Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
09/2007
09/25/2007CA2303124C Tool having a protective layer system
09/20/2007WO2007106732A1 Sputter deposition system and methods of use
09/20/2007WO2007106462A2 Temperature controlled cold trap for a vapour deposition process and uses thereof
09/20/2007WO2007106361A2 Thermal transfer barrier building members
09/20/2007WO2007106195A2 Magnetron source for deposition on large substrates
09/20/2007WO2007105252A1 Use of magnesium-copper compositions for the evaporation of magnesium and magnesium dispensers
09/20/2007WO2006126234A3 Process for production of jewels
09/20/2007US20070218333 Metal-Oxide Containing Substrate and Manufacturing Method Therefor
09/20/2007US20070218316 Magnetic recording medium, method of producing same, and magnetic storage apparatus
09/20/2007US20070218265 Photo-induced hydrophilic article and method of making same
09/20/2007US20070218213 Method of manufacturing liquid crystal alignment film
09/20/2007US20070218201 Continuous Thermal Vacuum Deposition Device and Method
09/20/2007US20070215572 Substrate processing method and substrate processing apparatus
09/20/2007US20070215463 Pre-conditioning a sputtering target prior to sputtering
09/20/2007US20070215462 Target holding apparatus
09/20/2007US20070215456 Oxide sintered body, manufacturing method therefor, manufacturing method for transparent conductive film using the same, and resultant transparent conductive film
09/20/2007US20070215044 Substrate processing apparatus, deposit monitoring apparatus, and deposit monitoring method
09/20/2007US20070215043 Substrate processing apparatus, deposit monitoring apparatus, and deposit monitoring method
09/20/2007DE202006007937U1 Plasmabehandlungsanlage Plasma treatment plant
09/20/2007DE19913123B4 Kristallwachstumsverfahren für Dünnfilme aus BiSrCaCuO-Oxiden Crystal growth method for thin films of oxides BiSrCaCuO
09/20/2007DE10347119B4 Beschichtungsvorrichtung, Beschichtungsverfahren und beschichtetes Objekt A coating apparatus, coating method and coated object
09/20/2007DE102006012747A1 Vorrichtung zum Halten sowie zum Drehen und/oder Wenden eines Gegenstands bei dessen Beschichtung in einer Vakuumbeschichtungsanlage, Kalotte sowie Verfahren zum Halten sowie zum Drehen und/oder Wenden eines Gegenstands bei dessen Beschichtung in einer Vakuumbeschichtungsanlage Apparatus for holding and for rotating and / or turning of an object during its coating in a vacuum coating system, and method for holding and dome for rotating and / or turning of an object during its coating in a vacuum coating system
09/20/2007DE102004044357B4 Vorrichtung zur Durchführung der Oberflächenbehandlung von Bauteilen in der Plasmatechnik Apparatus for carrying out the surface treatment of parts in the plasma technology
09/19/2007EP1835526A1 Mounting device for a sputter source
09/19/2007EP1835524A1 Fastening means for sputtering source
09/19/2007EP1835511A2 Oxide sintered body, manufacturing method therefor, manufacturing method for transparent conductive film using the same, and resultant transparent conductive film
09/19/2007EP1835048A1 Device for holding and turning and/or rotating an object when coating it in a vacuum coating facility, calotte and method for holding and turning and/or rotating an object when coating it in a vacuum coating facility
09/19/2007EP1835047A1 Opposing target type sputter device
09/19/2007EP1834364A1 Method and apparatus for controlling the vaporization of organic material
09/19/2007EP1834007A1 Oscillating shielded cylindrical target assemblies and their methods of use
09/19/2007EP1833523A1 Prosthetic joint with articulating surface layers comprising adlc
09/19/2007CN200949112Y Anode for ion source of optical auxiliary film plating machine
09/19/2007CN101040572A Double layer flexible board and method for manufacturing the same
09/19/2007CN101040571A Double layer flexible board and method for manufacturing the same
09/19/2007CN101039801A Gas barrier laminated film and laminated material using it
09/19/2007CN101038796A Oxide sintered body, manufacturing method therefor, manufacturing method for transparent conductive film using the same, and resultant transparent conductive film
09/19/2007CN101038766A Write-once information recording medium and method for forming the recording layer
09/19/2007CN101037766A Sputtering target and manufacturing method therefor, and recordable optical recording medium
09/19/2007CN101037765A Method for metallization treatment of textile surface
09/19/2007CN100338781C Semiconductor device and its producing method
09/19/2007CN100338720C Hybrid scanning system and methods for ion implantation
09/19/2007CN100338261C Method for ceramic treatment of metal surface
09/19/2007CN100338257C Method and device for manufacturing semiconductor or insulator/metallic laminar composite cluster
09/19/2007CN100338256C Coating apparatus for color drum filter
09/19/2007CN100338255C Method for preparing aluminum-silicon-yttrium diffusion alloying coating
09/18/2007US7271535 Electroluminescent display device, method for manufacturing the same, and electronic equipment
09/18/2007US7271054 Method of manufacturing a ferroelectric capacitor having RU1-XOX electrode
09/18/2007US7270891 Coating on substrate, wherein the coating is a homogeneous mixture of silicon and germanium in proportions selected to combine desirable properties of both materials, and wherein the coating provides blanket selected emittive characteristics for infrared energy and reflective characteristics, spacecraft
09/18/2007US7270854 Method for forming a head having improved spin valve properties
09/18/2007US7270849 Organic siloxane copolymer film, method and deposition apparatus for producing same, and semiconductor device using such copolymer film
09/18/2007US7270729 System for, and method of, etching a surface on a wafer
09/18/2007US7270719 Method for manufacturing surface hardened stainless steel with improved wear resistance and low static friction properties
09/18/2007US7270714 Surface treating apparatus
09/18/2007US7270586 Organic electroluminescence element and production method thereof
09/16/2007CA2579934A1 A securing device for a sputtering source
09/16/2007CA2577757A1 Target holding apparatus
09/13/2007WO2007103902A2 Notched deposition ring
09/13/2007WO2007103829A1 Method for production of metal oxide coatings
09/13/2007WO2007103471A2 System and method for sputtering a tensile silicon nitride film
09/13/2007WO2007103014A2 Sputtering target
09/13/2007WO2007102970A2 Etch and sidewall selectivity in plasma sputtering
09/13/2007WO2007102905A2 Method and apparatus for improving symmetry of a layer deposited on a semiconductor substrate
09/13/2007WO2007102882A2 Multiple zone sputtering target created through conductive and insulation bonding
09/13/2007WO2007102247A1 Deposition mask for film formation, opposite side substrate assembly, and display device
09/13/2007WO2007101964A1 Substrate comprising a stack having thermal properties
09/13/2007WO2007101895A1 Method and apparatus for manufacturing purely refractive optical structrues
09/13/2007WO2007041469A3 A method for a metallic dry-filling process
09/13/2007WO2006121604A3 Conductive barrier layer, especially an alloy of ruthenium and tantalum and sputter deposition thereof
09/13/2007WO2005085491A3 Device and method for nitriding by ionic implantation of an aluminium alloy part
09/13/2007US20070213212 Fine Particle
09/13/2007US20070212811 Low temperature CVD process with selected stress of the CVD layer on CMOS devices
09/13/2007US20070212573 Having a relatively high saturation magnetization (Ms) and perpendicular coercivity (Hc bottom ), so as to produce sufficient magnetic flux under the room temperature for signal readout; a magnetic layer of iron-patinum alloy and a reading layer of cobalt-terbium; high energy exchange
09/13/2007US20070210431 Support with integrated deposit of gas absorbing material for manufacturing microelectronic microoptoelectronic or micromechanical devices
09/13/2007US20070209973 Sluice System For A Vaccum Facility
09/13/2007US20070209934 Arrangement for the separation of particles from a plasma
09/13/2007US20070209933 Sample holding electrode and a plasma processing apparatus using the same
09/13/2007US20070209932 Sputter deposition system and methods of use
09/13/2007US20070209931 Notched deposition ring
09/13/2007US20070209930 Apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma system
09/13/2007US20070209928 Indium Oxide-Cerium Oxide Based Sputtering Target, Transparent Electroconductive Film, and Process for Producing a Transparent Electroconductive Film
09/13/2007US20070209927 Magnetron Sputtering Device In which Two Modes Of Magnetic Flux Distribution (Balanced Mode/Unbalanced Mode) Can Be Switched From One To The Other And Vice Versa, A Film Formation Method For Forming A Film From An Inorganic Film Formation Material Using The Device, And A Dual Mode Magnetron Sputtering Device And Film Formation Method For Forming A Film From An Inorganic Film Formation Material At A Low Temperature Using The Device
09/13/2007US20070209926 Sputter Deposition System and Methods of Use
09/13/2007US20070209925 Etch and sidewall selectivity in plasma sputtering
09/13/2007US20070209533 Metallic Thin Film Chip Producing Method and Metallic Thin Film Chip Producing Apparatus
09/13/2007US20070209317 Thermal transfer barrier building members
09/13/2007DE102006010860A1 Production of ceramic heat-insulating layer on component for use in compressor and turbine units, by preparing ceramic vapor for deposition on component and depositing vapor on component for forming column-/pole-like heat-insulating layer
09/13/2007DE102006010732A1 Vapor-deposit process to manufacture a micro- or nano-structure e.g. semiconductor wafer part-screened by stencil
09/13/2007DE102005050374B4 Gleitschicht mit verschleißmindernden Ausscheidungen und Verfahren zur Herstellung einer solchen Gleitschicht Sliding layer with wear-reducing secretions and method for producing such a sliding layer
09/13/2007DE102004041855B4 Vorrichtung und Verfahren zur kontinuierlichen thermischen Vakuumbeschichtung Apparatus and method for continuous thermal vacuum coating
09/13/2007CA2644888A1 Substrate comprising a stack having thermal properties
09/12/2007EP1832669A1 Bond coat process for thermal barrier coating.
09/12/2007EP1831504A2 Durable thermal barrier coatings
09/12/2007EP1831429A2 Methods and apparatus for sequentially alternating among plasma processes in order to optimize a substrate
09/12/2007EP1831423A2 Methods of forming three-dimensional pvd targets
09/12/2007EP1831422A2 Device for the tempered storage of a container
09/12/2007EP1831421A2 Controlling the application of vaporized organic material
09/12/2007EP1831408A2 Composition and process for enhanced properties of ferrous components
09/12/2007EP1831013A1 Coated article with low-e coating including zirconium silicon oxynitride and methods of making same
09/12/2007EP1329526B1 Method for producing high-purity zirconium and hafnium for sputtering targets
09/12/2007EP0996765B1 Substrate processing apparatus having a substrate transport with a front end extension and an internal substrate buffer