Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
12/2008
12/30/2008US7470607 Transparent oxide semiconductor thin film transistor
12/30/2008US7469558 As-deposited planar optical waveguides with low scattering loss and methods for their manufacture
12/30/2008CA2436750C Film deposition method and film deposition apparatus
12/30/2008CA2268659C Rectangular cathodic arc source and method of steering an arc spot
12/25/2008US20080318069 Hard, Wear-Resistant Aluminum Nitride Based Coating
12/25/2008US20080318013 Hard films, multilayer hard films, and production methods thereof
12/25/2008US20080317993 Ag base alloy thin film and sputtering target for forming ag base alloy thin film
12/25/2008US20080317969 Method of manufacturing magnetic head for perpendicular magnetic recording
12/25/2008US20080317968 Tilted plasma doping
12/25/2008US20080317965 Plasma processing apparatus and method
12/25/2008US20080316628 Density filter, method of forming the density filter and apparatus thereof
12/25/2008US20080315763 Organic optoelectronic component
12/25/2008US20080315127 Ion Implanter Operating in Pulsed Plasma Mode
12/25/2008US20080314743 Shadow mask
12/25/2008US20080314737 Methods of Making Molybdenium Titanium Sputtering Plates and Targets
12/25/2008US20080314736 Filled-gap magnetic recording head and method of making
12/25/2008US20080314735 Reactive Multilayer Joining To Control Thermal Stress
12/24/2008WO2008156794A2 Sputtering target having increased life and sputtering uniformity
12/24/2008WO2008156762A1 Sealing technique and hermetically sealed device
12/24/2008WO2008156029A1 Process for producing semiconductor device, insulating film for semiconductor device, and apparatus for producing the insulating film
12/24/2008WO2008155087A2 Plasma reactor, and method for the production of monocrystalline diamond layers
12/24/2008WO2008155051A1 Pdv method and pdv device for producing low friction, wear resistant, functional coatings, and coatings produced therewith
12/24/2008WO2008154770A1 Method for forming a colorful coating on a transparent plastic article
12/24/2008WO2008133752A9 Nanoscale oxide coatings
12/24/2008EP2006413A1 Coated cemented carbide for die and mould applications
12/24/2008EP2006412A1 Sputtering target and process for producing the same, thin film for optical information recording medium and process for producing the same
12/24/2008EP2006411A1 Evaporation apparatus having a rotatable evaporation unit receptacle
12/24/2008EP1794346A4 Apparatus and method for depositing a material on a substrate
12/24/2008EP0972851B1 Sliding member having chromium nitride film formed thereon
12/24/2008DE202008013163U1 Substrat Carrier aus CFC (Carbonfiber) für Siliziumwafer Substrate carrier from CFC (Carbon Fiber) for silicon wafers
12/24/2008DE112006003537T5 Sputtertargetaufbau Sputtering target
12/24/2008DE102007058356A1 PVD-Verfahren und PVD-Vorrichtung zur Erzeugung von reibungsarmen, verschleißbeständigen Funktionsschichten und damit hergestellte Beschichtungen PVD process and PVD apparatus for producing low-friction, wear-resistant functional layers and coatings prepared therewith
12/24/2008DE102007028986A1 Method for production of thin-walled endless belt for devices for processing flat material layer, involves forming endless belt smoothly on surface by laying material layer with material laying unit
12/24/2008CN201169622Y Substrate carrier with insulated function
12/24/2008CN201169621Y Support for vacuum plating furnace
12/24/2008CN201169620Y Arc ion source reinforced magnetron sputtering apparatus
12/24/2008CN201169619Y Apparatus for rapidly preparing gallium nitride thin film
12/24/2008CN201169618Y Covering type easy-to-wash electrode of vacuum aluminum plating machine evaporation boat
12/24/2008CN201169617Y Chucking appliance performing vacuum coating and spray painting for lock body
12/24/2008CN201169616Y Chucking appliance performing vacuum coating and spray painting for lock body
12/24/2008CN201169615Y Chucking appliance performing vacuum coating and spray painting for lock body
12/24/2008CN101331095A Sintered body for vacuum vapor deposition
12/24/2008CN101329495A Window for protecting mobile phone camera and manufacture method thereof
12/24/2008CN101329419A Diffraction grid component and manufacturing method thereof
12/24/2008CN101328576A Vacuum film coating equipment and atmosphere turntable therefor
12/24/2008CN101328575A Bearing device for sputtering
12/24/2008CN101328574A Preparation of high film substrate bond strength photocatalysis TiO2 film
12/24/2008CN101328573A Sputtering target and the production method thereof
12/24/2008CN101328572A High resistance transparent conductive film, transparent conductive film substrate and preparation thereof
12/24/2008CN101328571A Auxiliary jig for physical vapour deposition apparatus and maintenance method thereof
12/24/2008CN101328065A Preparation of vitrified Ta2O5-TiO2 composite metal oxide vapor deposition material
12/24/2008CN101327710A Method for decorating surface of metal
12/24/2008CN101327524A Carbide blade for parting, grooving and threading
12/24/2008CN101327523A Fine grained cemented carbide for turning in heat resistant super alloys (HRSA) and stainless steels
12/24/2008CN100446642C Housing and making method
12/24/2008CN100446300C Film formation source, film formation apparatus, film formation method, organic EL panel, and method of manufacturing organic EL panel
12/24/2008CN100446102C Silver alloy sputtering target for forming reflection layer of optical recording medium
12/24/2008CN100446101C Silver alloy sputterig target for forming reflective layer of optical recording medium
12/24/2008CN100445421C Sputter ion pump
12/24/2008CN100445420C Hafnium alloy target and process for producing the same
12/24/2008CN100445419C Ta sputtering target and method for preparation thereof
12/24/2008CN100445418C Sputtering target and optical recording medium
12/24/2008CN100445417C Production method of cobalt base alloy target for vertical magnetic recording medium soft magnetization bottom
12/23/2008US7468328 Method for producing patterned thin films
12/23/2008US7468110 Hollow cathode target and methods of making same
12/23/2008US7467741 Method of forming a sputtering target assembly and assembly made therefrom
12/23/2008US7467447 Method of manufacturing a SAW device
12/23/2008CA2400407C Tumble coater
12/18/2008WO2008154397A1 Rotatable magnetron sputtering with axially moveable target electrode tube
12/18/2008WO2008153843A1 Method for eliminating defects from semiconductor materials
12/18/2008WO2008153690A1 High rate sputtering apparatus and method
12/18/2008WO2008152981A1 Process management system
12/18/2008WO2008152663A1 Machine for controlled deposition of a thin-film multilayer
12/18/2008WO2008152150A1 Production of adjustment structures for a structured layer deposition on a microsystem technology wager
12/18/2008WO2008152135A1 Multitarget sputter source and method for the deposition of multi-layers
12/18/2008WO2008152104A1 Piston ring
12/18/2008WO2008151603A2 Transparent planar material for architectural purposes
12/18/2008WO2008151335A1 Apparatus for the production of plasma or radicals by means of microwaves
12/18/2008WO2008104169A9 Method and apparatus for the treatment of strip-shaped substrate in a vacuum coating system
12/18/2008WO2008058412A3 Coated threadlike object with improved electrical conductance and/or improved optical reflection and device for treating the surface of a threadlike object
12/18/2008US20080312748 Process for forming a ceramic layer
12/18/2008US20080311435 Gas diffusion electrodes, membrane-electrode assemblies and method for the production thereof
12/18/2008US20080311345 Coating With Carbon Nitride and Carbon Nitride Coated Product
12/18/2008US20080311314 Multiple tools using a single data processing unit
12/18/2008US20080311310 DLC Coating System and Process and Apparatus for Making Coating System
12/18/2008US20080311296 Organic vapor phase deposition (OVPD) uses carrier gas to transport organic vapors into deposition chamber, where molecules diffuse across a boundary layer and physisorb on the substrate, patterned deposition without shadow mask; controlled separation; sharp-edged pixels with a resolution of 1 mu m
12/18/2008US20080311283 Method of Inspecting and Manufacturing an Integrated Circuit
12/18/2008US20080309223 Sputtering target, sintered article, conductive film fabricated by utilizing the same, organic el device, and substrate for use therein
12/18/2008US20080308774 Sputtering Target, Transparent Conductive Film, and Their Manufacturing Method
12/18/2008US20080308417 Sputtering Apparatus
12/18/2008US20080308416 Sputtering target having increased life and sputtering uniformity
12/18/2008US20080308412 Multitarget sputter source and method for the deposition of multi-layers
12/18/2008US20080308411 Method and process for deposition of textured zinc oxide thin films
12/18/2008US20080308410 Redundant Anode Sputtering Method and Assembly
12/18/2008US20080308145 Front electrode including transparent conductive coating on etched glass substrate for use in photovoltaic device and method of making same
12/18/2008DE19924174B4 Verbundwerkstoff Composite material
12/18/2008DE112006003471T5 Feststoffteilchenerosionsbeständige oberflächenbehandelte Beschichtung und damit behandelte rotierende Maschine Feststoffteilchenerosionsbeständige surface-treated coating and thus treated rotating machine
12/18/2008DE102007027271A1 Transparentes Flächenmaterial für architektonische Zwecke Transparent surface material for architectural purposes
12/18/2008CA2680551A1 Method for eliminating defects from semiconductor materials
12/17/2008EP2003662A1 Method for manufacturing rare earth permanent magnet