Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
07/2004
07/20/2004US6764386 Air bearing-sealed micro-processing chamber
07/20/2004US6764385 Methods for resist stripping and cleaning surfaces substantially free of contaminants
07/20/2004US6764381 Polishing apparatus
07/20/2004US6764380 Method and apparatus for measuring substrate layer thickness during chemical mechanical polishing
07/20/2004US6764271 Substrate conveyer robot
07/20/2004US6764212 Chemical supply system
07/20/2004US6763994 Semiconductor device and method of manufacture thereof, circuit board and electronic instrument
07/20/2004US6763840 Method and apparatus for cleaning substrates using liquid carbon dioxide
07/20/2004US6763839 Substrate cleaning system
07/20/2004US6763714 Method and apparatus for controlling the level of liquids
07/20/2004US6763700 Trap apparatus
07/20/2004US6763608 Method of transporting a reticle
07/20/2004US6763585 Method for producing micro bump
07/20/2004US6763581 Method for manufacturing spiral contactor
07/20/2004US6763578 Method and apparatus for manufacturing known good semiconductor die
07/20/2004CA2318968C Slip free vertical rack design having rounded horizontal arms
07/20/2004CA2222857C Process to create metallic stand-offs on an electronic circuit
07/20/2004CA2167396C Silicon pixel electrode
07/15/2004WO2004060034A1 Electronic component-built-in module
07/15/2004WO2004060028A1 Organic electroluminescence element and organic electroluminescence display
07/15/2004WO2004059841A1 Ground switching circuit
07/15/2004WO2004059838A1 Non-volatile latch circuit and method for driving same
07/15/2004WO2004059809A2 Methods of forming semiconductor devices having self aligned semiconductor mesas and contact layers and related devices
07/15/2004WO2004059808A2 Methods of forming semiconductor devices including mesa structures and multiple passivation layers and related devices
07/15/2004WO2004059751A2 Methods of forming semiconductor mesa structures including self-aligned contact layers and related devices
07/15/2004WO2004059745A1 Magnetic switching device and magnetic memory
07/15/2004WO2004059744A1 Compound semiconductor epitaxial substrate and method for manufacturing same
07/15/2004WO2004059743A1 Compound semiconductor epitaxial substrate and method for manufacturing same
07/15/2004WO2004059742A1 High electron mobility epitaxial substrate
07/15/2004WO2004059739A2 Memory architecture with series grouped memory cells
07/15/2004WO2004059738A1 Fin field effect transistor memory cell, fin field effect transistor memory cell arrangement, and method for the production of a fin field effect transistor memory cell
07/15/2004WO2004059737A1 Multi-level memory cell with lateral floating spacers
07/15/2004WO2004059736A1 Method for manufacturing semiconductor device
07/15/2004WO2004059732A1 Ic tiling pattern method, ic so formed and analysis method
07/15/2004WO2004059731A1 Silicon on sapphire structure (devices) with buffer layer
07/15/2004WO2004059730A1 Method of self-assembling electronic circuitry and circuits formed thereby
07/15/2004WO2004059728A2 Method of fabricating an integrated circuit and semiconductor chip
07/15/2004WO2004059727A1 Methods of forming structure and spacer and related finfet
07/15/2004WO2004059726A1 Integrated antifuse structure for finfet and cmos devices
07/15/2004WO2004059725A1 Method of the production of cavities in a silicon sheet
07/15/2004WO2004059724A1 End effector assembly for supporting substrates
07/15/2004WO2004059723A2 System to identify a wafer manufacturing problem and method therefor
07/15/2004WO2004059721A1 Electronic component unit
07/15/2004WO2004059720A1 Three-dimensional device fabrication method
07/15/2004WO2004059718A1 Method of fabricating a tft device formed by printing
07/15/2004WO2004059717A1 Thin film transistor, method for producing a thin film transistor and electronic device having such a transistor
07/15/2004WO2004059716A1 A system and method for controlling plasma with an adjustable coupling to ground circuit
07/15/2004WO2004059715A1 Polishing pads, conditioner and methods for polishing using the same
07/15/2004WO2004059713A1 Selective etching of a protective layer
07/15/2004WO2004059711A1 Method of producing mixed substrates and structure thus obtained
07/15/2004WO2004059709A1 Coating device and coating film forming method
07/15/2004WO2004059708A2 Structure and method for bonding to copper interconnect structures
07/15/2004WO2004059707A2 A method and apparatus for forming a high quality low temperature silicon nitride film
07/15/2004WO2004059706A2 Electronic devices including semiconductor mesa structures and conductivity junctions and methods of forming said devices
07/15/2004WO2004059705A1 Apparatus and methods for dispensing fluids with rotatable dispense arms
07/15/2004WO2004059704A1 Method of manufacturing an oxide beam
07/15/2004WO2004059703A1 Finfet sram cell using inverted finfet thin film transistors
07/15/2004WO2004059702A2 Method and apparatus for monitoring a material processing system
07/15/2004WO2004059700A2 Photoresist removal
07/15/2004WO2004059699A2 System and method for on-the-fly eccentricity recognition
07/15/2004WO2004059697A2 Adaptive negative differential resistance device
07/15/2004WO2004059695A2 Ultrasonic levitation in a rapid thermal processing plant for wafers
07/15/2004WO2004059689A2 Method and apparatus for monitoring a plasma in a material processing system
07/15/2004WO2004059682A1 Low-temperature formation method for emitter tip including copper oxide nanowire or copper oxide nanowire or copper nanowire and display device or light source having emitter tip manufactured using the same
07/15/2004WO2004059678A1 Push/pull actuator for microstructures
07/15/2004WO2004059391A1 Resist composition and method of forming resist pattern using same
07/15/2004WO2004059384A1 Lithography mask blank
07/15/2004WO2004059383A2 Fluoride in supercritical fluid for photoresist and residue removal
07/15/2004WO2004059271A1 Method for determining the temperature of a semiconductor wafer in a rapid thermal processing system
07/15/2004WO2004059242A1 Method and apparatus for metrological process control implementing complimentary sensors
07/15/2004WO2004059042A1 Lead-free bump and method for forming the same
07/15/2004WO2004059038A1 Etching of algainassb
07/15/2004WO2004058453A1 Polishing pad having multi-windows
07/15/2004WO2004053994A3 Buffer layer comprising quaternary and ternary alloys in semiconductor devices
07/15/2004WO2004051729A3 Method and device for pre-treating surfaces of substrates to be bonded
07/15/2004WO2004049424A3 Microelectronic packaging and components
07/15/2004WO2004049400A3 Methods for applying thermally conductive compounds utilizing piezo electric jet deposition
07/15/2004WO2004047148A3 Method for producing and testing a corrosion-resistant channel in a silicon device
07/15/2004WO2004042794A3 Removal of particle contamination on patterned slilicon/silicon dioxide using supercritical carbon dioxide/chemical formulations
07/15/2004WO2004042784A8 Stabilized semiconductor nanocrystals
07/15/2004WO2004041972A3 Gas layer formation materials
07/15/2004WO2004040623A3 An improved barrier layer for a copper metallization layer including a low k dielectric
07/15/2004WO2004038787A3 Using scatterometry to optimize circuit structure manufacturing processes
07/15/2004WO2004038764A3 Semiconductor device with quantum well and etch stop
07/15/2004WO2004030083A3 User interface for quantifying wafer non-uniformities and graphically explore significance
07/15/2004WO2004027865A3 Support structures for wirebond regions of contact pads over low modulus materials
07/15/2004WO2004017361A3 Method for selectively removing material from the surface of a substrate, masking material for a wafer and wafer provided with a masking material
07/15/2004WO2004017143A3 Method for irradiating a resist
07/15/2004WO2004015741A3 Notch-free etching of high aspect soi structures using alternating deposition and etching and pulsed plasma
07/15/2004WO2004013697A3 Micro-contact printing method
07/15/2004WO2004008246A3 Method and system for context-specific mask writing
07/15/2004WO2004003970A9 A semiconductor device and method of fabricating a semiconductor device
07/15/2004WO2004000718A3 Bridges for microelectromechanical structures
07/15/2004WO2003107350B1 Magnetoresistive random access memory with reduced switching field
07/15/2004WO2003106328A3 Micromechanical component and corresponding production method
07/15/2004WO2003104344A8 Abrasive particles to clean semiconductor wafers during chemical mechanical planarization
07/15/2004WO2003098636A3 STACKED 1T-nMEMORY CELL STRUCTURE
07/15/2004WO2003085742A8 Method for forming a modified semiconductor having a plurality of band gaps
07/15/2004WO2003084688A3 Method and system for providing a thin film
07/15/2004WO2003079240A3 System and method for placement of dummy metal fills while preserving device matching and/or limiting capacitance increase