Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
11/2007
11/14/2007EP1518005B1 Material evaporation chamber with differential vacuum pumping
11/14/2007EP1448804B1 METHOD OF SYNTHESIZING A COMPOUND OF THE FORMULA M sb n+1 /sb AX sb n /sb , FILM OF THE COMPOUND AND ITS USE
11/14/2007EP1330642B1 Method for chlorine plasma modification of silver electrodes
11/14/2007EP1103076B1 Zinc oxide films containing p-type dopant and process for preparing same
11/14/2007EP0914497B1 Hard graphite-like material bonded by diamond-like framework
11/14/2007CN200974865Y Continuous vacuum coating apparatus
11/14/2007CN101072893A A method and apparatus for deposition of films of coating materials, in particular of superconductive oxide
11/14/2007CN101071858A Lithium ionic cell anode membrane material Sb3N and its preparing method
11/14/2007CN101071848A Cobalt-lithium silicate positive electrode material for lithium ion cell and its preparing method
11/14/2007CN101071752A High current ionic current implanted system and improved device and insulator thereof
11/14/2007CN101070592A Composite ion-injection surface modification method for copper and its alloy
11/14/2007CN101070591A Sputtering apparatus, method of driving the same, and method of manufacturing substrate using the same
11/14/2007CN101070590A Sputtering with cooled target
11/14/2007CN101070589A Method for synthesizing hydrophobic silicon dioxide nano fiber by heat evaporation of gold-plate silicon sheet
11/14/2007CN101070127A Conveying mechanism for continuous processed long substrate, processing forming equipment and long piece produced
11/14/2007CN100349350C Assembly for N consumers of electric energy, of which M consumers are simultaneously supplied with energy
11/14/2007CN100349278C Method for making substrates and resulting substrates
11/14/2007CN100349269C Laser anneal equipment and laser film forming method
11/14/2007CN100349265C Method of in-situ depositing high dielectric constant ferric oxide and metal film on indium phosphide material
11/14/2007CN100349264C Method of in-situ depositing high dielectric constant Al2O3 and metal film on GaN base compound material
11/14/2007CN100349223C Method for delivery of substrate to film forming device for disk-like substrate, substrate delivery mechanism and substrate holder used for the method, and method of manufacturing disk-like recording
11/14/2007CN100348773C Vacuum module (variants thereof) and system of modules for applying coatings to a substrate
11/14/2007CN100348772C Temperature control device for collimator in physical vapour deposition system
11/14/2007CN100348771C Method for preparing lead based ferroelectric film
11/13/2007US7295367 Optical element, optical apparatus, film forming method, film forming apparatus and device fabrication method
11/13/2007US7295166 Method for producing a wave-transmitting cover
11/13/2007US7294852 Transparent conductive films and processes for forming them
11/13/2007US7294546 Capacitor for a semiconductor device and method of fabricating same
11/13/2007US7294416 Hard film
11/13/2007US7294413 Substrate protected by superalloy bond coat system and microcracked thermal barrier coating
11/13/2007US7294404 Graded photocatalytic coatings
11/13/2007US7294403 Soil-resistant coating for glass surfaces
11/13/2007US7294391 Contamination resistant fiber sheet
11/13/2007US7294367 Photon energy is directed through a photon-transparent support and absorbed by an interlayer coated thereon; energized interlayer causes the transfer of a biological material coated thereon across a gap and onto a receiving substrate
11/13/2007US7294283 Penning discharge plasma source
11/13/2007US7294245 Cover ring and shield supporting a wafer ring in a plasma reactor
11/13/2007US7294242 For providing a parallel magnetic field at a substrate during sputter deposition of a metal film onto the substrate; sputter depositing a magnetic film on a substrate to produce a magnetic device such as magnetic recording heads for reading digital information from a storage medium
11/13/2007US7294241 Method to form alpha phase Ta and its application to IC manufacturing
11/13/2007CA2460744C Substrate having catalyst compositions on surfaces of opposite sides and method for producing the same
11/13/2007CA2456949C Formable bright, reflecttive film having discontinuous metallic layers
11/13/2007CA2373441C Hard, scratch-resistant coatings for substrates
11/13/2007CA2237732C Glancing angle deposition of thin films
11/08/2007WO2007127896A2 Method and system for conditioning a vapor deposition target
11/08/2007WO2007126943A1 Ternary aluminum alloy films and targets
11/08/2007WO2007126091A1 Etching method, etching mask and method for manufacturing semiconductor device using the same
11/08/2007WO2007125860A1 Method for manufacturing gallium nitride compound semiconductor light emitting element, gallium nitride compound semiconductor light emitting element and lamp
11/08/2007WO2007125814A1 ZnO DEPOSITION MATERIAL AND ZnO FILM FORMED OF SAME
11/08/2007WO2007125748A1 Film forming method, film forming device, and storage medium
11/08/2007WO2007124890A1 Multifunctional hard material layers
11/08/2007WO2007124879A2 Homogeneous pvd coating device and method
11/08/2007WO2007109784A3 Surface treatments for spiral bevel gear sets
11/08/2007WO2007106462A3 Temperature controlled cold trap for a vapour deposition process and uses thereof
11/08/2007WO2007098523A3 Operable transmission, working fluid for such a transmission, and method for commissioning the same
11/08/2007WO2007096476A3 Coating on a medical substrate and a coated medical product
11/08/2007WO2007051105A3 Cathode incorporating fixed or rotating target in combination with a moving magnet assembly and applications thereof
11/08/2007US20070259215 Perpendicular magnetic recording media
11/08/2007US20070259210 Structure and process for production thereof
11/08/2007US20070259204 Diamond Thin Film Coating Method and Diamond-Coated Cemented Carbide Member
11/08/2007US20070259202 hard coating layer comprises an upper layer comprising chromium boride and a lower layer comprising a composite nitride containing Ti and Al; excellent wear resistance in cases of cutting of hard difficult-to-cut materials such as Ti-based alloy, Ni-based alloy, Co-based alloy
11/08/2007US20070259191 Sputter target of a silver alloy, its use and glass substrate with thermal insulation layer
11/08/2007US20070259190 ITO transparent substrate with high resistance at low-temperature sputtering process and method for producing the same
11/08/2007US20070259132 Composite material
11/08/2007US20070259108 Ultra low residual reflection, low stress lens coating
11/08/2007US20070259105 Vacuum Deposition Apparatus of the Winding Type
11/08/2007US20070256934 Apparatus and Method for Coating Substrates With Approximate Process Isolation
11/08/2007US20070256933 Sputtering apparatus, method of driving the same, and method of manufacturing substrate using the same
11/08/2007US20070256929 Production of Carbon Nanotubes
11/08/2007US20070256928 sputter coating an insulated wire with a silicon and Fe or steel, to provide the wire with sufficient surface conductivity to protect against build-up of electrostatic charge; wire is insulated with polyimide
11/08/2007US20070256927 Coating Apparatus for the Coating of a Substrate and also Method for Coating
11/08/2007US20070256926 Hollow cathode sputtering apparatus and related method
11/08/2007US20070256925 Method of forming a film
11/08/2007US20070256924 Method of printing on a disc
11/08/2007DE112004002976T5 Organisches lichtemittierendes Element, Herstellungsverfahren hierfür und Anzeigevorrichtung An organic light emitting element display device manufacturing method thereof and
11/08/2007DE10240337B4 Vorrichtung und Verfahren zur Separation von Partikeln aus einem von einem Target zur Beschichtung eines Substrates erzeugten Plasma im Vakuum Device and method for separating particles from a generated from a target for coating a substrate plasma in the vacuum
11/08/2007DE102007010595A1 Auf amorphem Kohlenstoff basierender, harter Mehrschichtfilm und Teil mit harter Oberfläche, das den Film auf der Oberfläche aufweist Based on amorphous carbon, hard multilayer film part and with a hard surface, comprising the film on the surface
11/08/2007CA2586718A1 Method for producing components for rocket construction
11/07/2007EP1852395A1 Gallium-containing zinc oxide
11/07/2007EP1852372A1 Vibrating bowl, vibrating bowl feeder, and vacuum deposition apparatus
11/07/2007EP1851508A1 Optical monitoring system for coating processes
11/07/2007EP1851365A1 Color-coded stainless steel fittings and ferrules
11/07/2007EP1851361A1 High wear resistant triplex coating for cutting tools
11/07/2007EP1851356A1 Tubular target comprising a connecting layer that is situated between the tubular target and the tubular support
11/07/2007EP1851355A2 Effusion cell valve
11/07/2007EP1851354A2 Method of making low-e coating using ceramic zinc inclusive target, and target used in same
11/07/2007EP1851353A2 Product coated with a composite max-material and method of its production
11/07/2007EP1850993A1 Saw band and method for the production of a saw band
11/07/2007EP1406847B1 Visible-light-responsive photoactive coating, coated article and method of making same
11/07/2007EP1029942B1 Vacuum device
11/07/2007CN200971381Y Plane magnetic control spattering apparatus
11/07/2007CN101069257A Dispensing system for alkali metals capable of releasing a high quantity of metals
11/07/2007CN101068949A Film forming device, thin-film manufacturing apparatus, and film forming method
11/07/2007CN101068948A Physical vapor deposition chamber having a rotatable substrate pedestal
11/07/2007CN101068947A Sb-Te base alloy sintered spattering target
11/07/2007CN101068946A Use of a titanium-copper-nickel based alloy
11/07/2007CN101068449A Bi-directional filtered arc plasma source
11/07/2007CN101067986A High temperature capacitors and method of manufacturing the same
11/07/2007CN101067661A Infrared cut-off light filtering films on germanium-base parts surface and plating method thereof
11/07/2007CN101067204A Technological process for lauminizing or coppering on aluminium or aluminium-magnesium alloy substrate
11/07/2007CN101067199A Fe-Co series target material and manufacturing method thereof
11/07/2007CN101067198A Mounting device for a sputter source