Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
10/2010
10/27/2010EP1835946B1 Surface treated shape memory materials and methods for making same
10/27/2010EP1602745B1 Hafnium alloy target and process for producing the same
10/27/2010CN201614409U 腔门固定结构及具有该结构的密封腔体机构 Chamber door with a fixed structure and organization of the seal cavity structure
10/27/2010CN201614408U 用于单、双面镀膜模式切换的过渡装置 Transition means for single-sided coating mode switching
10/27/2010CN201614407U 真空镀膜磁控溅射磁流体密封旋转靶 Magnetron sputtering vacuum coating magnetic fluid seal rotating target
10/27/2010CN201614406U 沉积材料形成镀层的设备 Sedimentary material coating equipment
10/27/2010CN201614405U 一种旋转溅射靶 A rotary sputtering target
10/27/2010CN201614404U 离子束辅助多弧离子镀真空镀膜机 Ion beam assisted multi-arc ion plating vacuum coating machine
10/27/2010CN201614403U 一种镀金陶瓷 One kind of gilded ceramic
10/27/2010CN1985028B Common rack for electroplating and PVD coating operations
10/27/2010CN101873928A Method for producing a sliding bearing element having a bismuth-containing sliding layer
10/27/2010CN101871873A Heavy metal ion detection device and preparation method thereof
10/27/2010CN101871166A Method and device for continuous metal coating of yarn
10/27/2010CN101871116A Preparation method for ordered silicon nano-wires
10/27/2010CN101871103A Solar spectrum high-temperature selective absorbing film and manufacturing method thereof
10/27/2010CN101871096A Methods and apparatuses for transferring articles through a load lock chamber under vacuum
10/27/2010CN101871095A Multifunctional film-coating production line for panel display material
10/27/2010CN101871094A Method for controlling acquisition of alloy films on multi-arc ion plating machine and proportional regulator thereof
10/27/2010CN101871093A Method for preparing selective absorbing coating for steel core of solar collection tube
10/27/2010CN101871092A Sputtering method
10/27/2010CN101871091A Target seat structure
10/27/2010CN101871090A Coating raw material containing device
10/27/2010CN101871089A Method for preparing ordered aluminum nanoparticles
10/27/2010CN101870458A Preparation methods of multi-element metal chalcogen compound, target and coating material
10/27/2010CN101870209A Local aluminizing positioning printing method of packaging film
10/27/2010CN101869725A Antibacterial bioactivity composite coating comprising nano Ag particles and preparation method
10/27/2010CN101493360B Thermocouple with micron or nanometer grade tip curvature radius and method for producing the same
10/27/2010CN101423927B Method for preparing AlxIn1-xN film
10/27/2010CN101403097B Method for high-temperature alloy vacuum diffusion connection with film as intermediate coat
10/27/2010CN101173347B Production method for vehicle lights protective film
10/26/2010US7820231 superior uniformity in electroluminescence( EL) layer film thickness, superior throughput, and improved utilization efficiency of EL materials
10/26/2010US7820125 Phosphorus effusion cell arrangement and method for producing molecular phosphorus
10/26/2010US7820088 Applying multilayer laminate of vapor deposited metal and release agents to rotating cooled drum
10/26/2010US7820020 Apparatus for plasma-enhanced physical vapor deposition of copper with RF source power applied through the workpiece with a lighter-than-copper carrier gas
10/26/2010US7820019 Forming at least one dielectric layer on the substrate, forming an infrared (IR) reflecting layer comprising silver on the substrate over at least the first dielectric layer, forming at least one additional dielectric layer on the substrate over at least the IR reflecting layer; solar control coatings
10/26/2010US7820018 sputtering and ion-enhanced atomization in a vacuum chamber; depositing a transition layer to match mechanical properties of the glass substrate; noncontamination; antireflection and mirror coatings, optical filters
10/26/2010US7820017 Dielectric-layer-coated substrate and installation for production thereof
10/26/2010US7820016 attaching a container to a plate through a first container fixing hole by screwing a first screw; less tightly attached through the second container fixing hole to the plate, and allow the sputtering apparatus expands by heat; semiconductor wafers or liquid crystal panels
10/26/2010US7819718 Electronic device having catalyst used to form carbon fiber according to Raman spectrum characteristics
10/26/2010US7819079 Cartesian cluster tool configuration for lithography type processes
10/26/2010CA2635062C Antimicrobial coating methods
10/26/2010CA2551722C High throughput physical vapor deposition system for material combinatorial studies
10/26/2010CA2525622C Transparent gas barrier laminated film, and electroluminescent light-emiiting element, electroluminescent display device, and electrophoretic display panel using the same
10/26/2010CA2446428C Method for the production of plane-parallel platelets by using organic separating agents
10/26/2010CA2426641C Multi-face forming mask device for vacuum deposition
10/21/2010WO2010120792A1 Method and apparatus for super-high rate deposition
10/21/2010WO2010120355A1 Sealed magnetic roller for vacuum coating applications
10/21/2010WO2010119952A1 Thin film transistor and method for manufacturing thin film transistor
10/21/2010WO2010119887A1 Cu-Ga ALLOY SPUTTERING TARGET AND PROCESS FOR MANUFACTURE THEREOF
10/21/2010WO2010119785A1 Barrier film for semiconductor wiring, sintered sputtering target, and method of manufacturing sputtering targets
10/21/2010WO2010119687A1 Method for producing transparent conductive material
10/21/2010US20100267568 Superconducting film and method of manufacturing the same
10/21/2010US20100267549 Method of producing particles by physical vapor deposition in an ionic liquid
10/21/2010US20100267231 Apparatus for uv damage repair of low k films prior to copper barrier deposition
10/21/2010US20100266866 Method of metal coating and coating produced thereby
10/21/2010US20100266804 Recordable optical storage medium comprising a semiconductor layer, and respective manufacturing method
10/21/2010US20100266787 Oxide material and sputtering target
10/21/2010US20100266781 Structural Components for Oil, Gas, Exploration, Refining and Petrochemical Applications
10/21/2010US20100266766 Guiding devices and methods for contactless guiding of a web in a web coating process
10/21/2010US20100265811 Information recording medium, method for manufacturing the same, and recording/reproducing apparatus
10/21/2010US20100264023 Method for producing metal nitride film, metal oxide film, metal carbide film or film of composite material thereof, and production apparatus therefor
10/21/2010US20100264022 Sputtering And Ion Beam Deposition
10/21/2010US20100264019 Method and apparatus for manufacturing magnetic recording media
10/21/2010US20100264018 Ag base sputtering target and process for producing the same
10/21/2010US20100264017 Method for depositing ceramic thin film by sputtering using non-conductive target
10/21/2010US20100264016 Very low pressure high power impulse triggered magnetron sputtering
10/21/2010US20100263503 Workpiece with hard coating
10/21/2010DE202009014959U1 Sputtertargetanordnung Sputtertargetanordnung
10/21/2010DE112008002496T5 Funkwellen durchlassendes Zierelement Radio waves-passing decorative element
10/20/2010EP2241650A1 Element of a vulcanising mould, vulcanising mould and method for producing an element of a vulcanising mould
10/20/2010EP2241649A1 Ytterbium sputtering target and method for manufacturing the target
10/20/2010EP2240631A2 Antimicrobial provision of titanium and titanium alloys with silver
10/20/2010EP2240625A1 Deposition process
10/20/2010EP2240623A1 Low thermal conductivity, cmas-resistant thermal barrier coatings
10/20/2010EP2240212A2 Coated articles
10/20/2010CN201610446U Ito透明导电膜卷绕镀膜机 Ito transparent conductive film Roll Coater
10/20/2010CN201610445U 真空热处理腔 Vacuum heat treatment chamber
10/20/2010CN1983560B Mask
10/20/2010CN1880000B Sputtering target, sputtering target assembly and method for welding sputtering target material brand
10/20/2010CN1841654B Device and method for controlling temperature of a mounting table, a program therefor, and a processing apparatus including same
10/20/2010CN101868857A Oxide semiconductor material, method for manufacturing oxide semiconductor material, electronic device and field effect transistor
10/20/2010CN101868566A Process for producing single crystal SiC substrate and single crystal SiC substrate produced by the process
10/20/2010CN101868562A Method and apparatus for deposition of diffusion thin film
10/20/2010CN101868561A Sputtering apparatus, and filming method
10/20/2010CN101867012A Preparation method of epitaxial iron-based superconducting thin film and prepared epitaxial iron-based superconducting thin film
10/20/2010CN101866978A Method for continuously producing Cu-lm-Ga-S soft body film type solar cell assembly
10/20/2010CN101866832A Method for intermittently growing single-layer Ge quantum dots with high dimensional homogeneity on buffer layer by landfill
10/20/2010CN101864568A Method for preparing high-orientation PZT piezoelectric thin film
10/20/2010CN101864559A Grid mesh magnetron sputtering hafnium evaporation method
10/20/2010CN101864558A Reaction sputtering system
10/20/2010CN101864557A Method for preparing transparent conductive film
10/20/2010CN101864556A High dielectric coefficient titanium-aluminum oxide film and preparation method and application thereof
10/20/2010CN101864555A Conductive niobium oxide target and preparation method and application thereof
10/20/2010CN101864554A Hard alloy blade for improving cutting edge structure
10/20/2010CN101864553A Integrated manufacturing method of microminiature parts based on surface coating
10/20/2010CN101864552A Mask frame assembly for thin film deposition and associated methods
10/20/2010CN101863667A Ceramics and production method therefor, and ferroelectric capacitor, semiconductor device, other elements
10/20/2010CN101863152A Infrared radiation inhibiting material with nano periodic structure and method for preparing same
10/20/2010CN101503791B Alloying technique for semiconductor chip Au-Si solder
10/19/2010US7816292 based on silicon, boron, and phosphorus; plasma enhanced chemical vapor deposition