Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
10/2007
10/25/2007US20070248767 Method of self-cleaning of carbon-based film
10/25/2007US20070248752 Method for making oxygen-reducing catalyst layers
10/25/2007US20070248751 Dynamic film thickness control system/method and its utilization
10/25/2007US20070248745 System and method for controlling coating width of electrode plate
10/25/2007US20070246356 Sputtering apparatus
10/25/2007US20070246355 Batch-Type Remote Plasma Processing Apparatus
10/25/2007US20070246354 Plasma systems with magnetic filter devices to alter film deposition/etching characteristics
10/25/2007US20070246346 Electroformed sputtering target
10/25/2007DE10248962B4 Verfahren zur Herstellung einer Hochtemperatur-Supraleiterschicht A process for producing a high-temperature superconductor layer
10/25/2007DE102006017455A1 Tubular cathode for coating materials in a coating process comprises openings provided between a target carrier tube and a target for contacting the target with coolant
10/25/2007DE102006004702B3 Verfahren und Vorrichtung zum allseitigen Beschichten von Gegenständen Method and apparatus for all-round coating objects
10/25/2007CA2643823A1 Method for producing a thermal barrier coating and thermal barrier coating for a component part
10/24/2007EP1848054A1 Separator for fuel cell and method for manufacturing same
10/24/2007EP1847874A2 Photomask blank
10/24/2007EP1847632A1 P-type semiconductor zinc oxide films process for preparation thereof, and pulsed laser deposition method using transparent substrates
10/24/2007EP1846963A2 Light-emitting element, light-emitting device, and electronic appliance
10/24/2007EP1846590A1 Cemented carbide insert for toughness demanding short hole drilling operations
10/24/2007EP1846588A1 Method for preparing by thermal spraying a silicon- and zirconium-based target
10/24/2007EP1846587A1 Sealing of plastic containers
10/24/2007EP1846586A2 Method of making coated article by sputtering cast target to form zinc oxide inclusive layer(s)
10/24/2007EP1846567A2 Cellular microarrays for screening differentiation factors
10/24/2007EP1421613A4 Method and apparatus for fabricating mercuric iodide polycrystalline films for digital radiography
10/24/2007CN200964436Y Ion source leading seam adjustment control system
10/24/2007CN200964435Y Device for coating anti reflection passive film on crystal silicon solar cell sheet
10/24/2007CN101061252A Sputtering target for production of metallic glass film and process for producing the same
10/24/2007CN101061251A Co-cr-pt-b alloy sputtering target
10/24/2007CN101061250A Physical vapor deposition chamber having an adjustable target
10/24/2007CN101061249A Physical deposition system
10/24/2007CN101060980A Method for preparing flexible mechanically compensated transparent layered material
10/24/2007CN101060149A LED vapor film pattern forming method and device
10/24/2007CN101058871A Method of preparing HfON protective film for optical element
10/24/2007CN101058870A Hall Ion Source excitation magnetron sputtering enhancement magnetism filtration multi-arc ion composite coating method
10/24/2007CN101058869A Nitrogen ion beam assistant electric arc ion plating deposition TiAlN film layer process
10/24/2007CN101058868A In-situ uv curing of media lubricants
10/24/2007CN101058867A P-type semiconductor zinc oxide films, process for preparation thereof, and pulsed laser deposition method using transparent substrates
10/24/2007CN101058484A P-type nitrogen-doping cuprous oxide thin film material and preparation method thereof
10/24/2007CN101058147A Method for brazing aluminium parts on the carbon steel part surface and aluminizing anti-rust on the non brazing surface
10/24/2007CN100345241C Plasma display panel, method for producing same and material for protective layer of such plasma display panel
10/24/2007CN100345000C Optical anti-reflection film and its film coating method
10/24/2007CN100344890C Sliding member and production process thereof
10/24/2007CN100344789C Pt-Co based sputtering targets
10/24/2007CN100344444C Heat-resistant resin film with metal layer and wiring board, and method for manufacturing them
10/24/2007CN100344404C Friction stir welding for material incapable of functional welding using a superabrasive tool
10/23/2007US7286637 Optical thin film and mirror using the same
10/23/2007US7285906 Film formation mask, organic EL panel, and method of manufacturing the organic EL panel
10/23/2007US7285497 Mask, method for manufacturing a mask, method for manufacturing an electro-optical device, and electronic equipment
10/23/2007US7285342 Indium-tin oxide (ITO) film and process for its production
10/23/2007US7285338 Anisotropic thin-film rare-earth permanent magnet
10/23/2007US7285312 Atomic layer deposition for turbine components
10/23/2007US7285196 Methods and apparatus for making integrated-circuit wiring from copper, silver, gold, and other metals
10/18/2007WO2007118204A2 Reactive sputtering zinc oxide transparent conductive oxides onto large area substrates
10/18/2007WO2007118042A2 Depositing ruthenium films using ionized physical vapor deposition (ipvd)
10/18/2007WO2007117294A2 System and method for continuous deposition of graded coatings
10/18/2007WO2007116834A1 METHOD FOR MANUFACTURING Co-BASE SINTERED ALLOY SPUTTERING TARGET FOR FORMATION OF MAGNETIC RECORDING FILM WHICH IS LESS LIKELY TO GENERATE PARTICLES, AND Co-BASE SINTERED ALLOY SPUTTERING TARGET FOR FORMATION OF MAGNETIC RECORDING FILM
10/18/2007WO2007116547A1 Heat shield coating member, process for producing the same, heat shield coat material, gas turbine and sintered body
10/18/2007WO2007116523A1 Method of removing hard coating film
10/18/2007WO2007116471A1 Capacitative element
10/18/2007WO2007116033A1 Etching process
10/18/2007WO2007115419A2 Wear-resistant layer for parts, method for coating a part with a wear-resistant layer, and device for carrying out said method
10/18/2007WO2007096483A3 Coating on a stone or ceramic substrate and a coated stone or ceramic product
10/18/2007WO2007096461A3 Method for producing high-quality surfaces and a product having a high-quality surface
10/18/2007WO2007050270A3 System and method for processing an organic memory cell
10/18/2007WO2006053219A8 Vertical production of photovoltaic devices
10/18/2007WO2005029537A3 Electric lamp and method of depositing a layer on the lamp
10/18/2007US20070243719 Shadow mask deposition of materials using reconfigurable shadow masks
10/18/2007US20070243459 Method and apparatus for thin-film battery having ultra-thin electrolyte
10/18/2007US20070243328 P-type semiconductor zinc oxide films process for preparation thereof, and pulsed laser deposition method using transparent substrates
10/18/2007US20070241458 Metal / metal nitride barrier layer for semiconductor device applications
10/18/2007US20070240992 purification by electrolytic refining; uniform thickness distribution, has a purity of 4N (99.99%) or higher, and is used in forming a capacitor electrode of a semiconductor memory
10/18/2007US20070240982 Arc ion plating apparatus
10/18/2007US20070240981 Sputter Target With High-Melting Phase
10/18/2007US20070240980 Sputtering target and sputtering equipment
10/18/2007US20070240979 Shield Body and Vacuum Processing Apparatus
10/18/2007US20070240977 Sputtering with cooled target
10/18/2007US20070240976 Method and Apparatus for the Application of Powder Material to Substrates
10/18/2007US20070240637 Thin-Film Forming Apparatus
10/18/2007US20070240636 Thermal Vacuum Deposition Method and Device
10/18/2007US20070240300 Method for manufacturing electrode, apparatus for manufacturing electrode, and method for manufacturing secondary cell
10/18/2007DE102007014092A1 Anordnung mit einer Maske zur Abschattung einer gekrümmten Substratoberfläche und Vorrichtung zur Beschichtung derselben Arrangement with a mask for shading a curved substrate surface and apparatus for coating the same
10/18/2007DE102006019424A1 Herstellungsverfahren für eine integrierte Halbleiterkontaktstruktur mit einer verbesserten Aluminiumfüllung Manufacturing method of a semiconductor integrated contact structure having an improved aluminum filling
10/18/2007DE102006018048A1 Verfahren und Vorrichtung zur Einstellung vorgegebener Spannungsverläufe in einer Schicht Method and apparatus for setting a predetermined voltage curves in a layer
10/18/2007DE102006018046A1 Verfahren und Vorrichtung zur Abscheidung von diamantartigen Kohlenstoffschichten mit vorgegebenem Härteverlauf auf Substrate Method and apparatus for deposition of diamond-like carbon films with a given hardness profile on substrates
10/17/2007EP1844177A2 Controllably feeding organic material in making oleds
10/17/2007EP1843972A2 Patterning by energetically-stimulated local removal of solid-condensed-gas layers and solid state chemical reactions produced with such layers
10/17/2007EP1725695A4 Coated piston pin
10/17/2007CN200961146Y Film coating clamp for small diameter optical lens
10/17/2007CN101057349A Method and apparatus for controlling the vaporization of organic material
10/17/2007CN101057021A Metal-coated textile
10/17/2007CN101057000A Molybdenum sputtering targets
10/17/2007CN101054671A Composite ferroelectric film and low-temperature preparation method thereof
10/17/2007CN101054659A Magnetron sputtering coating method under multi-stage acceleration mode
10/17/2007CN101054658A 软磁性靶材 Soft magnetic target
10/17/2007CN101054657A Film formation apparatus and film formation method and cleaning method
10/17/2007CN101054268A Coating glass with function of sunlight control low radiation, ultraviolet radiation stopping and photocatalysis sterilization, and preparation method thereof
10/17/2007CN101053477A Metallized cutlery
10/17/2007CN100343416C Technology of vacuum metal film plating on microparticle surface and its equipment
10/17/2007CN100343415C Method for fabricating rainbow film or paper through direct plating
10/17/2007CN100343414C Composite vapour deposition material and composite deposition film made therefrom
10/17/2007CN100343413C Solar energy selective absorptive coating and its preparing method
10/17/2007CN100343200C Methods of roughening ceramic surface