| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/25/1991 | WO1991011020A1 Vuv lithography |
| 07/25/1991 | DE4000980C1 Appts. for exposing printing plate - has frusto=conical casing filled with plastics light absorbing balls |
| 07/24/1991 | EP0438382A1 Disubstituted aromatic dianhydrides and polyimides prepared therefrom |
| 07/24/1991 | EP0438123A2 Near infrared polymerization initiator |
| 07/24/1991 | CN2081543U Differential separating device of heavy nitrogen duplicator |
| 07/23/1991 | US5034685 Test device for testing integrated circuits |
| 07/23/1991 | US5034526 Halomethyl-1,3,5-triazines containing a sensitizer moiety |
| 07/23/1991 | US5034429 An unsaturated monomer, a photoinitiator and a benzene derivative for providing a cured film |
| 07/23/1991 | US5034307 Process for the photographic production of relief images using selected titanocenes |
| 07/23/1991 | US5034306 Photocurable elastomeric mixture and recording material, obtained therefrom, for the production of relief printing plates |
| 07/23/1991 | US5034305 Radiation-sensitive mixture |
| 07/23/1991 | US5034304 Photosensitive compounds and thermally stable and aqueous developable negative images |
| 07/23/1991 | US5034302 Developer sheet for forming high density images |
| 07/23/1991 | US5034301 Recording medium |
| 07/23/1991 | US5034149 Binary azeotropic compositions of 3-chloro-1,1,1-trifluoropropane with methanol or ethanol, or trans-1,2-dichloroethylene |
| 07/23/1991 | US5034090 Process for manufacturing semiconductor device involving dry etching an organic resist layer |
| 07/23/1991 | US5033404 Barrier mechanism for isolating drive chain from active chamber in Langmuir trough |
| 07/23/1991 | US5033377 Gravure printing plate |
| 07/23/1991 | CA2034265A1 Synthesis of difunctional halo organo noncarbon group iv main group element amides |
| 07/23/1991 | CA1286831C Photosensitizers and polymerizable compositions |
| 07/23/1991 | CA1286797C Rotary developer and method for its use |
| 07/23/1991 | CA1286794C Apparatus for dry processing a semiconductor wafer |
| 07/23/1991 | CA1286792C Embedded catalyst receptors for metallization of dielectrics |
| 07/23/1991 | CA1286532C Photoresist compositions containing quinone sensitizer |
| 07/20/1991 | CA2034535A1 Polyesters containing nonionic surfactants as cocondensed units, preparation thereof and use thereof in detergents |
| 07/20/1991 | CA2034384A1 Disubstituted aromatic dianhydrides and polyimides prepared therefrom |
| 07/20/1991 | CA2034234A1 Radiation-sensitive mixture and recording material based on oligomeric maleates and fumarates |
| 07/19/1991 | CA2034542A1 Method for making optically readable media containing embossed information |
| 07/18/1991 | DE4000979A1 Illuminating edge regions of printing plate - involves lamp which can be moved vertically or horizontally |
| 07/17/1991 | EP0437374A2 Optical molding resin composition |
| 07/17/1991 | EP0437343A2 Photopolymerizable, positive working, peel developable, single sheet colour proofing system |
| 07/17/1991 | EP0437259A2 Photopolymerizable compositions sensitive to longer wavelength visible actinic radiation |
| 07/17/1991 | EP0437247A2 UV curable silicone resin-organic mercaptan composition |
| 07/17/1991 | EP0437090A1 Developer material including styrene-maleic anhydride copolymer and reactive organic acid |
| 07/17/1991 | EP0437015A2 Positive working, peel developable, colour proofing system having two photosensitive layers |
| 07/17/1991 | EP0436948A2 Inhibitor-containing photohardenable compositions having improved resolution |
| 07/17/1991 | EP0436844A2 High purity hydroxy-terminated phenyl ladder polysiloxane and method for producing the same |
| 07/17/1991 | EP0436652A1 Hybrid microchip bonding article |
| 07/17/1991 | EP0436639A1 Multifunctional photolithographic compositions |
| 07/17/1991 | EP0436617A1 Baking treatment of lithographic printing plate. |
| 07/17/1991 | EP0308400B1 Processing of exposed lithographic printing plates |
| 07/16/1991 | US5032566 Image recording system |
| 07/16/1991 | US5032492 Photolithographic masking process and apparatus |
| 07/16/1991 | US5032490 Photosensitive aqueous developable copper conductor composition |
| 07/16/1991 | US5032486 Lithography |
| 07/16/1991 | US5032478 Resolution |
| 07/16/1991 | US5032217 Impingement |
| 07/16/1991 | US5032216 Non-photographic method for patterning organic polymer films |
| 07/16/1991 | US5032209 Heat sealing of semicrystalline quasi-amorphous polymers |
| 07/16/1991 | US5031977 Deep ultraviolet (UV) lens for use in a photolighography system |
| 07/16/1991 | CA1286424C Bilayer lithographic process |
| 07/16/1991 | CA1286145C Developing station of a processing system for printing plates |
| 07/13/1991 | CA2033821A1 Photopolymerizable compositions sensitive to longer wavelength visible actinic radiation |
| 07/13/1991 | CA2033599A1 Inhibitor-containing photohardenable compositions having improved resolution |
| 07/11/1991 | WO1991010344A1 Etching of nanoscale structures |
| 07/11/1991 | WO1991010202A1 Processing systems with intelligent article tracking |
| 07/11/1991 | WO1991010170A1 Programmable masking apparatus |
| 07/11/1991 | WO1991009880A1 Photopolymerizable composition |
| 07/11/1991 | WO1991009646A1 Oxygen ion-beam microlithography |
| 07/11/1991 | CA2033703A1 Photopolymerizable, positive working, peel developable, single sheet color proofing system |
| 07/10/1991 | EP0436457A2 Photosensitive polyimide compositions |
| 07/10/1991 | EP0436352A2 Solid imaging method and apparatus |
| 07/10/1991 | EP0436320A2 Laser ablatable polymer dielectrics and methods |
| 07/10/1991 | EP0436174A2 Radiation sensitive mixture and process for the production of relief structures |
| 07/10/1991 | EP0436065A2 Method and apparatus for automatically bonding film to a substrate and cutting the film to desired size |
| 07/10/1991 | CA2033641A1 Uv curable silicone resin-organic mercaptan composition |
| 07/09/1991 | US5031199 X-ray lithography beamline method and apparatus |
| 07/09/1991 | US5030836 Method and apparatus for drawing patterns using an energy beam |
| 07/09/1991 | US5030550 Containing a basic compound and a nonionic surfactant containing oxyethylene and oxypropylene groups |
| 07/09/1991 | US5030549 Organometallic complex or chloride of nickel, copper or cobalt; semiconductor substrate; heat treatment; reducing agent; resists |
| 07/09/1991 | US5030548 Photoiniator system comprising a 4,4'-bis(dialkylamino) benzophenone, an aromatic ketone and lophine dimer; also present a halogen compound leuco and dye; lithography; printing plates; photoresists |
| 07/09/1991 | US5030543 Light-sensitive material containing silver halide, reducing agent and polymerizable compound |
| 07/09/1991 | US5030542 Light-sensitive material containing silver halide, hydrazine derivative and polymerizable compound |
| 07/09/1991 | US5030541 Image-forming method using a light-sensitive material |
| 07/09/1991 | US5030540 Pressure sensitive recording; microcapsules encapsulating dye precursor;developer sheet releasable from adhesive sheet |
| 07/09/1991 | US5030539 Developer sheet useful in providing transparencies or reproductions having a controlled gloss finish utilizing a surfactant |
| 07/09/1991 | US5030538 Method for producing overhead transparencies having high color density images using a double sided image recording material |
| 07/09/1991 | US5029555 Wafer holder method and apparatus in a vacuum deposition system |
| 07/09/1991 | CA2033573A1 Developer material including styrene-maleic anhydride copolymer and reactive organic acid |
| 07/09/1991 | CA1285759C Micropositioning device |
| 07/08/1991 | CA2019149A1 Positive working, peel developable, color proofing system having two photosensitive layers |
| 07/04/1991 | DE4039334A1 Two level light sensitive system with radiation de-polymerisable coat - with light sensitive top coat forming mask, giving resist with good contrast |
| 07/03/1991 | EP0435751A1 Process for the synthesis of polysilsesquioxanes and applications of the products obtained |
| 07/03/1991 | EP0435644A2 Scanning system |
| 07/03/1991 | EP0435594A2 Photoinitiators |
| 07/03/1991 | EP0435564A2 Solid imaging system |
| 07/03/1991 | EP0435531A2 Photoacid generating composition and sensitizer therefor |
| 07/03/1991 | EP0435502A1 Method of preparing high glass transition temperature novolak resins useful in high resolution photoresist compositions |
| 07/03/1991 | EP0435489A1 Microcapsules, their production, and their use in recording sheets |
| 07/03/1991 | EP0435437A1 Positive resist composition |
| 07/03/1991 | EP0435323A2 An image forming apparatus |
| 07/03/1991 | EP0435262A2 Visible radiation sensitive composition |
| 07/03/1991 | EP0435261A2 4-Carbonyl-substituted coumarin compound |
| 07/03/1991 | EP0435211A2 Photo-curable, urethane-containing compositions |
| 07/03/1991 | EP0435181A2 Radiation-sensitive positive resist composition |
| 07/03/1991 | EP0435147A2 Elements for recording volume transmission holograms |
| 07/03/1991 | EP0435058A2 Layer transfer process for image production and apparatus to perform the process |
| 07/03/1991 | EP0434968A2 Light-sensitive preparation and process for the fabrication of photoresists and printing plates |
| 07/03/1991 | EP0403580A4 Light-sensitive novolac resins |
| 07/03/1991 | EP0211044B1 Device fabrication method using spin-on glass resins and devices formed thereby |