Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
08/2009
08/05/2009CN101497990A Sputtering film-plating apparatus
08/05/2009CN101497989A Novel high vacuum laser coating machine
08/05/2009CN101497988A Method for plating tantalum on TiNi alloy surface
08/05/2009CN101497987A Apparatus for preparing polycrystal ferriferrous oxide film by facing-target reactive sputtering and operation method
08/05/2009CN101497986A Apparatus for preparing extension ferriferrous oxide film by facing-target reactive sputtering and operation method
08/05/2009CN101497985A Single-phase hexagonal tungsten carbide hard coating material and low temperature synthesizing method thereof
08/05/2009CN101497984A Locating mask
08/05/2009CN101497536A Preparation of SiC fibre surface recombination gradient coating
08/05/2009CN101497424A Nano cable composed of semimetal bismuth and metallic copper and method for synthesizing the same
08/05/2009CN100524682C Method for moving chip and electrostatic sucking disc device
08/05/2009CN100524647C Organic siloxane copolymer film, method and deposition apparatus for producing same, and semiconductor device using such copolymer film
08/05/2009CN100524626C Etch and deposition control for plasma implantation
08/05/2009CN100524623C Preparation of ZnO base thin-magnetic semi-conductor film using electric-magnetic field restricted jigger coupling plasma sputtering sedimentation
08/05/2009CN100523293C Method of forming film, film forming apparatus
08/05/2009CN100523285C Method of manufacturing crystalline film, method of manufacturing crystalline-film-layered substrate, method of manufacturing thermoelectric conversion element, and thermoelectric conversion element
08/05/2009CN100523284C GCr15 bearing steel ball surface intensified ion injection technology
08/05/2009CN100523283C Combined ion implantation technology capable of raising crystallization quality of material
08/05/2009CN100523282C Sputter source, sputtering device, and sputtering method
08/05/2009CN100523281C Sputter arrangement with a magnetron and a target
08/05/2009CN100523280C Method for treating motorcycle engine inner wall
08/05/2009CN100523279C AI-Ni-rare earth element alloy sputtering target
08/05/2009CN100523278C Enhanced oxygen non-stoichiometry compensation for thin films
08/05/2009CN100523277C Sputtering target
08/05/2009CN100523276C Design of hardware features to facilitate arc-spray coating applications and functions
08/05/2009CN100523275C Material evaporation chamber with differential vacuum pumping
08/05/2009CN100523274C Method for preparing silica steam plating material
08/05/2009CN100523273C Nano-stack TiN gradient film and preparation thereof
08/05/2009CN100523272C Method of forming shadow mask pattern
08/05/2009CN100523271C Method for preventing etching or corrosion of metallic titanium in screen layer
08/05/2009CN100523241C Pyrogenic oxidation resistant nickel-aluminium-dysprosium coat bond material and preparation of hot screening coating
08/05/2009CN100522885C Low-temperature preparation method for high zirconium content lead series composite antiferroelectric thin film
08/04/2009US7569494 Apparatus and method for deposition of thin films
08/04/2009US7569285 Phosphate coating; cell proliferation; adhesion to bone tissue
08/04/2009US7569256 Plasma CVD apparatus and dry cleaning method of the same
08/04/2009US7569251 Method of forming a thermal protective coating on a super alloy metal substrate
08/04/2009US7569167 Sputtering target; radiation transparent; electroconductivity; a bixbyite structure indium oxide crystal phase containing tungsten in a solid solution and/or an indium tungstate compound crystal phase, with no tungsten oxide crystal phase; low electrical resistance
08/04/2009US7569125 Shields usable with an inductively coupled plasma reactor
08/04/2009US7569123 Generating an erosion profile recording of the shaped, hollow cathode target by tracing on a grid overlay the sputtering first by a closed plasma loop and then an open one; adjusting the magnetic configuration of the sputtering apparatus to adjust the first closed plasma accordingly; cost efficiency
08/04/2009US7568445 System and method for the holographic deposition of material
07/2009
07/30/2009WO2009094622A2 Vacuum coating techniques
07/30/2009WO2009093598A1 Sputtering film forming method and sputtering film forming apparatus
07/30/2009WO2009093596A1 Method for producing metal fine particle, method for producing metal-containing paste, and method for forming metal thin film wiring
07/30/2009WO2009093580A1 Process for producing liquid crystal display device
07/30/2009WO2009092816A2 Permeation barrier layer
07/30/2009WO2009092459A1 Vacuum coating apparatus and method
07/30/2009WO2009092207A1 A stirring device, a device with said stirring device for producing nanometer powder and its method
07/30/2009US20090191417 Permeation barrier layer
07/30/2009US20090191360 Strip crossbow reduction and strip vibration reduction method and hot dip coated strip manufacturing method using the strip stabilization method
07/30/2009US20090191327 Vacuum coating installation and method of producing a coating layer on a substrate
07/30/2009US20090191326 Thin film forming method and color filter manufacturing method
07/30/2009US20090189817 Housing, wireless communication device using the housing, and manufacturing method thereof
07/30/2009US20090188790 Concentric hollow cathode magnetron sputter source
07/30/2009US20090188789 Sodium/molybdenum powder compacts and methods for producing the same
07/30/2009US20090188786 Hidden Micromirror Support Structure
07/30/2009US20090188785 Sputtering Targets and Methods for Depositing Film Containing Tin and Niobium
07/30/2009US20090188784 Bio-sensors including nanochannel integrated 3-dimensional metallic nanowire gap electrodes, manufacturing method thereof, and bio-disk system comprising the bio-sensors
07/30/2009DE102008015982B3 Verfahren und Vorrichtung zur Fixierung und den Weitertransport stoßempfindlicher Platten in Sputter-Beschichtungsanlagen, Computerprogramm zur Durchführung des Verfahrens und maschinenlesbarer Träger hierzu Method and apparatus for fixing and further transport shock-sensitive plates in sputter coating systems, computer program for carrying out the method and machine-readable carrier for this purpose
07/30/2009DE102008005771A1 Sputtering target for producing physical vapor deposition coatings comprises a rear side made from a base plate with recesses facing the cathode for holding residual components
07/29/2009EP2083466A1 Process for the fabrication of a sputter deposited fully dense electrolyte layer embedded in a high performance membrane electrolyte assembly of solid oxide fuel cell
07/29/2009EP2083095A2 Diamond-like carbon film for sliding parts and method for production thereof
07/29/2009EP2082872A1 Surface-treated resin, method for producing the same, and use of the same
07/29/2009EP2082631A1 A coating method and the coating formed thereby
07/29/2009EP2082079A1 Layer system having at least one mixed crystal layer of a polyoxide
07/29/2009EP2082076A1 Coating optimization process using a coupon and component comprising a coupon
07/29/2009EP2082075A2 Automated layer by layer spray technology
07/29/2009EP2082074A2 Process for depositing a thin film of a metal alloy on a substrate, and a metal alloy in thin-film form
07/29/2009EP1592822B1 Disk coating system
07/29/2009EP1556902A4 Manufacturing apparatus and method for large-scale production of thin-film solar cells
07/29/2009EP1312695B1 Sputtering target producing few particles, backing plate provided with the target, and a method of producing the target
07/29/2009CN201280592Y Transmission mechanism of vacuum sputtering equipment
07/29/2009CN201280591Y Overcurrent protecting equipment for physical vapour deposition heating system
07/29/2009CN201280590Y Universal clamp apparatus for turbine blade coating
07/29/2009CN101495667A CoCrPt-based sputtering target and method for production thereof
07/29/2009CN101495666A Lithium-containing transition metal oxide target, process for producing the same and lithium ion thin-film secondary battery
07/29/2009CN101495665A Vacuum film forming apparatus and vacuum film forming method
07/29/2009CN101495664A Method for forming transparent conductive film
07/29/2009CN101492811A Self-air-suction vacuum plating method
07/29/2009CN101492810A Wafer support assembly
07/29/2009CN101492809A Vacuum magnetron sputtering coil film coating apparatus
07/29/2009CN101492808A Surface treatment process for square TiW target material for sputtering
07/29/2009CN101492807A Self-air-suction vacuum plating method
07/29/2009CN100521103C Plasma processing apparatus and method
07/29/2009CN100521062C Particle-optical device and detection means
07/29/2009CN100521037C Alkali metal generating agent,
07/29/2009CN100519829C Aperture masks for circuit fabrication
07/29/2009CN100519828C Vacuum film plating method and apparatus
07/29/2009CN100519827C Method of forming film on substrate
07/29/2009CN100519826C Evaporated device and method of changing evaporated source therefor
07/29/2009CN100519825C Built-in double warehouse vacuum coating system and application method thereof
07/29/2009CN100519824C Preparation method lowering annealing temperature of spinel ferrite thin film material
07/29/2009CN100519823C Cleaning apparatus
07/29/2009CN100519822C Vacuum production method for SiOx coating on organic precoating metal sheet
07/29/2009CN100519821C Method for producing surface antibiotic product using physical gas phase deposition technology
07/28/2009US7567379 Technique to prevent tin contamination of mirrors and electrodes in an EUV lithography system
07/28/2009US7566957 Support device with discrete getter material microelectronic devices
07/28/2009US7566665 Semiconductor device manufacturing method and manufacturing line thereof
07/28/2009US7566483 Particle irradiation method for modification of local strain in strain reactive structures
07/28/2009US7566482 Silicon-on-insulator (SOI) formed by implanting dopant into substrate, activating dopant by annealing, then anodizing in hydrogen fluoride- containing solution; oxidation
07/28/2009US7566481 Method of making scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s)
07/28/2009US7566472 Cathode sputtering