Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/1991
08/20/1991US5041353 Process for preparation of light-sensitive material containing silver halide, reducing agent, precursor and polymerizable compound
08/20/1991US5040882 Unit magnification optical system with improved reflective reticle
08/20/1991US5040431 Movement guiding mechanism
08/20/1991CA1287918C Preformatted optical recording card and method of producing the same
08/20/1991CA1287769C Process for the production of a protective layer or a relief image
08/20/1991CA1287768C Antireflective photoresist composition
08/20/1991CA1287767C Coated material and use thereof
08/17/1991CA2034623A1 Photoimageable compositions containing fugitive colorants
08/16/1991CA2035779A1 Process for the preparation of photostructured layers with improved mechanical properties
08/16/1991CA2035722A1 Radiation-sensitive mixture and recording material and a process for the production of relief recordings
08/15/1991CA2036303A1 Process for manufacturing photopolymer plates
08/15/1991CA2036302A1 Process for the manufacture of photopolymer plates
08/14/1991EP0441638A2 Light sensitive litho printing plate
08/14/1991EP0441550A2 Novolak resins and positive photoresists prepared therefrom
08/14/1991EP0441524A2 Polymers containing halomethyl-1,3,5-triazine moieties
08/14/1991EP0441308A2 Process for preparing printed circuit board having through-hole
08/14/1991EP0362213B1 Process for manufacturing a structured ceramic film or a ceramic object composed of such films
08/14/1991EP0248872B1 Radiation sensitive device
08/14/1991DE4004054A1 One component screen printing copying material - based on PVA modified with unsatd. acid chloride, anhydride, methylated acid amide or aldehyde
08/14/1991DE4003634A1 Method of producing diffraction grating - involves directing light through transparent matrix with parallel opaque strips
08/14/1991CN1053847A Overlay proofs comprising precolored and toned images
08/14/1991CN1053846A Elements for recording volume transmission holograms
08/14/1991CN1053845A Improved solid imaging method and apparatus
08/14/1991CN1053843A 固体成像系统 Solid Imaging System
08/14/1991CN1053769A Non-photographic method for patterning organic polymer films
08/14/1991CA2036268A1 Polymeric compounds
08/14/1991CA2026794A1 Method for applying liquid photoresist to planar substrate surfaces
08/13/1991US5040018 Method of disposing of end of photosensitive medium
08/13/1991US5039596 Deep u.v. photoresist process utilizing compositions containing polycyclic cyclopentane 2-diazo-1,3-dione
08/13/1991US5039595 Aqueous developer solution having hydroxy-alkyl piperidine for positive-working photoresists
08/13/1991US5039594 Mixed solvents reduce odors, o-quinone diazide photosensitizer increases speed
08/13/1991US5039593 Poly(silyl silane) homo and copolymers
08/13/1991US5039592 Ethyl cellulose, hydroxypropyl cellulose, saponified polyvinyl acaetate, improved resolution
08/13/1991US5039589 Light-sensitive material containing silver halide, reducing agent, polymerizable compound and base precursor dispersed in the polymerizable compound
08/13/1991US5039588 Non-electroscopic prolonged tack toners
08/13/1991US5038934 Microcapsule-carrying sheet storage cartridge and method of sealing the same
08/13/1991US5038710 Developer material coating apparatus
08/13/1991CA2034601A1 Solder mask vacuum laminator conversion
08/08/1991WO1991011825A1 Method and structures for making integrated circuits
08/08/1991WO1991011473A1 Photocurable resin composition and process for producing photocurable resin
08/08/1991WO1991011307A1 Method of and material for forming thick filmy pattern
08/08/1991DE4003676A1 Producing surface grid structure with phase change for DFB-laser - uses soluble plastic auxiliary layer in process step requiring no etching
08/08/1991DE4003093A1 Preparing endless solid, light-sensitive polymeric recording coating - by applying to cylindrical surface in fluid form and rolling during hardening to produce defined surface structure
08/08/1991CA2050580A1 Photocurable resin composition and process for the preparation of photocurable resin
08/08/1991CA2034274A1 Polymers containing halomethyl-1,3,5-triazine moieties
08/07/1991EP0440470A2 Exposure method
08/07/1991EP0440444A2 Photosensitive resin composition
08/07/1991EP0440376A2 Process for forming pattern
08/07/1991EP0440375A1 Diazodisulfones
08/07/1991EP0440374A2 Chemical amplified resist material
08/07/1991EP0440238A2 Positive photoresist composition
08/07/1991EP0440086A2 Radiation-sensitive composition, radiation-sensitive recording material produced therewith and process for the production of relief records
08/07/1991EP0440079A2 Process for producing an endless photosensitive polymeric recording layer for the production of endless printing forms
08/07/1991EP0440057A2 Radiation sensitive composition and radiation sensitive recording material produced therefrom
08/07/1991EP0440005A2 Burnout frame with UV-absorption
08/07/1991EP0292519B1 Process and device for generating material structures of atomic dimensions
08/07/1991CN1053687A Photosensitive resin composition and method of use thereof
08/07/1991CN1053616A Method of preparing high glass transition temperature novolak resins for use in high resolution photoresist compositions
08/06/1991WO1991011752A1 Overlay proofs comprising precolored and toned images
08/06/1991USH952 Method of preparing a quartz surface for sweeping
08/06/1991US5037961 Coatings
08/06/1991US5037949 Polymers prepared from 4,4'-bis[2-(amino (halo) phenoxyphenyl) hexafluoroisopropyl]diphenyl ether
08/06/1991US5037724 Solution of hyrogen peroxide and formamide, acetamide or propionamide
08/06/1991US5037723 Method of manufacturing a plasma display panel
08/06/1991US5037722 Photoresist exposure method and apparatus therefor
08/06/1991US5037721 Positive radiation-sensitive mixture containing monomeric acid-cleavable compound and radiation-sensitive recording material produced therefrom
08/06/1991US5037720 Hydroxylated aromatic polyamide polymer containing bound naphthoquinone diazide photosensitizer, method of making and use
08/06/1991US5037719 Image forming method using microcapsules containing silver halide and a salt of a reducing agent
08/06/1991US5037506 Method of stripping layers of organic materials
08/06/1991CA2075199A1 Overlay proofs comprising precolored and toned images
08/06/1991CA2034602A1 Novolak resins of lowered hydroxyl content and high contrast high thermal stability positive photoresists prepared therefrom
08/06/1991CA1287438C Novolak resin for positive photoresist
08/03/1991CA2035406A1 Radiation-sensitive mixture, radiation-sensitive recording material produced therewith and process for producing relief copies
08/02/1991CA2035148A1 Photosensitive resin composition
08/01/1991DE4102731A1 Directly writing multibeam lithography system - has substrate markers with radiation energy source, generating first number of radiation beams
08/01/1991DE4002397A1 Positive photosensitive mixt. contg. hydroxy-aralkyl acrylate polymer - and sensitiser, useful in printing plate mfr. and as photoresist
07/1991
07/31/1991WO1991011474A1 Photocurable resin composition
07/31/1991WO1991011472A1 Photocurable resin composition
07/31/1991EP0439371A2 Photoresist containing aliphatic di- and tri-esters of aliphatic and aromatic di- and tri-acids and alcohols
07/31/1991EP0439324A2 Process of forming diffraction grating without using a separation film between positive and negative resists
07/31/1991EP0439295A2 Novel Synthesis of difunctional halo organo noncarbon Group IV main group element amides
07/31/1991EP0439289A2 Pattern-forming method and radiation resist for use when working this pattern-forming method
07/31/1991EP0439258A2 Actinic radiation-reactive pressure-sensitive adhesive composition
07/31/1991EP0439123A2 A method for producing a photocured image structure
07/31/1991EP0439052A1 Exposure system
07/31/1991EP0439050A2 Method for making optically readable media containing embossed information
07/31/1991CA2050574A1 Photocurable resin composition
07/31/1991CA2050496A1 Photocurable resin composition
07/30/1991US5036209 Fabrication method for semiconductor devices and transparent mask for charged particle beam
07/30/1991US5035982 Aqueous developer composition for developing negative working lithographic printing plate
07/30/1991US5035981 Multilayer, sheet-like, photosensitive recording material
07/30/1991US5035980 Photosensitive semi-aqueous developable gold conductor composition
07/30/1991US5035979 Radiation-sensitive mixture
07/30/1991US5035976 Photoresists, improved shelf life
07/30/1991US5035975 Microcapsules, images formed by addition polymerization
07/30/1991US5035918 Applying uniform layer of styrene acrylic copolymer, butyl cellosolve, butyl carbitol and water, and subjecting select areas to excimer laser
07/30/1991US5035621 Method of dental treatment
07/30/1991CA1286905C Resist process using polysulfone polymers
07/27/1991CA2033403A1 Photoresist containing aliphatic di- and tri-esters of aliphatic and aromatic di-and tri-acids and alcohols
07/25/1991WO1991011043A1 Laser plasma x-ray source
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