C30B 25 - Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth

Patents for C30B 25 - Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth (13,302)
12/1994
12/20/1994	US5374829 Vacuum chuck
12/20/1994	US5374318 Process for the deposition of diamond films using low energy, mass-selected ion beam deposition
12/20/1994	US5374159 Robotically loaded epitaxial deposition apparatus
12/20/1994	US5373806 Particulate-free epitaxial process
12/13/1994	US5372799 Process for the synthesis of granular diamond
12/13/1994	US5372089 Method of forming single-crystalline thin film
12/07/1994	EP0498887B1 Core wire connecting bridge for polycrystalline silicon manufacturing apparatuses
12/06/1994	US5370855 Conversion of fullerenes to diamond
12/06/1994	US5370738 Controlling thickness and composition; laminar flow of gases
12/06/1994	US5370709 Semiconductor wafer processing apparatus having a Bernoulli chuck
12/06/1994	US5370371 Heat treatment apparatus
11/1994
11/30/1994	EP0444190B1 Gas separation by semi-permeable membranes
11/30/1994	CN1095769A Method and apparatus for preparing crystalline thin-films for solid-state lasers
11/29/1994	US5368937 Improved carbon containing thin film formed by increasing bias voltage during a plasma CVD process
11/29/1994	US5368897 Method for arc discharge plasma vapor deposition of diamond
11/29/1994	US5368647 Photo-excited processing apparatus for manufacturing a semiconductor device that uses a cylindrical reflecting surface
11/24/1994	WO1994027323A1 Preparation of nucleated silicon surfaces
11/24/1994	WO1994026953A1 Method for fabricating oriented diamond films
11/23/1994	EP0625589A1 CVD reactor
11/22/1994	US5366585 Method and apparatus for protection of conductive surfaces in a plasma processing reactor
11/22/1994	US5365877 Method of growing semiconductor in vapor phase
11/22/1994	US5365876 Crystal face temperature determination means
11/22/1994	US5365772 Leak detection in a reduced pressure processing apparatus
11/16/1994	CN1026599C Method for formation of crystall film
11/15/1994	US5364815 Crystal growth to form monocrystalline silicon having high light sensitivity and polycrystalline silicon having low light sensitivty to light on same substrate
11/15/1994	US5364664 Vapor depositing aluminum from alkylaluminum hydride and hydrogen gas; wiring semiconductors and integrated circuits
11/15/1994	US5364660 Continuous atmospheric pressure CVD coating of fibers
11/15/1994	US5364423 Method for making diamond grit and abrasive media
11/15/1994	US5363799 Method for growth of crystal
11/15/1994	US5363798 Large area semiconductor wafers
11/15/1994	US5363793 Implanting ions in the surface of a substrate, preferential etching
11/15/1994	US5363694 Ampoule rupture detection system
11/15/1994	CA1333041C Process for forming deposited film
11/08/1994	US5362972 Semiconductor device using whiskers
11/08/1994	US5362711 Method for producing single crystal superconducting LnA2 Cu3 O7-x films
11/08/1994	US5362682 Method of producing sheets of crystalline material and devices made therefrom
11/08/1994	US5362526 Plasma-enhanced CVD process using TEOS for depositing silicon oxide
11/02/1994	EP0622472A1 Method for growing a diamond or c-BN thin film on a diamond or c-BN substrate
11/01/1994	US5360760 Vapor phase epitaxial growth method of a compound semiconductor
11/01/1994	US5360754 Lasers
11/01/1994	US5360479 Vapor depositing carbon-12 or carbon-13; thermoconductivity
10/1994
10/27/1994	DE4404110A1 Substrathalter für MOCVD und MOCVD-Vorrichtung Substrate holder for MOCVD and MOCVD apparatus
10/25/1994	US5359148 Heat-treating apparatus
10/25/1994	US5358596 Method and apparatus for growing diamond films
10/25/1994	CA1332694C Reagent source
10/20/1994	DE4331654C1 Organoarsenido and organophosphido metallanes, preparation thereof and use thereof
10/20/1994	DE4311815A1 Method for producing essentially defect-free lattice-defect conformal layers on monocrystalline bulk material
10/18/1994	US5356510 Method for the growing of heteroepitaxial layers
10/12/1994	EP0619615A2 Arsenic passivation for epitaxial deposition of ternary chalcogenide semiconductor films onto silicon substrates
10/11/1994	US5354921 Single crystalline fibrous superconductive composition and process for preparing the same
10/11/1994	US5354715 Exposing heated substrate surface to plasma of ozone, oxygen, tetraethyl orthosilicate in chamber at specified pressure
10/11/1994	US5354708 Method of nitrogen doping of II-VI semiconductor compounds during epitaxial growth using an amine
10/11/1994	US5354412 Forming intermetallic containing arsenic
10/11/1994	CA1332342C Process for producing crystal
10/04/1994	US5352293 Tube apparatus for manufacturing semiconductor device
10/04/1994	CA2028808C Dislocation free compound semiconductor wafer
09/1994
09/29/1994	WO1994021841A1 Method and apparatus for the combustion chemical vapor deposition of films and coatings
09/29/1994	WO1994021557A1 Conversion of fullerenes to diamond
09/27/1994	US5350720 Silicon nitride, graphite
09/27/1994	US5349922 Free standing diamond sheet and method and apparatus for making same
09/22/1994	DE4401156A1 Apparatus for simultaneous admission of at least one process gas into a plurality of reaction chambers
09/21/1994	EP0422243B1 Method of forming polycrystalline film by chemical vapor deposition
09/21/1994	EP0368900B1 Improved reaction chambers and methods for cvd
09/20/1994	US5349154 Diamond growth by microwave generated plasma flame
09/20/1994	US5348911 Material-saving process for fabricating mixed crystals
09/20/1994	CA1332039C Ii - vi group compound crystal article and process for producing the same
09/15/1994	WO1994020980A1 Cold wall reactor for heating of silicon wafers by microwave energy
09/14/1994	EP0615124A1 Method for in-situ growth of single crystal whiskers
09/14/1994	EP0614998A1 Diamond covered member and process for producing the same
09/13/1994	US5347460 Method and system employing optical emission spectroscopy for monitoring and controlling semiconductor fabrication
09/13/1994	US5346852 Low temperature process for producing indium-containing semiconductor materials
09/13/1994	US5346555 Device for thermal treatment and film forming process
09/13/1994	CA1331950C Iii - v group compound crystal article and process for producing the same
09/07/1994	EP0462135B1 Metallo-organic adduct compounds
09/06/1994	US5344796 Forming microcrystalline silicon seed layer over glass substrate, chemical vapor deposition of hydrogen-containing amorphous silicon layer over seed layer, heat treating upper layer; polycrystalline silicon seed layer may also be used
09/06/1994	US5344500 Silicon film on graphite substrate, concave-convex surface
09/01/1994	WO1994019509A1 Film forming method and film forming apparatus
09/01/1994	WO1994015707A3 Device for simultaneously letting in at least one process gas into a plurality of reaction chambers
08/1994
08/31/1994	EP0613173A1 Thermal reaction chamber for semiconductor wafer processing operations
08/31/1994	EP0612868A1 Single crystal diamond and process for producing the same
08/24/1994	EP0612104A2 Compound semi-conductors and controlled doping thereof
08/23/1994	US5341000 Thin silicon carbide layer on an insulating layer
08/23/1994	US5340553 Deoxygenation and dehydration by the heated silicon
08/23/1994	US5340401 Heater, temperature and pressure controllers, means for accurately positioning substrate from surface of heater
08/17/1994	EP0610175A1 High temperature superconducting films on aluminum oxide substrates
08/16/1994	US5338389 Heating substrate crystal in vacuum, forming monlayer, evacuating, introducing reaction gas, evacuating and introducing second crystal component gases
08/16/1994	US5338363 Chemical vapor deposition method, and chemical vapor deposition treatment system and chemical vapor deposition apparatus therefor
08/10/1994	EP0609886A1 Method and apparatus for preparing crystalline thin-films for solid-state lasers
08/10/1994	EP0609799A2 Improvements in heteroepitaxy by large surface steps
08/09/1994	US5336360 Vapor deposition of fibers onto heated substrate
08/09/1994	US5336327 CVD reactor with uniform layer depositing ability
08/09/1994	US5336324 Apparatus for depositing a coating on a substrate
08/04/1994	WO1994017353A1 A rapid thermal processing apparatus for processing semiconductor wafers
08/03/1994	EP0414842B1 Improved diamond deposition cell
08/02/1994	US5334565 Method of manufacturing silicon nitride whiskers
08/02/1994	US5334277 Gallium nitride from organometallic compound
08/02/1994	US5334250 Vapor deposition apparatus for using solid starting materials
07/1994
07/26/1994	US5332442 Surface processing apparatus
07/26/1994	CA1330862C Production of silicon carbide by carbonizing silica particles in residual oil
07/21/1994	WO1994016275A1 Method and apparatus for delivering gas

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