Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/1989
09/12/1989US4865938 Developers
09/12/1989CA1259239A1 Photoetching process for making surgical needles
09/12/1989CA1259219A1 Radiation sensitive plates
09/12/1989CA1259218A1 Dry film resist and production of resist images
09/08/1989WO1989008281A1 Image processing apparatus
09/08/1989WO1989008280A1 Improved developer solutions for pmma electron resist
09/08/1989WO1989008021A1 Stereolithography using composition providing reduced distortion
09/07/1989DE3906676A1 Photosensitive material for lithographic printing plates, and process for the production of printing plates
09/06/1989EP0331496A1 Polyfluoride sulfonium compounds and polymerization initiator thereof
09/06/1989EP0331494A2 Photoresist process
09/06/1989EP0331437A2 Characterization of semiconductor resist material during processing
09/06/1989EP0331413A1 Novel sulfonium salts and the use thereof as photoinitiators
09/06/1989EP0331233A2 Method of manufacturing a laminated element and the element thus obtained
09/06/1989EP0331171A2 Light-sensitive composition
09/06/1989EP0331022A2 Radiation induced pattern deposition
09/06/1989EP0331007A2 Light-sensitive recording materials for the manufacture of scratch-resistant intaglio printing formes
09/06/1989CN1035364A Photopolymerizable compositions and elements for refractive index imaging
09/05/1989US4864418 Display unit for controlling pattern printing
09/05/1989US4864360 Exposure apparatus
09/05/1989US4864356 Exposure device for image recording apparatus
09/05/1989US4864353 Image recording apparatus
09/05/1989US4864343 Pressure development roll for imaging sheets employing photosensitive microcapsules
09/05/1989US4864145 Apparatus and method for curing photosensitive coatings
09/05/1989US4863835 Developer composition for lithographic printing plates
09/05/1989US4863834 Silicon-containing polymers as resists
09/05/1989US4863833 Pattern-forming material and its production and use
09/05/1989US4863831 Photosensitive lithographic plate requiring no dampening water having a gelatin primer layer
09/05/1989US4863829 Positive type high gamma-value photoresist composition with novolak resin possessing
09/05/1989US4863828 Positive-working o-quinone diazide photoresist composition
09/05/1989US4863827 Postive working multi-level photoresist
09/05/1989US4863557 Pattern forming process and thin-film magnetic head formed by said process
09/05/1989US4863548 Test pattern for use monitoring variations of critical dimensions of patterns during fabrication of semiconductor devices
09/05/1989US4863547 Equipment for heating and cooling substrates for coating photo resist thereto
08/1989
08/31/1989DE3805385A1 Apparatus for holding constant the temperature of substrates
08/30/1989EP0330504A2 Photosensitive material and image forming method
08/30/1989EP0330406A2 Radiation-sensitive resin composition
08/30/1989EP0330386A2 Radiation sensitive materials and devices made therewith
08/30/1989EP0330344A2 Method of crosslinking collagen using photoactivatable chemical crosslinkers. Uses of both the such crosslinked collagen or amino acid containing polymers .
08/30/1989EP0330339A2 Dry film photoresist for forming a conformable mask and method of application to a printed circuit board or the like
08/30/1989EP0330239A2 Photosensitive composition
08/30/1989EP0330215A2 Method for making lithographic printing plate
08/30/1989EP0330209A2 Photoreactive polymers and process for the production of a two-layer resist
08/30/1989EP0330059A2 Mixture polymerisable by radiation, and a recording material manufactured from it
08/30/1989EP0329917A1 Tool for connecting a cable core
08/30/1989EP0329791A1 Photosensitive resin composition and color filter
08/29/1989US4862064 End sensor
08/29/1989US4862008 Method and apparatus for optical alignment of semiconductor by using a hologram
08/29/1989US4861916 Photoinitiators for photopolymerization of unsaturated systems
08/29/1989US4861899 Photochromic gamma butyrolactones
08/29/1989US4861854 Photosensitive polyimide precursor
08/29/1989US4861806 Process for curing polyisocyanate coatings in the presence of a ferrocenium compound
08/29/1989US4861732 Method for removing an ion-implanted organic resin layer during fabrication of semiconductor devices
08/29/1989US4861699 Photosensitive material on support plate, separation layer, and second photosensitive material
08/29/1989US4861698 Hardened gelatin, silicone rubber
08/29/1989US4861696 Light-sensitive material comprising light-sensitive layer provided on support having low air permeability
08/29/1989US4861695 Light-sensitive recording medium, cartridge encasing same, and image recording system therefor
08/29/1989US4861629 Polyfunctional ethylenically unsaturated cellulosic polymer-based photocurable compositions
08/29/1989US4861438 Method of making patterns
08/29/1989US4861424 Ashing process of a resist layer formed on a substrate under fabrication to a semiconductor device
08/29/1989US4861422 Method of manufacturing shadow mask and apparatus
08/29/1989US4861162 Alignment of an object
08/29/1989US4861148 Projection optical system for use in precise copy
08/29/1989US4861140 Method of making a thin lens
08/29/1989CA1258946A1 Polyimides, a process for their preparation and their use
08/24/1989WO1989007787A1 Method of preparing substrate having pattern formed thereon
08/24/1989WO1989007786A1 Photoresist composition
08/24/1989WO1989007785A1 Coating compositions
08/24/1989DE3904055A1 Ir-fenster mit metallgitter und verfahren zum herstellen eines solchen fensters IR window with metal mesh and method for producing such a window
08/23/1989EP0329610A2 Silicium-containing positive photoresist compositions with 1,2 disulfones
08/23/1989EP0329439A2 Method and apparatus for glossing sheets
08/23/1989EP0329313A2 Laser patterning using a novel resist
08/23/1989EP0329298A2 Radiation crosslinkable compositions
08/23/1989EP0329217A1 Tensioning roller, and device provided with such a tensioning roller
08/23/1989EP0329207A1 Apparatus for processing a printing plate with a liquid
08/23/1989EP0329140A2 Exposure control system for full field photolithography using pulsed sources
08/23/1989EP0329102A2 Photosensitive material and volume type phase hologram member formed therefrom
08/23/1989EP0329009A2 Light-sensitive negative registration sheet
08/23/1989EP0328824A2 Sulfonic acid esters useful as sensitizers for positive resists
08/23/1989EP0328655A1 Pattern-forming process utilizing radiation-induced graft polymerization reaction
08/23/1989EP0328522A1 Uv stabilizer for polyacetylenic recording media
08/23/1989CN1035006A Photo hardening electrostatic printing mould containing eletron donor and donee
08/23/1989CN1035005A Photo-hardening electrostatic printing mould with improved umkehr effect and electricity erasing ability
08/23/1989CN1035004A Storage stable photopolymerizable composition for refractive index imaging
08/22/1989US4860328 Target positioning for minimum debris
08/22/1989US4860062 Device and method for measuring reflective notch control in photoresists
08/22/1989US4860058 Image forming apparatus
08/22/1989US4859913 Vacuum fluorescent printing device
08/22/1989US4859906 Deep UV lamp bulb with improved fill
08/22/1989US4859857 Ion-projection apparatus and method of operating same
08/22/1989US4859789 Diarylnitrones
08/22/1989US4859573 Opaque, insoluble surface
08/22/1989US4859572 Dye sensitized photographic imaging system
08/22/1989US4859571 Embedded catalyst receptors for metallization of dielectrics
08/22/1989US4859570 Photosensitive element having improved antistatic layer
08/22/1989US4859568 Photographic image recording method using silver halide and vinyl monomer
08/22/1989US4859563 Positive photoresist composition
08/22/1989US4859562 Photosensitive mixture and photosensitive recording material produced therefrom with polymeric compound which is reaction product of unsaturated (thio)phosphinic acid iso(thio)cyanate and active hydrogen containing compound
08/22/1989US4859561 Developer sheet useful in providing transparencies or reproductions having a controlled gloss finish
08/22/1989US4859548 Method for generating a lattice structure with a phase shift on the surface of a substrate
08/22/1989US4859303 Method and apparatus for removing coating from substrate