Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
01/2006
01/11/2006EP0984876B1 Method for coating a rubber wiper blade
01/11/2006CN2751035Y Water vapour supply device
01/11/2006CN2751034Y Vaporization plating apparatus
01/11/2006CN2751033Y Substrate heating system for preparing oxide film with temperature equalization and isolation assembly
01/11/2006CN1720345A Methods of using thin metal layers to make carbon nanotube films, layers, fabrics, ribbons, elements and articles
01/11/2006CN1719646A Method and device for making calalyst layer of fuel cell
01/11/2006CN1719626A Cu-Ga alloy target for Cu-In-Ga-Se film solar battery and preparing process thereof
01/11/2006CN1719625A Process for preparing Cu-In-Ga-Se or Cu-In-Ga-S film solar battery obsorbing layer
01/11/2006CN1718851A Monitoring device of optical film preparation
01/11/2006CN1718850A Method of preparing ZrWzO8/ZrO2 film by radio frequency magnetic controlled sputtering
01/11/2006CN1718849A Multifunction composite magnetic controlled plasma sputtering device
01/11/2006CN1718848A Method and system of preparing ITO film using medium frequency reaction magnetic controlled sputtering indium tin alloy target
01/11/2006CN1718847A Pair target twin magnetic controlled sputtering ion plating deposition device
01/11/2006CN1718846A Staggered target tiles
01/11/2006CN1718845A Technology of vacuum metal film plating on microparticle surface and its equipment
01/11/2006CN1718844A Correction method of evenness of film thickness of electron beam evaporation film coating
01/11/2006CN1718843A Manufacturing technology of wood surface vacuum metal film plating
01/11/2006CN1718842A Method of preparing nano-structure bioactive titanium metal film
01/11/2006CN1718841A Method of preparing ZnO:Zr transparent conductive film by radio frequency magnetic controlled sputtering method
01/11/2006CN1718840A Preparation method of gallium adulterated zinc oxide transparent conductive film
01/11/2006CN1718334A Insert for metal cutting
01/11/2006CN1236504C Method and device for membrane deposition
01/11/2006CN1236303C Method for quantifying texture homogeneity of polycrystalline material
01/11/2006CN1236101C High temperature metal boat and method of plating tin doped indium oxide transparent conductive membrane
01/11/2006CN1235549C Scalpel blade having high sharpness and toughness
01/10/2006US6984833 Ion implanter and method for controlling the same
01/10/2006US6984750 Providing a catalyst support; vapor depositing layers comprising molybdenum, vanadium and tellurium and layer comprising at least one other element; calcining
01/10/2006US6984294 Method of forming a conductive barrier layer having improved coverage within critical openings
01/10/2006US6984272 Process for producing titanium material for target, titanium material for target, and sputtering target using the same
01/10/2006US6983925 Rotary barrel gate valve
01/10/2006US6983718 Electron beam physical vapor deposition apparatus
01/10/2006US6983542 Metallized cutlery and tableware
01/05/2006WO2006002138A2 Etch and deposition control for plasma implantation
01/05/2006WO2006001840A2 System and method for quality testing of superconductivity tape
01/05/2006WO2006000862A1 Coating device for coating a substrate and coating method
01/05/2006WO2006000186A2 Device for providing a special atmosphere with a media connection
01/05/2006WO2005108064A3 Coating stack comprising a layer of barrier coating
01/05/2006US20060003545 Method of making scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s)
01/05/2006US20060003188 ITO thin film, method of producing the same, transparent conductive film, and touch panel
01/05/2006US20060003099 Vapor deposition and in-situ purification of organic molecules
01/05/2006US20060003094 Forming a film of water to a plastic lens having an organosilicon compound-containing hard coat film; treating the surface with ozone; and forming the antireflection film on the surface of the hard coat film through vapor deposition.
01/05/2006US20060002838 Iron silicide powder and method for production thereof
01/05/2006US20060001082 Floating-gate field-effect transistors having doped aluminum oxide dielectrics
01/05/2006US20060001079 Electronic systems having doped aluminum oxide dielectrics
01/05/2006US20060001012 Method for manufacturing nanostructured manganese oxide having dendritic structure, and oxygen reduction electrode comprising nanostructured transition metal oxide having dendritic structure
01/05/2006US20060000715 Manufacturing medical devices by vapor deposition
01/05/2006US20060000706 Soil-resistant coating for glass surfaces
01/05/2006US20060000705 Cylindrical target with oscillating magnet for magnetron sputtering
01/05/2006US20060000704 Solution treatment apparatus and solution treatment method
01/05/2006US20060000523 Metal surface being treated is subjected in the chamber in which there is a through flow of the surfacing material to an exhaust connection, and in which the surfacing material comprises compounds arising in dry distillation of deciduous-wood
01/05/2006DE102004029466A1 Medieninjektor Medieninjektor
01/05/2006DE102004028348A1 Coating components, especially gas turbine components, comprises generating a three-dimensional moving path and moving the component along a moving path during coating
01/05/2006DE102004028112A1 Borhaltiges Schichtsystem, bestehend aus einer Borcarbid-, einer BCN und einer kohlenstoffmodifizierten kubischen Bornitridschicht sowie Verfahren zur Herstellung eines solchen Schichtsystems Boron-containing layer system consisting of a boron carbide, a BCN and a carbon-modified cubic boron nitride as well as methods for producing such a layer system
01/05/2006DE102004027897A1 Vorrichtung und Verfahren zur Zerstäubung mit einem bewegbaren planaren Target Apparatus and method for atomization with a movable planar target
01/05/2006DE102004027752A1 Schleusenvorrichtung Lock device
01/04/2006EP1612853A1 Cooling device for vacuum treatment device
01/04/2006EP1612784A1 Semi-reflective film and reflective film for optical information recording medium, optical information recording medium, and sputtering target
01/04/2006EP1612292A1 Sputtering target and method for preparation thereof
01/04/2006EP1611265A2 Substrates coated with mixtures of titanium and aluminum materials, methods for making the substrates, and cathode targets of titanium and aluminum metal
01/04/2006EP1461286A4 Differential stress reduction in thin films
01/04/2006EP0990061B1 Method and device for vacuum-coating a substrate
01/04/2006CN2750327Y Optical coating device
01/04/2006CN1717783A Alloy material for semiconductor, semiconductor chip using such alloy material, and method for manufacturing same
01/04/2006CN1717766A Alkali metal generating agent, alkali metal generator, photoelectric surface, secondary electron emission surface, electron tube, method for manufacturing photoelectric surface, method for manufacturi
01/04/2006CN1716524A Refurbishment of a coated chamber component
01/04/2006CN1716496A Flexible emitter using high molecular compound and method for fabricating the same
01/04/2006CN1716473A Method for producing multilayer ceramic capacitor using vacuum sputtering method
01/04/2006CN1716073A Process for forming a patterned thin film conductive structure on a substrate
01/04/2006CN1715454A Method for producing high-purty nickel, high-purity nickel formed sputtering target and thin film formed by using said sputtering target
01/04/2006CN1715441A Roasting process for obtaining super high vacuum in vacuum system
01/04/2006CN1715440A Transparent conductive thin film, process for producing the same, sintered target for producing the same, and its use
01/04/2006CN1235446C Method for producing electroluminescent element and vapour-deposition shade
01/04/2006CN1235213C ZnS-SiO2 sputtering target and optical recording medium having ZnS-SiO2 phase-change type optical disc protective film formed through use of that target
01/04/2006CN1235212C Information recording medium, medium mfg. method, information recording method and reproducing method
01/04/2006CN1235065C Composition for vapor-phase deposition, method for forming anti-reflecting film using the same and its optical element
01/04/2006CN1234906C Coating equipment
01/04/2006CN1234905C Method for vacuum film-coating of small size work piece
01/04/2006CN1234904C Ceramic flash evaporator for television
01/03/2006US6982797 comprises separate/rotatable magazines containing crystal resonators and test glasses; thermal stability; moisture resistance; abrasion resistance
01/03/2006US6982132 Rechargeable thin film battery and method for making the same
01/03/2006US6982126 Thermal barrier coating
01/03/2006US6982071 Thin-film magnetic recording media with dual intermediate layer structure for increased coercivity
01/03/2006US6982005 Multiple-nozzle thermal evaporation source
01/03/2006US6981334 Dual wedge fixture locator
01/03/2006CA2248807C Droplet deposition apparatus
12/2005
12/29/2005WO2005125288A2 Method of fabricating an electrochemical device using ultrafast pulsed laser deposition
12/29/2005WO2005124905A1 Gas diffusion electrodes, membrane-electrode assemblies and method for the production thereof
12/29/2005WO2005124829A2 In-line heater for use in semiconductor wet chemical processing and method of manufacturing the same
12/29/2005WO2005124819A1 Media injector
12/29/2005WO2005124818A1 Device for carbon deposition
12/29/2005WO2005123978A1 Transport system for nanoparticles and method for the operation thereof
12/29/2005WO2005123977A1 Fastening unit for ignition units, and device for eliminating carbon
12/29/2005WO2005123382A2 Refractive index coated embossable film
12/29/2005WO2005123312A1 Surface-coated cutware and process for producing the same
12/29/2005WO2005106070A3 Vacuum deposition method
12/29/2005WO2005024892A3 Coating device and related method
12/29/2005WO2004107411A3 Deposition apparatus and method
12/29/2005WO2004101662A8 Process for preparing a composite material
12/29/2005US20050287897 Method of producing display using mask alignment method
12/29/2005US20050287724 Transparent conductive films and processes for forming them