Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
11/2008
11/20/2008US20080283940 LOW-TEMPERATURE GROWN HIGH QUALITY ULTRA-THIN CoTiO3 GATE DIELECTRICS
11/20/2008US20080283802 Ceramic Target, Film Consisting of Zinc Oxide, Gallium and Boron, and Method for Preparing the Film
11/20/2008US20080283393 Elongate Vacuum System for Coating One or Both Sides of a Flat Substrate
11/20/2008US20080283389 Method for Manufacturing Chalcopyrite Thin-Film Solar Cell
11/20/2008US20080283388 an optical membrane detects H2 gas by measuring a change in the transmittance of light when exposed to an atmosphere containing H2; membrane using a thin film of platinum oxide and platinum catalyst layer on a radiation transparent substrate such as glass; hydrogen energy, free of greenhouse gases; safe
11/20/2008US20080283387 programmable; for transferring conductive pieces such as solder balls to electrode pads of a target substrate; includes a transfer substrate; individually addressable electrodes formed on the transfer substrate which selectively attract and hold solder balls during transfer
11/20/2008US20080282984 Method of fabricating light-emitting device and apparatus for manufacturing light-emitting device
11/19/2008EP1992717A1 Target used to form a hard film
11/19/2008EP1992716A1 Light selectively absorbing layers and method for making the same
11/19/2008EP1992715A1 Amorphous hard carbon coating
11/19/2008EP1992714A1 Group 2 Metal Precursors for Depositing Multi-Component Metal Oxide Films
11/19/2008EP1992713A2 Hard coating excellent in wear resistance and in oxidation resistance and target for forming the same
11/19/2008EP1991824A1 Porous layer
11/19/2008EP1991716A2 Element
11/19/2008EP1991646A2 Operable transmission, working fluid for such a transmission, and method for commissioning the same
11/19/2008EP1991632A1 Heat reservoir and method for processing a substrate coupled to a heat reservoir
11/19/2008EP1991387A2 Coating method
11/19/2008EP1991386A2 Method for producing high-quality surfaces and a product having a high-quality surface
11/19/2008EP1559801B1 Metallic material for electronic part, electronic part, electronic equipment, method of working metallic material, process for producing electronic part and electronic optical part
11/19/2008CN201151740Y Gradient sputtering apparatus for preparing film material with compositional gradient
11/19/2008CN101310036A Multi-layer high quality gate dielectric for low-temperature poly-silicon tfts
11/19/2008CN101310035A Method of coating a cemented carbide or cermet substrate body and coated cemented carbide or cermet body
11/19/2008CN101308877A Transparent semiconductor film diode and preparing method thereof
11/19/2008CN101308784A Plasma immersion ion implantation with highly uniform chamber seasoning process for a toroidal source reactor
11/19/2008CN101307481A Multifunctional dielectrophoresis operated micro-electrode on-chip system and its manufacture method
11/19/2008CN101307442A Method for making high-temperature articles
11/19/2008CN101307433A Bearing table for sputtering machine table
11/19/2008CN101307432A Sputtering bearing device
11/19/2008CN101307431A Process for preparing nitrogen doped micropore titanium dioxide photocatalysis layer of visual light on base of titan and titan alloy
11/19/2008CN101307430A Energy filtrated magnetron sputtering plating method and apparatus for applying the method
11/19/2008CN101307429A Process for preparing high-purity metallic nickel target of superfine crystal particle
11/19/2008CN101307428A Combined vacuum coating process of magnetron sputtering and multisphere ion plating
11/19/2008CN101307427A Oil-free processing method of ion plating GIC depositing of high speed sewing machine rotating shuttle
11/19/2008CN101307426A Oil-free processing method of ion plating GIC depositing of high speed sewing machine needle rod
11/19/2008CN101307425A Surface treating method for enhancing abrasive resistance and fatigue life of bearing
11/19/2008CN101307424A Process for preparing zirconia coating
11/19/2008CN101307146A Anti-counterfeiting laser powder and method for manufacturing same
11/19/2008CN100435350C High-dielectric coefficient grid dielectric material titanium aluminate film and preparing method thereof
11/19/2008CN100435276C Vacuum processing apparatus
11/19/2008CN100434937C High-temperature-resistant optical film doped with stabilized zirconia and method for preparing same
11/19/2008CN100434569C Method for modifying environment protection piston ring surface
11/19/2008CN100434565C Process for preparing anti-bacteria stainless steel by double-layer glowing method
11/19/2008CN100434353C Gas phase synthesis process of nanometer particle array with one-dimensional diameter and number density gradient
11/18/2008US7453072 Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor
11/18/2008US7452604 Surface flatness, smoothness
11/18/2008CA2421171C Magnesium barium thioaluminate and related phosphor materials
11/13/2008WO2008137689A2 Fine grained, non banded, refractory metal sputtering targets with a uniformly random crystallographic orientation, method for making such film, and thin film based devices and products made there from
11/13/2008WO2008136504A1 Method for manufacturing group iii nitride semiconductor light-emitting device
11/13/2008WO2008136337A1 Sputtering apparatus and sputtering method
11/13/2008WO2008136174A1 Film forming apparatus
11/13/2008WO2008136130A1 Plasma generation device, and method and apparatus for forming film using the same
11/13/2008WO2008135109A1 Transparent barrier film and method for producing the same
11/13/2008WO2008091731A3 Target designs and related methods for reduced eddy currents, increased resistance and resistivity, and enhanced cooling
11/13/2008WO2005045891A8 Method and apparatus for measuring and monitoring coatings
11/13/2008US20080280158 Coated Sanitaryware Item
11/13/2008US20080280130 Component, an apparatus and a method for the manufacture of a layer system
11/13/2008US20080280119 Conductive film and method for manufacturing the same
11/13/2008US20080280114 Method for depositing a target material onto a substrate, laser deposition system for performing the method, and housing made by the method
11/13/2008US20080276755 Gear
11/13/2008DE19522331B4 Verfahren zum Beschichten mindestens eines Werkstückes, Anlage hierfür sowie Verfahren zum Betrieb einer kathodischen Bogenentladung und Verwendung desselben The same method of coating at least one workpiece, this system and method for operating a cathodic arc discharge and use
11/13/2008DE102006033072B4 Verfahren und Vorrichtung zum Beschichten von Substraten durch Tauchen in eine Metallschmelze Method and device for coating substrates by dipping in a molten metal
11/13/2008DE102004041854B4 Verfahren und Vorrichtung zur thermischen Vakuumbeschichtung Method and device for the thermal vacuum coating
11/13/2008CA2686242A1 Fine grained, non banded, refractory metal sputtering targets with a uniformly random crystallographic orientation, method for making such film, and thin film based devices and products made there from
11/12/2008EP1991037A1 Plasma gun and plasma gun film forming apparatus provided with same
11/12/2008EP1990564A1 Sliding member and production process thereof
11/12/2008EP1990442A1 Device for vacuum deposition of a coating on a continuous material, with liquid applicator
11/12/2008EP1990441A1 Method and apparatus for registering diffractive optical structures
11/12/2008EP1990432A1 Semiconductor device, its manufacturing method, and sputtering target material for use in the method
11/12/2008EP1990028A2 Endoluminal device exhibiting improved endothelialization and method of manufacture thereof
11/12/2008EP1989340A1 Target arrangement
11/12/2008EP1737997B1 Device for coating both sides of a substrate with a hydrophobic layer
11/12/2008EP1664367B1 Method for treating antireflection coatings on an optical substrate, the thus obtained optical substrate and device for carrying gout said method
11/12/2008EP1322567B1 Temporary protective covers
11/12/2008CN201148463Y Clamp for performing vacuum coating and spray painting for lock body
11/12/2008CN201148462Y Chucking appliance performing vacuum coating and spray painting for lock body
11/12/2008CN201148461Y Conveying rail capable of changing track as well as solar thermal-collecting tube continuous sputter film-plating machine
11/12/2008CN101305111A Method for applying a porous glass layer
11/12/2008CN101304634A Flexible laminated board and manufacturing method thereof
11/12/2008CN101303860A Magnetic recording/reproducing head, magnetic recording medium, and method for manufacturing them
11/12/2008CN101302607A Low-adsorption products production method based on siliconization process
11/12/2008CN101302606A Magnesium alloy surface strengthening method and apparatus
11/12/2008CN101302079A Coated glass, coating system for preparing the same and coating method
11/12/2008CN100433415C Composite electrode having platinum adulterated by nickel acid lanthanum and its preparing method
11/12/2008CN100433355C Deposition mask, method for manufacturing display unit using it, and display unit
11/12/2008CN100433236C Use of pulsed votage in a plasma reactor
11/12/2008CN100432286C Multipair target thin film sputterying instrument
11/12/2008CN100432285C Technique for increasing A1 caverne in metal wire through sprttered film for metal wire
11/12/2008CN100432284C Production of tin-doped indium oxide ITO thin film by electronic beam evaporation
11/12/2008CN100432283C Rare earth based permanent magnet
11/12/2008CN100432282C Tungsten/iridium composite coating layer for carbon material antioxidation and its preparation method
11/12/2008CN100432281C Iridium coating layer for carbon material anti oxidation and its preparation method
11/12/2008CN100432280C Multi particle jewel adhesive method and equipment
11/12/2008CN100431756C Cutting tool made of surface-coated super hard alloy, and method for manufacture thereof
11/12/2008CN100431717C Method for optimization of radiant curing of surface coatings on three-dimensional objects
11/11/2008US7450233 Measuring device for the measurement of optical properties of coated substrates
11/11/2008US7449253 High wear resistant hard film
11/11/2008US7449213 An inspection step that allows operation for quickly feeding back results obtained by inspecting a phosphor layer to an application step of applying a phosphor material while allowing identification of types of defects
11/11/2008US7448397 Apparatus for applying disparate etching solutions to interior and exterior surfaces
11/06/2008WO2008134516A2 Novel manufacturing design and processing methods and apparatus for sputtering targets
11/06/2008WO2008134467A1 Apparatuses and methods for cryogenic cooling in thermal surface treatment processes
1 ... 273 274 275 276 277 278 279 280 281 282 283 284 285 286 287 288 289 290 291 292 293 ... 674