Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/1991
09/04/1991EP0445058A1 Speed enhancers for acid sensitized resists
09/04/1991EP0444937A2 Exposure apparatus
09/04/1991EP0444936A2 Exposure apparatus
09/04/1991EP0444923A2 Water-soluble resin emulsion and process for preparation thereof
09/04/1991EP0444786A1 Preparation and use of dyes
09/04/1991EP0444665A2 A laser scanning apparatus
09/04/1991EP0444531A2 Process for multi-layer photoresist etching with minimal feature undercut and unchanging photoresist load during etch
09/04/1991EP0444493A2 Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom
09/04/1991EP0444450A1 Latent-image control of lithography tools
09/04/1991EP0444201A1 Method of producing a color filter
09/04/1991CN1054324A Photopolymerizable compositions sensitive to longer wavelength visible actinic radiation
09/03/1991US5045763 Motor-control device for image forming apparatus
09/03/1991US5045573 Photoinitiators for photopolymerization of unsaturated systems
09/03/1991US5045439 Process for the lithographic manufacture of electroformable microstructures having a triangular or trapezoidal cross-section
09/03/1991US5045437 Method for producing a structured ceramic film or a ceramic member constructed of such films by sintering and useful as ultrasound transducers
09/03/1991US5045435 Water-borne, alkali-developable, photoresist coating compositions and their preparation
09/03/1991US5045434 Addition polymer crosslinkable by exposure to argon laser light
09/03/1991US5045433 Substituted acridine derivatives and application thereof
09/03/1991US5045432 Radiation-sensitive composition containing both a poly(N-acylalkyleneimine) and an unsaturated polyester and use thereof in lithographic printing plates
09/03/1991US5045431 Tert-butyl acrylate or methacrylate, another acrylic ester and acrylic or methacrylic acid, printed circuits, resolution
09/03/1991US5045430 Microcapsules containing photohardening composition
09/03/1991US5045429 Light-sensitive photopolymerizable and diazonium resin containing composition and recording material including reaction product of anhydride with carboxylic acid and vinyl alcohol
09/03/1991US5045427 Photographic material containing non-photosensitive silver salt
09/03/1991US5045419 Pattern exposure/transfer method and pattern exposure/transfer mask apparatus
09/03/1991US5045417 Mask for manufacturing semiconductor device and method of manufacture thereof
09/03/1991US5044750 Method for checking lithography critical dimensions
09/03/1991CA2037385A1 Dual-tone imaging using novolac photoresists and carbodiimides
09/03/1991CA1288539C Photopolymerizable composition
09/03/1991CA1288538C Photosensitive compositions containing microgels
09/03/1991CA1288330C Adaptive torque control of cutoff knife pull roll
08/1991
08/29/1991WO1991012904A1 Method and device for moving molecules by the application of a plurality of electrical fields
08/29/1991DE4007716A1 Positioning document for copying - controlling by computer and digitally illuminating by laser to match length and breadth of printing plate
08/29/1991CA2075969A1 Method and device for moving molecules by the application of a plurality of electrical fields
08/29/1991CA2037265A1 Image-forming material and process for forming images
08/28/1991EP0443820A2 Radiation-sensitive resin composition
08/28/1991EP0443803A2 Dummy wafer
08/28/1991EP0443796A2 Development process
08/28/1991EP0443742A2 Presensitized plate for use in making lithographic printing plate
08/28/1991EP0443607A2 Radiation-sensitive positive resist composition
08/28/1991EP0443533A2 Positive photoresist composition
08/28/1991EP0443415A2 Radiation sensitive mixture
08/28/1991EP0443153A1 Radiation sensitive composition on the basis of oligomer maleic and fumaric acid esters and recording material obtained therefrom for the production of relief printing plates
08/28/1991EP0443106A2 Exposure apparatus
08/28/1991EP0442952A1 Positive-working photoresists employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent.
08/28/1991EP0183827B1 Deep-uv lithography
08/27/1991US5043824 Color mask recording apparatus with light components scanned at set exposure amount conversion rates
08/27/1991US5043759 Color image recording apparatus with light transmissive feed belt
08/27/1991US5043757 Image forming apparatus using heat-softening microcapsules
08/27/1991US5043586 Planarized, reusable calibration grids
08/27/1991US5043363 Active energy ray-curing resin composition
08/27/1991US5043362 Polyvinyl alcohol modified with dialkylamino groups as hydrogen donor; screen printing stencils
08/27/1991US5043314 Recording medium
08/27/1991US5043252 Developer composition for PS plates for use in making lithographic printing plate and method of plate-making
08/27/1991US5043251 Process of three dimensional lithography in amorphous polymers
08/27/1991US5043250 Radiation-sensitive composition containing a poly (N-acyl-alkyleneimine) and use thereof in lithographic printing plates
08/27/1991US5043249 Photoresists, printing plates
08/27/1991US5043248 Photosensitive amhilphilic high polymers and process for producing them
08/27/1991US5043247 Multicolor, silver halide emulsion hydrophilic colloid on temporary support; hardening, development after transferred to other support; multilayer relief images
08/27/1991US5043244 Process for defined etching of substrates
08/27/1991US5043243 Photoresists, semiconductors, integrated circuits
08/27/1991US5043237 Inhibitor-containing photohardenable electrostatic master compositions having improved resolution
08/27/1991US5043236 Process for determining the focussing of a photolithographic apparatus
08/27/1991US5043184 Method of forming electrically conducting layer
08/27/1991US5042951 High resolution ellipsometric apparatus
08/27/1991US5042421 Rotatable vacuum chuck with magnetic means
08/27/1991US5042165 Step and repeat apparatus
08/24/1991CA2036812A1 Radiation-sensitive positive resist composition
08/24/1991CA2036424A1 Photopolymer printing plates having a dimpled printing surface
08/22/1991WO1991012706A1 Making and testing an integrated circuit using high density probe points
08/22/1991WO1991012630A1 Spin-on glass processing technique for the fabrication of semiconductor devices
08/22/1991DE4005212A1 Radiation-sensitive mixt. for prodn. of photoresist - contains alkali-soluble binder, onium salt of strong acid and 2,2-di:substd. benz-1,3-dioxolane as solubility inhibitor
08/21/1991EP0442755A2 Alternating copolymer of styrene and 2-diazo-4-cyclopentene-1,3-dione
08/21/1991EP0442703A2 Photoimageable compositions containing fugitive colorants
08/21/1991EP0442702A1 Solder mask vacuum laminator conversion
08/21/1991EP0442638A2 Polymeric compounds
08/21/1991EP0442403A2 Method for the burning-in of light-sensitive layers in the manufacturing of printing plates
08/21/1991EP0442386A2 Radiation-sensitive composition, radiation-sensitive recording material produced therewith and process for the production of relief records
08/21/1991EP0442358A1 Process for the preparation of polymeric printing plates
08/21/1991EP0442357A2 Process for the preparation of photopolymer plates
08/21/1991EP0442196A2 Method for applying liquid photoresist to planar substrate surfaces
08/21/1991EP0442101A1 Polyesters containing nonionic surfactants in a condensed form, their preparation and their use in detergents
08/21/1991EP0442097A2 Poly(arylenevinylene siloxanes)
08/21/1991EP0442071A2 Process for the production of photostructured layers with improved mechanical properties
08/21/1991EP0441905A1 Method and apparatus for processing materials.
08/21/1991EP0441878A1 Device for cleaning photopolymer printing plates with solvents, drying said printing plates and recovering the solvents
08/21/1991EP0237574B1 Cylindrical photosensitive resin structure and method of preparing cylindrical printing plate
08/20/1991USRE33669 Aligning exposure method
08/20/1991US5041879 Sheet supplying device having control unit for sheet supplying operation
08/20/1991US5041865 Image recording apparatus with exposure amount controlling capability dependent upon temperature/humidity changes
08/20/1991US5041863 Image recording apparatus which prohibits starting of a recording operation until completion of photosensitive recording medium adjustment
08/20/1991US5041862 Lens screen
08/20/1991US5041570 Sulfonamide or sulfonic acid radical; soluble in polar solvents; compatible with binder resins; non-swelling; metal-free
08/20/1991US5041524 Polyphosphazene derivatives containing carbonyl groups suitable for photoreticulation processes
08/20/1991US5041369 Photosensitive material and image forming method
08/20/1991US5041362 Forming photocenest; plasms etching using hydrogen dry processing/photo/
08/20/1991US5041361 Oxygen ion-beam microlithography
08/20/1991US5041360 Process for producing an ozone-resistant flexographic printing form
08/20/1991US5041359 Method for forming a patterned photopolymer coating on a printing roller
08/20/1991US5041358 Negative photoresist and use thereof
08/20/1991US5041357 Photoresists, printing plates
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