Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
09/2010
09/30/2010US20100246066 Head slider, storage device, and method of manufacturing head slider
09/30/2010US20100246062 Patterned-media perpendicular magnetic recording disk with servo regions having magnetized servo pillars and oppositely-magnetized servo trenches
09/30/2010US20100246036 Preliminary Controlled Pre-Deformation Treatment for the Production of Mirrors
09/30/2010US20100245973 Electrochromic devices
09/30/2010US20100244262 Deposition method and a deposition apparatus of fine particles, a forming method and a forming apparatus of carbon nanotubes, and a semiconductor device and a manufacturing method of the same
09/30/2010US20100244259 Substrate and manufacturing method therefor
09/30/2010US20100244258 Substrate and manufacturing method therefor
09/30/2010US20100244192 Dielectric film and semiconductor device using dielectric film
09/30/2010US20100244032 Aluminum-nickel alloy wiring material, device for a thin film transistor and a thin film transistor substrate using the same, and method of manufacturing the thin film transistor substrate
09/30/2010US20100243440 Mechanism for continuously varying radial position of a magnetron
09/30/2010US20100243439 Sputtering target and method for preparation thereof
09/30/2010US20100243438 Sputtering apparatus
09/30/2010US20100243437 Research-scale, cadmium telluride (cdte) device development platform
09/30/2010US20100243436 Sputtering device with gas injection assembly
09/30/2010US20100243435 Sputtering Target for Magnetic Recording Film and Method for Manufacturing the Same
09/30/2010US20100243431 Ion radiation damage prediction method, ion radiation damage simulator, ion radiation apparatus and ion radiation method
09/30/2010US20100243428 Rotary cathode for magnetron sputtering apparatus
09/30/2010US20100243427 Fabrication of low defectivity electrochromic devices
09/30/2010US20100243056 Layer for thin film photovoltaics and a solar cell made therefrom
09/30/2010US20100243043 Light Absorbing Layer Of CIGS Solar Cell And Method For Fabricating The Same
09/30/2010US20100242843 High temperature additive manufacturing systems for making near net shape airfoils leading edge protection, and tooling systems therewith
09/30/2010US20100242842 Evaporation system
09/30/2010US20100242841 Electron beam vapor deposition apparatus and method of coating
09/30/2010US20100242837 Combinatorial deposition method and apparatus thereof
09/30/2010US20100242674 High-Purity Ni-V Alloy, Target therefrom, High-Purity Ni-V Alloy Thin Film and Process for Producing High-Purity Ni-V Alloy
09/30/2010DE102009015638A1 Rohrförmiges Sputtertarget und Verfahren zu seiner Herstellung A tubular sputtering target and process for its preparation
09/30/2010DE102009015478A1 Producing hard material layers by magnetron sputtering, comprises carrying out a substrate cleaning and then a substrate pre-treatment, in which a coating material is deposited on a substrate with a magnetron in pure inert gas atmosphere
09/30/2010DE102009015477A1 Physical vapor deposition coating process for a substrate, comprises depositing two different coating materials on a substrate one after the other in a vacuum chamber by using two magnetrons
09/30/2010DE102009014891A1 Apparatus for evaporating material inside vacuum chamber, comprises vessel, in which material is evaporatable, where surface area of vessel outer wall is covered with porous heat-insulating layer, which is spaced with gap from outer wall
09/30/2010DE102009013310A1 Coating substrates by vacuum evaporation, comprises evaporating evaporation material to be deposited for formation of partially ionized vapor, which moves towards substrate and deposits on substrate, and measuring vapor charge carrier flow
09/30/2010DE102009001765A1 PVD beschichtetes Werkzeug PVD coated tool
09/30/2010DE102007046380B4 Schneidwerkzeug Cutting tool
09/30/2010DE102006027029B4 Sputtertarget mit einem Sputtermaterial auf Basis TiO2 sowie Herstellverfahren Sputtering with a sputtering based on TiO2 or production process
09/30/2010DE102005004402B4 Hartstoff-Schichtsystem und Verfahren zu dessen Bildung Hard material layer system and method for its formation
09/29/2010EP2233974A2 Apparatus and method of inspecting mask
09/29/2010EP2233615A2 Metal nano-objects, formed on semiconductor surfaces, and methods for making said nano-objects
09/29/2010EP2233604A1 Tubular sputter target and method for its production
09/29/2010EP2233603A1 Method and apparatus
09/29/2010EP2233602A2 DLC film and coated member
09/29/2010EP2233600A1 Method for the protection of a thermal barrier coating system and a method for the renewal of such a protection
09/29/2010EP2233079A2 Ultrasound catheter housing with electromagnetic shielding properties and methods of manufacture
09/29/2010EP2231895A1 Method and devices for controlling a vapour flow in vacuum evaporation
09/29/2010EP2231894A1 Solid support coated with at least one metal film and with at least one transparent conductive oxide layer for detection by spr and/or by an electrochemical method
09/29/2010EP2231893A1 Method and system for galvanizing by plasma evaporation
09/29/2010EP1579025B1 Coater having substrate cleaning device and coating deposition method employing such coater
09/29/2010EP1393601B1 Method for improving the effectiveness of medical devices by adhering drugs to the surface thereof
09/29/2010CN1946873B Substrate dome rotating mechanism
09/29/2010CN1869280B Multiple target tiles with complementary beveled edges forming a slanted gap therebetween
09/29/2010CN1869277B Sputtering target, sintered article, conductive film fabricated by utilizing the same, organic EL device, and substrate for use therein
09/29/2010CN1813332B Sidewall magnet improving uniformity of inductively coupled plasma
09/29/2010CN1756857B Sputtering target, thin film for optical information recording medium and process for producing the same
09/29/2010CN101849033A Thin film forming apparatus and forming method for thin film
09/29/2010CN101849032A Vacuum-evaporation source, and organic EL element manufacturing apparatus
09/29/2010CN101848782A Cutting tool
09/29/2010CN101847598A Self-ionized and inductively-coupled plasma for sputtering and resputtering
09/29/2010CN101846756A MgF2/oxide composite membrane used for anti-reflection of glass surface
09/29/2010CN101846673A Antigen detection method
09/29/2010CN101845661A Monocrystalline silicon slice with ultra-hydrophobicity nano silicone linear arrays on surface and preparation method thereof
09/29/2010CN101845629A Composite process for plating molybdenum plate with ruthenium
09/29/2010CN101845617A Continuous coating material conveying device for linear metal coating evaporation source
09/29/2010CN101845616A Conductor electric exploding plasma-based low-energy metal ion implantation (PBLEMII) device
09/29/2010CN101845615A Method for preparing single crystal transparent ZnO film by adopting RF (Radio Frequency) magnetron sputtering
09/29/2010CN101845614A Method for preparing zinc oxide-based sputtering target material
09/29/2010CN101845613A Sputtering device
09/29/2010CN101845612A Linear deposition source
09/29/2010CN101845611A Vacuum evaporation equipment and method thereof
09/29/2010CN101845610A Continuous vertical hot evaporation metal film coating method
09/29/2010CN101845609A Method for preparing diffusion-resistant coating for single-crystal high-temperature alloy
09/29/2010CN101845608A TeOx-based thin film material for laser direct writing and method for preparing same
09/29/2010CN101613850B Processing method for aluminium target material
09/29/2010CN101557896B Surface-coated tool and method of working cutting object
09/29/2010CN101550535B Method for preparing compound metal sulfide diamond composite membrane
09/29/2010CN101451773B Solar selective absorption film and method for manufacturing same
09/29/2010CN101421825B Film depositing method
09/29/2010CN101413106B Surface modification method for GCr15 plunger matching parts by injecting nitrogen and carbon plasma ions
09/29/2010CN101311298B Process for measuring source material in site in source furnace
09/29/2010CN101307427B Oil-free processing method of ion plating GIC depositing of high speed sewing machine rotating shuttle
09/29/2010CN101299416B Substrate support, substrate processing device and method of placing a substrate
09/29/2010CN101280420B Magnetron sputtering target having magnetic field enhancing and adjusting functions
09/29/2010CN101241840B Vacuum processing apparatus and method
09/29/2010CN101235482B Process kit for substrate processing chamber
09/29/2010CN101225503B Sputtering film plating device
09/29/2010CN101224576B Teaching track optimized controlling method of magnetic-controlled spraying robot
09/29/2010CN101213642B Metal film deposition method and film deposition device
09/29/2010CN101192497B 离子源 Ion source
09/29/2010CN101161856B Optical coating film thickness monitoring automatic control system and monitoring method
09/29/2010CN101150115B Conductive resistance blocking layer material for copper interconnection and making method
09/29/2010CN101111625B Device for vacuum deposition with recharging reservoir and corresponding vacuum deposition method
09/29/2010CN101096754B Shadow mask and method of fabricating organic light-emitting device using the same
09/29/2010CN101045989B Low energy ion implanter based on great area DC pulse plasma
09/28/2010US7804144 Low-temperature grown high quality ultra-thin CoTiO3 gate dielectrics
09/28/2010US7803255 arc discharge plasma source and generator for generate a magnetic field in a vapor deposition zone between an evaporator and a movable substrate, are aligned perpendicular to a movement direction of the substrate and parallel to a transport plane of the substrate; uniformity; simple and cost-effective
09/28/2010US7803254 using ion beam sputtering; lamination on light emitting diodes
09/28/2010US7803209 Sb-Te alloy sintered compact sputtering target
09/28/2010CA2591651C Shadow sculpted thin films
09/28/2010CA2313767C Metal material for electronic parts, electronic parts, electronic apparatuses, and method of processing metal materials
09/23/2010WO2010106958A1 Positioning method and vapor deposition method
09/23/2010WO2010106929A1 Dissolution-inhibiting covering member
09/23/2010WO2010106410A1 Evaporator, coating installation, and method for use thereof
09/23/2010WO2010106142A1 Cutting tool
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