Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
10/2008
10/30/2008US20080264776 generating a nitrogen plasma with a radio frequency field and a power of less than or equal to 2 kW; and treating the gold film with said nitrogen plasma to from gold nitride film on a silicon wafer substrate; nitriding
10/30/2008US20080264775 sputter forms a film on an incline, while rotating the substrate; facilities obtaining a stack film wherein the film thickness is distributed at a given incline rate, and in a single direction of the substrate
10/30/2008US20080264774 electrochemical deposition of copper, a barrier layer of tantalum nitride/tantalum was formed, followed by physical vapor deposition of copper seed layer; gap fill metallization; reduction of copper oxide to copper; reducing gas selected from hydrogen, argon, nitrogen, ammonia and boronhydride
10/30/2008US20080264337 Substrate processing apparatus and method for manufacturing semiconductor device
10/30/2008US20080264336 Mechanical and acoustical suspension coating of medical implants
10/30/2008DE10355682B4 Trägeranordnung Carrier assembly
10/30/2008DE10213043B4 Rohrmagnetron und seine Verwendung Tubular magnetron and its use
10/30/2008DE102007057699A1 Electrically conductive fluid distribution component for fuel cell comprises metallized regions on surface of conductive non-metallic porous media layer
10/30/2008DE102007019994A1 Transparente Barrierefolie und Verfahren zum Herstellen derselben Transparent barrier film and method for manufacturing the same
10/30/2008DE102007019982A1 Anordnung zur Ausbildung von Beschichtungen auf Substraten im Vakuum Arrangement for the formation of coatings on substrates in vacuum
10/30/2008CA2630122A1 Method of deposition onto a sic-covered substrate
10/30/2008CA2630121A1 Method of deposition of aluminum onto a sic-covered substrate
10/29/2008EP1986472A2 Method for patterning, method for forming film, patterning apparatus, film formation apparatus, electro-optic apparatus and method for manufacturing the same, electronic equipment, and electronic apparatus and method for manufacturing the same
10/29/2008EP1985725A2 Sputtering target, optical information recording medium and process for producing the same
10/29/2008EP1985584A1 Method for producing a carbon-containing material by carbon electron-beam vaporisation in a vacuum and a subsequent condensation thereof on a substrate and a device for carrying out said method
10/29/2008EP1984534A1 Radiopaque coatings for polymer substrates
10/29/2008EP1984152A2 Multi-layer coating for razor blades
10/29/2008EP1700324B1 Self-healing liquid contact switch
10/29/2008EP1429326B1 Sputtering target and production method therefor and optical recording medium formed with phase-change type optical disk protection film
10/29/2008EP1287172B1 High purity niobium and products containing the same, and methods of making the same
10/29/2008CN201142322Y Improved structure of carrier disk
10/29/2008CN201141398Y Plated film bearing
10/29/2008CN101297060A Sheet-like plasma generator, and film deposition method and equipment employing such sheet-like plasma generator
10/29/2008CN101297059A Cathode incorporating fixed or rotating target in combination with a moving magnet assembly and applications thereof
10/29/2008CN101295704A Ta-Al-N diffusion blocking layer thin film for copper wiring and preparation thereof
10/29/2008CN101295631A Sputtering film forming method, electronic device manufacturing method, and sputtering system
10/29/2008CN101295560A Multi-layer isolation layer and YBCO coating conductor on metal base band, and preparation thereof
10/29/2008CN101295031A Double-frequency magnetic response negative magnetoconductivity metal compound structure material and production method thereof
10/29/2008CN101294284A Ablation-resistant fatigue-resistant plasma surface recombination reinforcing method
10/29/2008CN101294283A Method for processing magnesium alloy surface
10/29/2008CN101294272A Method for sputtering and depositing tin indium oxide transparent electroconductive film on flexible substrate at room temperature
10/29/2008CN101294271A Deposition apparatus
10/29/2008CN101294270A Equipment and method for producing nichrome composite plate with vacuum arc ion plating
10/29/2008CN101294269A Process for producing vitrification SiO2-Al2O3 mix oxide deposition material
10/29/2008CN101294268A Nitrogen case hardening method of orientation silicon steel
10/29/2008CN101293409A Metallic-organic complex function thin film with stepped construction and uses thereof
10/28/2008US7442665 Forming intermetallics, alloy, ceramic or composite
10/28/2008US7442627 Transparent conductive layer forming method, transparent conductive layer formed by the method, and material comprising the layer
10/28/2008US7442428 Gas barrier substrate
10/28/2008US7442285 Common rack for electroplating and PVD coating operations
10/28/2008US7442258 Organic electroluminescent device for fabricating shadow mask
10/23/2008WO2008127554A1 Fine control of vaporized organic material
10/23/2008WO2008127493A1 Ultra smooth face sputter targets and methods of producing same
10/23/2008WO2008126811A1 Magnetron sputtering apparatus
10/23/2008WO2008126525A1 Metallic separator for fuel cell and process for producing the metallic separator
10/23/2008WO2008126489A1 Sputtering system and method for using sputtering system
10/23/2008WO2008126445A1 Fluorescent material film forming equipment
10/23/2008WO2007149546A3 Implantable medical devices comprising cathodic arc produced structures
10/23/2008WO2007126469A3 Method for conditioning a process chamber
10/23/2008US20080261072 Clad textured metal substrate for forming epitaxial thin film thereon and method for manufacturing the same
10/23/2008US20080261056 Coating; a photocatalytic compound in intimate association with Gallium Phosphide, Cadmium Sulfide, oxide of potassium, tantallum and Niobium, Cadmium Selenide, oxide of Strontium Titanium, TiO2, ZnO, Fe2O3, WO3, Nb2O5, V2O5 and Eu2O3.
10/23/2008US20080260963 Substrate support, a proximity head to dispense a treatment gas having a chamber to excite the treatment gas before being dispensed
10/23/2008US20080260940 Improving metal migration performance and reducing void propagation; barrier atomic layer deposition using proximity heads then copper seed deposition under controlled ambient transition conditions
10/23/2008US20080260478 Pvd Coated Substrate
10/23/2008US20080258073 Method and apparatus for simultaneously depositing and observing materials on a target
10/23/2008US20080257724 sputtering; hot forging copper billet, upset forging to form part, rotating, quenching, heating, cooling, cold rolling, annealing, hydroforming
10/23/2008US20080257723 Physical Vapor Deposition System
10/23/2008US20080257716 Coating Method and Apparatus, a Permanent Magnet, and Manufacturing Method Thereof
10/23/2008US20080257715 Method of Deposition with Reduction of Contaminants in An Ion Assist Beam and Associated Apparatus
10/23/2008US20080257714 Method of making a tmr sensor having a tunnel barrier with graded oxygen content
10/23/2008US20080257481 Sealing of plastic containers
10/23/2008US20080257475 Flexible electrically conductive film
10/23/2008US20080257263 Cooling shield for substrate processing chamber
10/23/2008US20080257014 Partial pressure measuring method and partial pressure measuring apparatus
10/23/2008DE112006003294T5 Absperrventil für eine Vakuumvorrichtung Shut-off valve for a vacuum device
10/23/2008DE112006003218T5 Filmherstellvorrichtung und Verfahren zum Herstellen eines Films Filmherstellvorrichtung and method for producing a film
10/23/2008DE102007018535A1 Protective material, useful to provide barrier effect against chemical attacks, comprises different layers of fluoroplastic materials, which are coated by metallic and/or ceramic materials
10/22/2008EP1983072A1 Processing device and method for processing a subtrate
10/22/2008EP1983071A1 Method for manufacturing pyrolytic boron nitride composite substrate
10/22/2008EP1983070A2 Metal oxide layer formed on substrates and its fabrication methods
10/22/2008EP1982967A2 Freestanding reactive multilayer foils
10/22/2008EP1982003A2 Process for forming a metallized sheet
10/22/2008EP1982002A1 Process for producing partially metallized substrates
10/22/2008EP1831429A4 Methods and apparatus for sequentially alternating among plasma processes in order to optimize a substrate
10/22/2008EP1680527A4 Apparatus and process for high rate deposition of rutile titanium dioxide
10/22/2008EP1393340B1 Ion gun
10/22/2008EP1187148B1 Thin permanent-magnet film and process for producing the same
10/22/2008CN201136891Y Coating part rack for ion device planting film on surface of ceramic tile
10/22/2008CN101292058A Film forming material supplying apparatus
10/22/2008CN101291806A Durable thermal barrier coating having low thermal conductivity
10/22/2008CN101291742A Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantation
10/22/2008CN101289738A Film thickness correcting process and system for magnetron sputtering coating
10/22/2008CN101289737A Program controlled and compounding magnetic field controlled vaporizing ionization source for round cathode surface arc spot
10/22/2008CN101289736A Partial pressure measuring method and partial pressure measuring apparatus
10/22/2008CN100428581C Method for manufacturing electric connector
10/22/2008CN100428536C Sb2Se3 anode film material for lithium ion cell and its preparing method
10/22/2008CN100428527C Mask and its mfg. method, electroluminescent apparatus and its mfg. method, and electronic apparatus
10/22/2008CN100428367C Aluminum alloy wiring material having high resistance to heat and target material
10/22/2008CN100427640C Vacuum coating device
10/22/2008CN100427639C Method for fabricating oriented film of liquid crystal by using sputtering in long range
10/22/2008CN100427638C Sputtering target for forming optical recording medium protection film and optical recording medium with protection film produced by the same
10/22/2008CN100427381C Diameter thinning method of one-dimensional micro-nanometer structural material of metal organic complex
10/21/2008US7439208 Growth of in-situ thin films by reactive evaporation
10/21/2008US7439194 Lanthanide doped TiOx dielectric films by plasma oxidation
10/21/2008US7438965 Phase-change information recording medium, manufacturing method for the same, sputtering target, method for using the phase-change information recording medium and optical recording apparatus
10/21/2008US7438955 Titanium nitride thin film formation on metal substrate by chemical vapor deposition in a magnetized sheet plasma source
10/21/2008US7438762 Manufacture method for ZnO based compound semiconductor crystal and ZnO based compound semiconductor substrate
10/21/2008CA2347830C Process for making metal flakes
10/16/2008WO2008124555A1 Techniques for low-temperature ion implantation
10/16/2008WO2008124519A2 Stents with ceramic drug reservoir layer and methods of making and using the same