| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/24/1991 | EP0424182A2 Process for formation of resist patterns |
| 04/24/1991 | EP0424181A2 X-ray exposure apparatus |
| 04/24/1991 | EP0424134A2 X-ray exposure apparatus |
| 04/24/1991 | EP0424124A2 Positive-acting photoresist compositions |
| 04/24/1991 | EP0424123A2 Image recording |
| 04/24/1991 | EP0423782A2 Apparatus for processing pre-sensitized lithographic printing plate |
| 04/24/1991 | EP0423446A1 Near UV photoresist |
| 04/24/1991 | EP0423399A1 Method for preparing planographic printing plate |
| 04/24/1991 | EP0423352A1 Method of production and duplication of filter, and method of production of photosensitive member provided with the filter |
| 04/24/1991 | EP0423150A1 A scanner system for successive irradiation of a working surface, particularly for ultra-violet exposure of a photo emulsion on a serigraphic printing frame |
| 04/24/1991 | EP0346355A4 Method of patterning resist |
| 04/24/1991 | CN1050935A Photoreative resin compositions developable in a semi-aqueous solution |
| 04/23/1991 | US5010465 Optical lighting system |
| 04/23/1991 | US5010415 Image forming apparatus having switchable color separation filter units |
| 04/23/1991 | US5010360 Image forming apparatus |
| 04/23/1991 | US5010230 Laser processor |
| 04/23/1991 | US5009982 Photosetting, thermosetting liquid ink |
| 04/23/1991 | US5009981 Photosensitive composition |
| 04/23/1991 | US5009972 Blank plates for forming multi-color fluorescent planes and methods for forming multi-color fluorescent planes |
| 04/23/1991 | CA1283410C Anthraquinoylcarboxylic acid hydrazides, curable compositions and use thereof |
| 04/21/1991 | WO1991006118A1 Non-photographic method for patterning organic polymer films |
| 04/21/1991 | CA2069306A1 Non-photographic method for patterning organic polymer films |
| 04/21/1991 | CA2028060A1 Apparatus for processing pre-sensitized lithographic printing plate |
| 04/18/1991 | WO1991005018A1 Novel polysilane composition |
| 04/18/1991 | WO1991004798A1 Methods of coating stereolithographic parts |
| 04/18/1991 | WO1991001516A3 Pattern forming and transferring processes |
| 04/18/1991 | DE4031418A1 X- and Y- axis scanner for type setting equipment - uses laser scanner movable in Y direction in low junction with plate movable in X direction |
| 04/17/1991 | EP0423054A2 Method of producing printing plates by means of a laser beam |
| 04/17/1991 | EP0422853A2 Apparatus for semiconductor lithography |
| 04/17/1991 | EP0422814A2 Exposure apparatus |
| 04/17/1991 | EP0422686A2 Aluminate complex and use thereof in photopolymerizable composition and image-forming material |
| 04/17/1991 | EP0422667A1 Radiation-sensitive positive resist composition |
| 04/17/1991 | EP0422662A2 Light-sensitive material containing silver halide, reducing agent, polymerizable compound, color image forming substance, base precursor and polar compound |
| 04/17/1991 | EP0422628A2 Photosensitive element |
| 04/17/1991 | EP0422570A2 Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions |
| 04/17/1991 | EP0422525A2 Exposing method and apparatus |
| 04/17/1991 | EP0422488A2 Photopolymerisable mixtures and photosensitive recording elements containing such mixtures |
| 04/17/1991 | EP0422395A2 Apparatus for and method of characterizing photolithography systems |
| 04/17/1991 | EP0422375A2 Versatile reactive ion etch barriers from polyamic acid salts |
| 04/16/1991 | US5008703 Exposure apparatus and control of the same |
| 04/16/1991 | US5008702 Exposure method and apparatus |
| 04/16/1991 | US5008700 Color image recording apparatus using intermediate image sheet |
| 04/16/1991 | US5008426 Novel 6-acyl-(6H)-dibenz[c,e][1,2]oxaphosphorin 6-oxides, their preparation and their use as photoinitiators |
| 04/16/1991 | US5008362 Binders soluble in aqueous alkali and containing silanyl groups in the side chain, process for preparing same and also photosensitive mixture containing these compounds |
| 04/16/1991 | US5008302 Titanocenes, the use thereof, and N-substituted pyrroles |
| 04/16/1991 | US5008175 Copying materials |
| 04/16/1991 | US5008166 Method for manufacturing a color filter |
| 04/16/1991 | US5008135 Excellent corrosion resistance |
| 04/16/1991 | US5007969 Low toxicity liquid solvent |
| 04/16/1991 | US5007708 Technique for producing antireflection grating surfaces on dielectrics, semiconductors and metals |
| 04/16/1991 | CA1283188C End sensor |
| 04/14/1991 | CA2027454A1 Photosensitive element |
| 04/14/1991 | CA2027368A1 Radiation-sensitive positive resist composition |
| 04/11/1991 | WO1991006039A1 Novel onium salts and the use thereof as photoinitiators |
| 04/11/1991 | CA2039703A1 Onium salts and the use thereof as photoinitiators |
| 04/10/1991 | EP0421746A2 Exposure apparatus |
| 04/10/1991 | EP0421745A2 Apparatus for cleaning an optical element for use with a radiation beam. |
| 04/10/1991 | EP0421695A2 Electron beam exposuring device and exposuring method using the same |
| 04/10/1991 | EP0421667A1 Positive resist composition |
| 04/10/1991 | EP0421645A2 Apparatus for and method of optical inspection in a total internal reflection holographic imaging system |
| 04/10/1991 | EP0421527A1 Two-step positioning device |
| 04/10/1991 | EP0421512A1 Sensitisation and stabilisation of organometallic compounds acting as photocatalysts and photosensitisers in photochemical radical polymerisation process |
| 04/10/1991 | EP0421466A2 Coating apparatus |
| 04/10/1991 | EP0421429A2 Electrode pattern forming method |
| 04/10/1991 | EP0421388A2 Positive-acting photoresist composition |
| 04/10/1991 | EP0421381A2 A method for transferring images and an apparatus used therefor |
| 04/10/1991 | EP0421195A2 Photoreactive resin compositions developable in a semi-aqueous solution |
| 04/10/1991 | EP0421138A2 Device for coating a screen printing tissue |
| 04/10/1991 | EP0421086A2 Epoxy acrylate resins and photosensitive resin compositions therefrom |
| 04/10/1991 | EP0215069B1 Polysiloxane resist for ion beam and electron beam lithography |
| 04/10/1991 | EP0193543B1 Process for forming a layer of patterned photoresist |
| 04/10/1991 | EP0188568B1 Method of developing radiation sensitive negative resists |
| 04/10/1991 | CN1050620A Holographic optical elements having a reflection hologram formed in a phtotlolymer |
| 04/09/1991 | US5006887 Image forming apparatus |
| 04/09/1991 | US5006884 Imaging device |
| 04/09/1991 | US5006883 Image forming apparatus |
| 04/09/1991 | US5006447 Photosensitive resin plate for flexography |
| 04/09/1991 | US5006443 Radiation sensitive reproduction composition and element with perfluoroalkyl group containing polymer |
| 04/09/1991 | US5006442 Applying solution containing radiation sensitive material while also applying potential to disrupt solution into drops |
| 04/09/1991 | US5006436 UV curable compositions for making tentable solder mask coating |
| 04/09/1991 | US5006370 Compositions for production of electronic coatings |
| 04/09/1991 | US5006364 Solid imaging method utilizing compositions comprising thermally coalescible materials |
| 04/09/1991 | US5005969 Optical projection apparatus with the function of controlling laser coherency |
| 04/09/1991 | US5005959 Illumination system |
| 04/09/1991 | CA1282627C Image reversal negative working photoresist |
| 04/05/1991 | CA2026848A1 Method for transferring images and an apparatus used therefor |
| 04/04/1991 | WO1991004512A1 Selected block copolymer novolak binder resins and their use in radiation-sensitive compositions |
| 04/04/1991 | WO1991004511A1 Material for self-developing photoetching in the near uv range and process for producing it |
| 04/04/1991 | DE3931434A1 Ein material fuer selbstentwickelndes photoaetzen im nahen uv-bereich A material for self-developing photo-etching in the near uv-range |
| 04/04/1991 | DE3931213A1 Interferometric measuring procedure for surface evenness - subjecting semiconductor silicon wafer to at least three different phases of radiation to derive topography |
| 04/03/1991 | EP0420827A2 Aqueous base developable negative resist compositions |
| 04/03/1991 | EP0420700A2 Exposure apparatus |
| 04/03/1991 | EP0420675A2 Low gain pre-press proofs |
| 04/03/1991 | EP0420614A2 Methods of coating stereolithographic parts |
| 04/03/1991 | EP0420551A2 Conveying apparatus |
| 04/03/1991 | EP0420526A2 Improved contact printing process |
| 04/03/1991 | EP0420489A2 Compensation of lithographic and etch proximity effects |
| 04/03/1991 | EP0420318A1 Multilayer material for the preparation of full flat background masks for graphic industry and for the production of printed circuits |
| 04/03/1991 | EP0420276A2 Display and process for production thereof |
| 04/03/1991 | EP0420225A2 Photopolymer film for holography |