| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
|---|
| 03/04/1987 | EP0212477A1 Power transistor device |
| 03/04/1987 | EP0212295A2 Monocrystalline semiconductor superlattice structures |
| 03/04/1987 | EP0212267A1 Improved differential input attenuator circuit |
| 03/04/1987 | EP0212266A2 Selective titanium silicide formation |
| 03/04/1987 | EP0212251A2 Process using dry etchant to avoid mask-and-etch cycle |
| 03/04/1987 | EP0212219A2 Visibility enhancement of first order alignment marks |
| 03/04/1987 | EP0212208A1 Circuit arrangement for testing integrated-circuit units |
| 03/04/1987 | EP0212207A1 Fast switching bipolar transistor structure for integrated circuits, and method of making it |
| 03/04/1987 | EP0212149A2 Planarization process for semiconductor structures |
| 03/04/1987 | EP0212124A1 Method of fabricating a multilayer ceramic substrate |
| 03/04/1987 | EP0212098A2 Method of forming a passivation film |
| 03/04/1987 | EP0212054A2 Process for the production of X-ray masks |
| 03/04/1987 | EP0211938A1 System and method for depositing plural thin film layers on a substrate. |
| 03/03/1987 | US4648106 Gas control for X-ray lithographic system |
| 03/03/1987 | US4648072 High speed data acquisition utilizing multiplex charge transfer devices |
| 03/03/1987 | US4647959 Integrated circuit package, and method of forming an integrated circuit package |
| 03/03/1987 | US4647958 Bipolar transistor construction |
| 03/03/1987 | US4647957 Latchup-preventing CMOS device |
| 03/03/1987 | US4647953 Semiconductor laser device and method for manufacturing the same |
| 03/03/1987 | US4647798 Negative input voltage CMOS circuit |
| 03/03/1987 | US4647782 Charged particle beam exposure apparatus |
| 03/03/1987 | US4647523 Production of a resist image |
| 03/03/1987 | US4647517 Very large scale integration semiconductor components |
| 03/03/1987 | US4647477 Surface preparation of ceramic substrates for metallization |
| 03/03/1987 | US4647472 Process of producing a semiconductor device |
| 03/03/1987 | US4647361 Plates, electrodes, semiconductors, heaters |
| 03/03/1987 | US4647340 Programmable read only memory using a tungsten fuse |
| 03/03/1987 | US4647339 Production of semiconductor devices |
| 03/03/1987 | US4647338 Method of manufacturing a semiconductor device, in which a semiconductor substrate is subjected to a treatment in a reaction gas |
| 03/03/1987 | US4647266 Wafer coating system |
| 03/03/1987 | US4647096 Device for gripping electronic parts |
| 03/03/1987 | US4646958 Fluxless soldering process using a silane atmosphere |
| 03/03/1987 | US4646678 Thin film deposition |
| 03/03/1987 | US4646435 Chip carrier alignment device and alignment method |
| 03/03/1987 | US4646432 Placement mechanism |
| 03/03/1987 | US4646427 Method of electrically adjusting the zener knee of a lateral polysilicon zener diode |
| 03/03/1987 | US4646426 Method of producing MOS FET type semiconductor device |
| 03/03/1987 | US4646425 Method for making a self-aligned CMOS EPROM wherein the EPROM floating gate and CMOS gates are made from one polysilicon layer |
| 03/03/1987 | US4646424 Liquid crystal display devices |
| 03/03/1987 | US4646418 Carrier for photomask substrate |
| 03/03/1987 | CA1218767A1 Head and method for orienting electrical components |
| 03/03/1987 | CA1218766A1 Self-aligning, self-loading semiconductor clamp |
| 03/03/1987 | CA1218765A1 Contact material for compression bonded semiconductor devices |
| 03/03/1987 | CA1218764A2 Semiconductor die-attach technique and composition therefor |
| 03/03/1987 | CA1218763A1 Focal plane adjusted photomask and methods of projecting images onto photosensitized workpiece surfaces |
| 03/03/1987 | CA1218762A1 Method of producing a thin silicon-on-insulator layer |
| 03/03/1987 | CA1218761A1 Method and apparatus for tape automated bonding of integrated circuits |
| 03/03/1987 | CA1218760A1 Method of fabricating vlsi cmos devices |
| 03/03/1987 | CA1218567A1 Sensitizing bath for chalcogenide resists |
| 03/03/1987 | CA1218553A1 Cross-linked polyalkenyl phenol based photoresist compositions |
| 02/26/1987 | WO1987001239A1 Dielectric isolation structure for integrated circuits |
| 02/26/1987 | WO1987001238A1 Fabricating a semiconductor device with buried oxide |
| 02/26/1987 | DE3628233A1 Integrated circuit and method of producing the circuit |
| 02/25/1987 | EP0211716A1 Method for continuously producing micromodules for cards comprising components, continuous strip of micromodules, and micromodule realized by such a method |
| 02/25/1987 | EP0211667A2 Radiation-sensitive resin composition |
| 02/25/1987 | EP0211634A2 Method and apparatus for manufacturing semiconductor devices |
| 02/25/1987 | EP0211632A2 Self-aligned split gate EPROM |
| 02/25/1987 | EP0211622A1 Mos integrated circuit having a protection circuit which includes divided protection resistors |
| 02/25/1987 | EP0211620A2 Process and apparatus for sealing semiconductor packages |
| 02/25/1987 | EP0211609A2 Chemically sensitive semiconductor devices and their production |
| 02/25/1987 | EP0211590A2 Method and apparatus for optically determining defects in a semiconductor material |
| 02/25/1987 | EP0211529A1 Method for forming CuInSe2 films |
| 02/25/1987 | EP0211468A2 Device for producing alternating monomolecular layers |
| 02/25/1987 | EP0211441A2 Charge coupled device delay line |
| 02/25/1987 | EP0211412A2 Planar magnetron sputtering apparatus and its magnetic source |
| 02/25/1987 | EP0211402A2 Process and structure for thin film transistor matrix addressed liquid crystal displays |
| 02/25/1987 | EP0211401A2 N+ Amorphous silicon thin film transistors for matrix addressed liquid crystal displays |
| 02/25/1987 | EP0211370A2 Deposition and hardening of titanium gate electrode material for use in inverted thin film field effect transistors |
| 02/25/1987 | EP0211353A2 Method for the manufacture of a field effect transistor |
| 02/25/1987 | EP0211318A1 Process for selectively filling contact holes made by etching in insulating layers with electrically conductive materials for the manufacture of high-density integrated semiconductor circuits, and apparatus used for this process |
| 02/25/1987 | EP0211292A2 Molecular beam epitaxy apparatus |
| 02/25/1987 | EP0211190A1 CVD plasma reactor |
| 02/25/1987 | EP0211002A1 Method and apparatus for spot shaping and blanking a focused beam. |
| 02/25/1987 | CN86105660A Method of manufacturing semiconductor device |
| 02/25/1987 | CN86105621A Process and apparatus for production od clad sheets |
| 02/25/1987 | CN86102300A Buried interconnect for silicon |
| 02/24/1987 | US4646268 Semiconductor bipolar memory device operating in high speed |
| 02/24/1987 | US4646267 Semiconductor memory |
| 02/24/1987 | US4646266 Programmable semiconductor structures and methods for using the same |
| 02/24/1987 | US4646253 Method for imaging electrical barrier layers such as pn-junctions in semiconductors by means of processing particle-beam-induced signals in a scanning corpuscular microscope |
| 02/24/1987 | US4646130 Semiconductor device for current rectification |
| 02/24/1987 | US4646128 High-density electronic processing package--structure and fabrication |
| 02/24/1987 | US4646127 Scrap-less taping system for IC lead-frames |
| 02/24/1987 | US4646123 Latchup-preventing CMOS device |
| 02/24/1987 | US4646121 Thyristor with a self-protection function for breakover turn-on failure |
| 02/24/1987 | US4646119 Charge coupled circuits |
| 02/24/1987 | US4646118 Semiconductor memory device |
| 02/24/1987 | US4646116 Boron impurities at layer interface |
| 02/24/1987 | US4645924 Observation apparatus with selective light diffusion |
| 02/24/1987 | US4645687 Deposition of III-V semiconductor materials |
| 02/24/1987 | US4645684 Method for forming deposited film |
| 02/24/1987 | US4645683 Silicon nitride coating gallium arsenide |
| 02/24/1987 | US4645564 Method of manufacturing semiconductor device with MIS capacitor |
| 02/24/1987 | US4645563 Isotropic deposition, anisotropic etching |
| 02/24/1987 | US4645562 Double layer photoresist technique for side-wall profile control in plasma etching processes |
| 02/24/1987 | US4645560 Liquid encapsulation method for growing single semiconductor crystals |
| 02/24/1987 | US4645552 Process for fabricating dimensionally stable interconnect boards |
| 02/24/1987 | US4645546 With gettering layer on back side |
| 02/24/1987 | US4645402 Integrated circuit handler automatic unload apparatus |
| 02/24/1987 | US4645338 Optical system for focus correction for a lithographic tool |