C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material

Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
11/2007
11/07/2007	CN101067197A Scratch start and column arc vacuum coating method
11/07/2007	CN101067196A Method for raising common steel antibiotic and rust resisting performance
11/07/2007	CN101067195A Metallising using thin seed layer deposited using plasma-assisted process
11/07/2007	CN101066845A Low radiation glass capable of being post-treated and its production process
11/07/2007	CN101066843A Negative pole material CrN of solid film cell and its prepn
11/07/2007	CN100348078C Ecr等离子体源和ecr等离子体装置 Ecr plasma source and ecr plasma device
11/07/2007	CN100347890C Method for forming inorganic solid electrolyte film
11/07/2007	CN100347817C Plasma processing apparatus
11/07/2007	CN100347343C Method for preparing thin film of transparent hydrophobic born nitride
11/07/2007	CN100347334C Double-frequency vacuum sediment equipment having radiofrequency power supply feeding unit
11/07/2007	CN100347333C Thin metal oxide film and process for producing the same
11/07/2007	CN100347115C Holding device for a screen
11/07/2007	CN100346943C Device for handling flat panels in a vacuum
11/06/2007	US7291555 Methods of forming a reaction product and methods of forming a conductive metal silicide by reaction of metal with silicon
11/06/2007	US7291365 Providing a source of laser radiation; providing the gap between the donor element and the substrate and selecting the power of the laser radiation applied to the donor element by the laser radiation source to cause sufficient heat to transfer the organic material across the gap to the substrate
11/06/2007	US7291357 Vacuum deposiiton; rotation
11/06/2007	US7291251 Method of making coated article with IR reflecting layer(s) using krypton gas
11/06/2007	US7291224 Covering assembly for crucible used for evaporation of raw materials
11/06/2007	US7291185 Method of manufacturing both-side metallized film with reduced blocking of metallized film and metallized film capacitor using the same
11/06/2007	US7290751 Composite mold and method for manufacturing the same
11/01/2007	WO2007123891A1 Vapor deposition of a layer
11/01/2007	WO2007123032A1 Vertical substrate conveyance device and film deposition equipment
11/01/2007	WO2007122735A1 Sputtering apparatus
11/01/2007	WO2007122203A2 Thermal evaporation apparatus, use and method of depositing a material
11/01/2007	WO2007121954A1 Coated body
11/01/2007	WO2007121898A1 Process for producing a corrosion-protected and high-gloss substrate
11/01/2007	WO2007103014A3 Sputtering target
11/01/2007	WO2007100873A9 Hybrid wafer -holding pin
11/01/2007	WO2007059546A3 Method for producing a tubular target
11/01/2007	WO2007044248A3 Low-voltage inductively coupled source for plasma processing
11/01/2007	US20070254552 Production Method of Organic El Device and Cleaning Method of Organic El Device Production Apparatus
11/01/2007	US20070254173 Tool for machining
11/01/2007	US20070254102 Method for producing SiOx (x < 1)
11/01/2007	US20070254096 Apparatus and Method for Cleaning at Least One Process Chamber for Coating at Least One Substrate
11/01/2007	US20070253686 Nozzle-based, vapor-phase, plume delivery structure for use in production of thin-film deposition layer
11/01/2007	US20070253103 Soft magnetic underlayer in magnetic media and soft magnetic alloy based sputter target
11/01/2007	US20070252338 Method for the Production of Wear-Resistant Sides for a Keystone Ring for Internal Combustion Engine
11/01/2007	US20070252113 Gradient Structure Material and Functional Element Using the Same
11/01/2007	US20070252092 Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor
11/01/2007	US20070251821 Soft magnetic target material
11/01/2007	US20070251820 Sputtering target as well as a joined type sputtering target assembly and a method of making such a joined type sputtering target assembly
11/01/2007	US20070251819 Hollow cathode magnetron sputtering targets and methods of forming hollow cathode magnetron sputtering targets
11/01/2007	US20070251818 Copper physical vapor deposition targets and methods of making copper physical vapor deposition targets
11/01/2007	US20070251816 Bi-directional filtered arc plasma source
11/01/2007	US20070251815 Method for manufacturing diamond-like carbon film
11/01/2007	US20070251814 Target for a sputtering source
11/01/2007	US20070251813 Method and system for conditioning a vapor deposition target
11/01/2007	US20070251458 Cleanroom-Capable Coating System
11/01/2007	CA2635713A1 Process for producing a corrosion-protected and high-gloss substrate
10/2007
10/31/2007	EP1850334A1 Soft magnetic underlayer in magnetic media and soft magnetic alloy based sputter target
10/31/2007	EP1849888A1 Reel to reel vacuum sputtering apparatus
10/31/2007	EP1849887A1 Mounting device for a sputter source
10/31/2007	EP1849886A1 Apparatus and method for plasma enhanced deposition of hard material layers
10/31/2007	EP1849885A1 Metallising using thin seed layer deposited using plasma-assisted process.
10/31/2007	EP1849884A2 Hard carbon film and hard carbon film sliding member
10/31/2007	EP1849883A2 Hard coating excellent in wear resistance and in oxidation resistance and target for forming the same
10/31/2007	EP1848838A2 Physical vapor deposition chamber having a rotatable substrate pedestal
10/31/2007	EP1848671A1 Method of making coated article with ir reflecting layer(s) using krypton gas
10/31/2007	EP1848552A2 Sputtering target and method of fabrication
10/31/2007	EP1397244A4 Transparent conductive stratiform coating of indium tin oxide
10/31/2007	EP1198609B2 Process for producing a hard-material-coated component
10/31/2007	EP0913714B1 Mechanism for imparting water repellency to both sides simultaneously
10/31/2007	DE102006019866A1 Multifunktionelle Hartstoffschichten Multifunctional hard coatings
10/31/2007	CN101065512A High resolution substrate holder leveling device and method
10/31/2007	CN101065511A Sputtering target, sputtering target backing plate assembly and film deposition system
10/31/2007	CN101065335A Method for transferring a functional organic molecule onto a transparent substrate
10/31/2007	CN101065239A Gas barrier transparent resin substrate, method for manufacture thereof, and flexible display element using gas barrier transparent resin substrate
10/31/2007	CN101064354A Method and apparatus for forming evaporated film pattern of luminous diode
10/31/2007	CN101064352A Method for producing multi-layer metal one-time electrode of luminous diode and its production apparatus
10/31/2007	CN101063194A Sputtering target, a joined type sputtering target and a method of making such a joined type sputtering target
10/31/2007	CN101063193A 溅镀靶材 Sputtering Targets
10/31/2007	CN101063192A Metal plate belt vacuum film coating equipment
10/31/2007	CN101063033A Magnetic refrigeration material and magnetic refrigeration device
10/31/2007	CN101062602A Amorphous-carbon-based hard multilayer film and hard surface member having the film on surface
10/31/2007	CN100346524C Device and method for preparing solid thin-membrane lithium battery by in-situ deposition
10/31/2007	CN100345998C Method for determining optimum rotation rate for multi-station-type coating apparatus
10/31/2007	CN100345997C Bi reverse barrel target combined base sheet biaxial rotated film plating device
10/31/2007	CN100345787C Sunshine control film glass series of three-layer film structure
10/31/2007	CN100345599C Prepn process of biomedical active TiO2 film
10/30/2007	US7288426 Automatically adjusting serial connections of thick and thin layers and method for the production thereof
10/30/2007	US7288315 Gas-barrier material
10/30/2007	US7288224 Method of producing a sputtering target
10/30/2007	US7288203 Process for producing structure, process for producing magnetic recording medium, and process for producing molded product
10/30/2007	US7288173 Ion beam processing system and ion beam processing method
10/30/2007	CA2417936C Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby
10/30/2007	CA2294991C Coatings with a silver layer
10/30/2007	CA2248284C Tetracarbon coated medical implant
10/26/2007	CA2583982A1 Target for a sputtering source
10/25/2007	WO2007120967A2 Rf powered target for increasing deposition uniformity in sputtering systems
10/25/2007	WO2007120205A2 Compositions of corrosion-resistant fe-based amorphous metals suitable for producing thermal spray coatings
10/25/2007	WO2007119905A1 Technique of metal thin film deposition on the polymeric matrix
10/25/2007	WO2007119497A2 Transparent conductive film and method for production thereof
10/25/2007	WO2007118464A1 Method and device for adjusting predetermined voltage curves in a coating
10/25/2007	WO2007118463A1 Method and device for depositing diamond-like carbon coatings with a predetermined hardness progression on substrates
10/25/2007	WO2007118439A1 Method for producing a thermal barrier coating and thermal barrier coating for a component part
10/25/2007	WO2007095120A3 Multi-layer coating for razor blades
10/25/2007	WO2007087269A3 Antimicrobial coating methods
10/25/2007	WO2007041425A3 Very long cylindrical sputtering target and method for manufacturing
10/25/2007	WO2006110667A3 Biased target ion beam deposition (btibd) for the production of combinatorial materials libraries
10/25/2007	US20070248897 Chemically-resistant, transition metal siliconitride for photomask patterns of smaller geometries, particularly as a light-shielding film material required to carry out photolithography using exposure light having a wavelength of < 250 nm (ArF excimer laser); high electrical conductivity

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