H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/1986
11/11/1986	US4622570 Semiconductor memory
11/11/1986	US4622567 Semiconductor device
11/11/1986	US4622476 Temperature compensated active resistor
11/11/1986	US4622447 Microwave apparatus for vacuum treating and heating a semiconductor substrate
11/11/1986	US4622433 Ceramic package system using low temperature sealing glasses
11/11/1986	US4622383 Method for the fractionation of reactive terminated polymerizable oligomers
11/11/1986	US4622240 Process for manufacturing thick-film electrical components
11/11/1986	US4622236 Boron nitride film and process for preparing same
11/11/1986	US4622114 Process of producing devices with photoelectrochemically produced gratings
11/11/1986	US4622096 Method of manufacturing a semiconductor device comprising a silicon body, in which a sunken oxide layer is locally provided
11/11/1986	US4622094 Method of controlling dry etching by applying an AC voltage to the workpiece
11/11/1986	US4622083 Group 3 metal and group 3 metal and group 5 metal
11/11/1986	US4622082 Oxidation, reduction, nucleation
11/11/1986	US4622058 Formation of a multi-layer glass-metallized structure formed on and interconnected to multi-layered-metallized ceramic substrate
11/11/1986	US4621415 Method for manufacturing low resistance sub-micron gate Schottky barrier devices
11/11/1986	US4621414 Semiconductors
11/11/1986	US4621413 Annealing
11/11/1986	US4621412 Manufacturing a complementary MOSFET
11/11/1986	US4621411 Laser-enhanced drive in of source and drain diffusions
11/10/1986	EP0191805A4 Sealed standard interface apparatus.
11/10/1986	EP0182876A4 Tri-well cmos technology.
11/06/1986	WO1986006547A1 Double layer photoresist technique for side-wall profile control in plasma etching processes
11/06/1986	WO1986006546A1 Process for making semiconductor devices which involve gaseous etching
11/06/1986	WO1986006540A2 Memory cell for use in a read only memory
11/06/1986	WO1986006495A1 A coplanar waveguide probe
11/05/1986	EP0200603A2 A small contactless ram cell
11/05/1986	EP0200599A1 Method of producing non-linear control elements for an electro-optical, flat image screen, and flat screen produced by this method
11/05/1986	EP0200552A1 Photoelectric converting device
11/05/1986	EP0200531A1 Photoelectric conversion device
11/05/1986	EP0200525A2 Via in an integrated circuit and process for producing same
11/05/1986	EP0200477A2 Process for pattern formation
11/05/1986	EP0200441A2 Systems and methods for computer control of machine processes
11/05/1986	EP0200422A2 A transistor device
11/05/1986	EP0200372A2 Self-aligned contact window formation in an integrated circuit
11/05/1986	EP0200364A1 Method of fabricating metal silicide gate electrodes and interconnections
11/05/1986	EP0200355A2 Improvements in or relating to integrated circuit assemblies
11/05/1986	EP0200333A2 Ion beam processing method and apparatus
11/05/1986	EP0200332A2 Vertical apparatus for continuous deposition of semiconductor alloys
11/05/1986	EP0200237A2 Process to obtain thin film lines
11/05/1986	EP0200230A2 Logic integrated circuit device formed on compound semiconductor substrate
11/05/1986	EP0200133A2 Plasma etching reactor
11/05/1986	EP0200083A2 Apparatus for low-energy scanning electron beam lithography
11/05/1986	EP0200082A2 Barrierless high-temperature Lift-off process for forming a patterned interconnection layer
11/05/1986	EP0200059A2 A method of forming an ohmic contact to a group III-V semiconductor and a semiconductor intermediate manufacturing product
11/05/1986	EP0199965A2 Method of fabricating isolation trenches in a semiconductor wafer
11/05/1986	EP0199940A2 Photolithographic process, and organosilicone polymer composition for use therein
11/05/1986	EP0199939A2 A method of producing a metal silicide-silicon structure and a metal silicide-silicon structure
11/05/1986	EP0199875A1 Integrated semiconductor circuit device with multilayer wiring
11/05/1986	EP0199873A2 Heat sink mounting and method of making the same
11/05/1986	EP0199852A1 Monolithic integration of light-emitting elements and driver electronics
11/05/1986	EP0199736A1 Technique for the growth of epitaxial compound semiconductor films
11/05/1986	CN85204855U Mechanism for automatic transfer plate
11/05/1986	CN85109048A Chemical vapor deposition
11/05/1986	CN85103830A Trench capacitor process for high density dynamic ram
11/05/1986	CN85103578A Method of manufacturing a semiconductor device
11/05/1986	CN85103535A Methof of forming submircon grooves in, for example, semiconductor material and devices abtained by means of this method
11/04/1986	USH147 Indium phosphide or gallium arsenide; lasers, photodiodes
11/04/1986	US4621369 Input circuit for charge transfer device
11/04/1986	US4621278 Composite film, semiconductor device employing the same and method of manufacturing
11/04/1986	US4621277 Semiconductor device having insulating film
11/04/1986	US4621276 Buried contacts for N and P channel devices in an SOI-CMOS process using a single N+polycrystalline silicon layer
11/04/1986	US4621201 Integrated circuit redundancy and method for achieving high-yield production
11/04/1986	US4621045 Pillar via process
11/04/1986	US4620986 MOS rear end processing
11/04/1986	US4620934 Soluble fluorinated cycloalkane sulfonate surfactant additives for NH4
11/04/1986	US4620913 Electric arc vapor deposition method and apparatus
11/04/1986	US4620893 Apparatus for the plasma treatment of disk-shaped substrates
11/04/1986	US4620832 Furnace loading system
11/04/1986	US4620738 Vacuum pick for semiconductor wafers
11/04/1986	US4620661 Multilayer protective coating of nickel and noble metals
11/04/1986	US4620361 Method for producing a semiconductor device with a floating gate
11/04/1986	CA1213680A1 Rapid annealed boron implanted diodes
11/04/1986	CA1213600A1 Light-sensitive mixture based on o- naphthoquinonediazides, and light-sensitive copying material prepared therefrom
10/1986
10/29/1986	EP0199638A1 Process for producing on an insulator substrate an oriented single silicon crystal film with localized faults
10/29/1986	EP0199635A2 Integrated circuit device having stacked conductive layers connecting circuit elements therethrough
10/29/1986	EP0199497A2 Process for fabricating a self-aligned bipolar transistor
10/29/1986	EP0199435A2 Field effect semiconductor device
10/29/1986	EP0199427A1 Precision bandgap voltage reference
10/29/1986	EP0199424A2 Planar semiconductor device with a guard ring structure, family of such devices and method of manufacture
10/29/1986	EP0199388A1 Method of converting polycrystalline semiconductor material into monocrystalline semiconductor material
10/29/1986	EP0199387A1 Charge transfer device
10/29/1986	EP0199386A1 Method of producing conductive electrodes on a circuit element, and semiconductor device so obtained
10/29/1986	EP0199300A2 Method for making a patterned metal layer
10/29/1986	EP0199288A2 Method and apparatus for removing small particles from a surface
10/29/1986	EP0199231A1 Cell formed by using the CMOS technique
10/29/1986	EP0199167A2 Compound flow plasma reactor
10/29/1986	EP0199125A2 Multi-layer resist structure
10/29/1986	EP0199109A2 Bootstrap field effect transistor
10/29/1986	EP0199093A1 Process and apparatus for pulling a ribbon composed of a substrate coated by a semi-conductor material film from a melt of this material
10/29/1986	EP0199078A1 Integrated semiconductor circuit having an aluminium or aluminium alloy contact conductor path and an intermediate tantalum silicide layer as a diffusion barrier
10/29/1986	EP0199061A2 Semiconductor devices
10/29/1986	EP0199030A2 Method for manufacturing a multilayer wiring for integrated semiconductor circuits having at least one aluminium alloy layer with a contact hole filling
10/29/1986	EP0199014A2 Apparatus and method for determining focus correction for a lithographic tool
10/29/1986	EP0198976A2 Process for formation of insulating layer of silylated polysilsesquioxane on electronic circuit board
10/29/1986	EP0198852A1 Method for improving crystallinity of semiconductor ribbon
10/29/1986	EP0198842A1 Reactor apparatus for semiconductor wafer processing.
10/29/1986	CN86102448A Process to obtain thin film lines
10/28/1986	US4620288 Data handling system for a pattern generator
10/28/1986	US4620215 Integrated circuit packaging systems with double surface heat dissipation
10/28/1986	US4620213 Deep-grid semiconductor device

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