Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
10/2010
10/07/2010US20100255348 Perpendicular magnetic recording medium and method of manufacturing the same
10/07/2010US20100255340 Plain copper foodware and metal articles with durable and tarnish free multiplayer ceramic coating and method of making
10/07/2010US20100255294 Heat reflecting glass and process for producing heat reflecting glass
10/07/2010US20100255244 Sputtering target for making optical medium, method of making same, optical medium, and method of making same
10/07/2010US20100255215 Composition of Decolorable Ink and Decoloring Method
10/07/2010US20100255196 Treatment system for flat substrates
10/07/2010US20100255195 Apparatus and method for moving a substrate
10/07/2010US20100254067 Method of making electronic ceramic components with mesh electrode
10/07/2010US20100252427 Magnetron sputtering target and magnetron sputtering system
10/07/2010US20100252419 Method of manufacturing a high density capacitor or other microscopic layered mechanical device
10/07/2010US20100252418 Hot tile sputtering system
10/07/2010US20100252417 High pressure rf-dc sputtering and methods to improve film uniformity and step-coverage of this process
10/07/2010US20100252416 Sputtering Target for PVD Chamber
10/07/2010US20100251960 Chamber and film forming apparatus
10/07/2010DE19822877B4 Elektrische Steckverbindung für Beschichtungsanlagen Electrical connector for coating systems
10/07/2010DE112006003022B4 Sputtergerät mit gekühlter Targetröhre Sputtering with cooled target tube
10/07/2010DE10341513B4 Verfahren zur Regelung des Reaktivgasflusses in reaktiven plasmagestützten Vakuumbeschichtungsprozessen Method for regulating the reactive gas flow in the reactive plasma-assisted vacuum deposition processes
10/07/2010DE102009015737A1 Magnetron-Beschichtungsmodul sowie Magnetron-Beschichtungsverfahren Magnetron coating module and magnetron coating process
10/07/2010DE102004030248B4 Reflektierender AG-Legierungsfilm für Reflektoren und Reflektor, welcher mit demselben versehen ist Reflective AG alloy film for reflectors and reflector, which is provided with the same
10/06/2010EP2237313A1 Electronic member wherein barrier-seed layer is formed on base
10/06/2010EP2237312A1 Electronic member wherein barrier-seed layer is formed on base
10/06/2010EP2236645A1 Methods for improving the dielectric properties of a polymer, and related articles and devices
10/06/2010EP2236644A2 Sputtering target backing plate assembly and film deposition system
10/06/2010EP2236643A2 Electron beam vapor deposition apparatus and method of coating
10/06/2010EP2236642A1 Controlled oxidation of bond coat
10/06/2010EP2236641A1 Method for pre-treating substrates for PVD procedures
10/06/2010EP2236640A2 Multi-component coating deposition
10/06/2010EP2236548A2 Aliphatic polyester film and gas barrier film
10/06/2010EP2235735A1 Method and apparatus for plasma surface treatment of a moving substrate
10/06/2010EP1340836B1 Composite element and method for preparation thereof
10/06/2010CN201601846U 用于真空沉积系统的侧热台 For a vacuum deposition system side heat stations
10/06/2010CN201598329U 一种配置气体离子源的对靶磁控溅射装置 A gas ion source configuration magnetron sputtering device
10/06/2010CN201598328U 一种提高利用率的平面磁控溅射靶 A way to improve the utilization of planar magnetron sputtering target
10/06/2010CN201598327U 用于真空镀铝设备中旋转接头结构 Equipment for vacuum aluminum rotary joint structure
10/06/2010CN1978094B Nano net-like composite film, its preparing method and mould comprising side composite film
10/06/2010CN1926260B Sputtering target with few surface defects and method for processing surface thereof
10/06/2010CN1834285B Sputter source and sputtering device
10/06/2010CN1725933B Wired circuit forming board, wired circuit board, and thin metal layer forming method
10/06/2010CN1681363B Self-emitting display
10/06/2010CN1514808B Piezoelectric body, manufacturing method thereof, piezoelectric element having piezoelectric body, inkjet head and inkjet type recording device
10/06/2010CN101855724A Chalcogenide film and method for producing the same
10/06/2010CN101855699A Method for depositing electrically insulating layers
10/06/2010CN101855384A Vacuum processing apparatus and substrate processing method
10/06/2010CN101855383A Sputtering apparatus and sputtering film forming method
10/06/2010CN101855382A Method for forming sputtering film on three-dimensional work and apparatus used in the method
10/06/2010CN101855381A Sputtering system and film deposition method
10/06/2010CN101855380A Industrial vapour generator for the deposition of an alloy coating onto a metal strip
10/06/2010CN101855035A Member covered with hard coating film and process for the production of the member
10/06/2010CN101851747A High-current metal ion source
10/06/2010CN101851746A Magnetic control sputtering target and magnetic control sputtering system
10/06/2010CN101851745A Indium zinc gallium oxide (IZGO) sputtering target for transparent conductive film and manufacturing method
10/06/2010CN101851744A Preparation method of multilayer composite modified layer with strong toughness on titanium alloy surface
10/06/2010CN101851743A A method of plasma vapour deposition
10/06/2010CN101851742A Preparation method of compound semiconductor film
10/06/2010CN101851741A Method for preparing metal oxide thin film without transition layer on silicon substrate
10/06/2010CN101851740A Conductive Nb2O5-x target material for magnetron sputtering coating and production method thereof
10/06/2010CN101851739A AZO sputtering target for high-stability transparent conductive film and manufacturing method
10/06/2010CN101851738A Nano composite titanium silicon nitride tool coating and preparation method thereof
10/06/2010CN101850256A Preparation method of Y-Sb-based composite magnetic particle optical catalyst in nuclear-shell structures
10/06/2010CN101562220B Process for manufacturing amorphous silicon thin film solar cell
10/06/2010CN101365816B Al-Ni-B alloy material for reflection film
10/06/2010CN101323952B Preparing technological process of high vacuum vapor deposition dielectric membrane transfer material
10/06/2010CN101230450B Method for preparing textured barium strontium titanate dielectric ceramic film by radio frequency sputtering
10/06/2010CN101221359B Metallic material reflection type micro-optical element processing method based on hot press printing technology
10/06/2010CN101182629B Solar thermal-collecting tube reaction grid voltages feed back intelligent control method and apparatus
10/06/2010CN101082120B Technique for film plating on powder surface and equipment thereof
10/05/2010US7808184 Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities
10/05/2010US7808091 Wafer structure with discrete gettering material
10/05/2010US7807494 Method for producing a chalcogenide-semiconductor layer of the ABC2 type with optical process monitoring
10/05/2010US7807030 Small scanned magentron
10/05/2010US7806983 Substrate temperature control in an ALD reactor
10/05/2010US7806981 Method for the treatment of a web-type material in a plasma-assisted process
10/05/2010CA2477844C Thin film coating having niobium-titanium layer
09/2010
09/30/2010WO2010111387A1 Nozzle geometry for organic vapor jet printing
09/30/2010WO2010111386A1 Compact organic vapor jet printing print head
09/30/2010WO2010110412A1 Ti-nb oxide sintered body sputtering target, ti-nb oxide thin film, and method for producing the thin film
09/30/2010WO2010110305A1 Molded body, method for producing same, electronic device member, and electronic device
09/30/2010WO2010110304A1 Molded body, method for producing same, electronic device member, and electronic device
09/30/2010WO2010110224A1 Conductive zinc oxide multilayer body and method for producing same
09/30/2010WO2010110134A1 Lanthanum target for sputtering
09/30/2010WO2010110052A1 Sputter deposition device
09/30/2010WO2010110033A1 Ferromagnetic-material sputtering target of nonmagnetic-material particle dispersion type
09/30/2010WO2010109750A1 Method for manufacturing sapphire substrate, and semiconductor device
09/30/2010WO2010109686A1 Component for film-forming apparatus and method for removing film adhered to the component for film-forming apparatus
09/30/2010WO2010109685A1 Component for film-forming apparatus and method for removing film adhered to the component for film-forming apparatus
09/30/2010WO2010109505A1 Process for coating parts made of aluminium alloy and parts obtained therefrom
09/30/2010WO2010109430A2 Apparatus and method for manufacturing an integrated circuit
09/30/2010WO2010108869A1 Metallic component, in particular rolling bearing, engine or transmission component
09/30/2010WO2010064879A3 Film deposition method for razor blade
09/30/2010US20100248970 Apparatus for and method of continuous hts tape buffer layer deposition using large scale ion beam assisted deposition
09/30/2010US20100247952 Controlled oxidation of bond coat
09/30/2010US20100247933 Coating, substrate provided with a coating and method for the application of a corrosion-resistant coating
09/30/2010US20100247928 Coating apparatus and method
09/30/2010US20100247917 Carbon thin film and method of forming the same
09/30/2010US20100247883 corrosion resistant coating for copper substrate
09/30/2010US20100247809 Electron beam vapor deposition apparatus for depositing multi-layer coating
09/30/2010US20100247807 Electron gun evaporation apparatus and film formation method using the electron gun evaporation apparatus
09/30/2010US20100247755 Method of manufacturing or repairing a coating on a metallic substrate
09/30/2010US20100247745 Method for manufacturing a compound film
09/30/2010US20100247592 Process for limiting the growth of microorganisms
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