Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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10/19/1983 | EP0091734A1 Improvements in or relating to the bulk production of alloys by deposition from the vapour phase and apparatus therefor |
10/18/1983 | US4410559 Glow discharges |
10/18/1983 | US4410558 Continuous amorphous solar cell production system |
10/18/1983 | US4410504 Method of producing high density carbon |
10/11/1983 | US4409311 Electrography, silicon |
10/05/1983 | EP0090586A1 Gas flow in plasma treatment processes |
10/05/1983 | EP0090321A2 Reactor and process for the manufacture of semiconductor silicon |
10/05/1983 | EP0090319A1 Process for the selective deposition of layered structures consisting of silicides of high melting metals on substrates essentially consisting of silicon, and their use |
10/04/1983 | US4407230 Gas-feed nozzle for a pyrolytic particle coating apparatus |
09/28/1983 | EP0089382A1 Plasma-reactor and its use in etching and coating substrates |
09/27/1983 | US4406765 Glow discharges, high frequency, direct current, pulsation |
09/27/1983 | US4406680 Flame oxidation |
09/20/1983 | US4405656 Process for producing photoconductive member |
09/20/1983 | US4405655 Flames, on exterior of tube, supply high energy electric energy |
09/20/1983 | CA1153939A1 Process and apparatus for manufacturing filaments of a refractory material by high-frequency heating |
09/14/1983 | EP0088074A1 Plasma reactor and method therefor |
09/13/1983 | US4404236 High pressure chemical vapor deposition |
09/13/1983 | US4404235 Exposure to gaseous tungsten fluoride and hydrogen to form discontinuous tungsten islands |
09/13/1983 | US4404177 Method for producing graphite crystals |
09/13/1983 | US4404076 Film forming process utilizing discharge |
09/13/1983 | CA1153637A1 One-directional uniformly coated fibers, method of preparation, and uses therefor |
09/06/1983 | US4402997 Process for improving nitride deposition on a semiconductor wafer by purging deposition tube with oxygen |
09/06/1983 | US4402925 Porous free standing pyrolytic boron nitride articles |
08/31/1983 | EP0087151A2 Process for producing layers of refractory metals or metallic compounds by chemical vapour deposition |
08/30/1983 | US4401689 Inductively heating with radio frequency energy |
08/30/1983 | US4401687 Plasma deposition of silicon |
08/30/1983 | US4401507 Method and apparatus for achieving spatially uniform externally excited non-thermal chemical reactions |
08/30/1983 | US4401054 Plasma deposition apparatus |
08/24/1983 | EP0086378A1 Method of plasma-coating the inside surface of a glass tube |
08/23/1983 | US4400410 Coating insulating materials by glow discharge |
08/23/1983 | US4400409 By glow discharge vapor deposition followed by doping |
08/16/1983 | US4399168 Method of preparing coated cemented carbide product |
08/16/1983 | CA1152183A1 Vapor delivery control system and method |
08/10/1983 | EP0085397A2 Semiconductor vapor phase growing apparatus |
08/10/1983 | EP0085240A2 Multiple coated cutting tool and method for producing same |
08/09/1983 | US4397933 Electrography, solar cells |
08/09/1983 | US4397897 Bell of translucent fused silica for the precipitation of polysilicon |
08/02/1983 | CA1151105A1 Gas-discharge method for coating the interior of electrically non-conductive pipes |
08/02/1983 | CA1151019A1 Process of forming a metal or metal compound coating on a face of a glass substrate and apparatus suitable for use in forming such coating |
07/27/1983 | EP0084525A2 Method of making a coated cemented carbide body and resulting body |
07/26/1983 | US4395438 Vapor phase reaction of ammonia and a silane compound |
07/26/1983 | US4395435 Method for manufacturing information recording medium |
07/26/1983 | CA1150749A1 Jet for continuously depositing solid matter on a substrate |
07/19/1983 | US4394401 Method of plasma enhanced chemical vapor deposition of phosphosilicate glass film |
07/19/1983 | US4394400 Method and apparatus for depositing coatings in a glow discharge |
07/19/1983 | US4394237 Induction of fluorescence |
07/19/1983 | US4394191 Stacked polycrystalline silicon film of high and low conductivity layers |
07/12/1983 | US4393097 Electrically conductive Si3 N4 -C series amorphous material and a method of producing the same |
07/12/1983 | US4393095 Chemical vapor deposition of vanadium oxide coatings |
07/12/1983 | US4393013 Vapor mass flow control system |
07/07/1983 | WO1983002291A1 Process for making inorganic oxide fibers |
07/06/1983 | EP0083043A1 Wearing part |
07/05/1983 | US4391846 Method of preparing high-temperature-stable thin-film resistors |
07/05/1983 | CA1149245A1 Boride coated cemented carbide |
06/28/1983 | US4390586 Non-conducting oxide for restraining flow of electrons |
06/28/1983 | US4390567 Method of forming graded polymeric coatings or films |
06/28/1983 | US4389973 Apparatus for performing growth of compound thin films |
06/28/1983 | US4389970 Apparatus for regulating substrate temperature in a continuous plasma deposition process |
06/22/1983 | EP0082070A1 Protection method for a conducting part, and a conducing part made by this method |
06/14/1983 | US4388344 Method of repairing surface defects in coated laser mirrors |
06/14/1983 | US4388342 Method for chemical vapor deposition |
06/14/1983 | US4388095 Method of producing a glass layer on an interior surface of a hollow body |
06/07/1983 | US4387134 Coated with stannic oxide; for heated glazing |
06/07/1983 | US4386986 Chemical vapor deposition within coolant passages |
05/31/1983 | US4386255 Susceptor for rotary disc reactor |
05/31/1983 | US4386117 Coating process using alkoxy substituted silicon-bearing reactant |
05/26/1983 | WO1983001750A1 Coating process using alkoxy substituted silicon-bearing reactant |
05/24/1983 | CA1146909A1 Method and apparatus for forming films from vapors using a contained plasma source |
05/11/1983 | WO1983001710A1 An amorphous silicon material fabricated by a magnetically aligned glow discharge |
05/10/1983 | US4382454 Inner layer of crystalline boron, outer layer of amorphous boron |
05/04/1983 | EP0020746B1 Process and apparatus for cleaning wall deposits from a film deposition furnace tube |
05/03/1983 | US4382101 Method for increasing the peel strength of metal-clad polymers |
05/03/1983 | US4382100 Application of a layer of carbonaceous material to a surface |
05/03/1983 | US4382099 Dopant predeposition from high pressure plasma source |
04/27/1983 | EP0077535A1 Method for the production of layers of high melting metals at low substrate temperatures |
04/27/1983 | EP0077408A1 A method and apparatus for the heat treatment of semiconductor articles |
04/19/1983 | US4380556 On uranium oxide-zirconium oxide particles nuclear fuels |
04/19/1983 | CA1144825A1 Coating glass |
04/13/1983 | EP0076731A2 Porous free standing pyrolytic boron nitride articles and method for preparing the same |
04/13/1983 | EP0076426A2 Multiple chamber deposition and isolation system and method |
04/06/1983 | EP0075902A2 Method of vapor deposition |
04/06/1983 | EP0075889A2 Process for making thin silicon films |
04/05/1983 | US4379186 Fluidizing fine powder |
04/05/1983 | US4379181 Method for plasma deposition of amorphous materials |
04/05/1983 | US4378626 Cooled mirror construction by chemical vapor deposition |
03/31/1983 | WO1983001151A1 Semi-conductor material and process for its production |
03/31/1983 | WO1983001075A1 Plasma reactor and method therefor |
03/30/1983 | EP0075007A1 Amorphous semiconductor method and devices |
03/23/1983 | EP0074759A2 Sintered hard metal products having a multi-layer wear-restistant coating |
03/22/1983 | US4377564 Plasma in a gas flow where silicon compound reacts |
03/22/1983 | CA1143259A1 Method of cleaning a reactor |
03/16/1983 | EP0074212A1 Apparatus for forming thin film |
03/09/1983 | EP0073417A2 Use of a homogeneous coating of two or more metals or metal compounds |
02/22/1983 | US4374901 Etching tungsten core then vapor deposition of layer of tungsten by heat decomposition of tungsten compound |
02/22/1983 | US4374685 Forming a surface layer of titanium, tantalum, or niobium nitride by heat treating a tungsten carbide-nitride alloy; coating with aluminum oxide |
02/17/1983 | WO1983000481A1 High hardness material |
02/16/1983 | EP0072226A1 Vapor phase deposition of semiconductor material |
02/16/1983 | EP0025040B1 A process for producing a part by powder metallurgy methods |
02/15/1983 | US4374182 Of polychlorosilanes |
02/15/1983 | US4374163 Method of vapor deposition |