US4842987 Photosensitive element for producing printing plates or resist images |
| 06/27/1989 | US4842986 Positively working resist material |
| 06/27/1989 | US4842984 Water developable |
| 06/27/1989 | US4842983 Light-sensitive compositions and light-sensitive materials with phenolic resol having dibenzylic ether linkages |