Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
04/2009
04/07/2009US7514185 Forming a light-absorbing film on a transparent substrate, and irradiating the light-absorbing film with light from a flash lamp; flatness
04/07/2009US7514037 Reflective film; optical recording media; backing for liquid crystal display; electromagnetic shield
04/07/2009US7514015 Method for surface cleaning
04/07/2009US7513982 Two dimensional magnetron scanning for flat panel sputtering
04/07/2009US7513981 Manufacturing apparatus of semiconductor device
04/02/2009WO2009042484A1 Method for directional deposition using a gas cluster ion beam
04/02/2009WO2009041694A1 ZnO VAPOR DEPOSITION MATERIAL, PROCESS FOR PRODUCING THE SAME, AND ZnO FILM
04/02/2009WO2009041631A1 Zno semiconductor and zno semiconductor element
04/02/2009WO2009041529A1 Reflective film, reflective film laminate, led, organic el display, and organic el illuminating device
04/02/2009WO2009041412A1 Cemented carbide tool for fine machining
04/02/2009WO2009041399A1 Cr-mn-b sputtering target member for producing base film of magnetic recording medium, and thin film produced by using the same
04/02/2009WO2009041398A1 Ni-w-b sputtering target member for producing intermediate layer film of perpendicular magnetic recording medium, and thin film produced by using the same
04/02/2009WO2009041344A1 Method for controlling film forming apparatus, film forming method, film forming apparatus, organic el electronic device and storage medium having program for controlling film forming apparatus stored therein
04/02/2009WO2009041239A1 Thin nickel film, method for formation of the thin nickel film, ferromagnetic nano-junction element, process for producing the ferromagnetic nano-junction element, thin metallic wire, and process for producing the thin metallic wire
04/02/2009WO2009040972A1 Sheet plasma film forming apparatus
04/02/2009WO2009040964A1 Sheet plasma deposition device and deposition method using the same
04/02/2009WO2009040892A1 Magnet assembly capable of generating magnetic field whose direction is uniform and changeable and sputtering device using same
04/02/2009WO2009014398A3 Multipurpose carrier of vacuum vapor deposition material and method thereof
04/02/2009WO2008060917A3 Methods for making sputtering targets
04/02/2009WO2007145801A3 Method and apparatus to detect fault conditions of a plasma processing reactor
04/02/2009US20090088325 High performance electrical, magnetic, electromagnetic and electrooptical devices enabled by three dimensionally ordered nanodots and nanorods
04/02/2009US20090087936 Deposition method of iii group nitride compound semiconductor laminated structure
04/02/2009US20090087677 Amorphous Aluminum Alloy Coatings
04/02/2009US20090087673 Method for coating fuel system components
04/02/2009US20090087663 Free-standing metallic micromechanical structure, method of manufacturing the same, resonator structure using the same, and method of manufacturing a resonator structure using the same
04/02/2009US20090087579 Method for directional deposition using a gas cluster ion beam
04/02/2009US20090087578 Method for depositing films using gas cluster ion beam processing
04/02/2009US20090087577 Method to improve electrical leakage performance and to minimize electromigration in semiconductor devices
04/02/2009US20090087572 Gas turbines; intermetallics comprised of aluminum, nickel, and platinum; vapor deposition; heat treatment; electrodeposition
04/02/2009US20090087567 Method of fabricating one-dimensional metallic nanostructure
04/02/2009US20090087543 Templated growth of graphenic materials
04/02/2009US20090086920 X-ray Target Manufactured Using Electroforming Process
04/02/2009US20090085172 Deposition Method, Deposition Apparatus, Computer Readable Medium, and Semiconductor Device
04/02/2009US20090085014 Containing an element at 1-10 atomic % which has a smaller ion radius than zinc and serves as an n-type dopant where the nitrogen is contained as gallium nitride; low resistivity; indium-free; cost efficiency; industrial scale; environmentally friendly
04/02/2009US20090084757 Uniformity control for ion beam assisted etching
04/02/2009US20090084672 Method and system for adjusting beam dimension for high-gradient location specific processing
04/02/2009US20090084671 Sputtering apparatus
04/02/2009US20090084670 Light Emitting Diode Vacuum Coating by Magnetized Mask
04/02/2009US20090084500 Processing apparatus, exhaust processing process and plasma processing process
04/02/2009US20090084421 Thermoelectric devices
04/02/2009DE112005002056T5 Filmformungsvorrichtung Film forming apparatus
04/02/2009DE102007045862A1 Process for applying molybdenum-containing coatings to substrates comprises passing them through vacuum chamber and then through deposition chamber where gaseous coating material is produced by bombardment of solid with electron beam
04/02/2009DE102007045289A1 Small evaporation boat for evaporation of flexible substrates with metals includes electrically conductive ceramic material useful for evaporation of flexible substrates gives uniform spray-free coating with substrate
04/02/2009DE102007044651A1 Rohrsputtertarget mit grabenförmig strukturierter Außenfläche des Trägerrohres Pipe sputtering target with grave-patterned exterior surface of the support tube
04/02/2009DE102007043943A1 Dynamic coating of substrates with doped layers of silicon and/or germanium in vacuum coating chamber, comprises transferring the substrate into the chamber by transport system and over evaporation source with the coating material
04/02/2009DE102007043791A1 Verfahren zur Herstellung einer Wärmedämmschicht und Wärmedämmschicht A process for producing a thermal barrier coating and thermal barrier coating
04/02/2009DE102006043036B4 Verfahren zur Modifizierung von Innenoberflächen A method for the modification of internal surfaces
04/02/2009DE102004014323B4 Verfahren und Anordnung zur Herstellung von Gradientenschichten oder Schichtenfolgen durch physikalische Vakuumzerstäubung Method and apparatus for the production of gradient layers or layer sequences by physical sputtering
04/01/2009EP2043097A1 Silver alloy reflective film, and optical information recording medium using the same
04/01/2009EP2042261A2 Method of making a coated cutting tool
04/01/2009EP2041331A1 Method for depositing electrically insulating layers
04/01/2009EP1727643A4 Method of making sputtering target
04/01/2009EP1529124B1 Method for obtaining a thin, stabilized fluorine-doped silica layer, resulting coated substrat and ophthalmic lensoptics thus obtained
04/01/2009EP1480209B1 Method for producing a sputtering target
04/01/2009EP1185720B1 Pvd al2o3 coated cutting tool
04/01/2009CN201214679Y Physical vapor deposition apparatus and related protecting cover member
04/01/2009CN201214678Y Vacuum chamber protection device for splash plating machine
04/01/2009CN101401191A Methods of implanting ions and ion sources used for same
04/01/2009CN101401169A Transparent conductive film and method for production thereof
04/01/2009CN101400824A Technique for depositing metallic films using ion implantation surface modification for catalysis of electroless deposition
04/01/2009CN101400820A Method for producing a thermal barrier coating and thermal barrier coating for a component part
04/01/2009CN101400784A Biocompatible transparent sheet, method of producing the same and cell sheet
04/01/2009CN101400465A Surface-coated tool
04/01/2009CN101399333A Producing method for lithium negative pole of metal lithium secondary cell
04/01/2009CN101398123A WS2/MoS2 solid lubrication multilayer film and method for making same
04/01/2009CN101397665A Method for forming colorful decoration film on metal surface
04/01/2009CN101397650A Target structure and target holding apparatus
04/01/2009CN101397649A Deposition device for manufacturing organic compound on substrate
04/01/2009CN101397648A Amorphous niobium metal oxide film and heat oxidation evaporation coating technique thereof
04/01/2009CN101397647A Cu-In-Ga-Se or Cu-In-Al-Se solar cell absorption layer target material and preparation method thereof
04/01/2009CN101397520A 3Cr13//FeS composite solid lubrication film and preparation method thereof
04/01/2009CN101396891A Plastics products and preparation method thereof
04/01/2009CN101396890A Plastics products and preparation method thereof
04/01/2009CN100474993C Method for fabricating organic EL element and method for cleaning equipment for fabricating organic EL element
04/01/2009CN100473761C Titanium product with improved corrosion resistant property
04/01/2009CN100473756C Target designs and related methods for enhancing cooling and reducing deflection and deformation
04/01/2009CN100473755C Film forming equipment and method
04/01/2009CN100473754C Method for obtaining a thin, stabilized fluorine-doped silica layer, resulting thin layer and use thereof in ophthalmic optics
04/01/2009CN100473753C Sputter deposition process for electroluminescent phosphors
04/01/2009CN100473752C Surface treatment method
04/01/2009CN100473483C Surface-coated cermet cutting tool
03/2009
03/31/2009US7510788 Perpendicular magnetic recording medium utilizing a first cobalt magnetic layer and a second Pd-SiOx layer and method of manufacturing same
03/31/2009US7510786 a layer of titanium oxide is sputter deposited on a substrate; and thereafter an ion source(s) using a high voltage is used to implant carbon (C) ions with high energy into the titanium oxide so as to form a layer comprising titanium oxycarbide
03/31/2009US7510780 Structured material, magnetic recording medium utilizing the same, and magnetic recording/reproducing apparatus
03/31/2009US7510779 Low-sulfur article having a platinum aluminide protective layer and its preparation
03/31/2009US7510635 subjecting a raw material such as Zn-containing scrap to acid leaching or electrolytic extraction, performing solvent extraction and activated carbon treatment thereto in order to remove impurities, neutralizing with an alkaline solution to obtain zinc hydroxide, and firing
03/31/2009US7510634 Apparatus and methods for deposition and/or etch selectivity
03/31/2009US7510608 outstanding high-temperature characteristics; chemical vapor deposition or physical vapor deposition; nitride (CrAlN) or carbonitride (CrAlCN) of CrAl is properly combined with Zr or Hf
03/31/2009US7510582 Method of fabricating thin film battery with annealed substrate
03/31/2009US7509734 Repairing turbine element
03/26/2009WO2009039261A1 Method and apparatus for surface processing of a substrate using an energetic particle beam
03/26/2009WO2009038532A1 Method of producing a layer by arc-evaporation from ceramic cathodes
03/26/2009WO2009038151A1 Ornament parts
03/26/2009WO2009038116A1 Radio-wave-transmitting decorative member
03/26/2009WO2009038094A1 Solar battery manufacturing method
03/26/2009WO2009038091A1 Solar battery manufacturing method
03/26/2009WO2009038085A1 Thin film forming apparatus, film thickness measuring method and film thickness sensor
03/26/2009WO2009038011A1 Load lock device and vacuum processing system
03/26/2009WO2009037776A1 Hard laminated coating, hard laminated coating provided tool and method of providing coating
03/26/2009WO2009037734A1 Photoelectric conversion apparatus and method for manufacturing the same