| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 09/23/2008 | US7427329 Temperature control for single substrate semiconductor processing reactor |
| 09/23/2008 | CA2419353C Method and apparatus for depositing thin films on vertical surfaces |
| 09/23/2008 | CA2350492C Apparatus and method for coating objects through pvd |
| 09/18/2008 | WO2008111398A1 Apparatus for controlling deposition apparatus and method for controlling deposition apparatus |
| 09/18/2008 | WO2008111324A1 Transparent conductive film and method for manufacturing the transparent conductive film, and sputtering target used in the method |
| 09/18/2008 | WO2008111306A1 Deposition apparatus and method for manufacturing film by using deposition apparatus |
| 09/18/2008 | WO2008111163A1 Method of surface treatment for metal glass part, and metal glass part with its surface treated by the method |
| 09/18/2008 | WO2008092650A3 Method and embossing film for the selective transfer of at least one functional layer to a substrate |
| 09/18/2008 | WO2008080002A3 Method of diffusion-bond powder metallurgy sputtering target |
| 09/18/2008 | WO2008071441A3 Coating for moulds |
| 09/18/2008 | WO2002006747A9 Heat exchange foam |
| 09/18/2008 | US20080226950 Stably produced high performance low anisotropy constant soft magnetic layer; heat resistance; ease of writing, overwrite performance; signal to noise ratio |
| 09/18/2008 | US20080226926 Anti-etch layer comprises zirconium oxycarbide |
| 09/18/2008 | US20080226843 Laser to effect fusion bond between high melting point metal, alloy composite powder to surface of lower melting point substrate surface; high temperature-corrosive applications, metallurgical vessels, lances, nozzles, tuyeres; extend service life under severe conditions |
| 09/18/2008 | US20080226835 Production Method of Material Film and Production Apparatus of Material Film |
| 09/18/2008 | US20080226819 Methods of making crystalline titania coatings |
| 09/18/2008 | US20080226270 Nozzle-based, vapor-phase, plume delivery structure for use in production of thin-film deposition layer |
| 09/18/2008 | US20080223824 Columnar structured material and method of manufacturing the same |
| 09/18/2008 | US20080223718 Ai-based alloy sputtering target and process for producing the same |
| 09/18/2008 | US20080223716 Dependence relationship of deposition rate of layer on operating parameter; cathode voltage, current, power provided prior to deposition of layer; second dependence relationship on time is measured during deposition of layer, while a different operating parameter is held substantially constant |
| 09/18/2008 | US20080223715 Coating of Optical Substrates Using Closed Field System |
| 09/18/2008 | US20080223714 Plurality of target cathodes, each a target material having a different composition, DC power supply; target cathodes cosputtered to deposit a lay of a mixture of materials; composite refractive index controlled by adjusting voltage, current, angle, flow rate of reactive gas for plurality of cathodes |
| 09/18/2008 | US20080223430 tin oxide based buffer layer is advantageous in that it) provides a good work-function match to the CdS/CdTe film and the front electrode; able to withstand attacks of sulfur vapors at elevated temperatures during CdS/CdTe processing; good mechanical durability |
| 09/18/2008 | US20080223295 METHOD FOR PRODUCING A TOOL WHICH CAN BE USED TO CREATE OPTICALLY ACTIVE SURFACE STRUCTRES IN THE SUB-nuM RANGE AND A CORRESPONDING TOOL |
| 09/18/2008 | US20080223291 Vacuum coater device and mechanism for supporting and manipulating workpieces in same |
| 09/18/2008 | DE202007018495U1 Verbundformteil Composite molding |
| 09/18/2008 | DE102007012370A1 Bedampfungseinrichtung und Bedampfungsverfahren zur Molekularstrahlbedampfung und Molekularstrahlepitaxie Vaporization and vapor deposition and molecular beam epitaxy for Molekularstrahlbedampfung |
| 09/17/2008 | EP1970474A1 Vaporisation device and vaporisation process for molecular beam vaporisation and molecular beam epitaxy |
| 09/17/2008 | EP1970467A1 Flood chamber for coating installations |
| 09/17/2008 | EP1970466A2 Method and control system for depositing a layer |
| 09/17/2008 | EP1970465A2 Method and sputter-deposition system for depositing a layer composed of a mixture of materials and having a predetermined refractive index |
| 09/17/2008 | EP1970464A1 Cathode evaporation machine |
| 09/17/2008 | EP1970463A2 Vacuum coater device and mechanism for supporting and manipulating workpieces in same |
| 09/17/2008 | EP1969613A1 Method of manufacturing at least one sputter-coated substrate and sputter source |
| 09/17/2008 | EP1899496A4 Hydrophilic dlc on substrate with barrier discharge pyrolysis treatment |
| 09/17/2008 | EP1711644A4 Compensation of spacing between magnetron and sputter target |
| 09/17/2008 | EP1697556A4 Rotating sputtering magnetron |
| 09/17/2008 | EP1356496B1 Apparatus for evaporation of materials for coating objects |
| 09/17/2008 | CN201116306Y Self-rotation carrier for continuous film-plating equipment |
| 09/17/2008 | CN101268332A 实时监测和控制溅射靶的腐蚀 Real-time monitoring and control of sputter target erosion |
| 09/17/2008 | CN101268211A Sputtering target, transparent conductive film and transparent electrode |
| 09/17/2008 | CN101268210A Film forming apparatus, evaporating jig and measuring method |
| 09/17/2008 | CN101268026A 氧化物材料及溅射靶 Oxide material and sputtering target |
| 09/17/2008 | CN101267940A Clay thin-film board, clay thin-film board equipped with electrode and display device using them |
| 09/17/2008 | CN101267010A In-N adulterated making p type ZnO film method with NH3 as N source |
| 09/17/2008 | CN101266080A Selective solar energy absorbing coating and method for making same |
| 09/17/2008 | CN101265580A Pre-conditioning a sputtering target prior to sputtering |
| 09/17/2008 | CN101265569A Method and control system for depositing a layer |
| 09/17/2008 | CN101265568A Method and system for depositing a layer constituted by mixture and possessing predetermined refraction |
| 09/17/2008 | CN101265567A Evaporation crucible and evaporation apparatus with adapted evaporation characteristic |
| 09/17/2008 | CN101265566A Evaporation tube and evaporation apparatus with adapted evaporation characteristic |
| 09/17/2008 | CN101265565A Propulsion-free long life cathode electric arc source device |
| 09/17/2008 | CN101265549A Foam iron-nickel composite metal material and preparation method thereof |
| 09/17/2008 | CN101265502A Method for preparing tantalum doping tin oxide thin film carrier material for gene chip |
| 09/17/2008 | CN101265125A Hafnium oxide doping cerium oxide grid dielectric material and preparation method thereof |
| 09/17/2008 | CN100420030C Organic el panel and manufacturing method thereof |
| 09/17/2008 | CN100419953C Substrate processing method, substrate processing program and storage medium |
| 09/17/2008 | CN100419118C Method for preparing barium strontium titanate ferroelectric film |
| 09/17/2008 | CN100419117C Hard laminated film, method of manufacturing the same and film-forming device |
| 09/17/2008 | CN100418679C Composite coatings for finishing of hardened steels |
| 09/16/2008 | US7425504 Systems and methods for plasma etching |
| 09/16/2008 | US7425390 Preparation of halftone phase shift mask blank |
| 09/16/2008 | US7425353 Enhancement of magnetic media recording performance using ion irradiation to tailor exchange coupling |
| 09/16/2008 | US7425223 Method for preparing electrochemical device with a layer structure |
| 09/16/2008 | US7425093 Thermography test method and apparatus for bonding evaluation in sputtering targets |
| 09/12/2008 | WO2008108999A2 Thin film battery and manufacturing method |
| 09/12/2008 | WO2008108809A2 All-gaseous deposition of nanocomposite films |
| 09/12/2008 | WO2008108477A1 Film forming method and production process of liquid crystal display device |
| 09/12/2008 | WO2008108349A1 Plasma processing apparatus |
| 09/12/2008 | WO2008108185A1 Thin film forming method, and thin film forming apparatus |
| 09/12/2008 | WO2008108181A1 Gold alloy coating, gold alloy coating clad laminate and gold alloy coating clad member |
| 09/12/2008 | WO2008108149A1 Arc evaporation source |
| 09/12/2008 | WO2008108128A1 Dielectric material, capacitor using dielectric material, semiconductor device using dielectric material, and method for producing dielectric material |
| 09/12/2008 | WO2008108106A1 Method for manufacturing scintillator panel, and scintillator panel |
| 09/12/2008 | WO2008108018A1 Substrate holding device, target holding device, and vacuum film-forming apparatus |
| 09/12/2008 | WO2008107705A1 Apparatus |
| 09/12/2008 | WO2008107538A2 Method for coating a substrate, equipment for implementing said method and metal supply device for such equipment |
| 09/12/2008 | WO2008106812A1 Vacuum coating apparatus |
| 09/12/2008 | WO2008088446A3 Organic vapor jet deposition using an exhaust |
| 09/12/2008 | WO2008045114A9 Method for fabricating nanostructures |
| 09/12/2008 | WO2005084087A3 Methods and apparatus for generating high-density plasmas with ionizational instabilities |
| 09/11/2008 | US20080220261 Temperable Glass Coating |
| 09/11/2008 | US20080220197 Phase-change recording film with stable crystallization rate, target and process for producing the phase-change recording film |
| 09/11/2008 | US20080220177 Reliant Thermal Barrier Coating System and Related Methods and Apparatus of Making the Same |
| 09/11/2008 | US20080217170 Sputtering system |
| 09/11/2008 | US20080217163 Manufacturing method for a far-infrared substrate |
| 09/11/2008 | US20080217162 Sputter target contains nonconductor and semiconductor doping elements; substrate coating free of dope ; controlling temperature; sublimination or evaporation |
| 09/11/2008 | US20080216741 Dynamic film thickness control system/method and its utilization |
| 09/11/2008 | US20080216602 Coating process for manufacture or reprocessing of sputter targets and x-ray anodes |
| 09/11/2008 | DE102007010995A1 Verfahren und Vorrichtung zum Aufbringen von transparenten Siliziumdioxid-Schichten aus der Gasphase Method and apparatus for applying transparent silicon dioxide layers from the gaseous phase |
| 09/11/2008 | DE102007003766B4 Transparente Barrierefolien für die Verpackungsindustrie Transparent barrier films for the packaging industry |
| 09/10/2008 | EP1968096A2 Material of protective layer, method of preparing the same, protective layer formed of the material, and plasma display panel including the protective layer |
| 09/10/2008 | EP1967608A1 High density ceramic and cermet sputtering targets by microwave sintering |
| 09/10/2008 | EP1967607A1 Electron beam evaporation source |
| 09/10/2008 | EP1967606A1 Evaporation crucible and evaporation apparatus with adapted evaporation characteristic |
| 09/10/2008 | EP1967605A1 Evaporation tube and evaporation apparatus with adapted evaporation characteristic |
| 09/10/2008 | EP1967604A1 Evaporation crucible and evaporation apparatus with directional evaporation |
| 09/10/2008 | EP1967603A2 Aliphatic polyester film and gas barrier film |
| 09/10/2008 | EP1967602A2 Ceramic-coated member and production method thereof |
| 09/10/2008 | EP1966409A1 Delivering particulate material to a vaporization zone |