Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
02/2008
02/06/2008CN100366573C Evaporation material for the production of average refractive optical layers
02/05/2008USH2209 Uses an electron beam-produced plasma that delivers substantial ion and radical fluxes at low temperatures over an organic plastic or polymer substrate; surface is physically and chemically altered to improve metal adhesion
02/05/2008US7326669 Substrate having catalyst compositions on surfaces of opposite sides
02/05/2008US7326502 Ion beam deposition and atomic layer deposition to form alternating stack of thin films; to smooth surface defects; form extreme ultraviolet reflective mask in semiconductor processing; optical ultraviolet system for making semiconductor wafer
02/05/2008US7326487 Method for fabricating membrane-electrode assembly and fuel cell adopting the membrane-electrode assembly
02/05/2008US7326470 Adds the minimum weight while providing the maximum thermal insulation capability; for long life, stability, economy, gas turbines. coated part comprising a thermal barrier coating offering lower thermal conductivity but which exhibits suitable resistance to spallation
02/05/2008US7326446 Method for coating metal surfaces and substrate having a coated metal surface
02/05/2008US7326445 Method and apparatus for manufacturing ultra fine three-dimensional structure
02/05/2008US7326303 Single-pass growth of multilayer patterned electronic and photonic devices using a scanning localized evaporation methodology (SLEM)
02/05/2008CA2311494C Modification of surfaces in order to increase surface tension
02/01/2008CA2595773A1 Hybrid welding repair of gas turbine superalloy components
01/2008
01/31/2008WO2008014040A2 Apparatus and method for coating substrates with approximate process isolation
01/31/2008WO2008013469A1 Method for ion-plasma application of film coatings and a device for carrying out said method
01/31/2008WO2008013238A1 Method for forming transparent conductive film
01/31/2008WO2008013237A1 Method for forming transparent conductive film
01/31/2008WO2008012970A1 Lithium-containing transition metal oxide target, process for producing the same and lithium ion thin-film secondary battery
01/31/2008WO2005112603A3 Durable thermal barrier coating having low thermal conductivity
01/31/2008US20080026574 Method and apparatus of distributed plasma processing system for conformal ion stimulated nanoscale deposition process
01/31/2008US20080026548 Film Forming Apparatus and Film Forming Method
01/31/2008US20080026234 Epitaxial oxide films via nitride conversion
01/31/2008US20080026143 Process for flourinating piping
01/31/2008US20080023320 Method for Manufacturing Separator for Fuel Cell
01/31/2008US20080023319 Magnetron assembly
01/31/2008US20080023318 Sputtering Apparatus and Method, and Sputtering Control Program
01/31/2008US20080023113 High strength gear, power transmission mechanism using same, and production method for high strength gear
01/31/2008US20080023087 Transport System for Nanoparticles and Method for the Operation Thereof
01/31/2008DE10333129B4 Verfahren zur Bildung einer Siliziumnitridschicht für einen flaschenförmigen Graben A method for forming a silicon nitride layer for a bottle-shaped trench
01/31/2008DE102007033670A1 Dotierte Magnesiumdiborid-Pulver und Verfahren zu deren Herstellung Doped magnesium diboride powders and methods for their preparation
01/30/2008EP1882051A2 Module for a coating system and associated technology
01/30/2008EP1835946A4 Surface treated shape memory materials and methods for making same
01/30/2008EP1337684B1 Vacuum metalization process for chroming substrates
01/30/2008CN201012941Y Graphite boat used in production of silicon chip
01/30/2008CN201012936Y High-light even facula adjustable projector
01/30/2008CN201012935Y Adjustable film-thickness monitoring photoelectric signal conversion equipment
01/30/2008CN201012934Y Monochro-meter automatic control device
01/30/2008CN201012933Y Aluminium cover for magnetron sputtering film-plating
01/30/2008CN101116170A Encapsulated wafer processing device and process for making thereof
01/30/2008CN101115861A Method for preparing by thermal spraying a silicon- and zirconium-based target
01/30/2008CN101115860A Production method for vacuum component, resin coating forming device and vacuum film forming system
01/30/2008CN101113515A Knife tool face-hardening method
01/30/2008CN101113514A Substrate processing apparatus
01/30/2008CN101113513A Composite titanium-aluminum alloy target and method for making same
01/30/2008CN101113512A Method for preparing fluorine-carbon macromolecule/nano zinc oxide hybridization material
01/30/2008CN100365811C Interconnect for a semiconductor device
01/30/2008CN100365776C Production of thin-film ferroelectric materials with lead zirconate-titanate with reading circuit integration
01/30/2008CN100365467C Optical film thickness monitoring system
01/30/2008CN100365162C Improvement of coating film bearing structure
01/30/2008CN100365161C Single MEVVA ion source diffusion coating composite treating process
01/30/2008CN100365160C Preparation method of low resistivity metal oxide lanthanum nickelate
01/30/2008CN100365159C Method for preparing P-zinc oxide film by ion beam intensifying deposition
01/30/2008CN100365158C Preparation process for physics vapour phase deposition of ultrathin self-suporting polyimide filter film
01/30/2008CN100365157C Method for preparing La-Ba-Mn-o function film on silicon base plate
01/30/2008CN100365144C Aluminium alloy for tribologically stressed surfaces
01/30/2008CN100364707C Vacuum seal welding method for window and optic window of low temperature metal Dewar
01/29/2008US7323257 Complex oxide having an oxygen octahedral structure containing Si and Ge formed by post-annealing the components in a pressurized atmosphere including oxygen or ozone; dielectric capacitors
01/29/2008US7323249 Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby
01/29/2008US7323230 Anodizing an aluminum surface to form an Al2O3 layer; coating the oxide surface with aluminum by chemical vapor deposition from an aluminum-containing energized process gas; remelting the aluminum, and forming a second Al2O3 layer over the aluminum layer; completely fills the penetrating surface features
01/29/2008US7323229 Method and device for coating a substrate
01/29/2008US7323219 Apparatus and method for applying diamond-like carbon coatings
01/29/2008US7323088 Taking a glazing panel having on one of its surfaces transparent coating layer having a transformable portion, and enamel material associated with the transformable portion of the coating layer; heating to cause interaction
01/24/2008WO2008010747A1 Method of producing a rough surface on a substrate
01/24/2008WO2008009889A1 Ion deposition apparatus
01/24/2008WO2008009716A1 Arrangement comprising nanoparticles, and method for the production thereof
01/24/2008WO2008009619A1 Method for depositing electrically insulating layers
01/24/2008WO2008009107A2 Multilayer material based on active lithium, preparation method and applications in electrochemical generators
01/24/2008WO2007075435A3 Apparatus for reactive sputtering
01/24/2008US20080020546 Process for interfacial adhesion in laminate structures through patterned roughing of a surface
01/24/2008US20080020241 Thin film magnetic recording media
01/24/2008US20080019897 Phosphorus Effusion Cell Arrangement and Method for Producing Molecular Phosphorus
01/24/2008US20080017506 Tubular Magnet Assembly
01/24/2008US20080017502 Ti oxide film having visible light-responsive photocatalytic activites and process for its production
01/24/2008US20080017501 Cooled dark space shield for multi-cathode design
01/24/2008US20080017282 cryogenics; cooling, deforming, recrystallizing, finishing; cost efficiency
01/24/2008US20080017267 Moulded Body with Evaporation-Sputtered Layers
01/24/2008DE19840527B4 Verfahren zur Herstellung von Suspensionen und Pulvern von Indium-Zinn-Oxid A method for preparing suspensions and powders of indium tin oxide
01/24/2008DE102006008977B4 Vorrichtung zur Befestigung von Blenden in Prozessräumen von Vakuumprozessanlagen Device for fastening panels in areas of process vacuum process equipment
01/24/2008CA2657726A1 Method for depositing electrically insulating layers
01/24/2008CA2657492A1 Multilayer material based on active lithium, preparation method and applications in electrochemical generators
01/24/2008CA2553146A1 Preparation process for ceramics, ceramics thus obtained and their use namely as a sputtering target
01/23/2008EP1881523A1 Plasma doping method and plasma doping apparatus
01/23/2008EP1881086A1 Substrate holder with magnetic housing for vacuum coating apparatuses
01/23/2008EP1881085A2 A method for producing and depositing nanoparticles
01/23/2008EP1880578A1 A reflector for an infrared radiating element
01/23/2008EP1880036A2 Coating process for manufacture or reprocessing of sputter targets and x-ray anodes
01/23/2008EP1879928A1 A method for forming ferroelectric thin films, the use of the method and a memory with a ferroelectric oligomer memory material
01/23/2008EP1716202A4 Polypropylene modification for improved adhesion of polypropylene-based multilayer packaging film structure to vacuum deposited aluminum
01/23/2008EP1590502A4 Composite barrier films and method
01/23/2008EP1322444A4 Method of manufacturing sputter targets with internal cooling channels
01/23/2008CN201010691Y Self temperature dropping transmission shaft used for vacuum plating
01/23/2008CN201010690Y U-shaped vacuum chamber used for vacuum plating
01/23/2008CN201010689Y Reversible compensating baffle mechanism
01/23/2008CN201010688Y Novel vacuum chamber door structure
01/23/2008CN101111627A Sinter, sputtering target and molding die, and production process of sintered compact
01/23/2008CN101111626A Feeding particulate material to a heated surface
01/23/2008CN101111625A Device for vacuum deposition with recharging reservoir and corresponding vacuum deposition method
01/23/2008CN101109072A Device for leading-in inside and outside differential pressure step by step of magnetron sputtering vacuum chamber H2O
01/23/2008CN101109071A Substrate cryogenic cooling device for manufacturing amorphous and nano microcrystalline film
01/23/2008CN101109070A Method of manufacturing two-dimension periodic semi-sphere shell dot matrix of large scale zinc oxide
01/23/2008CN101109069A Cooled dark space shield for multi-cathode design
01/23/2008CN101109068A Sputtering targets, sputter reactors, methods of forming cast ingots, and methods of forming metallic articles