Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
12/2008
12/10/2008CN101318394A Novel TiA1N composite multiple coating applied for cutting tool
12/10/2008CN101318230A Coated cemented carbide cutting tool insert
12/10/2008CN101318229A Coated cemented carbide cutting tool insert
12/10/2008CN101318186A Refurbishment of a coated chamber component
12/10/2008CN100442458C Production of triple high K grid medium materials
12/10/2008CN100442083C Transparent conductive film and touch panel
12/10/2008CN100441735C Sputtering apparatus capable of changing distance between substrate and deposition preventing plate used for film formation
12/10/2008CN100441734C Efficient lining heat resisting active oxygen corrosion
12/10/2008CN100441733C Nozzle evaporating source for steam plating
12/10/2008CN100441732C Plasma-assisted reinforced coating
12/10/2008CN100441639C Color shifting carbon-containing interference pigments
12/10/2008CN100441288C Method for treating waste gas by using metal thin film adsorption and desorption
12/09/2008US7462989 Plasma display panel, method for producing same and material for protective layer of such plasma display panel
12/09/2008US7462578 Method and apparatus for producing photocatalyst
12/09/2008US7462407 Group IIIA element fluoride-containing coating having better corrosion resistance to corrosive halogen species; at least 50% of a crystalline phase of the orthorhombic system belonging to space group Pnma.
12/09/2008US7462398 glass substrate support having multilayer coatings comprising a dielectric layer, a zinc oxide, an infrared reflecting layer comprising silver, a layer comprising an oxide of nickel and chromium, having improved heat and sheet resistance; insulating glass (IG) windows
12/09/2008US7462397 Silicon nitride on glass substrate; zinc oxide, silver, metal oxide and dielectric multilayer; vehicle windshields
12/09/2008US7462380 Film forming method employing sub-electrodes aligned toward target
12/09/2008US7462375 Physical or cathodic arc deposition of multili alternate layer of nitride of aluminum, chromium, titanium, and chromium nitride; nonsticky kitchenware (pots, pans); heat/corrosion/wear resistance, color stability
12/09/2008US7462372 Light emitting device, method of manufacturing the same, and thin film forming apparatus
12/09/2008US7462335 Optical monitoring and control system and method for plasma reactors
12/09/2008US7462244 Device and method for vacuum film formation
12/09/2008US7462243 Chemical processing system and method
12/09/2008CA2483260C Sputter coating apparatus including ion beam source(s), and corresponding method
12/09/2008CA2475192C Solar control coating
12/04/2008WO2008146844A1 Film forming apparatus
12/04/2008WO2008146727A1 Surface-coated cutting tool
12/04/2008WO2008146693A1 Oxide transparent electroconductive film, and photoelectric conversion element and photodetection element using the oxide transparent electroconductive film
12/04/2008WO2008146572A1 Transparent conductive film pattern forming method and organic electroluminescence transparent conductive film resin substrate
12/04/2008WO2008145459A1 Vacuum treatment unit and vacuum treatment process
12/04/2008WO2008145397A1 Process for producing titanium oxide layers
12/04/2008WO2008145099A1 Temperature-resistant tco layer, production method therefor and use thereof
12/04/2008WO2008145093A2 Method for adjusting the number of phases of a pta1-layer of a gas turbine component and method for producing a single-phase pta1-layer on a gas turbine component
12/04/2008WO2008121668A3 Sputtering target and methods of manufacture
12/04/2008US20080299730 METAL OXYNITRIDE AS A pFET MATERIAL
12/04/2008US20080299415 Sputtering Target, Thin Film for Optical Information Recording Medium and Process for Producing the Same
12/04/2008US20080299385 Method for Making a Part of Composite Material with Ceramic Matrix and Resulting Part
12/04/2008US20080299327 Surface Energy Control Methods For Color Filter Printing
12/04/2008US20080299325 Processes for preparing electrically-conductive glass-ceramics
12/04/2008US20080299296 Successive vapour deposition system, vapour deposition system, and vapour deposition process
12/04/2008US20080298910 Droplet-free coating systems manufactured by arc-evaporation method
12/04/2008US20080297302 On chip zinc oxide thin film varistor, fabrication method thereof and applications thereof
12/04/2008US20080297292 Radio Frequency Device with Magnetic Element, Method for Making Such a Magnetic Element
12/04/2008US20080296510 Ion Implantation System and Ion Implantation System
12/04/2008US20080296149 Mixed chromium oxide-chromium metal sputtering target
12/04/2008US20080296148 Method for fabricating concentration-gradient high-frequency ferromagnetic films
12/04/2008US20080296143 Plasma Systems with Magnetic Filter Devices to Alter Film Deposition/Etching Characteristics
12/04/2008US20080296142 Swinging magnets to improve target utilization
12/04/2008US20080295963 Gas supply system and gas supply accumulation unit of semiconductor manufacturing apparatus
12/04/2008DE102008023479A1 Form tool for injection molding machine for the production of thermoplastic form part, comprises two mould halves, which form a cavity for injecting plasticized plastic, and a coated area, which has a higher absorption degree
12/04/2008DE102007025577A1 Verfahren zur Herstellung von Titanoxidschichten mit hoher photokatalytischer Aktivität und dergestalt hergestellte Titanoxidschichten A process for producing titanium oxide layers having high photocatalytic activity and thus prepared titanium oxide
12/04/2008CA2686445A1 Vacuum treatment installation and vacuum treatment method
12/03/2008EP1998364A2 Semiconductor thin film forming system
12/03/2008EP1998355A2 Antistatic film, spacer using it and picture display unit
12/03/2008EP1997938A2 Coated cutting tool insert
12/03/2008EP1997932A1 Method of arc ion plating and target for use therein
12/03/2008EP1997931A1 Zinc oxide-based transparent conductor and sputtering target for forming the transparent conductor
12/03/2008EP1997930A1 Method for producing a coating with improved adhesion
12/03/2008EP1996744A2 Antimicrobial coating methods
12/03/2008EP1996743A1 Use of magnesium-copper compositions for the evaporation of magnesium and magnesium dispensers
12/03/2008EP1996742A1 Ultraviolet activated antimicrobial surfaces
12/03/2008EP1996397A2 Self-supporting multilayer films having a diamond-like carbon layer
12/03/2008EP1929063A4 Siox:si sputtering targets and method of making and using such targets
12/03/2008CN201160064Y Hall type ion source
12/03/2008CN201158704Y Substrate warming frame for vacuum plating
12/03/2008CN201158703Y Substrates loader capable of preventing coil plating
12/03/2008CN201158702Y Dynamic magnetic controlled arc source device for improving electric arc ion plating deposition technique
12/03/2008CN201158701Y Coupling magnetic field assisted electric arc ion plating deposition device
12/03/2008CN201158700Y Heating mechanism of vacuum plants
12/03/2008CN201158699Y Coiling film-plating machine
12/03/2008CN201158188Y Improved structure of touch control element
12/03/2008CN101317237A Indium oxide transparent conductive film and method for manufacturing same
12/03/2008CN101316944A Sputtering target and method for manufacturing oxide sintered body
12/03/2008CN101315881A Production method and application of lithium niobate/III family nitride heterojunction ferroelectric semiconductor film
12/03/2008CN101315879A Method of cleaning a patterning device, method of depositing a layer system on a substrate, system for cleaning a patterning device, and coating system for depositing a layer system on a substrate
12/03/2008CN101315435A High reflection film of silicon carbide reflection mirror within visible light wave range, and its production method
12/03/2008CN101315100A Plated film bearing
12/03/2008CN101314854A Cr-O-N active diffusion blocking layer and production method thereof
12/03/2008CN101314853A Al-O-N diffusion blocking layer and production method thereof
12/03/2008CN101314843A Method for improving physical sputtering technology stability
12/03/2008CN101314842A Method for producing boron carbide film with electron beam evaporation technique
12/03/2008CN101314841A Manufacturing apparatus and manufacturing method of light-emitting device
12/03/2008CN101314311A False proof thin film and producing method thereof
12/03/2008CN100440436C Vapor-phase growth method
12/03/2008CN100440427C Plasma processing chamber
12/03/2008CN100440425C Structure for mounting loading table device, processing device, discharge prevention method between feeder lines
12/03/2008CN100440419C Faraday shields and plasma wafer processing
12/03/2008CN100440020C Micro Nano silicon based optical amplifier, and method for preparing gain medium of the amplifier
12/03/2008CN100439562C Process chamber component having electroplated yttrium containing coating
12/03/2008CN100439560C Installation for the vacuum treatment in particular of substrates
12/03/2008CN100439559C Ceramic sputtering targets of tantalum-base compound and its use method and preparation method
12/03/2008CN100439558C Copper alloy sputtering target process for producing the same and semiconductor element wiring
12/03/2008CN100439557C Sputtering target and optical recording medium
12/03/2008CN100439556C Manufacturing technology of wood surface vacuum metal film plating
12/03/2008CN100439555C Polycrystalline mgo vapor deposition material
12/03/2008CN100439554C Method of synthesizing a compound of the formula Mn*Axn, film of the compound and its use
12/03/2008CN100439100C Composite coat capable of replacing piston ring surface electroplating hard chrome and processing method thereof
12/03/2008CN100439016C Coated cutting tool member
12/02/2008US7459175 Creating a dynamic model of monolayer deposition processing system and incorporating virtual sensors in the dynamic model; includes using intelligent set points, dynamic models, and/or virtual sensors; depositing a film on a substrate in a semiconductor device
12/02/2008US7459036 Containing Zr; average roughness of an erosion face of 0.01-2 mu m.; favorable deposition property and deposition speed, generates few particles, and suitable for forming a high dielectric gate insulation film such as HfO or HfON film
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