Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
10/2008
10/16/2008WO2008123575A1 Vapor deposition material and optical thin film obtained from the same
10/16/2008WO2008123545A1 ZnO THIN FILM
10/16/2008WO2008123544A1 Oxide thin film and oxide thin film device
10/16/2008WO2008123441A1 Polycrystalline thin film and method for producing the same and oxide superconductor
10/16/2008WO2008123434A1 Rotating magnetron sputtering apparatus
10/16/2008WO2008123421A1 Ion implanting apparatus
10/16/2008WO2008123420A1 Process for producing indium oxide-type transparent electroconductive film
10/16/2008WO2008123170A1 SnO2 SPUTTERING TARGET AND SPUTTERED FILM
10/16/2008WO2008122738A2 Method for assembling at least two plates and use of said method for making an ionic sputtering assembly
10/16/2008WO2008083020A3 Technique for using an improved shield ring in plasma-based ion implantation
10/16/2008WO2008027186A3 Integrated process for sputter deposition of a conductive barrier layer, especially an alloy of ruthenium and tantalum, underlying copper or copper alloy seed layer
10/16/2008WO2007139258A8 Coating and ion beam mixing apparatus and method to enhance the corrosion resistance of the materials at the elevated temperature using the same
10/16/2008WO2007105252A8 Use of magnesium-copper compositions for the evaporation of magnesium and magnesium dispensers
10/16/2008WO2007022276A3 Siox:si composite material compositions and methods of making same
10/16/2008US20080254266 Gas Barrier Film and Gas Barrier Laminate
10/16/2008US20080254256 Heat-resistant light-shading film and production method thereof, and diaphragm or light intensity adjusting device using the same
10/16/2008US20080254235 Pulsed laser deposition of high quality photoluminescent GaN films
10/16/2008US20080254233 Plasma-induced charge damage control for plasma enhanced chemical vapor deposition processes
10/16/2008US20080253925 Alloy of aluminum/ rare earth element or aluminum/nickel/rare earth element of Lanthanum, Cerium, Praseodymium, and/or Neodymium; semiconductors
10/16/2008US20080251495 Methods of preparing printed circuit boards and packaging substrates of integrated circuit
10/16/2008US20080251376 Vacuum Processing Device and Method of Manufacturing Optical Disk
10/16/2008US20080251017 Fastening Unit for Ignition Units and Device for Carbon Deposition
10/16/2008DE102007018261A1 Werkstoff für Schutzschichten auf hochtemperaturbelastbaren, chromoxidbildenden Substraten, ein Verfahren zu seiner Herstellung sowie Verwendung Material for high-temperature protective coatings on duty, chromium oxide substrates, a process for its preparation and use
10/16/2008DE102004026344B4 Verfahren zum Herstellen einer hydrophoben Beschichtung, Vorrichtung zum Durchführen des Verfahrens und Substrat mit einer hydrophoben Beschichtung A method for producing a hydrophobic coating apparatus for performing the method and substrate with a hydrophobic coating
10/15/2008EP1981089A2 Transparent electrode film based on indium oxide with titanium and tungsten admixtures and manufacturing method thereof
10/15/2008EP1981067A1 Molecular beam cell having purge function
10/15/2008EP1981042A1 Inductive devices with granular magnetic materials
10/15/2008EP1981036A1 Transparent electroconductive film and process for producing transparent electroconductive film
10/15/2008EP1980644A1 Apparatus and method for coating of a plastic substrate
10/15/2008EP1979930A1 Apparatus for degassing a wafer-like substrate
10/15/2008EP1979537A2 Device and method for the surface treatment of rollers in the paper industry
10/15/2008EP1979504A2 Vapor deposition apparatus and method
10/15/2008EP1706068A4 Radiopaque coating for biomedical devices
10/15/2008EP1644143A4 Sputtering target assembly having low conductivity backing plate and method of making same
10/15/2008EP1495153B1 Method for coating metal surfaces
10/15/2008EP1278631B1 Method of making reactive multilayer foil and resulting product
10/15/2008CN201132850Y Automatic pressurized device for magnetron sputtering vacuum coating machine
10/15/2008CN201132849Y Film-plating machine for depositing multilayer films by using filtered cathode metal vapor vacuum arc plasma body out of sight
10/15/2008CN201132848Y Device for depositing high-quality film by arc ion plating
10/15/2008CN201132847Y Heating evaporator boat used in field of vacuum coating
10/15/2008CN101287858A High-purity ru alloy target, process for producing the same and sputtered film
10/15/2008CN101287857A Coating process for manufacture or reprocessing of sputter targets and x-ray anodes
10/15/2008CN101287856A Method for making a thin film layer
10/15/2008CN101287855A Module for a coating system and associated technology
10/15/2008CN101287612A Gravure printing roll and method for manufacture thereof
10/15/2008CN101286496A Electrically conductive barrier material for copper wiring and preparing method thereof
10/15/2008CN101286471A Polluting device for anti-slipping sheet
10/15/2008CN101286429A Single walled carbon nanotube membrane for cathode of field emission display and method of manufacture and test
10/15/2008CN101286422A A light sensitive press key and manufacturing method therefor
10/15/2008CN101285904A Thickness adjusting multilevel micro- reflector mixing manufacture method
10/15/2008CN101285192A Preparation method for titanic oxide nano-tube composite electrode under room temperture
10/15/2008CN101285173A Double-target radio frequency magnetron cosputtering method of Mg<x>Zn<1-x>O film
10/15/2008CN101285172A Rotary magnetron sputtering target
10/15/2008CN101285171A Rotary cylindrical magnetron sputtering target
10/15/2008CN101285170A Process for preparing wide-band and wave-absorbing magnetic multilayer membranous
10/15/2008CN101285169A Device for increasing utilization ratio of high vacuum ion beam sputter target
10/15/2008CN101285168A Preparation method of porous conducting nano copper film material with ultra- hydrophobicity
10/15/2008CN101285167A Ion beam emission source for outputting single ionic energy
10/15/2008CN101285166A Process for increasing binding force and reducing process temperature in filming process of sheet metal strip
10/15/2008CN101285165A Target material for preparing TFT LCD electrode film and method for preparing target material and electrode
10/15/2008CN101285164A Target material for preparing transparent conductive film and method for preparing conductive film and electrode
10/15/2008CN101284664A Modification methods for carbon nano-tube and manufacturing method for carbon nano-tube electron device
10/15/2008CN101284654A Preparing method of high active selenium source for selenylation, apparatus and applications
10/15/2008CN100426580C Fuel cell membrane electrode assemblies with improved power outputs and poison resistance
10/15/2008CN100425729C Method for cleaning sputter
10/15/2008CN100425391C Tools coated with cemented carbides
10/14/2008US7437060 Delivery systems for efficient vaporization of precursor source material
10/14/2008US7436526 Real-time system for monitoring and controlling film uniformity and method of applying the same
10/14/2008US7436013 Ferroelectric memory device
10/14/2008US7435487 Arc-discharge ion-plating inorganic coatings contains elements selecting from aluminum, chromium, or silicon, and nitrogen, boron, carbon, or oxygen; crystal structure; adhesion, hardness, resist to heat, oxidation and wear, elastic recovery
10/14/2008US7435486 Insert for metal cutting
10/14/2008US7435353 Patterning by energetically-stimulated local removal of solid-condensed-gas layers and solid state chemical reactions produced with such layers
10/14/2008US7435325 Impurities such as iron, cobalt and copper contained in the anolyte are eliminated by oxidizing and precipitating as hydroxide, preliminary electrolysis, and/or displacement with a Ni foil
10/14/2008US7435300 Dynamic film thickness control system/method and its utilization
10/09/2008WO2008120716A1 Substrate processing apparatus, substrate processing method and computer readable storage medium
10/09/2008WO2008120656A1 Plasma generation equipment rendered electrically neutral on the periphery of plasma gun
10/09/2008WO2008120610A1 Deposition source unit, deposition apparatus and temperature control apparatus for deposition source unit
10/09/2008WO2008120589A1 Vapor source for vapor deposition, radiographic image conversion panel and method for manufacturing radiographic image conversion panel
10/09/2008WO2008120445A1 Sensor fixing structure and vacuum film deposition apparatus
10/09/2008WO2008120430A1 Sheet plasma apparatus and sheet-like plasma adjusting method
10/09/2008WO2008119514A1 Method and device for coating particularly rounded objects by means of a pvd and/or cvd or pacvd method in a vacuum system
10/09/2008WO2008119321A1 Layer system for an electrolyte of a high-temperature fuel cell, and method for producing same
10/09/2008WO2008119173A1 Coating
10/09/2008WO2007102970A3 Etch and sidewall selectivity in plasma sputtering
10/09/2008US20080248647 Method of depositing materials on a non-planar surface
10/09/2008US20080248430 Oxidation, reduction; sputtering; vapor deposition; electroless plating; photoresists; photomasks
10/09/2008US20080248324 Piezoelectric element and film formation method for crystalline ceramic
10/09/2008US20080248320 Coating for Parts Made of Titanium or the Alloy Thereof or Preventing Cold Welding
10/09/2008US20080248316 Inorganic composition article
10/09/2008US20080248291 Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby
10/09/2008US20080248263 Method of creating super-hydrophobic and-or super-hydrophilic surfaces on substrates, and articles created thereby
10/09/2008US20080248219 contains a transparent conductive oxide as a surface layer and has a photo reflectance below 0.5%; layers are formed by an in-line or roll-to-roll vacuum sputtering method; plasma display or a liquid crystal display
10/09/2008US20080248215 cleaning a surface of the plastic substrate with a non-reactive low energy plasma; and activating the surface of the plastic substrate with a reactive high energy ion radiation
10/09/2008US20080248214 Method of forming an oxide coating with dimples on its surface
10/09/2008US20080247738 Nozzle-based, vapor-phase, plume delivery structure for use in production of thin-film deposition layer
10/09/2008US20080247737 Nozzle-based, vapor-phase, plume delivery structure for use in production of thin-film deposition layer
10/09/2008US20080247046 Glare free mirror pane as well as a rear view mirror with such a mirror pane
10/09/2008US20080247009 Optical Component Made of an Inorganic-Organic Hybrid Material for the Production of Refractive Index Gradient Layers with High Lateral Resolution and Method for the Production Thereof
10/09/2008US20080245658 Heat resistant barrier stack; dielectric and interface layers; annealing
10/09/2008US20080245657 Sputtering device and film forming method