Patents for C30B 29 - Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape (27,107)
06/2000
06/20/2000US6077342 Single crystal formed by the czochralski method and having a crystallographic axis as a pulling direction set within an angle range of 30 degrees from a b-axis (010) direction; substrate for uniform gallium nitride semiconductor thin film
06/20/2000CA2204086C Production of diamond film
06/15/2000WO2000034989A1 Method for producing high quality heteroepitaxial growth using stress engineering and innovative substrates
06/15/2000WO2000034553A1 Silicon wafer and method of manufacture thereof
06/15/2000WO2000034552A1 Single crystal processing by in-situ seed injection
06/14/2000EP1008677A1 Method for the conversion of polycrystalline carbon
06/14/2000EP1008553A1 Surface functionalized diamond crystals and methods for producing same
06/14/2000EP1007771A1 Thermal mismatch compensation to produce free standing substrates by epitaxial deposition
06/14/2000EP1007768A2 Elimination of thermal mismatch defects in epitaxially deposited films through the separation of the substrate from the film at the growth temperature
06/14/2000CN2382726Y Crystallizing room of adjustable vapour phase diffusion for protein crystal growth
06/14/2000CN1256724A Crucible and method of preparation thereof
06/14/2000CN1256723A Low defect density, ideal oxygen precipitating silicon
06/13/2000US6074768 Process for forming the oxide superconductor thin film and laminate of the oxide superconductor thin films
06/13/2000US6074477 Process and an apparatus for producing a composite oxide single crystal body
06/08/2000WO2000033388A1 METHOD OF PRODUCING DEVICE QUALITY (Al)InGaP ALLOYS ON LATTICE-MISMATCHED SUBSTRATES
06/08/2000WO2000033365A1 Fabrication of gallium nitride layers by lateral growth
06/08/2000WO2000032853A1 Large-size monoatomic and monocrystalline layer, made of diamond-type carbon and device for making same
06/08/2000WO2000007221A3 Holographic, laser-induced fabrication of indium nitride quantum wires and quantum dots
06/07/2000CN1255556A Single crystal transition control
06/06/2000US6072164 Heat-treating method and radiant heating device
06/06/2000US6072118 Process and apparatus for growing crystalline silicon plates by pulling the plate through a growth member
06/06/2000US6071349 Gas supplying apparatus and vapor-phase growth plant
06/06/2000US6071341 Apparatus for fabricating single-crystal silicon
06/06/2000US6071338 Method for crystal growth of multi-element oxide thin film containing bismuth as constituent element
06/02/2000WO2000031325A1 Production method for silicon single crystal and production device for single crystal ingot, and heat treating method for silicon single crystal wafer
06/02/2000WO2000031324A1 Single-crystal silicon wafer having few crystal defects and method for manufacturing the same
06/02/2000WO2000031322A1 Method for epitaxial growth on a substrate
06/02/2000WO2000031317A1 Reactor and method for chemical vapour deposition
06/02/2000WO2000030975A1 SiGe CRYSTAL
05/2000
05/31/2000EP1004899A1 Scintillating substance and scintillating wave-guide element
05/31/2000EP1004690A1 Single crystal conversion control
05/31/2000CN1255170A Process of diamond growth from C70
05/31/2000CN1255169A Low defect density, ideal oxygen precipitating silicon
05/31/2000CN1053021C Aluminium tetraborate gadolinium crystal blended with rare earth and growth method thereof
05/30/2000US6069682 Spherical shaped semiconductor integrated circuit
05/30/2000US6069369 Superconducting device
05/30/2000US6068699 Apparatus for fabricating semiconductor single crystal
05/25/2000DE19854235A1 Continuous combustible metallurgical dust passivation, especially in Czochralski silicon single crystal growth units, comprises controlled dust oxidation in off-gas stream
05/24/2000EP1002335A4 Ideal oxygen precipitating silicon wafers and oxygen out-diffusion-less process therefor
05/24/2000EP1002335A1 Ideal oxygen precipitating silicon wafers and oxygen out-diffusion-less process therefor
05/24/2000EP1002144A1 Method and system for controlling growth of a silicon crystal
05/23/2000US6066306 Silicon single crystal wafer having few crystal defects, and method RFO producing the same
05/17/2000EP1001055A1 Gas turbine component
05/16/2000US6063736 Oxide superconductor of high critical current density
05/16/2000US6063513 Silicon carbide(sic) top layer, surface processed to be a specular surface, and having a defect-free sic crystal layer at given depth from the specular surface; resistant to high energy beams for use such as reflecting mirrors
05/16/2000US6063443 Vapor deposition
05/16/2000US6063189 Mechanism for clamping a crystal body in a crystal-body lifting device
05/16/2000US6063186 Growth of very uniform silicon carbide epitaxial layers
05/16/2000US6063185 Production of bulk single crystals of aluminum nitride, silicon carbide and aluminum nitride: silicon carbide alloy
05/16/2000CA2057490C Laminated diamond substrate
05/11/2000WO2000026446A1 Method and system for measuring polycrystalline chunk size and distribution in the charge of a czochralski process
05/11/2000WO2000026422A1 High purity gallium for preparation of compound semiconductor, and method and apparatus for purifying the same
05/10/2000EP0830218A4 Structures having enhanced biaxial texture and method of fabricating same
05/09/2000US6061174 Image-focusing optical system for ultraviolet laser
05/09/2000US6059878 Liquid phase epitaxial; hydrogen reduction
05/04/2000WO2000025354A1 Polycrystalline silicon thin film forming method and thin film forming apparatus
05/03/2000EP0996967A2 Method for producing layered structures on a substrate, substrate and semiconductor components produced according to said method
05/03/2000EP0745147B1 Method and apparatus for coating a substrate
05/02/2000US6056931 Silicon wafer for hydrogen heat treatment and method for manufacturing the same
05/02/2000US6056819 Method for pulling a single crystal
05/02/2000US6056818 Method of manufacturing a silicon monocrystal, and method of holding the same
05/02/2000CA2064232C Superconducting metal oxide compositions and processes for manufacture and use
04/2000
04/26/2000EP0995821A1 Method and apparatus for working semiconductor material
04/26/2000EP0995820A1 Fluoride refining method and fluoride crystal manufacturing method, and optical part and aligner using same
04/26/2000EP0994973A1 Apparatus and method for nucleation and deposition of diamond using hot-filament dc plasma
04/26/2000CN1251625A Lanthanum gallium silicate disc and its preparation method
04/25/2000US6053975 Crystal holding apparatus
04/25/2000US6053974 Heat shield for crystal puller
04/25/2000US6053973 Single crystal SiC and a method of producing the same
04/20/2000WO2000022204A2 Simulated diamond gemstones formed of aluminum nitride and aluminum nitride:silicon carbide alloys
04/20/2000WO2000022203A2 Production of bulk single crystals of aluminum nitride, silicon carbide and aluminum nitride:silicon carbide alloy
04/20/2000WO2000022201A1 Method and apparatus for accurately pulling a crystal
04/20/2000WO2000022200A1 Method and system for controlling growth of a silicon crystal
04/20/2000WO2000022199A1 Electrode assembly for electrical resistance heater used in crystal growing apparatus
04/20/2000WO2000022197A1 Epitaxial silicon wafers substantially free of grown-in defects
04/20/2000WO2000022196A1 Process for preparing defect free silicon crystals which allows for variability in process conditions
04/20/2000WO2000022195A2 Production of bulk single crystals of silicon carbide
04/20/2000WO2000021905A1 Three dimensionally periodic structural assemblies on nanometer and longer scales
04/20/2000DE19847695A1 Single crystal, especially silicon single crystal, is grown under neck growth conditions of high pulling speed relative to the phase boundary axial temperature gradient
04/20/2000DE19847098A1 Verfahren und Vorrichtung zur Bearbeitung von Halbleitermaterial Method and apparatus for processing semiconductor material
04/19/2000EP0994502A2 Dynamic blending gas delivery system and method
04/19/2000CN1251206A Ideal oxygen precipitating silicon wafers and oxygen out-diffusion-less process therefor
04/19/2000CN1051554C Metalorganic compounds
04/19/2000CN1051553C Preparation of metalorganic compounds for growing epitaxial semiconductor layers
04/18/2000US6052042 Magnetostatic wave device
04/18/2000US6051062 Producing an optical single crystal epitaxial film from a melt containing a transition metal on a single crystal substrate by a liquid phase epitaxial method
04/18/2000CA2061302C Method of making synthetic diamond film
04/13/2000WO2000020664A1 Continuous oxidation process for crystal pulling apparatus
04/12/2000EP0993235A2 Thin film forming method, display, and color filter
04/12/2000EP0992072A1 Controlled conversion of metal oxyfluorides into superconducting oxides
04/12/2000EP0868753B1 Layer sequence with at least one epitaxial, non-c-axis oriented htsc thin film or with a layer of a structure crystallographically comparable to htsc
04/12/2000CN2373459Y Filament frock for batch producing CVD diamond slice
04/12/2000CN1250526A Scintillating substance and scintillating wave-guide element
04/12/2000CN1250115A Self-frequency doubling laser crystal of Nd-doped low temperature phase lanthanum-scandium borate
04/11/2000US6048813 Simulated diamond gemstones formed of aluminum nitride and aluminum nitride: silicon carbide alloys
04/11/2000US6048737 Forming conductive oxide layer between a metal electrode and a ferroelectric layer, capable of enhancing the fatigue behavior in addition to reducing the leakage current
04/11/2000US6048398 Device for epitaxially growing objects
04/11/2000US6048396 Method for producing calcite-type calcium carbonate single crystal
04/11/2000US6048395 Method for producing a silicon single crystal having few crystal defects
04/05/2000EP0990717A1 GaAs single crystal substrate and epitaxial wafer using the same