Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
02/2008
02/14/2008WO2007085614A3 Device and method for the surface treatment of rollers in the paper industry
02/14/2008WO2006055348A3 Method of forming coated article using sputtering target(s) and ion source(s) and corresponding apparatus
02/14/2008US20080038935 Aperture masks for circuit fabrication
02/14/2008US20080038861 Support with integrated deposit of gas absorbing material for manufacturing microelectronic microoptoelectronic or micromechanical devices
02/14/2008US20080038680 transfer layer, antistatic layer, a light-to-heat conversion layer on a base layer, anda conductive frame connected to the antistatic layer; making OLED, controlling static electricity
02/14/2008US20080038582 High-temperature coatings with pt metal modified y-Ni+y'-Ni3Al alloy compositions
02/14/2008US20080038581 Metal Multi-Layered Film Structure and Method of Manufacturing and Use of the Same
02/14/2008US20080038511 Carbon-Based Thin Film, and Process for Producing the Same, and Member Using Thin Film
02/14/2008US20080038487 Photon energy is directed through a photon-transparent support and absorbed by an interlayer coated thereon; energized interlayer causes the transfer of a biological material coated thereon across a gap and onto a receiving substrate
02/14/2008US20080038481 Fabricating and cleaning chamber components having textured surfaces
02/14/2008US20080038479 Apparatus and method for processing a substrate
02/14/2008US20080038095 Apparatus for vacuum treating two dimensionally extended substrates and method for manufacturing such substrates
02/14/2008US20080035477 Vacuum Coating System for Coating Elongate Substrates
02/14/2008US20080035471 Silicon object forming method and apparatus
02/14/2008US20080035470 Device For Plasma-Treating And/Or Coating Work Pieces
02/14/2008DE102007035118A1 Hartstoffschicht und Hartstoffschicht-beschichtetes Material Hard material layer and hard film-coated material
02/14/2008DE102006037909A1 Temperbares, Infrarotstrahlung reflektierendes Schichtsystem und Verfahren zu seiner Herstellung The temperable, infrared reflecting layer system and method for its preparation
02/13/2008EP1887103A2 High strength gear, power transmission mechanism using the same, and production method for high strength gear
02/13/2008EP1887101A1 Production method for tin targets used in magnetron sputtering coating of glass
02/13/2008EP1887100A1 Sputtering target and process for producing the same
02/13/2008EP1887099A1 Method for manufacturing diamond-like carbon film
02/13/2008EP1885908A1 Coating comprising layered structures of diamond like nanocomposite layers and diamond like carbon layers
02/13/2008EP1885906A1 Deposition chamber desiccation systems and methods of use thereof
02/13/2008EP1885905A2 Microporous article having metallic nanoparticle coating
02/13/2008EP1885658A2 Method of making scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s)
02/13/2008EP1540665A4 Photolithography mask repair
02/13/2008EP1458654B1 Method for the production of locally functional areas and objects obtained therewith
02/13/2008CN101124354A Color-coded stainless steel fittings and ferrules
02/13/2008CN101124350A A physical vapor deposition plasma reactor with RF source power applied to the target
02/13/2008CN101124349A Plasma film deposition equipment
02/13/2008CN101124348A Indium oxide/zinc oxide/magnesium oxide sputtering target and transparent conductive film
02/13/2008CN101124347A Magnesium oxide single crystal vapor deposition material and process for producing the same
02/13/2008CN101124164A Gallium-containing zinc oxide
02/13/2008CN101123295A A non-crystal sold film material Ag1-x-yGexSey and making method and its application
02/13/2008CN101123282A Inorganic EL display insulation media and its making method
02/13/2008CN101122020A Preparation method for large-area nano zinc oxide directional array
02/13/2008CN101122009A Annealing treatment method for deposition ring
02/13/2008CN101122008A Plasma sputtering target device and its manufacturing method
02/13/2008CN101122007A Method for preparing mercuric iodide film under ultrasound wave
02/13/2008CN101122006A Method for preparing metal nano-crystal thin film
02/13/2008CN101121309A Hard film and hard film-coated material
02/13/2008CN101121108A Vacuum processing apparatus
02/13/2008CN101121086A Method for manufacturing filtering material with far infrared energy by non-built-in mode
02/13/2008CN100369230C Processing method and processing appts
02/13/2008CN100369200C Method for preparing ferromagnetic manganese silicon film on silicon substrate by magnetic control sputtering
02/13/2008CN100369192C Semiconductor processing system reaction chamber
02/13/2008CN100369141C Sputtering target for phase-change memory, film for phase change memory formed by using the target, and method for producing the target
02/13/2008CN100368590C Apparatus for inner surface modification by plasma source ion implantation
02/13/2008CN100368027C Hydrogen ion implantation process of raising bioactivity of nanometer titania coating
02/12/2008US7329595 Deposition of carbon-containing layers using vitreous carbon source
02/12/2008US7329474 For use in the microfabrication of semiconductor integrated circuits
02/12/2008US7329433 Shippable heat-treatable sputter coated article and method of making same
02/12/2008US7329328 Method for etch processing with end point detection thereof
02/12/2008CA2467174C Differential stress reduction in thin films
02/12/2008CA2362146C Magnetron sputtering method and apparatus
02/07/2008WO2008016247A1 Linear deposition sources for deposition processes
02/07/2008WO2008016017A1 Solid state imaging device and its fabrication method, electronic information apparatus, ionization sputtering system
02/07/2008WO2008016004A1 Method for film formation, apparatus for film formation, computer program, and storage medium
02/07/2008WO2008015913A1 Vacuum film forming apparatus and vacuum film forming method
02/07/2008WO2008015159A1 Method and device for coating a substrate with a defined distribution of coating thickness
02/07/2008WO2008015016A1 Process and apparatus for the modification of surfaces
02/07/2008US20080032885 Electrocatalyst for ethanol oxidation and direct ethanol fuel cell using the same
02/07/2008US20080032585 Deposition mask, method for manufacturing display unit using it, and display unit
02/07/2008US20080032200 Solid amorphous electrolyte composed of an aluminum ion doped lithium phosphorus oxynitride optionally also sulfide doped; atomic ratio of Al ion to P ion in electrolyte is 0.1-0.3; reduced phase separation in electrolyte film induced by high intrinsic compressive stresses means reduced premature failure
02/07/2008US20080032161 Coated Product And Method Of Production Thereof
02/07/2008US20080032159 Method and apparatus for providing a magnetic read sensor having a thin pinning layer and improved magnetoreistive coefficient
02/07/2008US20080032106 Transparent Conductive Film, Sintered Body Target for Transparent Conductive Film Fabrication, and Transparent Conductive Base Material and Display Device Using the Same
02/07/2008US20080032066 Platforms, apparatuses, systems and methods for processing and analyzing substrates
02/07/2008US20080030130 Hermetic encapsulation of organic, electro-optical elements
02/07/2008US20080029387 Ganged Scanning of Multiple Magnetrons, Especially Two Level Folded Magnetrons
02/07/2008US20080029386 Method and apparatus for trans-zone sputtering
02/07/2008US20080029023 Vacuum Processing Device
02/07/2008DE102007020027A1 Treated austenitic steel for vehicles, comprises non-metal chemical element incorporated into surface of steel to provided protection against hydrogen embrittlement
02/07/2008DE102006036403A1 Verfahren und Vorrichtung zur Beschichtung eines Substrats mit einer definierten Schichtdickenverteilung Method and apparatus for coating a substrate with a defined layer thickness distribution
02/06/2008EP1884978A1 Process and apparatus for the coating of substrates with diamond-like carbon layers
02/06/2008EP1884576A2 Device for plasma coating of long, cylindrical components
02/06/2008CN201016531Y Solar heat-absorbing plate core coated with selectively-absorbing complex film
02/06/2008CN201016121Y Quartz boat with lid for vapor deposition
02/06/2008CN101119807A Dense coating formation by reactive deposition
02/06/2008CN101118865A Substrate support with a protective layer for plasma resistance
02/06/2008CN101118836A False piece operation method with cobalt deposition
02/06/2008CN101118007A High strength gear, power transmission mechanism using the same, and production method for high strength gear
02/06/2008CN101117898A Pre-coating burnishing of erosion coated parts
02/06/2008CN101117706A Ganged scanning of multiple magnetrons, especially two level folded magnetrons
02/06/2008CN101117705A Method for preparing zirconium wolframic acid-copper gradient composite film
02/06/2008CN101117704A Method for growing cube-texture yttrium-stabile zirconium dioxide film
02/06/2008CN101117703A Method for growing cube-texture cerium dioxide film
02/06/2008CN101117702A Method for growing cube-texture yttrium oxide film
02/06/2008CN101117701A Method for cube-texture Y2O3 film by electron-beam evaporation on mobile substrate
02/06/2008CN101117700A Continuous growing multilayer cube-texture insulating layer on metallic substrate and preparation method thereof
02/06/2008CN100367546C Method for producing tin-based oxide thin film positive pole
02/06/2008CN100367414C First wall part coated with thick wolfram coat or copper alloy heat sink and mfg. method thereof
02/06/2008CN100367362C Perpendicular magnetic recording medium having alternatively layered structure of Co alloy and Pt thin film, its production method and apparatus
02/06/2008CN100366791C Threshold value helium introducing method in metallic film
02/06/2008CN100366790C Film forming device and film forming method
02/06/2008CN100366789C Low temperature method for preparing Nano crystal thin film of semiconductor in Znl-xMgxO structure of wurtzite
02/06/2008CN100366788C Vacuum thermal evaporation film-forming method using strong electric field
02/06/2008CN100366787C Film-plating device and method, and film-plating chamber special for said film-plating device
02/06/2008CN100366786C Novel metallic film preparation technology on liquid phase substrate surface
02/06/2008CN100366785C Polymorphic indium tin oxide thin-membrane and production of polymorphic indium tin oxide electrode