Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/1983
10/19/1983EP0091734A1 Improvements in or relating to the bulk production of alloys by deposition from the vapour phase and apparatus therefor
10/18/1983US4410559 Glow discharges
10/18/1983US4410558 Continuous amorphous solar cell production system
10/18/1983US4410504 Method of producing high density carbon
10/11/1983US4409311 Electrography, silicon
10/05/1983EP0090586A1 Gas flow in plasma treatment processes
10/05/1983EP0090321A2 Reactor and process for the manufacture of semiconductor silicon
10/05/1983EP0090319A1 Process for the selective deposition of layered structures consisting of silicides of high melting metals on substrates essentially consisting of silicon, and their use
10/04/1983US4407230 Gas-feed nozzle for a pyrolytic particle coating apparatus
09/1983
09/28/1983EP0089382A1 Plasma-reactor and its use in etching and coating substrates
09/27/1983US4406765 Glow discharges, high frequency, direct current, pulsation
09/27/1983US4406680 Flame oxidation
09/20/1983US4405656 Process for producing photoconductive member
09/20/1983US4405655 Flames, on exterior of tube, supply high energy electric energy
09/20/1983CA1153939A1 Process and apparatus for manufacturing filaments of a refractory material by high-frequency heating
09/14/1983EP0088074A1 Plasma reactor and method therefor
09/13/1983US4404236 High pressure chemical vapor deposition
09/13/1983US4404235 Exposure to gaseous tungsten fluoride and hydrogen to form discontinuous tungsten islands
09/13/1983US4404177 Method for producing graphite crystals
09/13/1983US4404076 Film forming process utilizing discharge
09/13/1983CA1153637A1 One-directional uniformly coated fibers, method of preparation, and uses therefor
09/06/1983US4402997 Process for improving nitride deposition on a semiconductor wafer by purging deposition tube with oxygen
09/06/1983US4402925 Porous free standing pyrolytic boron nitride articles
08/1983
08/31/1983EP0087151A2 Process for producing layers of refractory metals or metallic compounds by chemical vapour deposition
08/30/1983US4401689 Inductively heating with radio frequency energy
08/30/1983US4401687 Plasma deposition of silicon
08/30/1983US4401507 Method and apparatus for achieving spatially uniform externally excited non-thermal chemical reactions
08/30/1983US4401054 Plasma deposition apparatus
08/24/1983EP0086378A1 Method of plasma-coating the inside surface of a glass tube
08/23/1983US4400410 Coating insulating materials by glow discharge
08/23/1983US4400409 By glow discharge vapor deposition followed by doping
08/16/1983US4399168 Method of preparing coated cemented carbide product
08/16/1983CA1152183A1 Vapor delivery control system and method
08/10/1983EP0085397A2 Semiconductor vapor phase growing apparatus
08/10/1983EP0085240A2 Multiple coated cutting tool and method for producing same
08/09/1983US4397933 Electrography, solar cells
08/09/1983US4397897 Bell of translucent fused silica for the precipitation of polysilicon
08/02/1983CA1151105A1 Gas-discharge method for coating the interior of electrically non-conductive pipes
08/02/1983CA1151019A1 Process of forming a metal or metal compound coating on a face of a glass substrate and apparatus suitable for use in forming such coating
07/1983
07/27/1983EP0084525A2 Method of making a coated cemented carbide body and resulting body
07/26/1983US4395438 Vapor phase reaction of ammonia and a silane compound
07/26/1983US4395435 Method for manufacturing information recording medium
07/26/1983CA1150749A1 Jet for continuously depositing solid matter on a substrate
07/19/1983US4394401 Method of plasma enhanced chemical vapor deposition of phosphosilicate glass film
07/19/1983US4394400 Method and apparatus for depositing coatings in a glow discharge
07/19/1983US4394237 Induction of fluorescence
07/19/1983US4394191 Stacked polycrystalline silicon film of high and low conductivity layers
07/12/1983US4393097 Electrically conductive Si3 N4 -C series amorphous material and a method of producing the same
07/12/1983US4393095 Chemical vapor deposition of vanadium oxide coatings
07/12/1983US4393013 Vapor mass flow control system
07/07/1983WO1983002291A1 Process for making inorganic oxide fibers
07/06/1983EP0083043A1 Wearing part
07/05/1983US4391846 Method of preparing high-temperature-stable thin-film resistors
07/05/1983CA1149245A1 Boride coated cemented carbide
06/1983
06/28/1983US4390586 Non-conducting oxide for restraining flow of electrons
06/28/1983US4390567 Method of forming graded polymeric coatings or films
06/28/1983US4389973 Apparatus for performing growth of compound thin films
06/28/1983US4389970 Apparatus for regulating substrate temperature in a continuous plasma deposition process
06/22/1983EP0082070A1 Protection method for a conducting part, and a conducing part made by this method
06/14/1983US4388344 Method of repairing surface defects in coated laser mirrors
06/14/1983US4388342 Method for chemical vapor deposition
06/14/1983US4388095 Method of producing a glass layer on an interior surface of a hollow body
06/07/1983US4387134 Coated with stannic oxide; for heated glazing
06/07/1983US4386986 Chemical vapor deposition within coolant passages
05/1983
05/31/1983US4386255 Susceptor for rotary disc reactor
05/31/1983US4386117 Coating process using alkoxy substituted silicon-bearing reactant
05/26/1983WO1983001750A1 Coating process using alkoxy substituted silicon-bearing reactant
05/24/1983CA1146909A1 Method and apparatus for forming films from vapors using a contained plasma source
05/11/1983WO1983001710A1 An amorphous silicon material fabricated by a magnetically aligned glow discharge
05/10/1983US4382454 Inner layer of crystalline boron, outer layer of amorphous boron
05/04/1983EP0020746B1 Process and apparatus for cleaning wall deposits from a film deposition furnace tube
05/03/1983US4382101 Method for increasing the peel strength of metal-clad polymers
05/03/1983US4382100 Application of a layer of carbonaceous material to a surface
05/03/1983US4382099 Dopant predeposition from high pressure plasma source
04/1983
04/27/1983EP0077535A1 Method for the production of layers of high melting metals at low substrate temperatures
04/27/1983EP0077408A1 A method and apparatus for the heat treatment of semiconductor articles
04/19/1983US4380556 On uranium oxide-zirconium oxide particles nuclear fuels
04/19/1983CA1144825A1 Coating glass
04/13/1983EP0076731A2 Porous free standing pyrolytic boron nitride articles and method for preparing the same
04/13/1983EP0076426A2 Multiple chamber deposition and isolation system and method
04/06/1983EP0075902A2 Method of vapor deposition
04/06/1983EP0075889A2 Process for making thin silicon films
04/05/1983US4379186 Fluidizing fine powder
04/05/1983US4379181 Method for plasma deposition of amorphous materials
04/05/1983US4378626 Cooled mirror construction by chemical vapor deposition
03/1983
03/31/1983WO1983001151A1 Semi-conductor material and process for its production
03/31/1983WO1983001075A1 Plasma reactor and method therefor
03/30/1983EP0075007A1 Amorphous semiconductor method and devices
03/23/1983EP0074759A2 Sintered hard metal products having a multi-layer wear-restistant coating
03/22/1983US4377564 Plasma in a gas flow where silicon compound reacts
03/22/1983CA1143259A1 Method of cleaning a reactor
03/16/1983EP0074212A1 Apparatus for forming thin film
03/09/1983EP0073417A2 Use of a homogeneous coating of two or more metals or metal compounds
02/1983
02/22/1983US4374901 Etching tungsten core then vapor deposition of layer of tungsten by heat decomposition of tungsten compound
02/22/1983US4374685 Forming a surface layer of titanium, tantalum, or niobium nitride by heat treating a tungsten carbide-nitride alloy; coating with aluminum oxide
02/17/1983WO1983000481A1 High hardness material
02/16/1983EP0072226A1 Vapor phase deposition of semiconductor material
02/16/1983EP0025040B1 A process for producing a part by powder metallurgy methods
02/15/1983US4374182 Of polychlorosilanes
02/15/1983US4374163 Method of vapor deposition