Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
07/2009
07/02/2009US20090166865 Manufacturable reliable diffusion-barrier
07/02/2009US20090166640 Copper wire, method for fabricating the same, and thin film transistor substrate with the same
07/02/2009US20090166577 Electrode of Supercapacitor and Method for Manufacturing the Same
07/02/2009US20090166329 Process and marker installation for an object
07/02/2009US20090166195 Sputtering apparatus
07/02/2009US20090166188 Method for depositing electrically insulating layers
07/02/2009US20090166187 Lithium-Containing Transition Metal Oxide Target, Process for Producing the same and Lithium Ion Thin Film Secondary Battery
07/02/2009US20090166186 Novel process for fabrication of a sputter deposited fully dense electrolyte layer embedded in a high performance membrane electrolyte assembly of solid oxide fuel cell
07/02/2009US20090166185 Ion assisted deposition method for forming multilayer film
07/02/2009US20090166184 Perpendicular magnetic medium with shields between tracks
07/02/2009US20090166183 Method of manufacturing a perpendicular magnetic write head with stepped trailing magnetic shield using collimated sputter deposition
07/02/2009US20090166182 Method for manufacturing tunneling magnetoresistive film
07/02/2009US20090166181 Sputter deposition of metal alloy targets containing a high vapor pressure component
07/02/2009US20090165846 Triplet emitter having condensed five-membered rings
07/02/2009US20090165710 Module for supporting a substrate and deposition apparatus having the same
07/02/2009US20090165706 Method for forming a plurality of metal lines in a semiconductor device using dual insulating layer
07/02/2009US20090165705 Batch forming system for amorphous silicon film
07/02/2009DE19649412B4 Vorrichtung und Verfahren zum Bewegen eines Substrats Apparatus and method for moving a substrate
07/02/2009DE10211332B4 Vorrichtung und Verfahren zur Aktivierung von Gasen im Vakuum sowie Verwendung der Vorrichtung Apparatus and method for activation of gases in the vacuum as well as using the apparatus
07/02/2009DE102008062374A1 Floor panel such as laminated panel, comprises surface layer that is applied by plasma coating, which contains silicon oxide, and decorative paper layer that is impregnated with resin, particularly melamine resin
07/02/2009DE102008028008A1 System zur Chargenfertigung von amorpher Siliziumfolie System for batch production of amorphous silicon film
07/02/2009DE102007061418A1 Method for generating hollow cathode arc discharge plasma in a working vacuum chamber and regulating material steam particles exposed to the hollow cathode arc discharge plasma, by reducing gas flow through the hollow cathode
07/02/2009CA2710032A1 Method for depositing metal oxide films
07/01/2009EP2075849A2 Transparent conductive film and solar cell using the same
07/01/2009EP2075352A1 Vacuum processing system
07/01/2009EP2075351A2 A coated plastic sheet, a method for preparing same, and housing using same
07/01/2009EP2074241A1 Coated cutting tool
07/01/2009EP2074238A1 Cap for a display or control element, comprising a light-permeable metal coating, and method for the production thereof
07/01/2009EP2073941A2 Superhydrophobic nanotextured polymer and metal surfaces
07/01/2009EP1929062A4 Aluminum sputtering while biasing wafer
07/01/2009EP1875468B1 Process and device for coating disk-shaped substrates for optical data carriers
07/01/2009EP1609441B1 Biocompatible material
07/01/2009CN201265041Y Vacuum ion film coater
07/01/2009CN201265040Y Vacuum ion film coater
07/01/2009CN201265039Y Hanging rod suspension device of vacuum ion film coater
07/01/2009CN201265038Y Autorotation mechanism of vacuum ion film coater
07/01/2009CN101473059A Cu-Mn alloy sputtering target and semiconductor wiring
07/01/2009CN101473058A Substrate with antimicrobial properties and process for obtaining such substrate
07/01/2009CN101469407A Sputtering equipment with close packing tip anode
07/01/2009CN101469406A Sputtering apparatus
07/01/2009CN101469405A Tubular target sputtering equipment with lengthened tubular anode
07/01/2009CN101469404A Film coating method
07/01/2009CN101469403A Process for manufacturing plasma display panel and substrate holder
07/01/2009CN101469402A Preparation of fullerene-like carbon film
07/01/2009CN101469401A Tinning method
07/01/2009CN101469400A Preparation of titanium-aluminum compound based composite material
07/01/2009CN101469399A Erbium oxide hydrogen resistance coating and preparation thereof
07/01/2009CN101469398A Film coating material and preparation thereof
07/01/2009CN100508112C Method for manufacturing semiconductor device
07/01/2009CN100507072C Synchronous measuring apparatus for current density and energy of ion beam
07/01/2009CN100507071C Process for fabricating magnetic direct current magnetron sputtering cobalt target material
07/01/2009CN100507070C NiTi shape memory alloy bionic nano TiO* tectorial membrane biology medical embedded material and application
07/01/2009CN100507069C ZnO:Zn film preparing method
07/01/2009CN100507068C Aluminum alloy thin film, wiring circuit having the thin film and target material depositing the thin film
06/2009
06/30/2009US7553754 Electronic device, method of manufacture of the same, and sputtering target
06/30/2009US7553518 Substrate processing method
06/30/2009US7552533 Method of manufacturing a fluid ejector head
06/30/2009CA2416093C Vapour deposition
06/25/2009WO2009079358A1 Very low pressure high power impulse triggered magnetron sputtering
06/25/2009WO2009078351A1 Chamber and film-forming apparatus
06/25/2009WO2009078330A1 Zinc oxide sintered compact, process for producing the zinc oxide sintered compact, sputtering target, and electrode formed using the sputtering target
06/25/2009WO2009078329A1 Zinc oxide sintered compact, process for producing the zinc oxide sintered compact, sputtering target, and electrode
06/25/2009WO2009078306A1 Thin film mainly composed of titanium oxide, sintered sputtering target suitable for the production of thin film mainly composed of titanium oxide, and method for production of thin film mainly composed of titanium oxide
06/25/2009WO2009052453A3 Plasma doping system with charge control
06/25/2009WO2009045740A3 Method for depositing films using gas cluster ion beam processing
06/25/2009WO2009015796A3 High temperature evaporator cell having parallel-connected heating zones
06/25/2009US20090162755 Thin Film Electrolyte for Thin Film Batteries
06/25/2009US20090162716 Method of Manufacturing Fuel Cell
06/25/2009US20090162702 Perpendicular magnetic recording medium and method for fabricating the same
06/25/2009US20090162695 Substrate with antimicrobial properties and process for obtaining such substrate
06/25/2009US20090162677 Metal-Free Diamond-Like-Carbon Coatings
06/25/2009US20090162618 Sputtering apparatus and method for forming coating film by sputtering
06/25/2009US20090162565 Method for Forming Tantalum Nitride Film
06/25/2009US20090162153 Coated cutting tool and method of making a coated cutting tool
06/25/2009US20090159566 Method and apparatus for controlling temperature of a substrate
06/25/2009US20090159441 Plasma Film Deposition System
06/25/2009US20090159440 Batch-Type Remote Plasma Processing Apparatus
06/25/2009US20090159439 Apparatus for wafer level arc detection at an RF bias impedance match to the pedestal electrode
06/25/2009US20090159433 Method for Sputter Targets for Electrolyte Films
06/25/2009US20090159432 Thin-film deposition apparatus using discharge electrode and solar cell fabrication method
06/25/2009US20090159431 Method for Forming Tantalum Nitride Film
06/25/2009US20090159430 Method for Forming Tantalum Nitride Film
06/25/2009US20090159429 Reactive sputtering apparatus and reactive sputtering method
06/25/2009US20090159428 Prediction and compensation of erosion in a magnetron sputtering target
06/25/2009US20090159212 Jet plasma gun and plasma device using the same
06/25/2009US20090159197 Method of Forming a Multilayer Test Sensor
06/25/2009DE212007000078U1 Züchtungsmanipulator Breeding manipulator
06/25/2009DE10352143B4 Längserstreckte Vakuumanlage zur ein- oder beidseitigen Beschichtung flacher Substrate Elongate vacuum system for single or double-sided coating of flat substrates
06/25/2009DE102008060683A1 Versatile vacuum chamber for vaporization or coating of samples, used e.g. in educational- and research establishments, includes lightweight, square tubular body
06/25/2009DE102008015078A1 Vacuum evaporator comprises vacuum chamber containing substrate and crucible filled with source material, scales below crucible measuring weight change as source material is used and control unit activating feed of new source material
06/25/2009DE102007062618A1 Verfahren und Vorrichtung zum Beschichten von Gläsern Method and apparatus for coating lenses
06/25/2009DE102007061777A1 Verfahren und Vorrichtung zur Temperaturmessung an zu beschichtenden Substraten Method and apparatus for temperature measurement of substrates to be coated
06/25/2009DE102007061419A1 Transparente Kunststofffolie zum Abschirmen elektromagnetischer Wellen und Verfahren zum Herstellen einer solchen Kunststofffolie Transparent plastic film for shielding electromagnetic waves and method for producing such a plastic film
06/25/2009DE102005045718B4 Träger für ein Substrat Support for a substrate
06/25/2009DE10004824B4 Verfahren zur Herstellung von Substraten, Magnetronquelle, Sputterbeschichtungskammer und Verwendung des Verfahrens A process for the production of substrates, magnetron Sputterbeschichtungskammer and use of the method
06/24/2009EP2073249A1 Linear electron source, evaporator using linear electron source, and applications of electron sources
06/24/2009EP2073248A1 Linear electron source, evaporator using linear electron source, and applications of electron sources
06/24/2009EP2073243A1 Linear electron source, evaporator using linear electron source, and applications of electron sources
06/24/2009EP2072638A1 Coated cutting insert
06/24/2009EP2072637A2 Coated cutting tool and a method of making a coated cutting tool