Patents for C09G 1 - Polishing compositions (7,846) |
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02/27/2013 | CN102010669B Method for preparing CMP (Chemically Mechanical Polishing) solution for sapphire substrate material |
02/27/2013 | CN102010664B Method for preparing CMP (Chemical Mechanical Polishing) polishing solution of hard disc indium phosphide substrate |
02/21/2013 | DE102012015825A1 Verfahren zum chemisch-mechanischen Polieren von Wolfram A method for chemical-mechanical polishing of tungsten |
02/21/2013 | DE102012015824A1 Verfahren zum chemisch-mechanischen Polieren von Kupfer A method for chemical mechanical polishing of copper |
02/20/2013 | CN102936462A Cleaning polishing wax with photocatalytic performance |
02/20/2013 | CN102936461A Rich cerium rare earth polishing powder and preparation method thereof |
02/20/2013 | CN102935618A Grinding fluid, over-polishing and end point detection method and device and polishing device |
02/14/2013 | WO2013021296A1 Aqueous alkaline compositions and method for treating the surface of silicon substrates |
02/14/2013 | WO2013020351A1 Chemical mechanical polishing solution |
02/13/2013 | CN202726699U Wire-drawing die polishing equipment |
02/13/2013 | CN102925060A Preparation method of marble composite polishing powder |
02/07/2013 | US20130032573 Method for polishing silicon wafer and polishing liquid therefor |
02/06/2013 | EP2554613A1 A process for the manufacture of semiconductor devices comprising the chemical mechanical polishing of elemental germanium and/or si1-xgex material in the presence of a cmp composi-tion comprising a specific organic compound |
02/06/2013 | EP2554612A1 A process for the manufacture of semiconductor devices comprising the chemical mechanical polishing of elemental germanium and/or Si1-xGex material in the presence of a CMP composi-tion having a pH value of 3.0 to 5.5 |
02/06/2013 | CN102911608A Dyeing and polishing wax |
02/06/2013 | CN102911607A Furniture brightener |
02/06/2013 | CN102911606A Sapphire polishing solution and preparation method thereof |
02/06/2013 | CN102911605A Chemical mechanical polishing solution |
02/06/2013 | CN102010667B Method for preparing aluminum wiring polishing solution of VLSI (Very Large-Scale Integration) circuit |
02/06/2013 | CN101870853B Slightly alkaline sapphire polishing solution and preparation method thereof |
01/31/2013 | DE102011079694A1 Polishing an amorphous silicon layer of a substrate, comprises pre-polishing silicon layer, and polishing layer with polishing tools using polishing liquid comprising aqueous colloidal suspension, which contains hydrophilic additive |
01/30/2013 | CN102898955A Brightener for shoes-polishing cloth |
01/30/2013 | CN102898954A Automobile cleaning and brightening agent |
01/30/2013 | CN102898953A Cerium-based mischmetal polishing material and preparation method thereof |
01/30/2013 | CN102898952A Metallic grinding and polishing agent for valves and preparation method thereof |
01/30/2013 | CN102898951A Polishing reagent liquid composition for semiconductor chip, polishing reagent liquid and preparation method thereof |
01/30/2013 | CN102898950A Chemical mechanical polishing solution |
01/30/2013 | CN101870851B Chemico-mechanical polishing liquid and polishing method |
01/29/2013 | US8361177 Polishing slurry, method of producing same, and method of polishing substrate |
01/23/2013 | CN102888305A Leather maintenance agent |
01/23/2013 | CN102888297A Kitchenware maintenance water |
01/23/2013 | CN102888208A Abrasive and substrate polishing method |
01/23/2013 | CN102888194A High-durability floor wax |
01/23/2013 | CN102888193A Chemical mechanical polishing solution for processing surface of sapphire or carborundum wafer for LED (Light Emitting Diode) substrate slice and preparation method thereof |
01/23/2013 | CN101824279B High accuracy aluminum oxide polishing powder and production method thereof |
01/17/2013 | US20130014446 Cerium salt, producing method thereof, serium oxide and cerium based polishing slurry |
01/16/2013 | CN1966594B Polishing composition including an inhibitor of tungsten etching |
01/16/2013 | CN102876238A High-performance nutritious waterproof shoe cream and preparation method thereof |
01/16/2013 | CN102876237A Leather care oil |
01/16/2013 | CN102876236A Cmp polishing liquid, method of polishing substrate, and electronic component |
01/10/2013 | WO2013003991A1 Polishing liquid for polishing process based on metal co and use thereof |
01/09/2013 | CN102864049A Leather maintenance water |
01/09/2013 | CN102864048A Home appliance brightening agent |
01/09/2013 | CN102863904A Moldproof softening and brightening agent for cleaning leather and preparation method thereof |
01/09/2013 | CN102863903A Monomer casting (MC) nylon polishing abrasive grain used in roller polishing machine and preparation method of MC nylon polishing abrasive grain |
01/09/2013 | CN102863902A Method of polishing a tungsten-containing substrate |
01/09/2013 | CN101875817B Polishing paste used for sapphire round-rod bakelite wheel and preparation method thereof |
01/09/2013 | CN101829520B Non-ionic surfactant composition and application thereof |
01/08/2013 | US8349062 Composition for washing and waxing a motor vehicle |
01/03/2013 | US20130000214 Abrasive Particles for Chemical Mechanical Polishing |
01/02/2013 | EP2539412A1 Aqueous polishing agent and graft copolymers and their use in process for polishing patterned and unstructured metal surfaces |
01/02/2013 | EP2539411A1 Chemical-mechanical planarization of substrates containing copper, ruthenium, and tantalum layers |
01/02/2013 | CN102858916A Stabilization of household, body-care and food products by using benzotropolone containing plant extracts and/or related benzotropolone derivatives |
01/02/2013 | CN102850940A Preparation method for brightening mildew-resistant cream for leather |
01/02/2013 | CN102850939A Brightening mildew-resistant cream for leather |
01/02/2013 | CN102850938A Preparation method of spherical composite rare earth polishing powder |
01/02/2013 | CN102850937A Chemical mechanical polishing (CMP) liquid |
01/02/2013 | CN101792640B Water wax for vehicle |
01/02/2013 | CN101191036B Slurry composition for chemical mechanical polishing and precursor composition thereof |
12/27/2012 | US20120329371 Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrate |
12/26/2012 | CN102838937A Preparation method of white shoe polish |
12/26/2012 | CN102838936A Method for preparing mildew-proof leather polish |
12/26/2012 | CN102838935A Preparation method of self-shining liquid shoe polish |
12/26/2012 | CN102837676A Wet tissue for cleaning dashboard |
12/26/2012 | CN102837227A Liquid polishing method of single crystal silicon wafer |
12/26/2012 | CN102172879B Method for processing soft and crisp LBO crystals based on consolidated abrasive polishing pad |
12/26/2012 | CN101638556B Polishing composition and polishing method |
12/26/2012 | CN101544871B Efficient scratch-free glass polishing solution and manufacturing method thereof |
12/19/2012 | CN102827549A Chemico-mechanical polishing solution for monox dielectric materials |
12/19/2012 | CN101875819B Polishing liquid used for gem ball with 10-grade surface finish and preparation method |
12/19/2012 | CN101875818B Polishing liquid used for stainless steel mirror surface and preparation method |
12/19/2012 | CN101535431B A chemical-mechanical polishing liquid for polishing polysilicon |
12/18/2012 | US8333820 Forming conductive features of electronic devices |
12/13/2012 | WO2012167607A1 Chemical-mechanical polishing liquid |
12/12/2012 | EP2533274A1 Aqueous dispersion for chemical mechanical polishing, and chemical mechanical polishing method using same |
12/12/2012 | CN102820223A Chemical-mechanical polishing method for simultaneously polishing phase-change material and tungsten |
12/12/2012 | CN102816658A Environment-friendly cleaning emulsion and preparation method thereof |
12/12/2012 | CN102816533A Chemical-mechanical polishing method used for phase-change materials |
12/12/2012 | CN102816532A Polishing solution for 3D packaging silicon |
12/12/2012 | CN102816531A Chemical-mechanical polishing slurry used for polishing copper |
12/12/2012 | CN102816530A Chemical-mechanical polishing solution |
12/12/2012 | CN102816529A Tungsten chemical-mechanical polishing solution being beneficial for cleaning after polishing |
12/12/2012 | CN102816528A Chemical-mechanical polishing solution for polishing tungsten |
12/11/2012 | US8329123 Method for preparing of cerium oxide powder for chemical mechanical polishing and method for preparing of chemical mechanical polishing slurry using the same |
12/06/2012 | US20120304545 Nano-diamond dispersion solution and method for preparing same |
12/05/2012 | CN102807823A Oil-based glazing agent |
12/05/2012 | CN101760139B Furniture glossing care aerosol wax with antimicrobial function and preparation method thereof |
12/05/2012 | CN101092543B Polishing slurry, method of producing same, and method of polishing substrate |
12/05/2012 | CN101016573B Leather nursing liquid for eliminating formaldehyde pollution and peculiar smell, and preparing method thereof |
12/04/2012 | US8323604 Cerium salt, producing method thereof, cerium oxide and cerium based polishing slurry |
11/28/2012 | CN102802875A Dispersion comprising cerium oxide and silicon dioxide |
11/28/2012 | CN102796461A Diversified cleaning agent and preparation method thereof |
11/28/2012 | CN102796460A Silicon dioxide-based CMP (Chemical Mechanical Polishing) solution and preparation method thereof |
11/28/2012 | CN102796459A Optical lens polishing solution |
11/28/2012 | CN102796458A Chemical mechanical polishing aqueous composite and chemical mechanical polishing process of titanium substrate |
11/21/2012 | EP2524013A1 Composition for washing and waxing a motor vehicle |
11/21/2012 | CN102786880A Shoe cream |
11/21/2012 | CN102786879A Barium titanate chemico-mechanical polishing aqueous composition and its application |
11/14/2012 | CN102782067A Aqueous polishing agent and graft copolymers and their use in process for polishing patterned and unstructured metal surfaces |
11/14/2012 | CN102782066A Chemical-mechanical planarization of substrates containing copper, ruthenium, and tantalum layers |