Patents for C25D 7 - Electroplating characterised by the article coated (12,170)
04/2000
04/06/2000WO1999060189A3 Method for metal coating of substrates
04/06/2000WO1999054920A3 Electro-chemical deposition cell for face-up processing of single semiconductor substrates
04/06/2000DE19845506A1 Verfahren zur Herstellung von prothetischen Formteilen für den Dentalbereich und prothetisches Formteil Process for the preparation of prosthetic moldings for the dental field and Prosthetic molding
04/05/2000EP0990423A1 Method of manufacturing prosthetic elements for the dental field and prosthetic element
04/04/2000US6045678 Formation of nanofilament field emission devices
03/2000
03/29/2000EP0989209A2 Electroplating apparatus
03/29/2000EP0583426B2 Improved process for preparing a nonconductive substrate for electroplating
03/28/2000US6042891 Roll forming structural steel profiles with galvanised coating
03/28/2000US6042712 Apparatus for controlling plating over a face of a substrate
03/23/2000WO1999064647A9 Method and apparatus for simultaneous non-contact electrochemical plating and planarizing of semiconductor wafers using a bipolar electrode assembly
03/23/2000WO1999054527A3 Electro-chemical deposition system and method of electroplating on substrates
03/22/2000EP0987931A2 Composite foil of aluminum and copper
03/22/2000CN1050730C Method of manufacturing printed circuit board
03/16/2000WO2000014308A1 Substrate plating device
03/16/2000WO2000014307A1 Pellistor
03/16/2000WO2000014306A1 Method for plating substrate and apparatus
03/16/2000CA2341033A1 Pellistor
03/14/2000US6036834 Selective electroplating of supported electrodes, then charging yields miniaturized biosensors
03/14/2000US6036826 Titanium electrodeposition drum
03/14/2000US6036822 Thin-film solar cell manufacturing apparatus and manufacturing method
03/07/2000US6033548 Rotating system and method for electrodepositing materials on semiconductor wafers
03/07/2000US6033540 Plating apparatus for plating a wafer
03/07/2000US6032356 Wafer-level test and burn-in, and semiconductor process
03/02/2000WO2000011679A2 Contact element
03/02/2000WO2000011245A2 Device for partial electrochemical treatment of bar-shaped objects
03/02/2000WO2000010797A1 Non-lambertian glass diffuser and method of making
03/02/2000DE19839479A1 Chemical or electrochemical treatment of an axisymmetric hollow component involves holding the component in a rotating unit so that a circumferential section of the component is dipped into the treatment bath
03/02/2000CA2341218A1 Contact element
03/01/2000EP0982771A1 Process for semiconductor device fabrication having copper interconnects
02/2000
02/29/2000US6030512 Device for forming bumps by metal plating
02/29/2000US6029344 Composite interconnection element for microelectronic components, and method of making same
02/24/2000WO2000010200A1 Wafer plating method and apparatus
02/23/2000EP0980918A1 Product conveyance mechanism of electroplating apparatus
02/22/2000US6027630 Method for electrochemical fabrication
02/17/2000WO2000007753A1 Casting steel strip
02/17/2000WO1999061183A3 Coated metal powder and method for producing the same
02/16/2000EP0979688A1 Method of manufacturing copper tubes
02/16/2000CN1244460A Composite foil of aluminium and copper
02/15/2000US6025205 Apparatus and methods of forming preferred orientation-controlled platinum films using nitrogen
02/15/2000US6024856 Copper metallization of silicon wafers using insoluble anodes
02/15/2000US6024849 Conducting roller for an electroplating apparatus
02/15/2000US6024846 Installation for coating a metallic band by guiding the latter through an electrolytic bath
02/10/2000WO2000007229A1 A system and a method for plating of a conductive pattern
02/10/2000WO1999066106A3 Method and apparatus for electroplating
02/09/2000EP0978575A1 Process and device for removing dendrites
02/09/2000EP0788728B1 Process for coating electrically non-conducting surfaces with connected metal structures
02/08/2000US6022468 Electrolytic hardening process
02/08/2000US6022467 Electrolytic tin plating process with reduced sludge production
02/08/2000US6022465 For customizing electrode contact placement on a semiconductor wafer while depositing and/or removing a material on semiconductor wafer
02/03/2000WO2000005775A1 Bipolar collector for fuel cell
02/03/2000WO2000005747A2 Metallization structures for microelectronic applications and process for forming the structures
02/03/2000WO2000005436A1 Circumferential cell device for electrodeposition with differentiated flows
02/03/2000DE19926102A1 Production of electrolytically coated hot-rolled strip comprises continuous single line feeding hot-rolled strip into a chemical pickling section and then into a coating section
02/03/2000DE19834759A1 Verfahren und Vorrichtung zum Entfernen von Dendriten Method and apparatus for removing dendrites
02/03/2000CA2337319A1 Bipolar collector for fuel cell
02/02/2000EP0975826A2 Method for electroplating metallic and non-metallic endless products and device for carrying out said method
02/02/2000EP0975825A2 Device for carrying out continuous electrolytic precipitation processes
02/01/2000US6019886 Comparator for monitoring the deposition of an electrically conductive material on a leadframe to warn of improper operation of a leadframe electroplating process
02/01/2000US6019884 Method of correcting warpage of steel strip in electroplating line
01/2000
01/26/2000EP0974686A2 Electroplating process for oldham ring and scroll member type compressor comprising the same
01/26/2000EP0973960A1 Device for producing foamed shaped parts, method for the production of a form tool and method for the production of a shaped foamed parted
01/25/2000US6017820 Integrated vacuum and plating cluster system
01/25/2000US6017437 Process chamber and method for depositing and/or removing material on a substrate
01/20/2000WO2000003072A1 Method and apparatus for copper plating using electroless plating and electroplating
01/20/2000WO2000003071A1 Electroplating reactor including back-side electrical contact apparatus
01/20/2000WO2000003067A1 Reactor vessel having improved cup, anode and conductor assembly
01/20/2000DE19837973C1 Apparatus for electrochemical treatment of parts of bar-shaped workpieces in immersion bath installations
01/19/2000EP0973195A1 Silver metallization by damascene method
01/19/2000CN1241650A Method of electromolding tridimensional metal structure directly on silicon substrate and the special fixture thereof
01/18/2000US6015482 Printed circuit manufacturing process using tin-nickel plating
01/18/2000US6015462 Semiconductor processing workpiece position sensing
01/17/2000CA2277319A1 Electroplating process for oldham ring and scroll member type compressor comprising the same
01/12/2000EP0874921B1 Process and system for electrochemical treatment of long stretched-out items
01/06/2000WO2000001208A1 Assembly of an electronic component with spring packaging
01/06/2000WO2000000673A1 Method for producing a nickel foam and a nickel foam thus obtainable
01/06/2000WO2000000672A2 Galvanic bath, method for producing structured hard chromium layers and use thereof
01/06/2000WO1999057342A8 Method and device for plating substrate
01/06/2000CA2334708A1 Galvanic bath, method for producing structured hard chromium layers and use thereof
01/05/2000EP0969124A1 Process and apparatus for the deposition of a zinc-nickel alloy on a substrate
01/04/2000US6010610 Stirring, sedimentation, electroplating cycles
01/04/2000US6009904 Diverter tub spout body
12/1999
12/29/1999WO1999067448A1 Freely detachable insoluble anode
12/29/1999EP0967303A1 Apparatus and method for electrolytically treating the inside surface of a portion of a vessel
12/29/1999EP0966556A1 Graded metal hardware component for an electrochemical cell
12/28/1999US6007866 Swelling, treating with alkaline permanganate, rinsing with water and acidic aqueous solution and water, neutralizing manganese dioxide layer with alkaline solution, rinsing with water and ethylene-3,4-dioxythiophene, acid, then coppering
12/28/1999US6007758 Using conductive material containing silver/palladium particles, ferrite particles, a cellulose-based or other organic binder, and a solvent, firing of the substrate onto which the ink has been coated, and plating of copper thereon
12/23/1999WO1999066106A2 Method and apparatus for electroplating
12/21/1999US6004828 Semiconductor processing workpiece support with sensory subsystem for detection of wafers or other semiconductor workpieces
12/21/1999US6004440 Cathode current control system for a wafer electroplating apparatus
12/16/1999WO1999064647A1 Method and apparatus for simultaneous non-contact electrochemical plating and planarizing of semiconductor wafers using a bipolar electrode assembly
12/15/1999EP0964080A1 Electrolysis apparatus having liquid squeezer out of contact with strip
12/15/1999CN1238394A Process of controlling grain growth in metal films
12/14/1999US6001235 Rotary plater with radially distributed plating solution
12/14/1999US6001234 Methods for plating semiconductor workpieces using a workpiece-engaging electrode assembly with sealing boot
12/14/1999US6000853 Multi-layer engine bearings and method of manufacture
12/07/1999US5998864 Stacking semiconductor devices, particularly memory chips
12/07/1999US5998228 Method of testing semiconductor
12/07/1999US5997710 Copper foil for a printed circuit board, a process and an apparatus for producing the same
12/02/1999WO1999061183A2 Coated metal powder and method for producing the same
12/02/1999DE19823341A1 Beschichtetes Metallpulver und Verfahren zu seiner Herstellung A coated metal powder and process for its preparation