Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
11/2007
11/28/2007CN101080797A Method for manufacturing plasma display panel
11/28/2007CN101080510A Magnet structure for magnetron sputtering and cathode electrode unit and magnetron sputtering equipment
11/28/2007CN101080509A Sputtering apparatus and method for manufacturing transparent conducting film
11/28/2007CN101080508A Tubular target comprising a connecting layer that is situated between the tubular target and the tubular support
11/28/2007CN101080507A Evaporation source
11/28/2007CN101080295A Coated cutting tool
11/28/2007CN101079382A Near-infrared high-transmission rate and multi-crystal transparent conductive oxide film and its making method
11/28/2007CN101078613A Coating layer thickness measurement mechanism and coating layer forming apparatus using the same
11/28/2007CN101078127A Steel plate coated with titanium
11/28/2007CN101078119A Preparation method for plastic with metallic handle surface
11/28/2007CN101078107A Optical film thickness control method and apparatus, insulation multilayer thin film and manufacturing device
11/28/2007CN101078106A Optical film thickness control method and apparatus, insulation multilayer thin film and manufacturing device
11/28/2007CN101078105A Automatic controlling method for increasing AIN medium film reaction direct current sputtering speed
11/28/2007CN101078104A Linear evaporator for manufacturing organic light emitting device using numerous crucibles
11/28/2007CN101078103A Deposition device
11/28/2007CN101077645A Cutting tool made of surface-coated cubic boron nitride-based ultra-high-pressure sintered material
11/28/2007CN100352076C Method for preparing aeolotropic magneto resistor permalloy thin film
11/28/2007CN100352011C Equipment and method for manufacturing semiconductor device
11/28/2007CN100351425C In-line deposition processes for circuit fabrication
11/28/2007CN100351424C Fabrication of B/C/N/O/Si doped sputtering targets
11/28/2007CN100351423C Crystal seat design for sputtering cleaning chamber and the metallizing process therewith
11/28/2007CN100351422C Apparatus for surface modification of polymer, metal and ceramic materials using ion beam
11/27/2007US7301211 Method of forming an oxide film
11/27/2007US7301149 Apparatus and method for determining a thickness of a deposited material
11/27/2007US7300838 Semiconductor device and method of manufacturing semiconductor device
11/27/2007US7300701 High durable, low-e, heat treatable layer coating system
11/27/2007US7300684 Method and system for coating internal surfaces of prefabricated process piping in the field
11/27/2007US7300617 Melting zinc oxide and indium oxide source materials into a liquid;cooling the liquid in a mold to form a fusion cast indium zinc oxide article
11/27/2007US7300559 Filtered cathodic arc deposition method and apparatus
11/27/2007US7300558 Rapid cycle time gas burster
11/27/2007US7300557 Device for targeted application of deposition material to a substrate
11/27/2007US7300556 Improving performance; reducing separation of protective overcoat from magnetic media; vacuum deposition, bombarding silicon target with xenon ions
11/27/2007CA2303167C A method of depositing an electrocatalyst and electrodes formed by such method
11/22/2007WO2007131506A1 Vacuum coating apparatus
11/22/2007WO2007114899A3 Vent groove modified sputter target assembly
11/22/2007WO2007103309A3 Methods of producing deformed metal articles
11/22/2007WO2007024465A3 Aluminum sputtering while biasing wafer
11/22/2007WO2007022275A3 Siox:si sputtering targets and method of making and using such targets
11/22/2007WO2006121891A3 Medical devices and methods of making the same
11/22/2007WO2006057829A3 Scratch resistant coated article and method of making
11/22/2007US20070269611 Systems and methods of combinatorial synthesis
11/22/2007US20070269599 Optical Function Layers, in Particular Zinc-Oxide Sulfide Layers, Exhibiting Variable Dielectric Responses
11/22/2007US20070269587 Film formation source, vacuum film formation apparatus, organic el panel and method of manufacturing the same
11/22/2007US20070268089 Plasma Immersion Ion Implantation Using Conductive Mesh
11/22/2007US20070267434 Dispensing System For Alkali Metals Capable Of Releasing A High Quantity Of Metals
11/22/2007DE19632581B4 Reihenverdampfer für Vakuumbedampfungsanlagen Series evaporator for vacuum vaporization
11/22/2007DE102006023463A1 Vorrichtung zum Elektronenstrahlverdampfen Apparatus for electron
11/22/2007DE10138156B4 Magnetron-Zerstäubungsanlage mit mehreren Plasmaringen, Verfahren zum Zerstäuben eines Targets sowie Verwendung der Anlage bzw. des Verfahrens Magnetron sputtering apparatus with multiple plasma rings, method of sputtering a target, and use of the plant or process
11/21/2007EP1858056A1 Plasma method for treating the surface of workpieces
11/21/2007EP1857569A2 Plasma processing system
11/21/2007EP1857432A2 Synthesis of metal bis-triflimide compounds and methods for purification thereof
11/21/2007EP1856303A1 Single, right-angled end-block
11/21/2007EP1856302A1 Pulsed laser deposition method
11/21/2007EP1856301A1 Non-stick metal product coated by pvd with a hydrophobic metal oxide.
11/21/2007CN101076614A Protective coating on a substrate and method of making thereof
11/21/2007CN101075639A Semiconductor device and fabricating method thereof
11/21/2007CN101075500A Solid electrolyte and method of producing the same
11/21/2007CN101074477A Method for coating silicon nitride film in vacuum
11/21/2007CN101074476A Method for producing Fe-Al intermetallic compound layer on surface of iron or steel materials
11/21/2007CN101074475A Organic-molecular beam depositer for producing organic/inorganic thin film
11/21/2007CN101074474A Hard laminated film, method of manufacturing the same and film-forming device
11/21/2007CN101073841A Tool bits having plasma deposited metal carbide coatings
11/21/2007CN101073771A Method for producing nano-carbon tube load platinum catalyst by laser deposition
11/21/2007CN100350651C Anode compositions having an elastomeric binder and an adhesion promoter
11/21/2007CN100350482C Disk-like substrate sputtering device, substrate chucking method in the device, method of producing disk-like recording medium using the device
11/21/2007CN100350071C 包装材料 Packaging Materials
11/21/2007CN100350070C Compound coating layer for improving micro drill service life and its preparation method
11/21/2007CN100349819C System of layers for transparent substrates and coated substrate
11/20/2007US7297422 Method for sputtering magnetic recording media
11/20/2007US7297411 Process of using sodium silicate to create fire retardant products
11/20/2007US7297361 In-line deposition processes for circuit fabrication
11/20/2007US7297247 Electroformed sputtering target
11/20/2007US7296965 Cryogenic bearings
11/18/2007CA2547091A1 Ceramic preparation process, the ceramic obtained via said process and their use namely as a target for cathode sputtering
11/15/2007WO2007130903A2 Hollow cathode sputtering target
11/15/2007WO2007130888A1 Copper target
11/15/2007WO2007130571A2 Method of and apparatus for hydrogen enhanced diesel engine performance
11/15/2007WO2007129979A1 Flapper valve material, production and use thereof
11/15/2007WO2007129773A1 Iii nitride compound semiconductor laminated structure
11/15/2007WO2007129643A1 Field effect transistor using organic semiconductor material and method for manufacturing the same
11/15/2007WO2007103471A3 System and method for sputtering a tensile silicon nitride film
11/15/2007WO2006101843A3 Sputtering devices and methods
11/15/2007WO2006055236A3 Wafer processing system and method of manufacturing wafers
11/15/2007WO2005111257A3 Effects of methods of manufacturing sputtering targets on characteristics of coatings
11/15/2007US20070264579 Solid electrolyte and method of producing the same
11/15/2007US20070264421 Method for Producing Multiple Layer Systems
11/15/2007US20070261957 Magnetron cathode and sputtering device installing it
11/15/2007US20070261956 Coating installation with carrier for substrate coating
11/15/2007US20070261955 Ruthenium oxide electrodes and fabrication method thereof
11/15/2007US20070261952 Magnetron Sputtering Apparatus
11/15/2007US20070261951 Reactive sputtering zinc oxide transparent conductive oxides onto large area substrates
11/15/2007US20070261444 Method for making a mold used for press-molding glass optical articles
11/15/2007DE19652471B4 Verfahren zur Wasserstoffpassivierung von Verbindungshalbleitern Process for hydrogen passivation of compound semiconductors
11/15/2007DE102006021994A1 Beschichtungsverfahren und Vorrichtung zum Beschichten Coating methods and apparatus for coating
11/15/2007DE102006021356A1 Kohlefilzhalterung für Sputtertargets Kohlefilzhalterung for sputtering targets
11/15/2007CA2587583A1 Solid electrolyte and method of producing the same
11/14/2007EP1855305A1 Method for plating a substrate
11/14/2007EP1854904A1 Apparatus for measuring semiconductor physical characteristics
11/14/2007EP1853744A1 Metallised plastics component with a display region, and method for producing same
11/14/2007EP1593142B1 Magnetically enhanced plasma processing installation for continuous material
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