Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
10/2010
10/19/2010US7816283 Method of depositing a higher permittivity dielectric film
10/19/2010US7815963 Enhanced bonding layers on titanium materials
10/19/2010US7815782 PVD target
10/19/2010US7815740 Substrate mounting table, substrate processing apparatus and substrate processing method
10/19/2010US7815737 Source for thermal physical vapor deposition of organic electroluminescent layers
10/19/2010US7814796 Partial pressure measuring method and partial pressure measuring apparatus
10/19/2010CA2489602C Material evaporation chamber with differential vacuum pumping
10/19/2010CA2433907C A method of making a continuous coating on the surface of a part
10/14/2010WO2010117649A1 Plain copper foodware and metal articles with durable and tarnish free multilayer ceramic coating and method of making
10/14/2010WO2010116981A1 Indium oxide-based electrically conductive transparent film, and process for production thereof
10/14/2010WO2010116980A1 Wiring board and connection structure
10/14/2010WO2010116802A1 Piezoelectric element
10/14/2010WO2010116697A1 Production device and production method of thin film
10/14/2010WO2010116560A1 Process for manufacturing semiconductor device and sputtering device
10/14/2010WO2010116112A2 Production method with thermal projection of a target
10/14/2010WO2010116110A1 Layer produced by spraying a target including at least one molybdenum powder compound
10/14/2010US20100261056 Electrode collector for battery and use thereof
10/14/2010US20100261040 Modification of magnetic properties of films using ion and neutral beam implantation
10/14/2010US20100261009 Transparent glass or glass ceramic pane with a layer that reflects infrared radiation
10/14/2010US20100261008 Gas barrier film and method of producing the same
10/14/2010US20100260946 Nanostructure arrays and fabrication methods therefor
10/14/2010US20100260943 Dual sided workpiece handling
10/14/2010US20100260640 High Purity Ytterbium, Sputtering Target Made Thereof, Thin Film Containing the Same, and Method of Producing the Same
10/14/2010US20100260445 Method for producing a sliding bearing element having a bismuth-containing sliding layer
10/14/2010US20100260035 Information recording medium and manufacturing method thereof
10/14/2010US20100258452 Electrode for electrochemical measurement apparatus and electrode for biosensor
10/14/2010US20100258437 Apparatus for reactive sputtering deposition
10/14/2010US20100258433 Film forming method and film forming apparatus for transparent electrically conductive film
10/14/2010US20100258432 Sputtering apparatus, sputter deposition method, and analysis apparatus
10/14/2010US20100258431 Use special ion source apparatus and implant with molecular ions to process hdd (high density magnetic disks) with patterned magnetic domains
10/14/2010US20100258430 Sputtering apparatus and film forming method
10/14/2010US20100258180 Method of forming an indium-containing transparent conductive oxide film, metal targets used in the method and photovoltaic devices utilizing said films
10/14/2010DE19807649B4 Vorrichtung und Verfahren zur dreidimensionalen Messung und Beobachtung dünner Schichten Apparatus and method for three-dimensional measurement and observation of thin layers
10/14/2010DE102010003414A1 Verfahren zur Herstellung einer Solarzelle vom Chalcopyrit-Typ A process for producing a solar cell from the chalcopyrite type
10/14/2010DE102009025422A1 Controlling a radio frequency-generator for magnetron in a vacuum coating system, comprises determining the characteristics of the radio frequency-generator that identifies arc-discharge, and scanning the occurrence of such characteristics
10/14/2010CA2757903A1 Production method with thermal projection of a target
10/13/2010EP2239352A2 Delivering particulate material to a vaporization zone
10/13/2010EP2238418A1 Method for producing absorption layers on thermal radiation sensors
10/13/2010EP2238276A1 Lock device for adding and removing containers to and from a vacuum treatment chamber
10/13/2010EP2238275A2 Multi-pass vacuum coating systems
10/13/2010EP2238274A1 Method for manufacturing nanowire by using stress-induced growth
10/13/2010EP1560943B1 High deposition rate sputtering
10/13/2010EP1008668B1 Apparatus for manufacturing thin film
10/13/2010CN201605320U 用于生产镜片的真空镀膜机循环冷却装置 Vacuum coating machine cycle cooling device for the production of lenses
10/13/2010CN201605319U 真空离子连续溅镀生产线的传送装置 Vacuum ion sputtering production line continuous conveying means
10/13/2010CN201605318U 真空镀铝设备中蒸发器水循环系统的防漏水装置 Aluminum vacuum leak water plant equipment evaporator water circulation system
10/13/2010CN201605317U 塑胶件真空镀支架 Pieces of plastic vacuum plating bracket
10/13/2010CN201605316U 真空镀膜用遮挡装置 Vacuum coating with occlusion devices
10/13/2010CN201605315U 真空镀膜硅醚罐的水浴加热装置 Silicon ether canister vacuum coating bath heating device
10/13/2010CN1961093B Method for the production of an ultra barrier layer system
10/13/2010CN1825556B Wafer holder
10/13/2010CN1791510B Transparent gas barrier laminated film, and electroluminescent light-emitting element, electroluminescent display device, and electrophoretic display panel using the same
10/13/2010CN1425187B Method and apparatus for ionized physical vapor deposition
10/13/2010CN101861424A Stain masking material and articles made therefrom
10/13/2010CN101861410A Sputtering film forming method and sputtering film forming apparatus
10/13/2010CN101861409A Sputtering apparatus and film forming method
10/13/2010CN101861408A Optical thin film deposition device and optical thin film fabrication method
10/13/2010CN101859022A Slide and forming method thereof
10/13/2010CN101858993A Window and electronic device using same
10/13/2010CN101857951A Magnetron sputtering device
10/13/2010CN101857950A Tantalum sputtering target
10/13/2010CN101857949A PVD vacuum ion plating method
10/13/2010CN101857948A Coated particle and manufacturing method thereof
10/13/2010CN101597746B Method for plating titanium film in vacuum on surface of carbon fiber composite material workpiece
10/13/2010CN101524754B Rapid thermal pressed sintering molding process for titanium-aluminum alloy targets
10/13/2010CN101464109B High-efficiency anti-dirt nano coating heat transmission surface, its production method and pool boiling apparatus
10/13/2010CN101447533B Method for preparing transparent low resistance/high resistance composite membrane used for thin-film solar cell
10/13/2010CN101424758B Negative refraction artificial material based on iron-clad
10/13/2010CN101403116B Preparation method for Ti-Si-N nano-coating
10/13/2010CN101280154B Ultraviolet curing vacuum metallizing coating
10/13/2010CN101198717B Ruthenium-alloy sputtering target
10/13/2010CN101164177B Method and device for producing electronic components
10/13/2010CN101093793B Apparatus for manufacturing flat-panel display
10/13/2010CN101045610B Self-clean film material and preparation method
10/13/2010CN101015234B Organic electroluminescent device and fabricating method thereof
10/12/2010US7811678 Low process temperature thin film phosphor for electroluminescent displays
10/12/2010US7811669 Gas barrier laminated film and process for producing the same
10/12/2010US7811634 Controlled sulfur species deposition process
10/12/2010US7811625 Method for manufacturing electron-emitting device
10/12/2010US7811429 Target support assembly
10/12/2010US7811428 Method and apparatus for an improved optical window deposition shield in a plasma processing system
10/12/2010US7811421 increased sputtering yield increases the deposition rate; without an occurrence of arcing between the anode and the cathode assembly; increase density of ions in the strongly ionized plasma
10/12/2010US7810227 Process to manufacture CPP GMR read head
10/12/2010CA2477845C Thin film coating having transparent base layer
10/12/2010CA2400928C Laser deposition of elements onto medical devices
10/07/2010WO2010115189A1 Rotary magnetron
10/07/2010WO2010115128A2 High pressure rf-dc sputtering and methods to improve film uniformity and step-coverage of this process
10/07/2010WO2010114823A2 Sputtering target for pvd chamber
10/07/2010WO2010114448A1 Coated cutting tool for metal cutting applications generating high temperatures
10/07/2010WO2010114274A2 Apparatus for depositing film and method for depositing film and system for depositing film
10/07/2010WO2010114159A1 Photoelectric conversion device and manufacturing method thereof, solar cell, and target
10/07/2010WO2010114118A1 Deposition head and film forming apparatus
10/07/2010WO2010113659A1 Film forming device, film forming method, and organic el element
10/07/2010WO2010113638A1 Lanthanum target for sputtering
10/07/2010WO2010113544A1 Insulator-interposed plasma processing device
10/07/2010WO2010113102A1 An arrangement for holding a substrate in a material deposition apparatus
10/07/2010WO2010112170A1 Magnetron coating module and magnetron coating method
10/07/2010WO2010111927A1 Method and device for preparing compound semiconductor film
10/07/2010WO2009030438A3 Coated engine component for a gas turbine
10/07/2010US20100255447 Advanced bio-compatible polymer surface coatings for implants and tissue engineering scaffolds
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