Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
03/2009
03/19/2009US20090075109 Silver alloy reflective films for optical information recording media, silver alloy sputtering targets therefor, and optical information recording media
03/19/2009US20090075069 Low-Maintenance Coatings, and Methods for Producing Low-Maintenance Coatings
03/19/2009US20090075067 including thickness film comprising titania, includes tungsten oxide; low visible reflection, color neutrality, improved photoactivity levels, hydrophilicity, and/or activation ability; durable, stable, and resistant to haze formation during tempering or other heat treatments
03/19/2009US20090075024 Method for producing a thermal barrier coating and thermal barrier coating for a component part
03/19/2009US20090075023 Method for producing thermal barrier coating and a thermal barrier coating
03/19/2009US20090074952 Fabrication System and a Fabrication Method of a Light Emitting Device
03/19/2009US20090074521 Insert for Milling of Cast Iron
03/19/2009US20090071934 Crystalline aluminum oxide layers having increased energy band gap, charge trap layer devices including crystalline aluminum oxide layers, and methods of manufacturing the same
03/19/2009US20090071835 Alleviation of voltage delay in lithium-liquid depolarizer/electrolyte solvent battery cells
03/19/2009US20090071822 Alloy and Sputtering Target Material for Soft-Magnetic Film Layer in Perpendicular Magnetic Recording Medium, and Method for Producing the Same
03/19/2009US20090071821 Sb-Te Alloy Powder for Sintering, Sintered Compact Sputtering Target Obtained by Sintering said Powder, and Manufacturing Method of Sb-Te Alloy Powder for Sintering
03/19/2009US20090071818 Film deposition apparatus and method of film deposition
03/19/2009US20090071605 Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor
03/19/2009US20090071402 Metal film vapor phase deposition method and vapor phase deposition apparatus
03/19/2009US20090071367 Coating compositions for marking substrates
03/19/2009DE102007044653A1 Direct laser engraving of metal sheet on metal carrier, for rotogravure printing, employs sheet made from surface-treated copper or brass alloy
03/19/2009CA2664369A1 Low-maintenance coatings, and methods for producing low-maintenance coatings
03/19/2009CA2664368A1 Low-maintenance coating technology
03/18/2009EP2037512A1 Method of manufacturing magneto-resistive device and apparatus for manufacturing the same
03/18/2009EP2037004A1 Cutting tool and method for manufacturing a cutting tool
03/18/2009EP2037001A1 Take up type vacuum vapor deposition device
03/18/2009EP2037000A2 A method and apparatus for depositing a coating onto a substrate
03/18/2009EP2036999A1 Method for manufacturing a heat insulation layer and heat insulation layer
03/18/2009EP2036998A1 Method for producing a multilayer coating and device for carrying out said method
03/18/2009EP2036997A1 Coated cemented carbide cutting tool inserts
03/18/2009EP2036996A1 Method for determining process parameters in a plasma-assisted process for treating surfaces
03/18/2009EP2036716A1 A laminate and composite layer comprising a substrate and a coating, and a process for preparation thereof
03/18/2009EP2036657A2 Method of repairing a turbine engine component
03/18/2009EP2036113A1 Method for controlling a reactive high-power pulsed magnetron sputter process and corresponding device
03/18/2009EP2000296A9 Transparent barrier sheet and production method of transparent barrier sheet
03/18/2009EP1210723B1 Shaped and low density focused ion beams
03/18/2009CN201210754Y Positive temperature coefficient thermistor heater
03/18/2009CN201209166Y Improved magnet sputtering cylinder target
03/18/2009CN201209165Y Baffle heat distortion compensation mechanism for VFD double-faced vacuum film coating equipment
03/18/2009CN201209164Y Baffle mechanism for VFD double-faced vacuum film coating equipment
03/18/2009CN201209163Y Evacuating device for splash plating machine vacuum cavity
03/18/2009CN201209162Y Modular vacuum apparatus
03/18/2009CN101390450A Film forming apparatus and method for manufacturing light emitting element
03/18/2009CN101389784A Sintered sputtering target made of high-melting metals
03/18/2009CN101389441A Coating on a plastic substrate and a coated plastic product
03/18/2009CN101389440A Coating with carbon nitride and carbon nitride coated product
03/18/2009CN101389439A Solar cell and an arrangement and a method for producing a solar cell
03/18/2009CN101388371A Semiconductor device, display device and manufacture method thereof
03/18/2009CN101388261A Thin-film electrolyte and preparation thereof
03/18/2009CN101386984A Double-frequency tunable magnetic resonance artificial compound material based on asymmetric metal grating structure
03/18/2009CN101386976A Technique for magnetron sputtering TiN film on magnesium alloy surface
03/18/2009CN101386975A Sputtering, depositing split cavity type vacuum film deposition apparatus and working method thereof
03/18/2009CN101386974A Target material for preparing TFT LCD electrode film and target material and electrode film preparation method
03/18/2009CN101386973A Method of forming a carbon polymer film using plasma cvd
03/18/2009CN101386972A Abrasion-proof physical vapor deposition coating on gold-silver coin die surface and preparation method
03/18/2009CN100470752C Apparatus for processing substrate
03/18/2009CN100470269C ND filter and aperture diaphragm apparatus
03/18/2009CN100470039C Method for manufacturing wearable side for ladder-shaped ring for internal combustion engine
03/18/2009CN100469944C Thin film forming method, optical film, polarizing film and image display
03/18/2009CN100469941C Method for protecting articles from damage of high temperature and oxidation enviroment, and related compositions
03/18/2009CN100469940C Preparation process of metal oxide film
03/18/2009CN100469925C Nickel-base alloy material for semiconductor
03/17/2009US7505565 Method for making a light weight high performance target
03/17/2009US7504351 Inhibiting generation of arcing in sputtering process of forming transparent electrode film, suppressing generation of defects caused by arcing, and reducing formation of nodules and abnormal discharge; density of 7.12 g/cm3 or greater; no particle having diameter of 10 nm or greater exposed on surface
03/17/2009US7504182 Scanning beam of metallic ions over defect to dope to reducing transparency; implanting gallium atoms to reduce transmission and quartz can be etched
03/17/2009US7504136 Method and system for forming a film of material using plasmon assisted chemical reactions
03/17/2009US7504135 Method of fabricating a manganese diffusion barrier
03/17/2009US7504126 Plasma display panel manufacturing method for improving discharge characteristics
03/17/2009US7504011 sputtering target comprising an outer target tube, an inner support tube supporting a magnet carrier extending along substantially the entire length of the inner support tube; and a water cooling circuit including at least one passageway within the inner support tube with an inlet at one end thereof
03/17/2009US7504008 prevent contamination from the environment by electrocoating a metal/alloy protective coatings; using electrical arc to melt a metall wire, injecting a pressurized gas to direct the liquefied metal toward the surface to splatter; integrated circuit chips and displays
03/17/2009US7504007 thin soft magnetic film combines a high magnetization with an insulating character. The film is formed by nitriding Fe-rich ferromagnetic nanograins immersed in an amorphous substrate. A selective oxidation of the amorphous substrate is then performed.
03/17/2009US7504006 To sputter depositing a liner material such as tantalum or tantalum nitride, by combining long-throw sputtering, self-ionized plasma sputtering and capacitively-coupled plasma resputtering in one chamber
03/17/2009US7503980 Substrate supporting apparatus
03/12/2009WO2009032021A2 Electroplating on roll-to-roll flexible solar cell substrates
03/12/2009WO2009031958A1 Coated drill and a method of making the same
03/12/2009WO2009031670A1 Sputtering target for forming zro2-in2o3 optical recording medium protective film
03/12/2009WO2009031399A1 Transparent conductive film and method for producing transparent conductive film
03/12/2009WO2009031276A1 Iii nitride structure and method for manufacturing iii nitride semiconductor fine columnar crystal
03/12/2009WO2009031232A1 Sputtering method and system
03/12/2009WO2009030438A2 Coated engine component for a gas turbine
03/12/2009WO2009030374A1 Method for producing a metal rear contact of a semiconductor element, particularly a solar cell
03/12/2009WO2009030149A1 Metallic-base antiseptic patch, its preformed body, its preparing method using magnetron sputtering and its use
03/12/2009WO2008102062A3 Method and arrangement for photon ablation of a target
03/12/2009US20090069172 Novel Platinum-Ruthenium Based Catalysts for Direct Methanol Fuel Cell
03/12/2009US20090068851 Susceptor, manufacturing apparatus for semiconductor device and manufacturing method for semiconductor device
03/12/2009US20090068845 Low contamination components for semiconductor processing apparatus and methods for making components
03/12/2009US20090068788 Method and device for producing electronic components
03/12/2009US20090068556 Battery-operated wireless-communication apparatus and method
03/12/2009US20090068503 Sputtering apparatus
03/12/2009US20090068500 Perpendicular magnetic recording medium and method of manufacturing the same
03/12/2009US20090068450 Method and Apparatus for Multi-Cathode PVD Coating and Substrate with PVD Coating
03/12/2009US20090068449 Method for manufacturing titanium dioxide thin film
03/12/2009US20090068434 Tantalum and Niobium Billets and Methods of Producing the Same
03/12/2009US20090068425 Decorated resin molded article and method for producing the same
03/12/2009US20090068355 Device and method for fabricating thin films by reactive evaporation
03/12/2009US20090068350 Method of making coated glass article using a monomeric material, and intermediate product used in same
03/12/2009US20090068082 Synthesis and characterization of a highly stable amorphous silicon hydride as the product of a catalytic hydrogen plasma reaction
03/12/2009US20090067031 Electrochemical system on a plastic substrate
03/12/2009US20090065746 producing a transparent electrically conductive film by sputtering under an inert gas atmosphere, using as a target a sintered body comprising Zn, Sn and O2, and thermally treating film under a reducing gas atmosphere at 300 degrees C. to 500 degrees C.
03/12/2009US20090065741 Apparatus and method for the application of a material layer to display devices
03/12/2009US20090065354 Sputtering targets comprising a novel manufacturing design, methods of production and uses thereof
03/12/2009US20090065351 Method and apparatus for deposition
03/12/2009US20090065350 Filtered cathodic arc deposition with ion-species-selective bias
03/12/2009US20090065349 Plasma Vapor Deposition
03/12/2009US20090065348 Method of arc ion plating and target for use therein