Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
06/2009
06/16/2009US7546840 Method for cleaning reaction container and film deposition system
06/16/2009CA2452637C Visible-light-responsive photoactive coating, coated article, and method of making same
06/11/2009WO2009073864A1 System and method for dual-sided sputter etch of substrates
06/11/2009WO2009072585A1 Process for production of crystalline kln film, process for production of semiconductor device, and semiconductor device
06/11/2009WO2009072426A1 Vacuum processing apparatus and substrate processing method
06/11/2009WO2009072242A1 Thin film forming apparatus and thin film forming method
06/11/2009WO2009071810A2 Substrate provided with a multilayer stack having thermal properties
06/11/2009WO2009071667A1 Reactive sputtering with hipims
06/11/2009WO2009070903A1 Pvd vacuum coating unit
06/11/2009WO2009010753A3 Plasma deposition apparatus
06/11/2009WO2006069085A3 An in-situ chamber clean process to remove by-product deposits from chemical vapor etch chamber
06/11/2009US20090150095 Ultrasonic Method For Detecting Banding In Metals
06/11/2009US20090149564 Transparent flexible film and fabrication method thereof
06/11/2009US20090148652 Diamond Film Deposition and Probes
06/11/2009US20090148631 Compositions and processes for preparing color filter elements using alkali metal fluorides
06/11/2009US20090148604 Substrate Processing Apparatus and Device Manufacturing Method
06/11/2009US20090148599 Pvd - vacuum coating unit
06/11/2009US20090146306 Semiconductor device with epitaxial C49-titanium silicide (TiSi2) layer and method for fabricating the same
06/11/2009US20090145755 Wear-resistant electrochemical test sensor and method of forming the same
06/11/2009US20090145751 Writing apparatus and writing data conversion method
06/11/2009US20090145747 Method and installation for the vacuum colouring of a metal strip by means of magnetron sputtering
06/11/2009US20090145746 Sputter depositing all of the layers in the solar cell, and particularly the copper-indium gallium senium (CIGS) alloy layer; increased deposition area where required properties are achieved and controlled; improved to the back contact/reflecting layer and the elimination of cadmium
06/11/2009US20090145745 Thin film coating system and method
06/11/2009US20090145744 Method of Forming Film, Film Forming Apparatus and Storage Medium
06/11/2009US20090145743 Sputtering devices and methods
06/11/2009US20090145555 Processing apparatus, exhaust processing process and plasma processing process
06/11/2009US20090145358 Deposition material supplying module and thin film deposition system having the same
06/11/2009CA2707581A1 Pvd - vacuum coating unit
06/10/2009EP2068602A1 Radially enlarged type plasma generating apparatus
06/10/2009EP2068389A1 Method for producing separator for fuel cell, separator for fuel cell, and fuel cell
06/10/2009EP2067879A1 Plated material having metal thin film formed by electroless plating, and method for production thereof
06/10/2009EP2067878A1 Plated material having metal thin film formed by electroless plating, and method for production thereof
06/10/2009EP2067874A1 Magnetic shunts in tube targets
06/10/2009EP2067873A1 Ag-based sputtering target
06/10/2009EP2066829A2 Gold alloy layer having nitrogen atoms inserted therein and related processing method
06/10/2009EP2066824A1 Method for depositing an oxide layer on absorbers of solar cells, solar cell and use of the method
06/10/2009EP2066594A1 Low-maintenance coatings, and methods for producing low-maintenance coatings
06/10/2009DE202009003715U1 Schnellverschlusstür für Vakuumanwendungen Quick release door for vacuum applications
06/10/2009DE102007060491A1 Warp thread guide for looms is made from plastic and has coating of electrically conducting or magnetic material, especially metal, alloy or metal-ceramic coating
06/10/2009DE102007060306A1 Magnetische Shunts in Rohrtargets Magnetic shunts in the tube target
06/10/2009DE102007059218A1 Method for guiding the temperature in a diffusion oven comprises using an average temperature rise which is larger than a first average rise of a first linear or non-linear temperature-time function progression
06/10/2009CN201254600Y Vacuum coating film device of gradually layer film thickness
06/10/2009CN101454478A Thermal evaporation apparatus, use and method of depositing a material
06/10/2009CN101454477A Thermal barrier coating with tungsten-bronze structure
06/10/2009CN101454476A Metal member having precious metal plating and manufacturingmethod of that metal member
06/10/2009CN101451233A Motion control device of rectangle sample magnetron sputtering instrument and control method thereof
06/10/2009CN101451232A Method for preparing nano composite multiple layer hard film
06/10/2009CN101451231A Magnetron sputtering cathode mechanism
06/10/2009CN101451230A Metal evaporation equipment
06/10/2009CN101451229A Deposition material supplying module and thin film deposition system having the same
06/10/2009CN101451228A Hard coating excellent in sliding property and method for forming same
06/10/2009CN101451227A Evaporation mask and method for manufacturing organic electroluminescent device thereby
06/10/2009CN100497728C Method for depositing magnetic film on flexible substrate
06/10/2009CN100497727C Multifunctional vacuum continuous coating apparatus
06/10/2009CN100497726C Surface treating device of mirror
06/10/2009CN100497725C Single target sputter method for preparing bismuth telluride thin film using powder target material
06/10/2009CN100497724C Vacuum electric arc deposition equipment
06/10/2009CN100497723C Method for preparing thick film of superfine crystal in pure aluminum through DC magnetism controlled sputtering
06/10/2009CN100497722C Method for preparing CeO2 buffer layer on substrate of metal in cube texture
06/10/2009CN100497721C Preprocessed method of optical coating materials
06/09/2009US7544884 Sputtering includes a high efficiency back contact/reflecting multi-layer containing at least one barrier layer consisting of a transition metal nitride, a copper indium gallium diselenide absorber layer is co-sputtered from an electroconductive targets using dual cylindrical rotary magnetron technology
06/09/2009US7544631 C and N-doped titaniumoxide-based photocatalytic and self-cleaning thin films and the process for production thereof
06/09/2009US7544399 Method for vapor depositing a material utilizing an electron beam
06/09/2009US7544397 Recording media having protective overcoats of highly tetrahedral amorphous carbon and methods for their production
06/09/2009US7544382 Dip coating process for producing electrophotographic composition layer having controlled thickness
06/09/2009US7544276 Biased pulse DC reactive sputtering of oxide films
06/09/2009US7544273 Deposition methods and stacked film formed thereby
06/05/2009CA2645293A1 Protective coating systems for gas turbine engine applications and methods for fabricating the same
06/04/2009WO2009070265A1 Control of arbitrary scan path of a rotating magnetron
06/04/2009WO2009070227A1 Dense homogeneous fluoride films for duv elements and method of preparing same
06/04/2009WO2009070111A1 Coated cemented carbide inserts for rough milling of gears
06/04/2009WO2009070109A1 Coated cemented carbide inserts for gear milling in cast low carbon steel parts
06/04/2009WO2009069891A1 Sputtering and ion beam deposition
06/04/2009WO2009069743A1 Substrate processing apparatus and substrate processing method
06/04/2009WO2009069740A1 Film forming device control method, film forming method, film forming device, organic el electronic device, and recording medium storing its control program
06/04/2009WO2009069695A1 Transparent electroconductive film and process for producing the transparent electroconductive film
06/04/2009WO2009069672A1 Sputtering apparatus, and filming method
06/04/2009WO2009069658A1 Sputtering target material and sputtering target obtained by using the sputtering target material
06/04/2009WO2009069506A1 Sio sintering and vapor depositing material and process for producing the same
06/04/2009WO2009069150A1 Non-stoichiometric titanium nitride films
06/04/2009WO2009068373A1 Underbump metallurgy employing sputter-deposited nickel titanium alloy
06/04/2009WO2009068150A1 Frame-based vacuum chamber for coating systems
06/04/2009WO2009040406A3 Method and arrangement for redundant anode sputtering having a dual anode arrangement
06/04/2009WO2009036263A3 Low-maintenance coating technology
06/04/2009WO2007047542A3 Method of preventing analyte alteration in diagnostic apparatuses involving contact of liquid and electrode
06/04/2009WO2006065571A3 Fuel cell conditioning layer
06/04/2009US20090142868 Organic electro-luminance device and method for fabricating the same
06/04/2009US20090142624 Magnetic recording medium and a method of producing the same
06/04/2009US20090142621 heat resistant underlayer film formed by sputter deposition, having crystal structure, seedlayer comprising magnesium oxide
06/04/2009US20090142584 Process for the deposition of metal nanoparticles by physical vapor deposition
06/04/2009US20090142524 Fine laminar barrier protective layer
06/04/2009US20090142509 Hard coating excellent in sliding property and method for forming same
06/04/2009US20090141376 Surface plasmon resonance compatible carbon thin films
06/04/2009US20090141357 Plastic lens comprising multilayer antireflective film and method for manufacturing same
06/04/2009US20090140430 Copper Alloy Sputtering Target and Semiconductor Element Wiring
06/04/2009US20090139865 Double-layer shutter control method of multi-sputtering system
06/04/2009US20090139864 Vertical Substrate Transfer Apparatus and Film-Forming Apparatus
06/04/2009US20090139863 Copper Alloy Sputtering Target and Semiconductor Element Wiring
06/04/2009US20090139862 Rotatable sputter target
06/04/2009US20090139861 Magnetic shunts in tubular targets