Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
03/2009
03/26/2009WO2009036910A1 Tubular sputtering target having a grooved outer surface of the support tube
03/26/2009WO2009036775A1 Process for preparing methyltrioxorhenium and organorhenium(vii) oxides
03/26/2009US20090081819 Method and apparatus for managing manufacturing equipment, method for manufacturing device thereby
03/26/2009US20090081434 Thin film getter devices
03/26/2009US20090081425 Precious metal jewelry and process for producing the same
03/26/2009US20090081391 Methanol oxidation catalyst
03/26/2009US20090081378 Layered lenses and method of layering lenses
03/26/2009US20090081343 Slip Resistant Tubular Food Casing Comprising Cellulose or Fibre-Reinforced Cellulose
03/26/2009US20090080098 Absorption Type Multi-Layer Film ND Filter and Process for Producing the Same
03/26/2009US20090078580 Method for Forming Cu Film
03/26/2009US20090078572 Magnetron end-block with shielded target mounting assembly
03/26/2009US20090078571 Magnet assembly capable of generating magnetic field having direction that is uniform and can be changed and sputtering apparatus using the same
03/26/2009US20090078570 Target/backing plate constructions, and methods of forming target/backing plate constructions
03/26/2009US20090078569 Inductively coupled plasma processing apparatus
03/26/2009US20090078567 Method of connecting electrodes and hydrogen generating apparatus using the same
03/26/2009US20090078566 Deposited Film Forming Method, Deposited Film Forming Device, Deposited Film, and Photosensitive Member Provided with the Deposited Film
03/26/2009US20090078565 Method and apparatus for depositing a coating onto a substrate
03/26/2009US20090078564 Target structure and target holding apparatus
03/26/2009US20090078563 Plasma Processing Apparatus And Method Capable of Adjusting Temperature Within Sample Table
03/26/2009US20090078391 Sputter targets and methods of manufacturing same to reduce particulate emission during sputtering
03/26/2009US20090078374 Apparatus and methods for transporting and processing substrates
03/26/2009US20090078202 Substrate heater for material deposition
03/26/2009DE10355678B4 Vakuumsystem, Verfahren zum Transport eines Objekts im Vakuum mittels des Vakuumsystems und Verwendung des Vakuumsystems Vacuum system, method for transporting an object in a vacuum via the vacuum system and the vacuum system using
03/26/2009DE10215369B4 Kathodenzerstäubungsgerät zur Ausbildung eines Metallfilms unter Verwendung eines Magnetfeldes A sputtering cathode apparatus for forming a metal film using a magnetic field
03/25/2009EP2040098A1 Apparatus and method for producing reflector mirror
03/25/2009EP2039798A1 Transparent conductive film, process for production of the film, and sputtering target for use in the production of the film
03/25/2009EP2039797A1 Sputtering target/backing plate conjunction element
03/25/2009EP2039665A2 Method of producing a lithium phosphate sintered body and sputtering target
03/25/2009EP2038451A2 Corrosion resistant thermal barrier coating material
03/25/2009EP2038450A1 Method for producing an electrically conducting layer
03/25/2009EP2038449A1 Substrate with antimicrobial properties
03/25/2009EP1776229A4 Metallic coatings on silicon substrates, and methods of forming metallic coatings on silicon substrates
03/25/2009EP1664368B1 A method and apparatus for the production of metal coated steel products
03/25/2009EP1641956B1 Rotating tubular sputter target assembly
03/25/2009EP1491255A4 Method for carrying out homogeneous and heterogeneous chemical reactions using plasma
03/25/2009EP1412550B1 Support with getter-material for micromechanical device
03/25/2009CN201212059Y Thickness evenness correcting device of sputter film
03/25/2009CN201212058Y Constant tension control device of high vacuum continuous coating
03/25/2009CN201212057Y Reversible winding control device of high vacuum continuous coating composite film
03/25/2009CN201212056Y Utilization rate strengthening device of high vacuum ion beam sputtering deposition target material
03/25/2009CN101395711A Vertical substrate conveyance device and film deposition equipment
03/25/2009CN101395296A Sputtering target
03/25/2009CN101395295A Target arrangement
03/25/2009CN101395294A System and method for sputtering a tensile silicon nitride film
03/25/2009CN101395290A Semiconductor device, its manufacturing method, and sputtering target material for use in the method
03/25/2009CN101395096A Substrate comprising a stack having thermal properties
03/25/2009CN101394062A Chamber surface passivation method for semi-conductor laser
03/25/2009CN101393980A Silicon cathode, lithium ion secondary battery comprising the same and manufacturing method therefor
03/25/2009CN101393979A Silicon cathode, lithium ion secondary battery comprising the same and manufacturing method therefor
03/25/2009CN101393294A Interference filter and method for its production
03/25/2009CN101392363A Method for diffusion connecting titanium alloy at low temperature and vacuum
03/25/2009CN101392362A Method for preparing ITO target from nano homogeneous ITO powder
03/25/2009CN101391557A Film with false proof function and anti-counterfeiting object containing film
03/25/2009CN101391502A Composite anti-fake film material, preparation method thereof and anti-fake paper using thereof
03/25/2009CN100472815C Electronic device and its mfg. method
03/25/2009CN100472711C Device for and method of creating a model for determining relationship between process and quality
03/25/2009CN100472670C Superconductor and process for producing the same
03/25/2009CN100471998C Surface processing technology for Mg-alloy
03/25/2009CN100471989C Sputtering coating method for high-shielding thin-film against electromagnetic interference on plastic matrix
03/25/2009CN100471988C Cooled backing plate for a sputter target and sputter target made with several backing plates
03/25/2009CN100471987C Method for improving sputtering and deposition processes
03/25/2009CN100471986C A method of manufacturing a sputter target
03/25/2009CN100471985C Making process for cellphone window protecting screen
03/25/2009CN100471984C Method of depositing a material layer
03/24/2009US7507615 Method of manufacturing gate insulated field effect transistors
03/24/2009US7507483 Enhanced bonding layers on native oxide surfaces
03/24/2009US7507467 Microchannels with minimum widths separate fluid from particles to be filtered; fluid flows through the widths into the microchannels and particles to be filtered are prevented from passing through the the widths; microchannels can be provided with gradient characteristics
03/24/2009US7507458 Semi-reflective film and reflective film for optical information recording medium, optical information recording medium, and sputtering target
03/24/2009US7507447 Transparent conductive film, method for producing same and method for forming pattern
03/24/2009US7507357 Transparent oxide electrode film and manufacturing method thereof, transparent electroconductive base material, solar cell and photo detection element
03/24/2009US7507304 Copper alloy sputtering target and semiconductor element wiring
03/19/2009WO2009036284A1 Low-maintenance coatings, and methods for producing low-maintenance coatings
03/19/2009WO2009036263A2 Low-maintenance coating technology
03/19/2009WO2009035933A2 Sputtering targets comprising a novel manufacturing design, methods of production and uses thereof
03/19/2009WO2009035870A2 Magnesium-titanium solid solution alloys
03/19/2009WO2009035404A1 Insert for milling of cast iron
03/19/2009WO2009035396A1 Coated cutting insert for machining of titanium based alloys
03/19/2009WO2009035002A1 Electrostatic chuck
03/19/2009WO2009034939A1 Process for producing thin organic film
03/19/2009WO2009034938A1 Organic-material vapor generator, film deposition source, and film deposition apparatus
03/19/2009WO2009034916A1 Vapor emission device, organic thin-film vapor deposition apparatus and method of organic thin-film vapor deposition
03/19/2009WO2009034915A1 Evaporation apparatus
03/19/2009WO2009034869A1 Vacuum processing system and substrate transfer method
03/19/2009WO2009034822A1 Substrate processing apparatus, method for suppressing contamination of substrate processing apparatus, and storage medium
03/19/2009WO2009034775A1 Method for producing sintered body, sintered body, sputtering target composed of the sintered body, and sputtering target-backing plate assembly
03/19/2009WO2009034716A1 Composite material and coated cutting tool
03/19/2009WO2009034610A1 Method of preventing detachment of deposited film on substrate retention tool in thin-film forming apparatus and thin-film forming apparatus
03/19/2009WO2009034566A1 Vapor deposition of biomolecules
03/19/2009WO2009034359A1 Coatings to resist and protect against aquatic biofouling
03/19/2009WO2009033503A1 Method for manufacturing a compound film
03/19/2009WO2009014394A3 Method for depositing ceramic thin film by sputtering using non-conductive target
03/19/2009WO2008156794A3 Sputtering target having increased life and sputtering uniformity
03/19/2009WO2008155087A3 Plasma reactor, and method for the production of monocrystalline diamond layers
03/19/2009WO2008153785A3 Substrate cleaning chamber and components
03/19/2009WO2008134516A3 Novel manufacturing design and processing methods and apparatus for sputtering targets
03/19/2009US20090075411 Manufacturing apparatus
03/19/2009US20090075361 Microfluidic Device and Method of Manufacturing the Microfluidic Device
03/19/2009US20090075119 Tunable low loss material compositions and methods of manufacture and use therefore
03/19/2009US20090075116 Gravure plate-making roll and method of producing the same
03/19/2009US20090075114 Method for the manufacture of a hard material coating on a metal substrate and a coated substrate