Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
03/2009
03/12/2009US20090064924 Method for the Consolidation of Ornamental Stones, Device and Relevant Plant
03/12/2009US20090064861 Hydrogen Separation Membrane, Sputtering Target for forming said Hydrogen Separation Membrane, and Manufacturing Method Thereof
03/12/2009DE102008045269A1 Hartbeschichtungsfilm, Material, beschichtet mit dem Hartbeschichtungsfilm, und Formwerkzeug für kalt-plastische Bearbeitung Hard coating film material coated with hard coating film, and die for cold plastic working
03/11/2009EP2034043A1 Surface treating process, surface treating apparatus, vapor-depositing material, and rare earth metal-based permanent magnet with surface treated
03/11/2009EP2034042A2 Process for forming a ferroelectric film, ferroelectric film, ferroelectric device, and liquid discharge apparatus
03/11/2009EP2034041A2 Process for forming a ferroelectric film, ferroelectric film, ferroelectric device, and liquid discharge apparatus
03/11/2009EP2034040A2 Perovskite type oxide, ferroelectric film, process for producing same, ferroelectric device, and liquid discharge apparatus
03/11/2009EP2034039A1 Metallic film and method of its manufacture and use
03/11/2009EP2032736A1 A method of manufacturing a rotatable sputter target
03/11/2009EP2032735A2 Implantable medical devices comprising cathodic arc produced structures
03/11/2009EP2032734A1 Method for the production of a coated object by sputtering a ceramic target
03/11/2009EP2032348A1 High barrier laminate and process
03/11/2009EP2000558A9 Method and apparatus for manufacturing purely refractive optical structures
03/11/2009EP1996744A4 Antimicrobial coating methods
03/11/2009EP1996742A4 Ultraviolet activated antimicrobial surfaces
03/11/2009EP1747301B1 Strip processing system
03/11/2009EP1556526B1 Method of forming a sputtering target assembly and assembly made therefrom
03/11/2009EP1449935B1 Sputtering target and production method therefor
03/11/2009CN201206165Y Magnetron sputtering cylinder target
03/11/2009CN201206164Y Foldable vacuum apparatus
03/11/2009CN101385396A Light-emitting device, method for manufacturing light-emitting device, and substrate processing apparatus
03/11/2009CN101384515A Method of producing particles by physical vapor deposition in an ionic liquid
03/11/2009CN101383389A Preparation for copper-indium-galliun-selenium-sulfur or copper-indium-galliun-selenium or copper-indium-galliun-sulfur film solar cell absorption layer
03/11/2009CN101381871A Method for producing mirror plate
03/11/2009CN101381860A Magnetron sputtering apparatus
03/11/2009CN101381859A Vapor deposition system and vapor deposition method
03/11/2009CN101381858A Process for forming a ferroelectric film, ferroelectric film, ferroelectric device, and liquid discharge apparatus
03/11/2009CN101381857A Evaporation apparatus, method of manufacturing anode using same, and method of manufacturing battery using same
03/11/2009CN101381205A Method for processing colored glass mosaic
03/11/2009CN101380835A ZrB2/W nano multilayer film and preparation method thereof
03/11/2009CN101380659A Mould for cold forging and manufacture method thereof
03/11/2009CN100469203C Silicon oxynitride passivated rare earth activated thioaluminate phosphors for electroluminescent displays
03/11/2009CN100468824C Method of manufacturing a mask
03/11/2009CN100468823C Manufacturing system and method, operational method therefor and luminating device
03/11/2009CN100468809C Method and apparatus for manufacturing luminant device
03/11/2009CN100468630C Method and equipment for forming crystalline silicon thin film
03/11/2009CN100468629C Vacuum control system
03/11/2009CN100468611C Method and apparatus for cleaning of native oxide with hydrogen-containing radicals
03/11/2009CN100468091C Manufacturing method of absorption near infrared ray and orange coloured light substrate of PDP protective screen
03/11/2009CN100468081C Optical component
03/11/2009CN100467663C Device and method for surface treatment of hollow cathode plasma in inner surface of slimline
03/11/2009CN100467662C High peak power plasma pulsed supply with arc handling capacity
03/10/2009US7501293 Semiconductor device in which zinc oxide is used as a semiconductor material and method for manufacturing the semiconductor device
03/10/2009US7501155 producing phosphor or scintillator plates or panels, the layer thickness is constant over large surface areas, panels produced on very large flexible substrates which are cut into size and protected against physical, chemical or mechanical damage, high energy radiation detection and imaging, radiography
03/10/2009US7501145 Continuous production of high-temperature superconductor coated tape via the deposition of, for example, yttrium-barium-copper-oxide (YBa2Cu3O7 or "YBCO") film onto a buffered metal substrate
03/10/2009US7500894 Method for manufacturing plasma display panels with consistent panel substrate characteristics
03/10/2009US7500472 Fuel injection valve
03/05/2009WO2009029944A2 Improved sputtering assembly
03/05/2009WO2009029532A2 Thermocouple
03/05/2009WO2009029134A1 Deposition of piezoelectric aln for baw resonators
03/05/2009WO2009028642A1 High-density ii-vi compound semiconductor compact and its manufacturing method
03/05/2009WO2009028595A1 Substrate processing apparatus
03/05/2009WO2009028569A1 Conductor layer manufacturing method
03/05/2009WO2009028552A1 Sputtering apparatus
03/05/2009WO2009028536A1 ZnO THIN FILM AND SEMICONDUCTOR ELEMENT
03/05/2009WO2009028389A1 Evaporation source, process for producing optical member, and optical member
03/05/2009WO2009028372A1 Method for forming transparent conductive film
03/05/2009WO2009028347A1 Sputtering target
03/05/2009WO2009028188A1 Selective film manufacturing method
03/05/2009WO2009028087A1 High-density group ii-vi compound semiconductor molding and process for producing the same
03/05/2009WO2009028055A1 Film deposition method and device by sputtering
03/05/2009WO2009027905A2 Sputtering system
03/05/2009WO2009026677A1 Process for depositing erosion resistant coatings on a substrate characterized by applying a negative bias voltage from -75v to -10v to substrate during vaporizing
03/05/2009WO2009000720A3 Resistive evaporator
03/05/2009WO2008102358A3 Group-iii metal nitride and preparation thereof
03/05/2009WO2008017880A9 Apparatus for conveying a waste stream
03/05/2009WO2007115419A9 Wear-resistant layer for parts, method for coating a part with a wear-resistant layer, and device for carrying out said method
03/05/2009US20090061319 Silicon thin film anode for lithium secondary battery and preparation method thereof
03/05/2009US20090061276 Anode for fuel cell and fuel cell using the same
03/05/2009US20090061254 Polycrystalline monolithic magnesium aluminate spinels
03/05/2009US20090061210 Coating on a fiber substrate and a coated fiber product
03/05/2009US20090061201 Ultra low dielectric constant (k) dielectric layer and method of fabricating the same
03/05/2009US20090061184 Processes for Applying a Conversion Coating with Conductive Additive(S) and the Resultant Coated Articles
03/05/2009US20090061156 Multifunctional hard material coating
03/05/2009US20090061142 Ag base alloy thin film and sputtering target for forming ag base alloy thin film
03/05/2009US20090061113 Embedding Metallic Glass with Nanocrystals
03/05/2009US20090061079 Evaporation apparatus, method of manufacturing anode using same, and method of manufacturing battery using same
03/05/2009US20090061075 for measuring a coating thickness; object is measured in size, coating is applied, a laser beam is projected on the coating, laser beam is reflected by coating to laser sensor, from reflected laser a computer determines thickness of coating; for precision coating such as for aircraft parts
03/05/2009US20090058955 Process for forming a ferroelectric film, ferroelectric film, ferroelectric device, and liquid discharge apparatus
03/05/2009US20090058954 Process for forming a ferroelectric film, ferroelectric film, ferroelectric device, and liquid discharge apparatus
03/05/2009US20090058953 Process for forming a ferroelectric film, ferroelectric film, ferroelectric device, and liquid discharge apparatus
03/05/2009US20090058285 Deposition Apparatus and Deposition Method
03/05/2009US20090057614 Soft-lift off of organic nanofibers
03/05/2009US20090057149 Method of Manufacturing a Diagnostic Test Strip
03/05/2009US20090057144 Arc Evaporation Source and Vacuum Deposition System
03/05/2009US20090057143 Film-depositing target and preparation of phase shift mask blank
03/05/2009US20090057142 Hafnium Alloy Target and Process for Producing the Same
03/05/2009US20090057141 Ag-based alloy sputtering target
03/05/2009US20090057140 Ag base alloy sputtering target and method for manufacturing the same
03/05/2009US20090057139 Pot-Shaped Copper Sputtering Target and Manufacturing Method Thereof
03/05/2009US20090057137 Synthesizing thin films of lithiated transition metal oxide for use in electrochemical and battery devices
03/05/2009US20090057136 Manufacturing method for thin film battery
03/05/2009US20090057135 Sputtering method and apparatus
03/05/2009US20090057134 Thin film application device and method for coating small aperture vacuum vessels
03/05/2009US20090057133 Method and Apparatus for Reactive Solid-Gas Plasma Deposition
03/05/2009US20090057132 Zinc Oxide Thin Film, Transparent Conductive Film and Display Device Using the Same
03/05/2009US20090056991 Methods of Treating a Surface to Promote Binding of Molecule(s) of Interest, Coatings and Devices Formed Therefrom
03/05/2009US20090056630 Workpiece support system and method
03/05/2009DE102007041374A1 Producing quantum structures and/or continuous nano-metal islands on substrate for bipolar plates, by cleaning substrate surface from impurities and/or oxide layers, structuring and then depositing active atomic- and/or molecular clusters
03/05/2009DE102007041328A1 Method for the production of coating under use of an externally heated arc used for the evaporation of metal and metal alloy, comprises evacuating an object to be coated in an evacuation coating chamber