H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/1986
12/30/1986	US4632719 Two concentric ring of magnets
12/30/1986	US4632718 Ic lead frames, boards; continuous loading
12/30/1986	US4632713 Process of making Schottky barrier devices formed by diffusion before contacting
12/30/1986	US4632712 Vapor phase deposition, temperature control
12/30/1986	US4632711 Vapor phase epitaxial growth method of zinc selenide and zinc selenide-sulphide by organometallic chemical vapor deposition
12/30/1986	US4632710 Vapor phase epitaxial growth of carbon doped layers of Group III-V materials
12/30/1986	US4632709 Process for preventing melt-back in the production of aluminum-containing laser devices
12/30/1986	US4632653 Press with a plurality of injection plungers
12/30/1986	US4632624 Vacuum load lock apparatus
12/30/1986	US4632057 CVD plasma reactor
12/30/1986	US4631821 Method for joining metal components to a substrate
12/30/1986	US4631806 Forming apertures in masking layer, depositiong first metal, then second layer where first metal is diffusion barrier
12/30/1986	US4631804 Technique for reducing substrate warpage springback using a polysilicon subsurface strained layer
12/30/1986	US4631803 Forming thin stress relieving oxide layer
12/30/1986	EP0207018A1 Method of fabricating an imaging x-ray spectrometer
12/30/1986	EP0206980A2 Heat sink for semiconductor devices and method for manufacturing the same
12/30/1986	EP0206938A2 Germanosilicate spin-on glasses
12/30/1986	EP0206937A2 Stress relieved intermediate insulating layer for multilayer metalization
12/30/1986	EP0206929A1 Method of producing an integrated circuit and in particular an EPROM memory with two distinct electrically isolated components
12/30/1986	EP0206787A2 Heterojunction bipolar transistor and method of manufacturing same
12/30/1986	EP0206785A2 Memory array
12/30/1986	EP0206633A2 Method of inspecting masks and apparatus thereof
12/30/1986	EP0206628A2 Adhesively mountable die attach film
12/30/1986	EP0206541A2 Gallium arsenide single crystals, and process for the preparation thereof
12/30/1986	EP0206514A1 Double crucible for single crystal growth
12/30/1986	EP0206481A2 Semiconductor device having a multi-layered wiring
12/30/1986	EP0206445A2 Process for forming a semiconductor cell in a silicon semiconductor body and a mixed CMOS/bipolar integrated circuit formed in a plurality of such cells
12/30/1986	EP0206444A1 Semiconductor device with interconnection and insulating layers
12/30/1986	EP0206370A1 Process for making a semiconductor device, including the vapour phase deposition of crystalline layers on a substrate
12/30/1986	EP0206274A1 High transconductance complementary IC structure
12/30/1986	EP0206229A2 Semiconductor memory device
12/30/1986	EP0206205A2 Read only memory device
12/30/1986	EP0206180A2 A means for loading or unloading workpiece into or from a vacuum processing chamber
12/30/1986	EP0206136A2 Semiconductor device manufacturing method
12/30/1986	EP0206055A2 A reactive ion etching process
12/30/1986	EP0206016A2 Apparatus and method for displaying hole-electron pair distributions induced by electron bombardment
12/30/1986	EP0205917A2 Sputtering apparatus
12/30/1986	EP0205760A1 Noncontact testing of integrated circuits
12/30/1986	EP0205728A2 Arrangement of input-output pins of an integrated circuit package
12/30/1986	EP0205644A1 Process for making contact holes in insulating layers applied to semiconductor material
12/30/1986	EP0205639A1 Bidirectional power fet with substrate referenced shield
12/30/1986	EP0205638A1 Bidirectional power fet with integral avalanche protection
12/30/1986	EP0205571A1 Establishing and/or evaluating alignment by means of alignment marks.
12/30/1986	EP0205557A1 Process for fabricating a device.
12/30/1986	EP0205476A1 Triode plasma reactor with magnetic enhancement
12/30/1986	EP0205422A1 Continuously pulled single crystal silicon ingots
12/30/1986	EP0108065B1 Method for manufacturing semi-conducting devices and semi-conducting devices thus obtained
12/30/1986	EP0097148B1 Improvements in or relating to wafer scale integrated circuits
12/30/1986	EP0075588B1 Process for fabricating a self-aligned buried channel and the product thereof
12/30/1986	EP0040629B1 Fine-line solid state device
12/30/1986	EP0026788B1 Semiconductor device
12/30/1986	CA1216076A1 Method for the manufacture of bipolar transistor structures with self-adjusting emitter and base regions for extreme high frequency circuits
12/30/1986	CA1216075A1 Wafer fabrication by implanting through protective layer
12/24/1986	CN85104935A Semiconductor integrated circuit and a method for designing circuit pattern therefor
12/24/1986	CN85103942A Laser-heating recrystallization method to polycrystalline silicon on the insulated layer
12/23/1986	US4631724 Semiconductor memory test equipment
12/23/1986	US4631705 Semiconductor integrated circuit memory device
12/23/1986	US4631686 Semiconductor integrated circuit device
12/23/1986	US4631633 Thin film capacitors and method of making the same
12/23/1986	US4631572 Multiple path signal distribution to large scale integration chips
12/23/1986	US4631571 Semiconductor device for use in a large scale integration circuit
12/23/1986	US4631570 Integrated circuit having buried oxide isolation and low resistivity substrate for power supply interconnection
12/23/1986	US4631568 Bipolar transistor construction
12/23/1986	US4631567 Semiconductor device for receiving an input signal
12/23/1986	US4631565 MISFET with input amplifier
12/23/1986	US4631416 Wafer/mask alignment system using diffraction gratings
12/23/1986	US4631248 Method for forming an electrical contact in an integrated circuit
12/23/1986	US4631234 Doping, semiconductors
12/23/1986	US4631219 Oxygen-impervious pad for semi-recessed oxide isolation regions of semiconductors
12/23/1986	US4631199 Oxidizing silane vapor with nitrous oxide and oxygen mixture exposed to radiation
12/23/1986	US4631198 By plasma vapor deposition
12/23/1986	US4631113 Selective etching
12/23/1986	US4631103 Process for peeling protective film off a thin article
12/23/1986	US4630922 Pattern transfer apparatus
12/23/1986	US4630357 Method for forming improved contacts between interconnect layers of an integrated circuit
12/23/1986	US4630356 Method of forming recessed oxide isolation with reduced steepness of the birds' neck
12/23/1986	US4630355 Electric circuits having repairable circuit lines and method of making the same
12/23/1986	US4630343 Flat glass surface
12/23/1986	CA1215788A1 Integrated circuit processing methods
12/23/1986	CA1215787A1 Buried schottky clamped transistor
12/23/1986	CA1215614A1 Brown stain suppressing phenol free and chlorinated hydrocarbon free photoresist stripper
12/23/1986	CA1215521A1 Catenated phosphorus materials, their preparation and use, and semiconductor and other devices employing them
12/18/1986	WO1986007520A1 Device for piling uniform objects, particularly plate-like objects
12/18/1986	WO1986007493A1 Calibration apparatus for integrated circuits
12/18/1986	WO1986007492A1 Lead frame deflashing
12/18/1986	WO1986007491A1 Process for forming contacts and interconnects for integrated circuits
12/18/1986	WO1986007474A1 Method and apparatus for the production of high resolution images
12/18/1986	WO1986007473A1 Contrast enhancement layer
12/18/1986	WO1986007337A1 Loading and unloading system for piece part carrier
12/18/1986	WO1986006540A3 Memory cell for use in a read only memory
12/17/1986	EP0205221A1 Charge-coupled device
12/17/1986	EP0205203A1 Charge-coupled device
12/17/1986	EP0205190A2 Method of producing a resin packaged semiconductor device
12/17/1986	EP0205183A2 Clad sheet and process and apparatus for producing same
12/17/1986	EP0205148A2 Method of applying a resist
12/17/1986	EP0205142A2 Pin lift plasma processing
12/17/1986	EP0205034A1 Chemical vapor deposition method for the GaAs thin film
12/17/1986	EP0205028A1 Apparatus for depositing thin layers on a substrate
12/17/1986	EP0205008A2 Integrated semiconductor structure and fabrication method
12/17/1986	EP0204979A1 Method of simultaneously producing bipolar and complementary MOS transistors as a common silicon substrate

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