Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
02/2009
02/03/2009US7485372 Multi-layer coating having excellent adhesion and sliding properties and production method thereof
02/03/2009US7485337 Depositing an organic layer for use in OLEDs
02/03/2009US7485210 Sputtering target fixture
02/03/2009US7485198 Tantalum and niobium billets and methods of producing the same
02/03/2009US7485169 Semiconductor manufacturing facility utilizing exhaust recirculation
02/03/2009US7484672 Coatings for use in fuel injector components
02/03/2009US7484546 Sputtering target for phase-change memory, film for phase change memory formed by using the target, and method for producing the target
02/03/2009CA2443005C Method for treating ferrous alloy parts in order to improve the rubbing properties thereof without causing hardness loss or deformation
02/03/2009CA2336594C Vacuum tight coupling for tube sections
01/2009
01/29/2009WO2009014398A2 Multipurpose carrier of vacuum vapor deposition material and method thereof
01/29/2009WO2009014394A2 Method for depositing ceramic thin film by sputtering using non-conductive target
01/29/2009WO2009013935A1 Sputtering apparatus
01/29/2009WO2009013714A1 Air brazeable material
01/29/2009WO2009013242A1 Method for providing a crystalline germanium layer on a substrate
01/29/2009WO2009013034A1 Method for providing a crystalline germanium layer on a substrate
01/29/2009WO2009012878A1 A laminate and composite layer comprising a substrate and a coating, and a process and apparatus for preparation thereof
01/29/2009WO2008133876A3 Cooling shield for substrate processing chamber
01/29/2009WO2008106448A3 Ion sources and methods of operating an electromagnet of an ion source
01/29/2009US20090029070 Method of producing nanowires in ambient conditions and nanowires thus produced
01/29/2009US20090028741 Insert for metal cutting
01/29/2009US20090026513 Method for forming ferroelectric thin films, the use of the method and a memory with a ferroelectric oligomer memory material
01/29/2009US20090026073 Sputtering system
01/29/2009US20090026072 Al-ni-la-si system al-based alloy sputtering target and process for producing the same
01/29/2009US20090026067 Droplet Removing Device and Method in Plasma Generator
01/29/2009US20090026066 Perpendicular magnetic recording medium and method of manufacturing the same and product thereof
01/29/2009US20090025776 Method of making an antireflective silica coating, resulting product, and photovoltaic device comprising same
01/29/2009US20090025632 Vacuum treatment installation for the production of a disk-shaped workpiece based on a dielectric substrate
01/29/2009US20090025630 Vacuum transfer apparatus and method
01/29/2009DE19626732B4 Vorrichtung und Verfahren zum Herstellen und Recyclen von Sputtertargets Apparatus and method for making and recycling of sputter targets
01/29/2009DE102008034145A1 Sputtertarget aus einer Legierung auf Al-Basis des Al-Ni-La-Si- Systems und Verfahren zu dessen Herstellung Sputtering target of an alloy of Al-based Al-Ni-La-Si system, and method for its production
01/29/2009DE102007035166A1 Hochtemperatur-Verdampferzelle mit parallel geschalteten Heizbereichen High-temperature evaporator cell with parallel heating zones
01/29/2009CA2693884A1 A laminate and composite layer comprising a substrate and a coating, and a process and apparatus for preparation thereof
01/28/2009EP2019437A1 Iii nitride compound semiconductor laminated structure
01/28/2009EP2019156A1 Shaped crucible and evaporation apparatus having same
01/28/2009EP2018653A2 Arc source and magnet arrangement
01/28/2009EP1735476A4 Textured-grain-powder metallurgy tantalum sputter target
01/28/2009CN201186950Y Substrate carrier
01/28/2009CN101356297A Spattering device and film forming method
01/28/2009CN101356296A Vapor deposition apparatus for organic vapor deposition material and process for producing organic thin film
01/28/2009CN101356244A Easy-to-clean, mechanically stable coating composition for metallic surfaces with increased chemical resistance and process for coating a substrate using said composition
01/28/2009CN101355099A Gate dielectric material silicic acid lanthanum film with high dielectric coefficient as well as preparation method and use thereof
01/28/2009CN101355031A Method for preparing p-type transparent oxide semiconductor CuCrO2 film material
01/28/2009CN101353783A Ceramic high barrier film apparatus of continuous winding type magnetron sputtering manufacture
01/28/2009CN101353782A Large area anti-reflection conductive film continuous magnetron sputtering film coating production line
01/28/2009CN101353781A Method for ion plating wear resistant anti-electric corrosion alloy on pure copper surface
01/28/2009CN101353780A Mounting plate with a cooled backing plate set on top
01/28/2009CN101353779A Al-Ni-La-Si system Al-based alloy sputtering target and process for producing the same
01/28/2009CN101353778A Sputtering type film coating apparatus and film coating method
01/28/2009CN101353777A Spherical parts batch plasma based ion injection method and apparatus thereof
01/28/2009CN101353776A Ce-Y-containing A1-Ti-N multicomponent composite coating and preparation thereof
01/28/2009CN101353732A Ultra-high purity NiPt alloys and sputtering targets comprising same
01/28/2009CN101352947A Outer casing of electronic product and preparation method thereof
01/28/2009CN100455975C High-temperature superconductive element based on nano material and its prepn.
01/28/2009CN100455777C 内燃机用排气管 Internal combustion engine with an exhaust pipe
01/27/2009US7482631 Film formation apparatus and film formation method
01/27/2009US7482035 Method of coating a substrate by a thermal application of the coating material
01/27/2009US7481902 Substrate processing apparatus and method, high speed rotary valve and cleaning method
01/27/2009US7481889 Film forming apparatus and film forming method
01/27/2009US7481887 Apparatus for controlling gas pulsing in processes for depositing materials onto micro-device workpieces
01/27/2009US7480992 Cooling plate and manufacturing method thereof, and sputtering target and manufacturing method thereof
01/27/2009CA2350894C Methods for preparing coated drug particles and pharmaceutical formulations thereof
01/22/2009WO2009011650A1 Fine grained cemented carbide for turning in heat resistant super alloys (hrsa)
01/22/2009WO2009011280A1 Graft copolymer, thermoplastic resin composition, and molded object
01/22/2009WO2009011232A1 Composite oxide sinter, process for producing amorphous composite oxide film, amorphous composite oxide film, process for producing crystalline composite oxide film, and crystalline composite oxide film
01/22/2009WO2009011026A1 Process for producing composite metal foil, composite metal foil, shaped metal foil and process for producing shaped metal foil
01/22/2009WO2009010468A1 Vacuum evaporation apparatus for solid materials
01/22/2009WO2009010330A1 Method of producing oxide coatings
01/22/2009US20090023587 Method of patterning a substrate
01/22/2009US20090022996 Method for Preparing One Dimensional Spin Photonic Crystal Device and One Dimensional Spin Photonic Crystal Device Prepared by the Same
01/22/2009US20090022982 Electronic Device, Method of Manufacture of Same and Sputtering Target
01/22/2009US20090022886 Method for making an interactive information device and product produced thereby
01/22/2009US20090020753 Method of manufacturing semiconductor active layer, method of manufacturing thin film transistor using the same and thin film transistor having semiconductor active layer
01/22/2009US20090020423 Potentiometric Mg2+ Sensor and Method thereof
01/22/2009US20090020417 use a dual damascene processes to protect the mask and enhance etch selectivity; prevent carbon depletion during resist strip processes; nonabsorbent, moisture proof; high speed electronic device
01/22/2009US20090020416 Sputter coating device and method of depositing a layer on a substrate
01/22/2009US20090020415 "Iontron" ion beam deposition source and a method for sputter deposition of different layers using this source
01/22/2009US20090020414 Method of eliminating electrostatic charges generated from friction between a carrier and a substrate
01/22/2009US20090020192 Copper Sputtering Targets and Methods of Forming Copper Sputtering Targets
01/22/2009US20090020157 Rear electrode structure for use in photovoltaic device such as CIGS/CIS photovoltaic device and method of making same
01/22/2009US20090020070 Vacuum evaporation apparatus for solid materials
01/22/2009DE112007000541T5 Selektive Trennverfahren Selective separation process
01/22/2009DE102007033665A1 Method for producing a layer system on a dielectric substrate having a first reflecting metal layer and a layer structure, comprises applying the first metal layer on the substrate by a vacuum coating process
01/22/2009DE102007033338A1 Hartstoffbeschichteter Glas- oder Glaskeramik-Artikel und Verfahren zu dessen Herstellung A coated hard material glass or glass-ceramic article and process for its preparation
01/22/2009CA2693825A1 Plasma deposition apparatus
01/21/2009EP2017881A2 Method of manufacturing semiconductor active layer, method of manufacturing thin film transistor using the same and thin film transistor having semiconductor active layer.
01/21/2009EP2017367A1 Sputter coating device and method of depositing a layer on a substrate
01/21/2009EP2017366A1 A method for the manufacture of a hard material coating on a metal substrate and a coated substrate
01/21/2009EP2017362A1 Brittle metall alloy sputtering targets and method of fabricating same
01/21/2009EP2017360A2 High purity hafnium, high purity hafnium target and method of manufacturing a thin film using high purity hafnium
01/21/2009EP1678736A4 Plasma immersion ion implantation using conductive mesh
01/21/2009EP1597066A4 Heat treatable coated article with chromium nitride ir reflecting layer and method of making same
01/21/2009CN201183821Y Isolated cooling structure for planar cathode
01/21/2009CN201183820Y Electric arc ion plating apparatus for improving thin film deposition quality
01/21/2009CN101351865A Method of manufacturing at least one sputter-coated substrate and sputter source
01/21/2009CN101351573A Stephanoporate valve metallic thin-film and manufacturing method thereof as well as thin-film capacitor
01/21/2009CN101351572A Rotatable aperture mask assembly and deposition system
01/21/2009CN101350366A Antistatic TFT substrate and processing technique thereof
01/21/2009CN101350313A Method of manufacturing semiconductor active layer, method of manufacturing thin film transistor and thin film transistor
01/21/2009CN101349769A Method for preparing ALON protection film for optical element
01/21/2009CN101348903A Multifunctional small film deposition equipment