Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
07/1991
07/02/1991US5029310 Pressure developing device
07/02/1991US5029222 Photoelectron image projection apparatus
07/02/1991US5028963 Image forming apparatus
07/02/1991US5028955 Exposure apparatus
07/02/1991US5028954 Image recording apparatus
07/02/1991US5028953 Image forming apparatus having sheet feeding condition detecting means
07/02/1991US5028952 Apparatus for the formation of images
07/02/1991US5028579 Photopolymerization, microcapsules, multicolor
07/02/1991US5028514 Method of producing an etched base plate for an ink print head
07/02/1991US5028512 Method of manufacturing photosensitive printing plates comprising applying a powdered surface
07/02/1991US5028511 Solid Polyoxyethylene Glycol Photorelease Agent
07/02/1991US5028457 Roll coating apparatus and method capable of providing coatings without pin holes
07/02/1991CA1285686C Curable compositions containing metallocene complexes, the activated precursors obtainable therefrom and the use thereof
07/02/1991CA1285664C Lithographic process using mask with small opaque or transparent elements
07/02/1991CA1285418C Pre-exposure method for increased sensitivity in high contrast resist development
07/02/1991CA1285416C Light-sensitive printing plate for waterless offset printing
06/1991
06/30/1991CA2032726A1 Solid imaging method and apparatus
06/29/1991CA2032697A1 Elements for recording volume transmission holograms
06/28/1991CA2032884A1 Radiation-sensitive positive resist composition
06/27/1991WO1991009346A1 Positive resist composition
06/27/1991CA2046908A1 Positive resist composition
06/26/1991EP0434579A1 UV curable compositions for use, in particular, in the field of antiadherent-paper and optical fibers
06/26/1991EP0434442A2 Positive photoresist composition
06/26/1991EP0434437A2 Photohardenable or thermohardenable compositions and photosensitive materials utilising such photohardenable compositions
06/26/1991EP0434398A2 Heat transfer film for marking articles and marking process using the same
06/26/1991EP0434273A2 Electromagnetic radiation filter elements and methods of fabrication
06/26/1991EP0434142A1 Method of manufacturing a device and group of masks for this method
06/26/1991EP0434141A1 Method for encoding identification information on circuit dice using step and repeat lithography
06/26/1991EP0434099A2 A process for obtaining textured coatings from photo-curable urea-containing compositions
06/26/1991EP0434098A2 Photo-curable amine-containing compositions
06/26/1991EP0434087A2 Photo-curable urea-containing compositions
06/26/1991EP0434032A2 An image forming apparatus
06/26/1991EP0433820A2 Multiple mask system
06/26/1991EP0433721A2 Method of applying a solder stop coating on printed circuit boards
06/26/1991EP0433720A2 Method of applying a solder stop coating on printed circuit boards
06/26/1991CN1052559A Optical near field microlithography process and microlithography device using it
06/26/1991CN1052558A Aqueous processible photopolymerizable compositions capable of photolytically generating metal ions
06/26/1991CN1012961B Photopolymerizable compositions containing inorganic fillers
06/25/1991US5027155 Image forming apparatus including mechanisms for exposure lamp exchange
06/25/1991US5027146 Processing apparatus
06/25/1991US5027137 Drawing surface adjusting mechanism for use with scanning pattern drawing apparatus
06/25/1991US5027132 Position compensation of laser scan for stage movement
06/25/1991US5026887 Metal-containing polymer and production process thereof
06/25/1991US5026788 Photosensitive polymer having thiol group
06/25/1991US5026740 For transparent or pigmented mixtures
06/25/1991US5026626 Oxygen resistant radiation-polymerizable composition and element containing a photopolymer composition
06/25/1991US5026625 Titanocenes, the use thereof, and n-substituted fluoroanilines
06/25/1991US5026624 Composition for photo imaging
06/25/1991US5026618 Photosensitive material and volume type phase hologram member formed therefrom
06/25/1991US5026590 Transfer recording medium and process for production thereof
06/25/1991US5026467 Automatic developing apparatus
06/25/1991US5026239 Mask cassette and mask cassette loading device
06/25/1991US5026166 Apparatus for pre-aligning substrate preparatory to fine alignment
06/25/1991US5026145 Optical image
06/24/1991CA2032698A1 Layer transfer process for image production and apparatus to perform the process
06/23/1991CA2033035A1 Photo-curable amine-containing compositions
06/23/1991CA2032977A1 Photo-curable urethane-containing compositions
06/23/1991CA2032976A1 Photo-curable urea-containing compositions
06/23/1991CA2032919A1 Process for obtaining textured coatings from photo-curable urea-containing compositions
06/23/1991CA2032712A1 Solid imaging system
06/21/1991CA2029464A1 Positive photoresist composition
06/20/1991DE3941130A1 Thin film esp. for superconductor structure prodn. - by high temp. photo-lacquer lift-off process
06/19/1991EP0433263A2 Method and apparatus for the exposure of photosensitised substrates, especially semiconductor substrates
06/19/1991EP0433094A1 Microcapsules, their preparation and their use in photosensitive material
06/19/1991EP0433081A2 Photosensitive resin composition and method of use thereof
06/19/1991EP0432907A1 Improved paste compositions
06/19/1991EP0432905A2 Polyisophenylenesiloxane, production process thereof, and resist material and semiconductor device formed thereof
06/19/1991EP0432760A2 Image forming apparatus equipped with a bucket for accommodating a photosensitive sheet cartridge
06/19/1991EP0432713A2 Process for the preparation of images on tonable light-sensitive layers
06/19/1991EP0432712A1 Process for the preparation of images on tonable light-sensitive layers
06/19/1991EP0432622A2 Process for developing photoresists
06/19/1991EP0432609A2 Process for the formation of negative copies
06/19/1991EP0432599A2 Light-sensitive composition, and process for the formation of relief patterns
06/19/1991EP0432493A2 Electronic circuitry utilizing silver diffusion transfer imaging
06/19/1991EP0432465A2 Method for making optical color filters
06/19/1991EP0432451A2 Developer concentrate and developer therefrom for negative working printing plates with overcoat; method for producing printing plates
06/19/1991EP0432450A2 Developer concentrate and developer therefrom for exposed negative working printing plates with overcoat and method for producing printing plates
06/19/1991EP0432211A1 Process and apparatus for producing printing plates.
06/19/1991EP0432194A1 Pre-correction heating stage of lithographic printing plate processing
06/19/1991CA2031564A1 Method of preparing high glass transition temperature novolak resin for use in high resolution photoresist compositions
06/18/1991US5025346 Laterally driven resonant microstructures
06/18/1991US5025284 Exposure method and exposure apparatus
06/18/1991US5025281 Image recording apparatus using photosensitive pressure-sensitive recording medium
06/18/1991US5025088 Photosensitive poly(amide)imide heat-resistant polymer
06/18/1991US5024968 Removal of surface contaminants by irradiation from a high-energy source
06/18/1991US5024923 Sulfur-containing metal complex
06/18/1991US5024922 Positive working polyamic acid/imide and diazoquinone photoresist with high temperature pre-bake
06/18/1991US5024921 Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin used in a method of forming a positive photoresist image
06/18/1991US5024920 Cathide ray tubes
06/18/1991US5024919 Process for forming fine pattern in semiconductor device
06/18/1991US5024918 Heat activated dry development of photoresist by means of active oxygen atmosphere
06/18/1991US5024916 Dry developable photoresist
06/18/1991US5024909 Dry film process for altering wavelength response of holograms
06/18/1991US5024894 Method of producing silicon and similar wafers buffered for the deposition of metal oxide superconducting (MOS) polymer composites and the like by insulating metal oxides (IMO) suitable as substrates for MOS, and novel buffered wafers provided thereby
06/18/1991US5024742 Method of crosslinking amino acid containing polymers using photoactivatable chemical crosslinkers
06/18/1991CA1284938C Process of laminating
06/18/1991CA1284912C Light-sensitive recording material and process for the production of the material
06/16/1991WO1991008840A1 Autodeposition emulsion for selectively protecting metallic surfaces
06/16/1991CA2051400A1 Autodeposition emulsion for selectively protecting metallic surfaces
06/16/1991CA2032329A1 Photosensitive resin composition and method of use thereof