Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
08/2009
08/27/2009US20090214835 Aqueous-based and transparent coatings for marking substrates
08/27/2009US20090214828 Blunt tip prism film and methods for making the same
08/27/2009US20090214772 Method and apparatus for coating powder material on substrate
08/27/2009US20090214760 Optical Monitoring System for Coating Processes
08/27/2009US20090214169 Structures formed in diamond
08/27/2009US20090213367 Transmissive element
08/27/2009US20090212801 Method of making high-frequency probe, probe card using the high-frequency probe
08/27/2009US20090212238 Apparatus for ion nitriding an aluminum alloy part and process employing such apparatus
08/27/2009US20090211904 Zinc oxide based sputtering target, method of manufacturing the same, and zinc oxide based thin film
08/27/2009US20090211903 Indium zinc oxide based sputtering target, method of manufacturing the same, and indium zinc oxide based thin film
08/27/2009US20090211902 Sputtering target
08/27/2009US20090211898 Magnetic recording media having five element alloy deposited using pulsed direct current sputtering
08/27/2009US20090211897 Sputtering apparatus and method for controlling the same
08/27/2009US20090211896 Cathode and Counter-Cathode Arrangement in an Ion Source
08/27/2009US20090211690 Rapid Prototyping of Microstructures Using a Cutting Plotter
08/27/2009DE112007002523T5 Entfernung einer Oxidationsschicht von einem Metallsubstrat und Aufbringung einer Titanhaftschicht auf das Metallsubstrat Removal of an oxidation film of a metal substrate and applying a titanium adhesion layer onto the metal substrate
08/27/2009DE10348639B4 Schleusensystem für eine Vakuumanlage Lock system for a vacuum system
08/27/2009DE102009010496A1 Sputtertarget Sputtering target
08/27/2009DE102008009487A1 Strahlbehandelter Schneideinsatz und Verfahren Beam-treated cutting insert and methods
08/27/2009DE102007063362B3 Screening device for tubular target, comprises a holding ring fastened to an end block of a tube magnetron and comprising three insulator bodies, three receptacles for insulator bodies and a screening ring centered by the insulator bodies
08/26/2009EP2093520A2 Radiation-selective absorber coating, absorber tube and method for its manufacture
08/26/2009EP2093307A1 Cathodic arc deposition coatings for turbine engine components
08/26/2009EP2093306A1 Plasma display panel manufacturing method and manufacturing device
08/26/2009EP2091642A1 Sealing gate for strips
08/26/2009EP1963721B1 Piston ring for internal combustion engines
08/26/2009EP0824604B1 Apparatus for reducing arcing during sputtering
08/26/2009CN201296779Y Novel electrode box
08/26/2009CN201296778Y Magnetic controlled target for sputtering magnetic material
08/26/2009CN101518161A Radially enlarged type plasma generating apparatus
08/26/2009CN101517799A Method for producing separator for fuel cell, separator for fuel cell, and fuel cell
08/26/2009CN101517759A Method for manufacturing group iii nitride compound semiconductor light-emitting device, group iii nitride compound semiconductor light-emitting device, and lamp
08/26/2009CN101517669A Permanent magnet and process for producing the same
08/26/2009CN101517127A Coated cutting tool
08/26/2009CN101517126A Workpiece with hard coating
08/26/2009CN101517122A Method for depositing an oxide layer on absorbers of solar cells, solar cell and use of the method
08/26/2009CN101517121A Coating apparatus and method
08/26/2009CN101517120A Vacuum evaporation processing equipment
08/26/2009CN101517119A Hard coating film excellent in lubrication characteristics, process for formation thereof, and tool for the plastic working of metal
08/26/2009CN101516615A Decorative part and process for producing the same
08/26/2009CN101515580A SiCN medium diffusion barrier film for copper interconnection and preparation process thereof
08/26/2009CN101514446A Multiple ampoule delivery systems
08/26/2009CN101514443A Boat-shaped member
08/26/2009CN101514442A Magnetron sputtering method
08/26/2009CN101514441A Sputtering apparatus and method for controlling the same
08/26/2009CN101514440A Method for preparation of indium oxide transparent film with high electron mobility
08/26/2009CN101514439A Method for depositing DLC film with changeable refractive index at low temperature
08/26/2009CN101513672A Molding die
08/26/2009CN100533805C Vacuum device
08/26/2009CN100533784C Method for preparing zinc oxide/p type silicon heterojunction ultraviolet electroluminescent device
08/26/2009CN100533670C Method of forming cobalt silicide film and method of manufacturing semiconductor device having cobalt silicide film
08/26/2009CN100533659C Vaccuum processing apparatus
08/26/2009CN100532997C Selective solar energy absorbing coating and method for making same
08/26/2009CN100532872C 轴承元件 Bearing elements
08/26/2009CN100532636C Vacuum treatment device and method of manufacturing optical disk
08/26/2009CN100532635C Method for precipitating corrosion-resistant alloy layer using magnesium alloy surface glow plasma
08/26/2009CN100532634C Magnetic charging method using standing wave resonance coupled power
08/26/2009CN100532633C Magnetic-control sputtering coiling film coating machine
08/26/2009CN100532632C Fe/Mo nano multilayer film and preparation method thereof
08/26/2009CN100532631C Vacuum-coating machine with motor-driven rotary cathode
08/26/2009CN100532630C Nitrogen ion beam assistant electric arc ion plating deposition TiAlN film layer process
08/26/2009CN100532629C Method for preparing premelting lanthanum titanate crystalloid steam plating material
08/26/2009CN100532628C Vacuum deposition of dielectric coatings on volatile material
08/25/2009US7579290 Functional fiber sheet
08/25/2009US7579067 Process chamber component with layered coating and method
08/25/2009US7578965 purification by electrolytic refining; uniform thickness distribution, has a purity of 4N (99.99%) or higher, and is used in forming a capacitor electrode of a semiconductor memory
08/25/2009US7578909 Method of forming CNT containing wiring material and sputtering target material used for the method
08/25/2009US7578908 Sputter coating system
08/25/2009CA2330123C Transparent conductive laminate, its manufacturing method, and display comprising transparent conductive laminate
08/20/2009WO2009103034A2 System, method and apparatus for an amorphous iridium oxide film ph sensor
08/20/2009WO2009102056A1 Process for embedding metal and equipment for depositing metal in recesses
08/20/2009WO2009101953A1 Vapor generating apparatus and deposition apparatus
08/20/2009WO2009101909A1 Magnetron sputtering apparatus and magnetron sputtering method
08/20/2009WO2009101795A1 Thin film forming method and film forming apparatus
08/20/2009WO2009100985A1 Multiple grooved vacuum coupling
08/20/2009WO2009100792A2 Antimicrobial provision of titanium and titanium alloys with silver
08/20/2009WO2009100750A1 Polymeric based lens comprising a hardening layer, an interferential multi- layer and a hard layer sandwiched between both, and corresponding manufacturing method
08/20/2009US20090208761 Radiation-selective absorber coating, absober tube and process for production thereof
08/20/2009US20090208726 Nanoporous membrane, process of fabricating the same and device for controlled release of biopharmaceuticals comprising the same
08/20/2009US20090208707 Thin film forming method and layered structure of thin film
08/20/2009US20090208672 Method of linear patterning at surfaces
08/20/2009US20090208671 Thin film battery fabrication using laser shaping
08/20/2009US20090208640 Fabrication method of composite metal oxide dielectric film, and composite metal oxide dielectric film fabricated thereby
08/20/2009US20090207576 Slotted magnetic material for integrated circuit inductors
08/20/2009US20090207229 Thermal print head and method for manufacturing same
08/20/2009US20090206982 Thin-film resistor with a layer structure and method for manufacturing a thin-film resistor with a layer structure
08/20/2009US20090206747 Organic Electro-Luminescence Device
08/20/2009US20090206368 Rhombohedral cubic semiconductor materials on trigonal substrate with single crystal properties and devices based on such materials
08/20/2009US20090206303 Gallium Oxide-Zinc Oxide Sputtering Target, Method for Forming Transparent Conductive Film, and Transparent Conductive Film
08/20/2009US20090206051 Capacitive substrate and method of making same
08/20/2009US20090205956 Method of making low-E coating using ceramic zinc inclusive target, and target used in same
08/20/2009US20090205955 Method of manufacturing a rotatable sputter target
08/20/2009US20090205954 Apparatus for treating a substrate
08/20/2009US20090205950 Film deposition apparatus and film deposition method
08/20/2009US20090205949 Magnetron sputtering source and arrangement with adjustable secondary magnet arrangement
08/20/2009US20090205948 Generation of multilayer structures in a single sputtering module of a multi-station magnetic recording media fabrication tool
08/20/2009US20090205709 Thin film type solar cell and method for manufacturing the same
08/20/2009DE112007002410T5 Sputter-Target aus einer Mischung von Chromoxid und Chrom-Metall The sputtering target from a mixture of chromium oxide and chromium metal
08/20/2009DE102009008290A1 Verfahren und Vorrichtung zum Beschichten eines Substrats unter Verwendung eines reaktiven Sputterprozesses Method and apparatus for coating a substrate using a reactive sputtering process
08/20/2009DE102008009504A1 Multi-layer coated substrate such as household appliances comprises a transparent first layer applied on the substrate surface, which comprises a substrate contour, and a second layer adjacent to the first layer
08/20/2009DE102008009337A1 Coating a substrate with a conductive and transparent metallic oxide layer by sputtering in a continuous process, comprises moving and coating the substrate in a coating chamber at a coating source with a tubular target of metallic oxide