Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
11/2008
11/06/2008WO2008134204A1 Thin film semiconductor material produced through reactive sputtering of zinc target using nitrogen gases
11/06/2008WO2008133876A2 Cooling shield for substrate processing chamber
11/06/2008WO2008133752A2 Nanoscale oxide coatings
11/06/2008WO2008133360A1 Coated cemented carbide cutting tools and method for pre-treating and coating to produce cemented carbide cutting tools
11/06/2008WO2008133279A1 Optical component, method for producing optical component, illuminating device and furniture
11/06/2008WO2008133156A1 Conductive protective film and method for producing the same
11/06/2008WO2008133139A1 Dummy substrate, method for starting film forming apparatus using same, method for maintaining/changing film forming condition, and method for stopping apparatus
11/06/2008WO2008133088A1 Fluorine-containing polymer thin film and method for producing the same
11/06/2008WO2008133020A1 Optical information recording medium
11/06/2008WO2008132409A1 Oxynitride sputtering target
11/06/2008WO2008105736A3 Method, material and apparatus for enhancing dynamic stiffness
11/06/2008US20080274660 Electroluminescent display device, method for manufacturing the same, and electronic equipment
11/06/2008US20080274613 Method for the Protection of Openings in a Component During a Machining Process
11/06/2008US20080274369 Adhesion to silicon and/or silicon dioxide substrates; diffusion barriers; tantalum, titanium, zirconium, hafnium, vanadium, niobium, molybdenum and/or tungsten; lower electrical resistivity, chemical mechanical polishing compatibility with copper
11/06/2008US20080274336 High temperature insulation with enhanced abradability
11/06/2008US20080274288 Vacuum processing apparatus and method
11/06/2008US20080273933 Pvd-Coated Cutting Tool Insert
11/06/2008US20080272299 Probe System Comprising an Electric-Field-Aligned Probe Tip and Method for Fabricating the Same
11/06/2008US20080272181 Method for making nanostructured soldered or brazed joints with reactive multilayer foils
11/06/2008US20080271998 Device for Carbon Deposition
11/06/2008US20080271997 Sputter target and backing plate assembly
11/06/2008US20080271991 Apparatus and Method for Supercritical Fluid Removal or Deposition Processes
11/06/2008US20080271990 Co-sputtering in vacuum enclosure from two separate targets; forming lanthium aluminum oxide and aluminum oxide; improved dielectrics; miniaturized semiconductor transistors
11/06/2008US20080271989 Plating bath for plating copper onto surfaces; supplying solution unit; analyzing concentration unit
11/06/2008US20080271988 Thin Film Forming Sputtering Target, Dielectric Thin Film, Optical Disc and Production Method Therefor
11/06/2008US20080271779 Fine Grained, Non Banded, Refractory Metal Sputtering Targets with a Uniformly Random Crystallographic Orientation, Method for Making Such Film, and Thin Film Based Devices and Products Made Therefrom
11/06/2008US20080271308 Method of manufacturing a perpendicular magnetic write head having a wrap-around trailing shield and a concave trailing edge main pole
11/06/2008DE112005001859T5 Mehrlagenhartstoffbeschichtung und mit Mehrlagenhartstoffbeschichtung versehenes Werkzeug Multilayer coating of hard material and provided with multi-layer hard coating tool
11/06/2008DE102007020800A1 Modifizierte Multikanalstrukturen Modified multi-channel structures
11/06/2008CA2681875A1 Apparatuses and methods for cryogenic cooling in thermal surface treatment processes
11/05/2008EP1988190A2 Coated cutting tool
11/05/2008EP1988186A1 Multichamber vacuum deposition system
11/05/2008EP1986791A2 Drug delivery system and method of manufacturing thereof
11/05/2008EP1554913B1 Thin film phosphor for electroluminescent displays
11/05/2008EP1235945B1 Rotating magnet array and sputter source
11/05/2008CN201144281Y Close-packed tip anode for sputtering system
11/05/2008CN201144280Y Multi-station bearing magnetron sputtering device
11/05/2008CN201144279Y Highly-effective aluminum alloy target element
11/05/2008CN201144278Y Zinc-molybdenum damascene target for reactive direct current magnetron sputtering
11/05/2008CN201144277Y Vacuum aluminum film plating apparatus
11/05/2008CN201144276Y Plasma evaporation coater
11/05/2008CN101300658A Redundant anode sputtering method and system
11/05/2008CN101300657A Magnetically enhanced capacitive plasma source for ionized physical vapor deposition
11/05/2008CN101300374A Two-layer thermal barrier coating system containing a pyrochlore phase
11/05/2008CN101300372A Magnet structure for magnetron sputtering system, cathode electrode unit and magnetron sputtering system
11/05/2008CN101299910A Apparatus and method for coating of a plastic substrate
11/05/2008CN101299461A Method for preparing platinum ruthenium doping La series rare earth element polyphase catalysts
11/05/2008CN101299416A Substrate support, substrate processing device and method of placing a substrate
11/05/2008CN101298662A Apparatus for working and observing samples and method of working and observing cross sections
11/05/2008CN101298661A Infrared sensing structure for physical vapor deposition equipment
11/05/2008CN101298660A Manufacturing method of insulated heat-conducting metal substrate
11/05/2008CN101298659A Manufacturing method of insulation heat-conducting metal substrate
11/05/2008CN101298658A Sample automatic alternate plating control apparatus and method in organic vacuum film forming procedure
11/05/2008CN101298657A Method for preparing diamond-like film on TiNi alloy surface
11/05/2008CN101298656A Preparation of high-hardness diamond-like multi-layer film
11/05/2008CN101298655A Nano-stack TiN gradient film and preparation thereof
11/05/2008CN101298392A Decorative protective coating and synthetic method thereof
11/05/2008CN100431191C Tension mask assembly for vacuum deposition organic electrofluorescent device film
11/05/2008CN100431157C Oxide ferroelectric memory cell and prepn process
11/05/2008CN100431099C Method for directly preparing Cr-Si silicide resistance film on surface of monocrystalline silicon substrate
11/05/2008CN100431097C Top electrode, plasma processing device and method
11/05/2008CN100431068C Ceramic laminated body and its manufacturing method
11/05/2008CN100430810C Process for forming a patterned thin film conductive structure on a substrate
11/05/2008CN100430515C Sediment appts. and sediment method
11/05/2008CN100430217C Transparent conductive stratiform coating of indium tin oxide
11/04/2008US7446393 Co-sputter deposition of metal-doped chalcogenides
11/04/2008US7445814 Methods of making porous cermet and ceramic films
11/04/2008US7445813 Method for forming thin films and apparatus therefor
11/04/2008US7445810 Creating a tantalum layer disposed on a first layer region of a first layer and on a second layer region of a second layer; tantalum layer has a substantially body-centered-cubic (bcc)-phase tantalum region on the first layer region, and a non-bcc-phase tantalum region on the second layer region
11/04/2008US7445695 Method and system for conditioning a vapor deposition target
11/04/2008US7445679 Controlled oxygen addition for metal material
11/04/2008US7445675 Sensor for monitoring material deposition
11/04/2008US7445273 Scratch resistant coated glass article resistant fluoride-based etchant(s)
11/04/2008US7444955 Apparatus for directing plasma flow to coat internal passageways
10/2008
10/30/2008WO2008130318A1 Contact element coated by electron beam evaporation of a steel strip with nickel for use in an alkaline battery
10/30/2008WO2008130316A1 A coated cutting tool and a method of making thereof
10/30/2008WO2008129983A1 Conveyor, and film-forming apparatus and maintenance method thereof
10/30/2008WO2008129925A1 Polyurea film and method of forming the same
10/30/2008WO2008129569A1 Coated plastic film
10/30/2008WO2008107538A3 Method for coating a substrate, equipment for implementing said method and metal supply device for such equipment
10/30/2008WO2007127896A3 Method and system for conditioning a vapor deposition target
10/30/2008WO2007103902A3 Notched deposition ring
10/30/2008WO2006081004B1 Methods and arrangement for the reduction of byproduct deposition in a plasma processing system
10/30/2008US20080269049 Color forming compositions with a fluoran leuco dye having a latent developer
10/30/2008US20080268669 Transferable Micro Spring Structure
10/30/2008US20080268636 Deposition methods for barrier and tungsten materials
10/30/2008US20080268582 Self-assembling monolayer (SAM); dipping into solvent to treat surface; ink jet coating
10/30/2008US20080268294 Disk; a magnetic layer formed on a nonmagnetic glass substrate and a protection layer formed of carbon, nitrogen and hydrogen; disk heads
10/30/2008US20080268289 Perpendicular magnetic recording medium and manufacturing method thereof
10/30/2008US20080268262 Transparent, heat-resistant glass with three or more infrared-reflective films; a transparent base layer, a protective niobium-titanium film formed on an infrared-reflective film of the coating; windshields, architectural glass
10/30/2008US20080268178 Method of producing encapsulated nanopowders and installation for its realization
10/30/2008US20080268164 Apparatuses and Methods for Cryogenic Cooling in Thermal Surface Treatment Processes
10/30/2008US20080268137 Film Formation Method and Method for Manufacturing Light-Emitting Device
10/30/2008US20080266045 Thin film varistor array
10/30/2008US20080265751 Light Emissive Device
10/30/2008US20080264786 Alternating current rotatable sputter cathode
10/30/2008US20080264785 Module For Coating Both Sides of a Substrate in a Single Pass
10/30/2008US20080264784 Media Injector
10/30/2008US20080264783 Sputtering target fixture
10/30/2008US20080264777 Thin film semiconductor material produced through reactive sputtering of zinc target using nitrogen gases