Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
04/1991
04/03/1991EP0419518A1 X-ray lens and collimator
04/03/1991EP0419483A1 Method and apparatus for generating high-resolution images
04/03/1991EP0245431A4 Photoimaging processes and compositions
04/03/1991CN1050448A Photosensitive semi-aqueous developable gold conductor composition
04/03/1991CN1050447A Photosensitive aqueous developable copper conductor composition
04/03/1991CN1012263B Control equipment suitable for single channel and multi-channel scanning photo type setter to output positive type patten, negative type pattern, inverse type pattern and inverse negative type pattern
04/02/1991US5005044 Automatic masking device
04/02/1991US5005043 Image forming apparatus
04/02/1991US5005028 Image forming method and transfer recording medium therefor
04/02/1991US5004891 Two-stage method and apparatus for glossing a developer sheet
04/02/1991US5004814 Substituted α-pyrones and process for their preparation
04/02/1991US5004673 Method of manufacturing surface relief patterns of variable cross-sectional geometry
04/02/1991US5004672 Electrophoretic method for applying photoresist to three dimensional circuit board substrate
04/02/1991US5004671 Optical recording medium and optical recording method
04/02/1991US5004668 Composite matting agent particles
04/02/1991US5004658 Mask comprising patterns; offset o capacitor plate metallized areas on substrate
04/02/1991US5004566 Process for fabrication of lipid microstructures from dry organic solvent
04/02/1991US5004321 Resolution confocal microscope, and device fabrication method using same
04/02/1991CA1282541C Photopolymerizable composition
04/02/1991CA1282533C Organopolysilazane composition containing free radicals and curable by heat supply
04/02/1991CA1282273C Method of creating patterned multilayer films for use in production of semiconductor circuits and systems
04/02/1991CA1282272C Photocurable composition
03/1991
03/30/1991CA2026230A1 Photopolymer film for holography
03/29/1991CA2024273A1 Low gain pre-press proofs
03/27/1991EP0419369A1 Optical near-field method for microlithography and microlithography devices using this method
03/27/1991EP0419287A2 Method of correcting astigmatism of variable shaped beam
03/27/1991EP0419240A2 Exposure apparatus
03/27/1991EP0419147A2 Resist composition
03/27/1991EP0419095A2 Radiation sensitive compositions
03/27/1991EP0419073A2 Process for production of a semiconductor device
03/27/1991EP0419069A2 System for selective laser assisted plating
03/27/1991EP0419018A2 Improvements in or relating to lithographic printing plates
03/27/1991EP0418890A2 Solid state laser device for lithography light source and semiconductor lithography method
03/27/1991EP0418870A2 Radiation sensitive polymer composition
03/27/1991EP0418757A2 Light-sensitive material processing apparatus
03/27/1991EP0418733A2 Radiation-curable composition and method of producing a solder mask
03/27/1991EP0418459A2 Overhead light exposure apparatus
03/27/1991EP0418427A2 Exposure process
03/27/1991CN2074024U Optical system of large-area uv photoetching (exposing) machine
03/27/1991CN2074023U Pressure-relief vacuum ingressive device
03/27/1991CN1050268A Photosensitive semi-aqueous developable copper conductor composition
03/27/1991CN1050266A Near field reflection microscopy process and microscope
03/27/1991CN1012253B Manufacturing multilayer circuit and its elements by receiver with catalyst
03/26/1991US5003567 Soft x-ray reduction camera for submicron lithography
03/26/1991US5003543 Laser plasma X-ray source
03/26/1991US5003345 Apparatus and method for aligning and focusing an image of a reticle onto a semiconductor wafer
03/26/1991US5003344 Projection unit for a light permeable original in a copying machine
03/26/1991US5003342 Exposure apparatus
03/26/1991US5002993 Contrast enhancement layer compositions, alkylnitrones, and use
03/26/1991US5002977 Active energy ray-curable unsaturated resin composition
03/26/1991US5002858 Process for the formation of an image
03/26/1991US5002857 Method for manufacturing lithographic printing plates
03/26/1991US5002856 Diazonium salts as photoinitiators, glycidyl polymers for development
03/26/1991US5002855 Solid imaging method using multiphasic photohardenable compositions
03/26/1991US5002854 Radiation Deflection
03/26/1991US5002853 Positive working photosensitive composition
03/26/1991US5002852 Optical recording media for forming images, polyacetylenic polymers, resistance to ultraviolet radiation
03/26/1991US5002851 Positive working photoresists, heat resistant images
03/26/1991US5002850 Acrylic Polymer
03/26/1991US5002849 Receiver sheet including amine salt
03/26/1991US5002844 Photoresist and method of manufacturing the color cathode-ray tube by use thereof
03/26/1991US5002312 Pre-imaged high resolution hot stamp transfer foil, article and method
03/26/1991US5002008 Coating apparatus and method for applying a liquid to a semiconductor wafer, including selecting a nozzle in a stand-by state
03/26/1991CA1281870C Polyester composite stretch film useable namely in the field of graphic arts
03/23/1991WO1991004513A1 Method of optical near field microlithography and microlithography devices implementing same
03/23/1991CA2066586A1 Method of optical near field microlithography and microlithography devices implementing same
03/23/1991CA2025681A1 Photoreactive resin compositions developable in a semi-aqueous solution
03/22/1991CA2025871A1 Solid state laser device for lithography light source and semiconductor lithography method
03/21/1991WO1991003770A1 Resists
03/21/1991WO1991003769A1 Radiation-sensitive compositions containing fully substituted novolak polymers
03/21/1991WO1991003767A1 Processing apparatus
03/21/1991WO1991003757A1 Microscopy method and reflexion near field microscope
03/21/1991WO1991003448A1 Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositions
03/20/1991EP0418054A2 Apparatus for evaluating a lens
03/20/1991EP0418011A2 Photocurable compositions
03/20/1991EP0417952A2 Shaping using area patterning mask
03/20/1991EP0417740A2 Image forming apparatus
03/20/1991EP0417557A2 Positive-working radiation-sensitive mixture and recording material prepared therefrom
03/20/1991EP0417556A2 Positive-working radiation-sensitive mixture and recording material prepared therefrom
03/20/1991CN2073595U Dynamic automatic focusing device for grating etching machine
03/20/1991CN2073594U Automatic focusing device for photoetching machine
03/20/1991CN1049966A Laser shaping with area patterning mask
03/19/1991WO1991004505A1 Method of producing color filter and resist for light-shielding film used for the method
03/19/1991US5001764 Guardbands for pattern inspector
03/19/1991US5001734 SOR exposure system
03/19/1991US5001514 Overhead exposure unit
03/19/1991US5001511 Image recording apparatus having exposure control unit
03/19/1991US5001243 Substituted naphthacene-5, 12-diones
03/19/1991US5001083 Silicon with silicon oxide or silicon nitride, an oxide reactive metal coating
03/19/1991US5001040 Process of forming resist image in positive photoresist with thermally stable phenolic resin
03/19/1991US5001039 Method of manufacturing semiconductor device comprising step of patterning resist and light irradiation apparatus used by the manufacturing method
03/19/1991US5001038 Process for photoimaging a three dimensional printed circuit substrate
03/19/1991US5001037 Method of making overlay proofs comprising precolored and toned images
03/19/1991US5001036 Multi-layer peel-apart photosensitive reproduction element containing a photorelease layer
03/19/1991US5001034 Image transfer method
03/19/1991US5001032 Photosensitive material containing a photosensitive and heat developable element and a polymerizable layer and image-forming method utilizing the same
03/19/1991US5000816 Thin film peeling apparatus
03/19/1991US5000814 Film peeling apparatus having fluid injection device
03/19/1991US5000573 Method of alignment with the use of diffraction gratings and an apparatus therefor
03/19/1991CA2042035A1 Method of producing color filter and resist for light-shielding film used for the method
1 ... 1152 1153 1154 1155 1156 1157 1158 1159 1160 1161 1162 1163 1164 1165 1166 1167 1168 1169 1170 1171 1172 ... 1272