Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
01/2008
01/23/2008CN101109067A Rotation evaporator for thin film deposition and thin film deposition apparatus using the same
01/23/2008CN101109066A Evaporating equipment and conveying device thereof
01/23/2008CN101109065A Method for manufacturing condensed nucleus aromatic organic semiconductor monocrystal nanostructure jointed to substrate
01/23/2008CN101109064A Method of plating-manufacturing silicon doped non-hydrogen diamond membrane
01/23/2008CN101109056A Aluminum-doping phase transiting storing thin-film material Alx(Ge2Sb2Te5)100-x and method of preparing the same
01/23/2008CN101108546A Flexible material and method of manufacturing the same and use thereof
01/23/2008CN101108328A Proessure reduction vessel, pressure reduction processing apparatus and method of manufacturing a proessure reduction vessel
01/23/2008CN100364140C Precision mask for film forming and its manufacturing method, electroluminescence device and manufacturing method
01/23/2008CN100363535C Power supply drive method for sputter ion pump
01/23/2008CN100363534C In situ getter pump system and method
01/23/2008CN100363533C Correction method of evenness of film thickness of electron beam evaporation film coating
01/23/2008CN100363532C Vacuum evaporation plating machine
01/23/2008CN100363531C Preparation method of gallium adulterated zinc oxide transparent conductive film
01/23/2008CN100363530C Nano super-lattice structured superhard composite film cutting tool and deposition method therefor
01/23/2008CN100363288C Substrate with photocatalytic coating
01/22/2008US7321188 Light filament formed from carbon nanotubes
01/22/2008US7321129 Deposition system and film thickness monitoring device thereof
01/22/2008US7320858 Formation of combinatorial arrays of materials using solution-based methodologies
01/22/2008US7320815 Method for forming oriented film, oriented film, substrate for electronic device, liquid crystal panel, and electronic device
01/22/2008US7320736 Cooling target blank that is at least 99.999 percent pure to less than 50 degrees C., deforming to introduce strain and to reduce grain size, recrystallizing below 200 degrees C. to form at least 99 percent recrystallized grains; grain size of less than 200 mu m
01/22/2008US7320331 In-situ plasma cleaning device for cylindrical surfaces
01/22/2008CA2450412C Support with getter-material for microelectronic, microoptoelectronic or micromechanical device
01/17/2008WO2008007784A1 Capacitive-coupled magnetic neutral line plasma sputtering system
01/17/2008WO2008007770A1 Transparent conducting layer coated film and its use
01/17/2008WO2008007732A1 Method for manufacturing semiconductor device
01/17/2008WO2008007559A1 Oxide phosphor epitaxial thin film
01/17/2008WO2008007165A1 Surface treatment for titanium or titanium-alloys
01/17/2008WO2008007095A1 Coating apparatus and method
01/17/2008WO2007094961A3 Water vapor passivation of a wall facing a plasma
01/17/2008US20080014822 Film Formation Apparatus and Film Formation Method
01/17/2008US20080014448 Coated article with oxides and/or oxynitrides of antimony and/or zinc dielectric layer(s) and corresponding method
01/17/2008US20080014420 Surface treatment for titanium or titanium-alloys
01/17/2008US20080014363 Electro-Static Chucking Mechanism and Surface Processing Apparatus
01/17/2008US20080014057 Loading and Unloading Apparatus For A Coating Device
01/17/2008US20080012337 Vacuum Tight Coupling For Tube Sections
01/17/2008US20080012016 Transparent conductive film, semiconductor device and active matrix display unit
01/17/2008US20080011603 Ultra high vacuum deposition of PCMO material
01/17/2008US20080011602 Deposition apparatus and deposition method
01/17/2008US20080011601 Cooled anodes
01/17/2008US20080011600 Dual hexagonal shaped plasma source
01/17/2008US20080011599 Sputtering apparatus including novel target mounting and/or control
01/17/2008US20080011018 Device for transporting glazing through a coating-depositing plant
01/17/2008DE102006033072A1 Molten metal immersion process for tin-plating involves plasma-physical etching and immersion within vacuum chamber
01/17/2008DE102006020004A1 Vorrichtung und Verfahren zur homogenen PVD-Beschichtung Apparatus and method for homogeneous PVD coating
01/17/2008DE10130129B4 Zerstäubungsvorrichtung Sputtering
01/17/2008CA2660085A1 Coating apparatus and method
01/17/2008CA2658075A1 Sputtering apparatus including target mounting and/or control
01/16/2008EP1879431A1 Apparatus for film formation and method for film formation
01/16/2008EP1879221A1 Method of mask forming and method of three-dimensional microfabrication
01/16/2008EP1877867A2 Methods and apparatus for the manufacture of microstructures
01/16/2008EP1877597A2 Target assemblies, targets backing plates, and methods of target cooling
01/16/2008EP1877596A2 Metering material to promote rapid vaporization
01/16/2008EP1877595A1 Cutting tool insert, solid end mill or drill coated with wear resistant layer.
01/16/2008EP1877114A2 Medical devices and methods of making the same
01/16/2008EP1349698A4 Friction fit target assembly for high power sputtering operation
01/16/2008CN201006893Y Substrate refrigerating mechanism
01/16/2008CN201006892Y Permanent magnetism quintain device of magnetron sputtering film-plating machine
01/16/2008CN201006891Y Movable magnetic pole type scan sputter source
01/16/2008CN101107381A Magnetic circuit device for magnetron sputtering and its manufacturing method
01/16/2008CN101107380A Magnesium oxide single crystal vapor deposition material and process for producing the same
01/16/2008CN101104934A Plastic film coating method and device used for hologram marking and packing
01/16/2008CN101104922A Complex ion injection bearing vacuum tempering treatment method
01/16/2008CN101104921A Cooled anodes
01/16/2008CN101104920A Film-forming apparatus and film-forming method
01/16/2008CN101104919A Electrode instrument used for vacuum aluminizing device
01/16/2008CN101104566A Ferroelectric ZnO thin film doped with V and preparation method thereof
01/16/2008CN101104548A Low-resistance P-type tin dioxide thin film material doped with indium and aluminum and preparation method thereof
01/16/2008CN100362621C Device and method for reducing thin-film type capacitance vacuum gauge zero-point drift
01/16/2008CN100362582C Optical information recording medium and method of manufacturing thereof, manufacturing apparatus, recording/reproducing method
01/16/2008CN100362412C Display cell, in particular liquid crystal, or photovoltaic cell comprising means for connection to an electronic control circuit
01/16/2008CN100362217C Tappet for internal combustion engine
01/16/2008CN100362216C Valve train for internal combustion engine
01/16/2008CN100362133C Hard antiwear protecting film and its prepn
01/16/2008CN100362127C Technology for producing titanium nitride composite ceramic
01/15/2008US7319079 refractory vessels consisting of boron nitride, boride and rare earth metal oxides, carbides, nitrides and/or mixtures, having durability, corrosion and heat resistance
01/15/2008US7318847 Workpiece with a face deposited by CVD or PVD process; a three dimensional micro structure extending from the surface of the layer system up into the workpiece, which is uncoated in a lower region of the micro structure
01/10/2008WO2008004657A1 p-TYPE ZINC OXIDE THIN FILM AND METHOD FOR FORMING THE SAME
01/10/2008WO2008004594A1 Substrate tray and film forming apparatus
01/10/2008WO2008004593A1 Plasma film deposition system and method for producing film
01/10/2008WO2008004558A1 Process for producing ornamental plated article with use of conversion of resin to conductive one by sputtering, and hanging jig for fixing of resin molding
01/10/2008WO2008004397A1 Apparatus and method for producing reflector mirror
01/10/2008WO2008004315A1 Process for production of decoratively plated articles by utilizing the impartation of electroconductivity to resin by sputtering
01/10/2008WO2008004256A1 Method and installation for producing spools of web like material with vacuum desposition
01/10/2008WO2008003973A1 A method and apparatus for the formation of coatings on drills
01/10/2008WO2008003113A1 Method for producing an electrically conducting layer
01/10/2008WO2007117294A3 System and method for continuous deposition of graded coatings
01/10/2008US20080008900 Ball Limiting Metallurgy, Interconnection Structure Including the Same, and Method of Forming an Interconnection Structure
01/10/2008US20080006602 Apparatus and method for fabricating color filter
01/10/2008US20080006529 Substrate Holder Assembly Device
01/10/2008US20080006528 Method for forming sputter target assemblies having a controlled solder thickness
01/10/2008US20080006525 Non-Oxidised Electrolyte Electrochemical System
01/10/2008US20080006524 Method for producing and depositing nanoparticles
01/10/2008US20080006523 Cooled pvd shield
01/10/2008US20080006522 Method of producing metal-oxide film
01/10/2008US20080006204 Corrosion resistant wafer processing apparatus and method for making thereof
01/10/2008DE102006031490A1 Method for connecting a housing used in the production of a flat tube heat exchanger comprises preparing a first housing part with first connecting edges and a second housing part with second connecting edges and further processing
01/10/2008DE102006031244A1 Vorrichtung zum Elektronenstrahlverdampfen Apparatus for electron
01/10/2008DE102006026576A1 Vorrichtung und Verfahren zum Aufdampfen eines pulverförmigen organischen Ausgangsstoffs Apparatus and method for vapor deposition of a powdery organic starting material
01/09/2008EP1876345A1 Piston ring for internal combustion engines
01/09/2008EP1876258A1 Sputtering target