Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
09/2009
09/16/2009CN100540725C Substrate angle adjusting device used for impulse laser deposition system
09/16/2009CN100540724C Method and apparatus of processing magnesium alloy surface utilizing vacuum composite plating film
09/16/2009CN100540723C Method for producing silicon oxide film and method for producing optical multilayer film
09/16/2009CN100540722C Device for cleaning and air-drying solar heat collecting pipe
09/15/2009US7588803 Exposing dielectric layer to first dose of electron beam radiation at first energy level and thereafter exposing dielectric layer to second dose of electron beam radiation at second energy level that is different from first energy level; improves uniformity of electron energy distributed throughout layer
09/15/2009US7588669 Single-process-chamber deposition system
09/15/2009US7588668 Thermally conductive dielectric bonding of sputtering targets using diamond powder filler or thermally conductive ceramic fillers
09/15/2009US7588667 Depositing rhuthenium films using ionized physical vapor deposition (IPVD)
09/11/2009WO2009110831A1 Oxide coated cutting insert
09/11/2009WO2009110830A1 Oxide coated cutting inser
09/11/2009WO2009110829A1 Thermally stabilized (ti, si)n layer for cutting tool insert
09/11/2009WO2009110404A1 Rotating magnet sputtering apparatus
09/11/2009WO2009110330A1 Semiconductor device manufacturing method, semiconductor manufacturing apparatus and storage medium
09/11/2009WO2009109485A1 Strand-like material composite with cnt yarns and method for the manufacture thereof
09/11/2009WO2009109464A1 Coating apparatus with rotation module
09/11/2009WO2009091721A3 Cmas-resistant thermal barrier coatings
09/11/2009WO2009058351A3 Spinulose surfaces
09/10/2009US20090227104 Film Deposition Method and Film Deposition Apparatus of Metal Film
09/10/2009US20090227093 Patterning During Film Growth
09/10/2009US20090226788 Fuel cell, flow field plate, and method for producing a flow field plate
09/10/2009US20090226764 Magnetic Recording Medium with Iridum-Manganese Based Intermediate Layer and Method of Manufacturing Same
09/10/2009US20090226763 Perpendicular magnetic recording medium, production process thereof, and magnetic recording and reproducing apparatus
09/10/2009US20090226735 Vacuum deposition method
09/10/2009US20090226716 Oxide Coated Cutting Insert
09/10/2009US20090226648 Unknown
09/10/2009US20090226638 Method and Apparatus for Producing Ultra-Thin Graphitic Layers
09/10/2009US20090226618 Coating apparatus with rotation module
09/10/2009US20090226341 High-Purity Hafnium, Target and Thin Film Comprising High-Purity Hafnium, and Process for Producing High-Purity Hafnium
09/10/2009US20090226294 Processing System and Method for Operating the Same
09/10/2009US20090226273 Layered Coated Cutting Tool
09/10/2009US20090223812 Processes and device for the deposition of films on substrates
09/10/2009US20090223452 Gas heating device for a vapor deposition system
09/10/2009US20090223450 Member of substrate processing apparatus and substrate processing apparatus
09/10/2009US20090223443 Supercritical film deposition apparatus
09/10/2009DE4447977B4 Vorrichtung und Verfahren zur Plasmabehandlung von flachen Werkstücken, insbesondere flachen, aktiven Bildschirmen, sowie Verwendung der Vorrichtung Apparatus and method for plasma treatment of flat workpieces, in particular flat active screens, as well as using the apparatus
09/10/2009DE112007002217T5 Bedampfungsvorrichtung A steamer
09/10/2009DE112007002168T5 Permanentmagnet und Verfahren zur Herstellung desselben Permanent magnet and method of manufacturing the same
09/10/2009DE112007002158T5 Unterdruck-Dampf-Bearbeitungs-Vorrichtung Vacuum vapor processing device
09/10/2009DE112007002116T5 Unterdruck-Dampf-Bearbeitungs-Vorrichtung Vacuum vapor processing device
09/10/2009DE10231203B4 Targetträgeranordnung Target support assembly
09/10/2009DE102009009275A1 Aufsputterverfahren, Aufsputtersystem und Chip Sputtering processes, sputter deposition system and chip
09/10/2009DE102008012836A1 Sluicing device for continuously introducing and removing of objects in and from a vacuum treatment chamber, comprises a rotatable sluicing cylinder with outwardly opened chamber arranged at circumference for the reception of a container
09/10/2009DE102008011444A1 Thermochrom beschichtete Substrate und Verfahren zu deren Herstellung Thermochromic coated substrates and processes for their preparation
09/10/2009DE102004045206B4 Vorgefertigte Platte und Verfahren zum Herrichten eines Verdampferkörpers und dessen Betreiben in einer PVD-Metallisierungsanlage A prefabricated panel and method for reconstituting an evaporator body and its operation in a PVD metallisation
09/09/2009EP2098613A1 Oxide target for laser vapor deposition and method of manufacturing the same
09/09/2009EP2098612A2 Oxide coated cutting insert
09/09/2009EP2098611A2 Layered coated cutting tool
09/09/2009EP2098610A1 Hard coating film excellent in lubrication characteristics, process for formation thereof, and tool for the plastic working of metal
09/09/2009EP2098609A1 Coating apparatus with rotation module
09/09/2009EP2098608A1 Coating apparatus with rotation module
09/09/2009EP2098607A1 Method of coating a metal strip and installation for implementing the method
09/09/2009EP2097554A1 Coating installation comprising a radio device and a measuring device
09/09/2009EP2097553A1 Method and device for coating substrates
09/09/2009EP2097208A2 Friction piece in a lubricated medium, working at contact pressures higher than 200 mpa
09/09/2009EP1859228B1 Measuring arrangement and method for the optical monitoring of coating processes
09/09/2009EP1597406B1 Foodware with multilayer stick resistant ceramic coating and method of making
09/09/2009EP1502295B1 Method of making transistors
09/09/2009EP1470263B1 Method for depositing metal-free carbon layers
09/09/2009EP1420002B1 Silicon monoxide sintered product and method for production thereof
09/09/2009CN201305626Y Device for monitoring the status of a target surface
09/09/2009CN201305625Y Filming production line
09/09/2009CN201305624Y Film preparation device
09/09/2009CN201305623Y High temperature corrosion resisting ultrasonic tool head
09/09/2009CN101528972A Thin film forming method and thin film forming device
09/09/2009CN101527362A Method for preparing all solid-state thin-film lithium battery
09/09/2009CN101527322A Flexible and wholly transparent ZnMgO thin film transistor and manufacturing method thereof
09/09/2009CN101527264A Gate dielectric taking TiO2 as MOS structure and preparation method thereof
09/09/2009CN101527237A Method for improving emission characteristic of film ZnO field
09/09/2009CN101526683A Manufacturing method of LCD substrate
09/09/2009CN101525739A Manipulator transferring device adapted to substrate handover position error
09/09/2009CN101525738A Internal surface ion implantation modification device and method of inductively coupled plasmatube barrel
09/09/2009CN101525737A Magnetron sputtering target for filming previous metals
09/09/2009CN101525736A Intellectualization ceramic tile vacuum ion membrane plating equipment
09/09/2009CN101525735A Coating device
09/09/2009CN101525734A Method for preparing boron, carbon and nitrogen hard coating
09/09/2009CN101524930A More environment-friendly print transferring method and product thereof
09/09/2009CN101524905A Oxide coated cutting insert
09/09/2009CN101524904A Layered coated cutting tool
09/09/2009CN101524754A Rapid thermal pressed sintering molding process for titanium-aluminum alloy targets
09/09/2009CN100539257C Negative pole for secondary cell, secondary cell using negative pole, and negative pole manufacturing method
09/09/2009CN100537835C Composite plating process and equipment for magnetron sputtering-laser heating
09/09/2009CN100537834C Cathode arrangement for atomizing a rotatable target pipe
09/09/2009CN100537833C Magnetron sputtering target with on-line cleaning function and its application method
09/09/2009CN100537832C Box-shaped facing-targets sputtering apparatus and method for producing compound thin film
09/09/2009CN100537831C Preparation process of low temperature double ion beam sputtered multilayer Ge/Si film with self-organized Ge quantum dots
09/09/2009CN100537830C Apparatus and methods for ionized deposition of a film or thin layer
09/09/2009CN100537829C Processes for producing a sputtering target from a silicon-based alloy, a sputtering target
09/09/2009CN100537828C Tin oxide powder for ITO sputtering target, manufacturing method of said powder, sintered body sputtering target for ITO film deposition, and manufacturing method of said target
09/09/2009CN100537827C Method for manufacturing condensed nucleus aromatic organic semiconductor monocrystal nanostructure jointed to substrate
09/09/2009CN100537826C Take-up vacuum deposition method and take-up vacuum deposition apparatus
09/09/2009CN100537825C A method and apparatus for the production of metal coated steel products
09/09/2009CN100537824C Method for manufacturing ultra-hydrophilic thin film coated metal product, and ultra-hydrophilic thin film coated metal product
09/09/2009CN100537823C Deposition device for hexamethyl disilylamine
09/09/2009CN100537822C Continuous growing multilayer cube-texture insulating layer on metallic substrate and preparation method thereof
09/09/2009CN100537232C Process for forming a patterned thin film structure for in-mold decoration
09/08/2009US7586572 Liquid crystal display having transparent conductive film on interlayer insulating film formed by coating
09/08/2009US7585584 Carbon nanotubes for fuel cells, method for manufacturing the same, and fuel cell using the same
09/08/2009US7585545 such that the hydrogen sulfur gas or vapour is provided at a high concentration, suitable flow rate, high temperature and energy to cause decomposition of the gas or vapour during the volatization of the source material(s) and deposition of the phosphor; full color displays
09/08/2009US7585399 Rotating magnet arrays for magnetron sputtering apparatus
09/08/2009US7585396 Coated article with ion treated overcoat layer and corresponding method