Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
10/2008
10/09/2008US20080245656 Silicon; controlling crystal structure, molecular orientation, thickness
10/09/2008US20080245446 Protective Layer for an Aluminum-Containing Alloy for High-Temperature Use
10/09/2008US20080245295 Device for the continuous coating of a strip-like substrate
10/09/2008US20080245294 Rack
10/09/2008DE20221864U1 Substrat beschichtet mit einem Schichtsystem A substrate coated with a layer system
10/09/2008DE112006003106T5 Target für Sputtern Target for sputtering
10/09/2008CA2682368A1 Coating
10/08/2008EP1978570A1 Increasing the lateral resolution of organic vapor jet deposition by using a confining guard flow
10/08/2008EP1978516A1 Recording film for use in optical information recording medium, optical information recording medium, and sputtering target
10/08/2008EP1978400A1 Laminated structure, and electrode for electric circuit using the same
10/08/2008EP1978127A1 Spattering device and film forming method
10/08/2008EP1978126A1 Apparatus for continuous coating of a strip substrate
10/08/2008EP1977025A1 Two-dimensional aperture array for vapor deposition
10/08/2008EP1977024A1 Rotatable aperture mask assembly and deposition system
10/08/2008EP1976793A2 Method for making nanostructures with chromonics
10/08/2008EP1602746B1 Sputtering target and process for producing the same, thin film for optical information recording medium and process for producing the same
10/08/2008EP1581963B1 Mid span support for a magnetic array of a cylindrical magnetron sputter device
10/08/2008EP1349682B1 Low temperature sputter target/backing plate joining technique and assemblies made thereby
10/08/2008EP1171901B1 Multi-column fib for nanofabrication applications
10/08/2008CN201128757Y Flattening device for vacuum aluminum plating machine
10/08/2008CN201128756Y Substrate holder for vacuum coating vapour deposition process
10/08/2008CN201128755Y Vapor deposition apparatus for coiled vapor deposition machine
10/08/2008CN101283122A ZnO crystal, method for growing the crystal, and method for manufacture of light-emitting element
10/08/2008CN101283114A Magnetron sputtering apparatus
10/08/2008CN101283113A Sputtering target made of multi-component alloys and production method
10/08/2008CN101283112A Low-voltage inductively coupled source for plasma processing
10/08/2008CN101281913A Display device and sputtering target for producing the same
10/08/2008CN101281884A Method for preparing SiOx thin film for silicon base photoelectricity integrated device
10/08/2008CN101280421A Multi-station bearing magnetron sputtering coating device
10/08/2008CN101280420A Magnetron sputtering target having magnetic field enhancing and adjusting functions
10/08/2008CN101280419A Method for manufacturing liquid crystal alignment film by long-throw sputtering
10/08/2008CN101280418A Multi-source vacuum evaporation device having multi-layer radial type evaporation source distribution structure
10/08/2008CN101280417A Apparatus for vapor plating of organic electroluminescent device
10/08/2008CN101280416A Plasma oxidation device for preparing alpha-Al2O3 coating on surface of steel/aluminum composite pipe
10/08/2008CN101280415A Nickel plating method for surface of silicon nanowires
10/08/2008CN101280414A ZnO: Bi photoemissive thin film and preparation thereof
10/08/2008CN101280413A Low temperature deposition method of hypovanadic oxide thin film on glass
10/08/2008CN101280412A Aluminum nitride piezoelectric film and preparation thereof
10/08/2008CN101280411A Mask frame assembly for thin film deposition of flat panel display and depositing equipment of the same
10/08/2008CN101280154A Ultraviolet curing vacuum metallizing coating
10/08/2008CN100424834C Method for preparing good ohmic contact on thin film of cubic boron nitride
10/08/2008CN100424825C Method for making the growth ZnO thin film material with the covariant underlay
10/08/2008CN100424820C A technique to generate mixed allotropic structure of VO2 film on Si base
10/08/2008CN100424819C A method for orientation growth of VO2 film of pulse laser deposition Si base
10/08/2008CN100424814C Vacuum processing device
10/08/2008CN100424586C Pattern formation method and device, electric sensitive element and colour filter producing method
10/08/2008CN100424225C Manufacturing method of colored diamond by ion implantation and heat treatment
10/08/2008CN100424224C Reaction and magnetically controlled sputtering process of preparing hard nanometer layered TiN/SiO2 coating
10/08/2008CN100424223C Reinforcement method of electric spark on surface of copper or copper alloy
10/08/2008CN100424222C Method for preparing thin film material of binary rare earth compounds
10/08/2008CN100424221C Production of hafnium nitride thin-membrane materials from ion beam epitaxial growth apparatus
10/08/2008CN100424220C Production of zirconium nitride thin-membrane materials from ion beam epitaxial growth apparatus
10/07/2008USRE40531 Ultrabarrier substrates
10/07/2008US7433655 Battery-operated wireless-communication apparatus and method
10/07/2008US7432116 Method and apparatus for film deposition
10/07/2008US7432024 For semiconductors, microelectronic and microelectromechanical devices, and microfluidic and photonic devices; eliminating image distorting charging effects during electron beam patterning of the template and charging effects during scanning electron microscope inspection
10/07/2008US7431967 Limited thermal budget formation of PMD layers
10/07/2008US7431808 Sputter target based on titanium dioxide
10/07/2008US7431807 Evaporation method using infrared guiding heater
10/07/2008US7431782 Tantalum metal having a purity of at least about 99.995%, and an average grain size of about 150 microns or less; useful as a sputtering target and its use in electrical components such as capacitors
10/07/2008US7431195 Method for centering a sputter target onto a backing plate and the assembly thereof
10/07/2008CA2466715C Heat treatable coated article with anti-migration barrier between dielectric and solar control layer portion, and methods of making same
10/07/2008CA2443843C Heat treatable coated articles with anti-migration barrier layer between dielectric and solar control layers, and methods of making same
10/02/2008WO2008118683A1 Electrostatic chuck with separated electrodes
10/02/2008WO2008118533A2 A method for depositing crystalline titania nanoparticles and films
10/02/2008WO2008117810A1 Noncrystalline oxide semiconductor thin film, process for producing the noncrystalline oxide semiconductor thin film, process for producing thin-film transistor, field-effect transistor, light emitting device, display device, and sputtering target
10/02/2008WO2008117706A1 Al-ni-b alloy sputtering target
10/02/2008WO2008117690A1 Evaporation source, vapor deposition apparatus and method of film formation
10/02/2008WO2008117482A1 Part of vacuum film forming apparatus and vacuum film forming apparatus
10/02/2008WO2008116617A1 Device for vacuum deposition of a coating on a continuous material, with liquid applicator
10/02/2008WO2007149545A3 Metal binary and ternary compounds produced by cathodic arc deposition
10/02/2008WO2007136777A3 Wear resistant coating
10/02/2008US20080243293 Fabrication system and fabrication method
10/02/2008US20080242087 Magnetron sputtering apparatus and method for manufacturing semiconductor device
10/02/2008US20080241587 Ejection of electroluminescence gas; multipipe system; evaporation; transportation gas flow
10/02/2008US20080241583 High Chromium Ferritic Steel With 0.5 Atomic % Hafnium, Part Of Which Is Ion Implanted
10/02/2008US20080241425 System and method to reduce redeposition of ablated material
10/02/2008US20080241363 Desirable piezoelectric elements are manufactured by an epitaxial growth method or an oriented growth method such as sputtering; increases resolution and raises printing speed by using multiple-nozzle head structure
10/02/2008US20080241357 Method for heating a substrate prior to a vapor deposition process
10/02/2008US20080237919 Method and apparatus for membrane deposition
10/02/2008US20080237540 Methods for encapsulating nanocrystals
10/02/2008US20080237224 Microwave Chamber
10/02/2008US20080237049 Ion-implanted electroformed structural material and method of producing the structural material
10/02/2008US20080237034 Processes for forming transparent conductive films
10/02/2008US20080237033 Coatings for osteointegration of surgical prosthesis are made in an Ion Plating Plasma Assisted plant, with a "reactive Magnetron sputtering" source, having a vacuum chamber, sputtering source, for instance a Magnetron, a vacuum connection to pumping group, plasma, for instance DC, process gases input
10/02/2008US20080237032 Method of applying a burnable poison onto the exterior of nuclear rod cladding
10/02/2008US20080237029 Forming a layer of ruthenium tantalum oxide on a sidewall of hole performed by sputtering a target comprising ruthenium tantalum; vertical interconnect structure
10/02/2008US20080236738 Bonded sputtering target and methods of manufacture
10/02/2008US20080236665 Method for Rapid Liquid Phase Deposition of Crystalline Si Thin Films on Large Glass Substrates for Solar Cell Applications
10/02/2008US20080236496 Vacuum evaporation apparatus
10/02/2008US20080236481 Method of and apparatus for monitoring mass flow rate of lubricant vapor forming lubricant coatings of magnetic disks
10/02/2008US20080236479 Susceptor for semiconductor manufacturing apparatus
10/02/2008US20080236478 Device for vacuum deposition of a coating on a continuous material, with liquid applicator
10/02/2008DE102007016029A1 Holding arrangement used in a CVD or a PVD installation comprises a holder having a section made from a dielectric material which is in contact with the substrate during a deposition process
10/02/2008DE102007015587A1 Anti-wear coating for rotating cutting tools, e.g. drills, comprises nitrides of chromium, titanium and aluminum, coating being made smoother by reducing the number of microdroplets in it
10/02/2008DE102007015358A1 Schichtsystem für einen Elektrolyten einer Hochtemperatur-Brennstoffzelle sowie Verfahren zur Herstellung desselben The same coating system for an electrolyte of a high temperature fuel cell and methods for preparing
10/01/2008EP1976022A2 Method and device for producing an anti-reflection or passivation layer for solar cells
10/01/2008EP1975928A2 Method of and apparatus for substantially preventing condensation on surfaces of a flow path for lubricant vapor flowing to a magnetic disk to form a lubricant coating on the disk
10/01/2008EP1975927A2 Apparatus for and method of applying lubricant coatings to magnetic disk via a vapor flow path including a selectively opened and closed shutter
10/01/2008EP1975926A2 Method of and apparatus for monitoring flow of lubricant vapor forming lubricant coatings of magnetic disks
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