Patents for C30B 25 - Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth (13,302)
06/1993
06/02/1993EP0544438A2 Method for selectively growing gallium-containing layers
06/02/1993EP0544399A2 Epitaxial magnesium oxide as a buffer layer for formation of subsequent layers on tetrahedral semiconductors
05/1993
05/27/1993CA2083760A1 Epitaxial magnesium oxide as a buffer layer for formation of subsequent layers on tetrahedral semiconductors
05/25/1993US5213997 Method for forming crystalline film employing localized heating of the substrate
05/25/1993US5213985 Temperature measurement in a processing chamber using in-situ monitoring of photoluminescence
05/25/1993US5213654 Vapor-phase epitaxial growth method for semiconductor crystal layers
05/25/1993US5213497 Semiconductor processing gas diffuser plate
05/25/1993CA1318261C Method of purifying and depositing group iiia and group va compounds to produce epitaxial films
05/25/1993CA1318226C Diamond crystal growth process
05/25/1993CA1318225C Resistance heater for diamond production by cvd
05/19/1993EP0542291A1 Zinc oxide crystal and method of producing same
05/18/1993US5212394 Compound semiconductor wafer with defects propagating prevention means
05/18/1993US5211905 Uniform microstructure
05/18/1993US5211758 Chemical vapor deposition apparatus
05/18/1993US5210959 Ambient-free processing system
05/18/1993CA1317857C Homoepitaxial growth of alpha-sic thin films and semiconductor devices fabricated thereon
05/11/1993US5209952 Use of organometallic compounds to deposit thin films from the gas phase
05/11/1993US5209916 Conversion of fullerenes to diamond
05/05/1993EP0540366A1 Tool insert
05/05/1993EP0540082A1 LPCVD reactor for high efficiency, high uniformity deposition and a method of such deposition
05/04/1993US5207863 Crystal growth method and crystalline article obtained by said method
05/04/1993US5207835 High capacity epitaxial reactor
05/01/1993CA2081631A1 Tool insert
04/1993
04/28/1993EP0538611A1 Multilayered composition with a single crystal beta-silicon carbide layer
04/27/1993US5205900 Making laser beam incident on surface of growing crystal, detecting diffracted laser beam from surface
04/21/1993EP0537854A1 Method of manufacturing a semiconductor device whereby a layer of material is deposited on the surface of a semiconductor wafer from a process gas
04/21/1993EP0293439B1 Semi-insulating group iii-v based compositions
04/20/1993US5204145 Apparatus for producing diamonds by chemical vapor deposition and articles produced therefrom
04/20/1993US5204138 From silane, perfluorosilane and nitrogen gases
04/20/1993CA1316436C Accelerated whisker growth on iron-chromium-aluminum alloy foil
04/15/1993WO1993007312A1 Method of coating substrates
04/14/1993EP0537049A1 Process for the growth of heteroepitaxial layers
04/13/1993US5202105 Method for making hexagonal silicon carbide platelets with the addition of a growth additive
04/07/1993EP0535308A1 Device for introducing reagents into an organometallic vapour phase deposition apparatus
04/06/1993US5200157 Susceptor for vapor-growth deposition
04/06/1993US5200022 Method of improving mechanically prepared substrate surfaces of alpha silicon carbide for deposition of beta silicon carbide thereon and resulting product
04/06/1993US5199603 Delivery system for organometallic compounds
04/01/1993WO1993006619A1 Apparatus for introducing gas, and apparatus and method for epitaxial growth
04/01/1993DE4130952A1 Mirror surfaced heating furnace - for reflecting radiation beam inside heating zone and using reflected beam as heating source
03/1993
03/31/1993EP0534729A2 Method for obtaining thick, adherent diamond coatings
03/31/1993EP0533678A1 Ellipsometric control of material growth
03/30/1993US5198071 Process for inhibiting slip and microcracking while forming epitaxial layer on semiconductor wafer
03/28/1993CA2076086A1 Method for obtaining thick, adherent diamond coatings using metal interface screens
03/24/1993EP0532758A1 Cvd semiconductor manufacturing equipment
03/18/1993WO1993005208A1 Enhanced heteroepitaxy
03/18/1993WO1993005207A1 Method of nucleating diamond and article produced thereby
03/17/1993EP0531354A1 Process for the measurement of the thickness and refractive index of a thin film on a substrate, and a device for carrying out the process.
03/17/1993EP0531348A1 Process for producing unagglomerated single crystals of aluminum nitride
03/10/1993EP0531085A2 Isotopic diamond coated products and their production
03/10/1993EP0530440A1 Copper oxide whiskers and process for producing the same
03/09/1993US5192589 Low-pressure chemical vapor deposition process for depositing thin titanium nitride films having low and stable resistivity
03/09/1993US5192393 Crystallization of silicon by neutralization and activation
03/04/1993WO1993004210A1 Method for forming oxide film
03/04/1993CA2076087A1 Isotopic diamond coated products and their production
03/03/1993EP0530021A2 Diamond film and method of producing same
03/03/1993EP0529982A1 Exhaust apparatus for epitaxial growth system.
03/03/1993CA2068437A1 Copper oxide whiskers and process for producing the same
03/02/1993US5190913 Chemical vapor deposition
03/02/1993US5190738 Process for producing unagglomerated single crystals of aluminum nitride
03/02/1993US5190613 Method for forming crystals
03/01/1993EP0610175A4 High temperature superconducting films on aluminum oxide substrates.
02/1993
02/24/1993EP0528592A1 Method for selective CVD diamond deposition
02/24/1993EP0528405A2 Ambient-free processing system
02/23/1993US5188672 Reduction of particulate contaminants in chemical-vapor-deposition apparatus
02/23/1993US5188058 Uniform gas flow CVD apparatus
02/23/1993CA1313813C Film forming apparatus
02/18/1993WO1993003196A1 Method for deposition of a metal
02/16/1993US5187771 Heat processing apparatus utilizing a plurality of stacked heater holders
02/16/1993US5187561 Metal single crystal line having a particular crystal orientation
02/16/1993US5186756 MOCVD method and apparatus
02/16/1993US5186750 Vacuum chamber having substrate holder, laser source and controller, vibration-proof base, for organometallic molecular beam epitaxy
02/10/1993EP0526779A1 Pulsed gas plasma-enhanced chemical vapor deposition of silicon
02/10/1993EP0526646A1 Semiconductor device having an isolation region enriched in oxygen and a fabrication process thereof.
02/10/1993EP0526468A1 Diamond-on-a-substrate for electronic applications
02/09/1993CA2072326A1 Method for selective cvd diamond deposition
02/04/1993WO1993002232A1 Process for producing silicon carbide platelets and the platelets so produced
02/02/1993US5183529 Fabrication of polycrystalline free-standing diamond films
02/02/1993CA1313343C Metal organic vapor phase epitaxial growth of group iii-v semiconductor materials
01/1993
01/26/1993US5182093 Diamond deposition cell
01/26/1993US5181964 Single ended ultra-high vacuum chemical vapor deposition (uhv/cvd) reactor
01/26/1993CA1313247C Compound semiconductor light emitting device
01/21/1993WO1993001614A1 Compound semiconductor and manufacturing method therefor
01/20/1993EP0524114A1 Process for making a crystal with a lattice gradient
01/20/1993EP0523639A2 Method for patterning metallo-organic precursor film and film products
01/19/1993US5180435 Remote plasma enhanced CVD method and apparatus for growing an epitaxial semiconductor layer
01/19/1993US5180000 Workpiece carrier with suction slot for a disk-shaped workpiece
01/16/1993CA2071161A1 Method for patterning metallo-organic precursor film and method for producing a patterned ceramic film and film products
01/13/1993EP0522842A1 Method and apparatus for synthesizing diamond in vapor phase
01/12/1993US5178847 Process for producing ceramic raw materials
01/12/1993US5178681 Suspension system for semiconductor reactors
01/12/1993US5177878 Apparatus and method for treating flat substrate under reduced pressure in the manufacture of electronic devices
01/07/1993EP0521473A1 Multi-layered composition containing crystalline silicon carbide
01/07/1993EP0353256B1 Method of purifying and depositing group iiib and group vb compounds to produce epitaxial films
01/07/1993EP0305461B1 Epitaxial installation
12/1992
12/30/1992EP0520365A1 Method of making a Bi-Sr-Ca-Cu-O superconductive film
12/30/1992EP0520216A2 Fabrication of defect free silicon on an insulating substrate
12/29/1992US5174983 Flowing together gaseous carbon and hydrogen source to form turbulent mixture which is excitied and become reactive and deposited on the substrate
12/29/1992US5174825 Uniform gas distributor to a wafer
12/29/1992US5174748 Chamber having a hot zone and a cold zone and at least one gas inlet tube
12/23/1992WO1992022689A1 Process for making large-area single crystal diamond films