Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
12/2007
12/19/2007EP1867754A1 Cutting tool made of surface-coated cubic boron nitride-based ultra-high-pressure sintered material
12/19/2007EP1866457A1 Device for machining workpieces in a vacuum
12/19/2007EP1866456A2 Methods for making sputtering targets
12/19/2007EP1711645A4 Method and apparatus for monitoring optical characteristics of thin films in a deposition process
12/19/2007CN200992574Y Pollution-proof ultrahigh vacuum magnetron sputtering coating device
12/19/2007CN200992573Y Rotary coating auxiliary device
12/19/2007CN200992572Y Vacuum barrel type coating machine
12/19/2007CN200992571Y Non-time-delay continuous vacuum process equipment
12/19/2007CN101091276A Bipolar plate with enhanced stability
12/19/2007CN101090997A Mask aligning mechanism for film forming apparatus, and film forming apparatus
12/19/2007CN101090996A Substrate mounting method and film forming method for film forming apparatus
12/19/2007CN101090995A Film forming device, film forming method, and method of producing organic el element
12/19/2007CN101090994A Mask holding mechanism and film forming apparatus
12/19/2007CN101090993A Mask clamp moving mechanism and film forming apparatus
12/19/2007CN101090992A Method and apparatus for manufacturing protective layer
12/19/2007CN101090991A Protective film-forming method and protective film-forming apparatus
12/19/2007CN101090790A 涂覆切削工具及其制造方法 Coated cutting tool and its manufacturing method
12/19/2007CN101090743A Prosthetic joint with articulating surface layers comprising ADLC
12/19/2007CN101089220A Process kit and target for substrate processing chamber
12/19/2007CN101089219A Physical gas-phase deposite method for preparing mesh nano array ferromagnetic film
12/19/2007CN101089213A Nickel-bass alloy material for semiconductor
12/19/2007CN101088757A Coated inserts for milling
12/19/2007CN101088756A Blade used for cast iron milling
12/19/2007CN100356642C C-MgxZn1-xO/MgO multi-quantum sink heterogeneous structural materials and producing process thereof
12/19/2007CN100356581C Semiconductor device and method of manufacturing the same
12/19/2007CN100356519C Precursor containing a nitrogen compound bound to hfcl4 for hafnium oxide layer and method for forming hafnium oxide film using the precursor
12/19/2007CN100356206C Production method for chip-form film-forming component
12/19/2007CN100355936C Surface treatment method and surface treatment apparatus
12/19/2007CN100355935C Optical element film coated appliance
12/19/2007CN100355934C Spin controllable vacuum film plating device
12/19/2007CN100355933C Arc evaporator with powerful magnetic guide for targets having large surface area
12/18/2007US7310563 Fabrication system and fabrication method
12/18/2007US7309842 Shielded monolithic microplasma source for prevention of continuous thin film formation
12/18/2007US7309616 Laser annealing of complex metal oxides (CMO) memory materials for non-volatile memory integrated circuits
12/18/2007US7309405 Sequential sputter deposition of seed and bulk layers; light-emitting display devices needing ultra-planarized surface roughness
12/18/2007US7309269 Method of fabricating light-emitting device and apparatus for manufacturing light-emitting device
12/13/2007WO2007142333A1 Sputtering target for forming high strength optical recording medium protection film
12/13/2007WO2007142330A1 Transparent conductive film, process for production of the film, and sputtering target for use in the production of the film
12/13/2007WO2007142265A1 Magnetron sputtering magnet assembly, magnetron sputtering device, and magnetron sputtering method
12/13/2007WO2007142043A1 Transparent conductive film, process for producing the same, and sputtering target for use in the production
12/13/2007WO2007141994A1 Oxide sinter, target, transparent conductive film obtained from the same, and transparent conductive base
12/13/2007WO2007141235A1 Apparatus and method for vapour depositing a powdered organic starting material
12/13/2007WO2007141174A1 A rotatable sputter target
12/13/2007WO2007141173A1 A rotatable sputter target
12/13/2007WO2007141076A1 Method for the electrical discharge machining of an electrically non-conductive material
12/13/2007WO2007141003A1 Sputter target with sputter material based on tio2, and a production method
12/13/2007WO2007044248B1 Low-voltage inductively coupled source for plasma processing
12/13/2007WO2007022277A3 Siox:si composite articles and methods of making same
12/13/2007WO2005122714A3 Self-expandable and collapsible three-dimensional devices and methods
12/13/2007US20070287026 Method for Manufacturing Ultra-Hydrophilic Thin Film Coated Metal Film Coated Metal Product
12/13/2007US20070286964 Method for Improving the Electrical Connection Properties of the Surface of a Product Made From a Polymer-Matrix Composite
12/13/2007US20070286943 Method of Forming Uniform Lines on a Substrate
12/13/2007US20070284246 Method and apparatus to detect fault conditions of plasma processing reactor
12/13/2007US20070283998 Precursor Film And Method Of Forming The Same
12/13/2007US20070283886 Apparatus for integration of barrier layer and seed layer
12/13/2007US20070283578 Atomically sharp edged cutting blades and methods for making same
12/13/2007DE112006000274T5 Filmbildungsvorrichtung, Filmbildungsverfahren, Herstellungsverfahren und Titanfilm Film forming apparatus, film forming method, manufacturing method, and titanium film
12/13/2007DE102006027098A1 Production of layers by physical or chemical vapor deposition comprises using radicals of an element of the layer material in the vapor phase
12/13/2007DE102006027029A1 Sputtertarget mit einem Sputtermaterial auf Basis TiO2 sowie Herstellverfahren Sputtering with a sputtering based on TiO2 or production process
12/13/2007DE102006026523A1 Verfahren zum Aufdampfen dünner Schichten im Vakuum und Draht zu seiner Ausführung Method for depositing thin films in vacuum and wire for its execution
12/13/2007DE102006019000A1 Einrichtung und Verfahren zur plasmagestützten Abscheidung von Hartstoffschichten Apparatus and method for plasma-assisted deposition of hard coatings
12/12/2007EP1865090A1 Deep-pot-shaped copper sputtering target and process for producing the same
12/12/2007EP1865089A2 Method for metallising thin layers in a vacuum and wire for performing this
12/12/2007EP1864793A1 Metallized blaxially oriented polypropylene film with high metal adhesion
12/12/2007EP1864742A1 Method of electric discharge machining for electrically insulating material
12/12/2007EP1864730A1 Method of making composite casting and composite casting
12/12/2007EP1864334A1 Process for preparing a metal film on a substrate
12/12/2007EP1864314A2 Method for operating a pulsed arc evaporation source and vacuum process system comprising said pulsed arc evaporation source
12/12/2007EP1863948A1 Device and method for the transport of a tube from a first chamber into a second chamber
12/12/2007EP1863947A1 Hard material layer
12/12/2007EP1863946A1 Multi-layered hard material coating for tools
12/12/2007CN200988861Y Ground shield module
12/12/2007CN101087899A Vertical production of photovoltaic devices
12/12/2007CN101086059A Solar energy heat-collecting pipe vacuum magnetic-control sputtering continuous plating line system
12/12/2007CN101086058A Vacuum deposition film device for continuous band-shaped base-material
12/12/2007CN101086057A Magnesium and its alloy surface vacuum plating preparation method
12/12/2007CN100355104C Multi-face forming mask device for vacuum deposition
12/12/2007CN100355058C Ionized PVD with sequential deposition and etching
12/12/2007CN100355045C Support with integrated deposit of gas absorbing material for manufacturing microelectronic, microoptoelectronic or micromechanical devices
12/12/2007CN100355026C Method and apparatus for producing polysilicon film, semiconductor device, and manufacture thereof
12/12/2007CN100355019C Substrate processing apparatus, pressure control method for substrate processing apparatus
12/12/2007CN100355017C Growth process capable of increasing zb-CrSb thickness
12/12/2007CN100354752C Masks for vaporation, frame assembly therewith and manufacture of both
12/12/2007CN100354725C Inorganic orientation film and its forming method,substrate for electronic device,liquid crystal panel
12/12/2007CN100354673C Mechanism for placing optical lens blank in holder
12/12/2007CN100354452C System and method for producing luminous device
12/12/2007CN100354451C Process for making angstrom scale and high aspect functional platelets
12/12/2007CN100354402C Method for surface-metallizing wax objects, especially for silver-plating candles to give them a bright shine
12/12/2007CN100354389C Aluminic gadolinium-base luminescent film material chip and preparing method thereof
12/11/2007US7306861 Sputtering target, sintered compact, electrically conductive film produced by using the same, and organic EL device and substrate used for the same
12/11/2007US7306707 Adaptable processing element for a processing system and a method of making the same
12/11/2007US7306696 Interferometric endpoint determination in a substrate etching process
12/11/2007US7306503 Method and apparatus of fixing carbon fibers on a substrate using an aerosol deposition process
12/06/2007WO2007139258A1 Coating and ion beam mixing apparatus and method to enhance the corrosion resistance of the materials at the elevated temperature using the same
12/06/2007WO2007139086A1 Substrate for growth of carbon nanotube, method for growth of carbon nanotube, method for control of paticle diameter of catalyst for growth of carbon nanotube, and method for control carbon nanotube diameter
12/06/2007WO2007139051A1 Panel manufacturing method
12/06/2007WO2007138865A1 Laminated body for resin glass and method for manufacturing such laminated body
12/06/2007WO2007138436A2 Metal member having precious metal plating and manufacturing method of that metal member
12/06/2007WO2007137876A1 Use of a tungsten bronze structured material and turbine component with a thermal barrier coating
12/06/2007WO2007137824A1 Cold-pressed sputter targets